Patents by Inventor Suzanne Coley

Suzanne Coley has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • COATING COMPOSITIONS FOR USE WITH AN OVERCOATED PHOTORESIST
    Publication number: 20190354015
    Abstract: Organic coating compositions, particularly antireflective coating compositions, are provided that comprise that comprise a component that comprises one or more uracil moieties. Preferred compositions of the invention are useful to reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and/or function as a planarizing, conformal or via-fill layer.
    Type: Application
    Filed: July 29, 2019
    Publication date: November 21, 2019
    Applicant: Rohm and Haas Electronic Materials LLC
    Inventors: Owendi Ongayi, Vipul Jain, Suzanne Coley, Anthony Zampini
  • Coating compositions for use with an overcoated photoresist
    Patent number: 10481494
    Abstract: Organic coating compositions, particularly antireflective coating compositions, are provided that comprise that comprise a component that comprises one or more parabanic acid moieties. Preferred compositions of the invention are useful to reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and/or function as a planarizing, conformal or via-fill layer.
    Type: Grant
    Filed: March 2, 2015
    Date of Patent: November 19, 2019
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Vipul Jain, Owendi Ongayi, Suzanne Coley, Anthony Zampini
  • Coating compositions for use with an overcoated photoresist
    Patent number: 10365562
    Abstract: Organic coating compositions, particularly antireflective coating compositions, are provided that comprise that comprise a component that comprises one or more uracil moieties. Preferred compositions of the invention are useful to reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and/or function as a planarizing, conformal or via-fill layer.
    Type: Grant
    Filed: December 30, 2011
    Date of Patent: July 30, 2019
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Owendi Ongayi, Vipul Jain, Suzanne Coley, Anthony Zampini
  • Coating compositions for use with an overcoated photoresist
    Patent number: 9244352
    Abstract: Coating compositions for use with an overcoated photoresist are provided where the coating composition comprises a resin containing cyanurate groups and hydrophobic groups. The coating composition can enhance resolution of an overcoated photoresist relief image.
    Type: Grant
    Filed: May 18, 2010
    Date of Patent: January 26, 2016
    Assignee: Rohm and Haas Electronic Materials, LLC
    Inventors: Anthony Zampini, Gerald B. Wayton, Vipul Jain, Cong Liu, Suzanne Coley, Owendi Ongayi
  • Copolymer with acid-labile group, photoresist composition, coated substrate, and method of forming an electronic device
    Patent number: 9182669
    Abstract: A copolymer includes repeat units derived from a lactone-substituted monomer, a base-soluble monomer having a pKa less than or equal to 12, a photoacid-generating monomer, and an acid-labile monomer having the formula wherein R1, R2, R3, and Ar are defined herein. The copolymer can be used as a component of a photoresist composition, and the photoresist composition can be coated on a substrate having one or more layers to be patterned, or used in a method of forming an electronic device.
    Type: Grant
    Filed: October 30, 2014
    Date of Patent: November 10, 2015
    Assignee: ROHM AND HAAS ELECTRONIC MATERIALS LLC
    Inventors: Owendi Ongayi, Vipul Jain, James F. Cameron, James W. Thackeray, Suzanne Coley
  • COPOLYMER WITH ACID-LABILE GROUP, PHOTORESIST COMPOSITION, COATED SUBSTRATE, AND METHOD OF FORMING AN ELECTRONIC DEVICE
    Publication number: 20150177614
    Abstract: A copolymer includes repeat units derived from a lactone-substituted monomer, a base-soluble monomer having a pKa less than or equal to 12, a photoacid-generating monomer, and an acid-labile monomer having the formula wherein R1, R2, R3, and Ar are defined herein. The copolymer can be used as a component of a photoresist composition, and the photoresist composition can be coated on a substrate having one or more layers to be patterned, or used in a method of forming an electronic device.
    Type: Application
    Filed: October 30, 2014
    Publication date: June 25, 2015
    Inventors: Owendi Ongayi, Vipul Jain, James F. Cameron, James W. Thackeray, Suzanne Coley
  • Coating compositions for use with an overcoated photoresist
    Patent number: 8968981
    Abstract: Organic coating compositions, particularly antireflective compositions, that comprise a component that comprises one or more parabanic acid moieties. Preferred compositions of the invention can reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and can serve as a planarizing, conformal or via-fill layer.
    Type: Grant
    Filed: December 30, 2011
    Date of Patent: March 3, 2015
    Inventors: Vipul Jain, Owendi Ongayi, Suzanne Coley, Anthony Zampini
  • Coating composition for use with an overcoated photoresist
    Patent number: 8927681
    Abstract: In a first aspect, organic coating compositions are provided, particularly spin-on antireflective coating compositions, that contain a polyester resin component. In a further aspect, coating compositions are provided that contain a resin component obtained by polymerization of a multi-hydroxy compound. Coating compositions of the invention are particularly useful employed in combination with an overcoated photoresist layer to manufacture integrated circuits.
    Type: Grant
    Filed: August 31, 2009
    Date of Patent: January 6, 2015
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Gerald B. Wayton, Peter Trefonas, III, Suzanne Coley, Tomoki Kurihara
  • Coating compositions for use with an overcoated photoresist
    Patent number: 8501383
    Abstract: Cyanurate compositions are provided that are particularly useful as a reagent to form a resin component of a coating composition underlying an overcoated photoresist. Preferred isocyanurates compound comprise substitution of multiple cyanurate nitrogen ring atoms by at least two distinct carboxy and/or carboxy ester groups.
    Type: Grant
    Filed: May 18, 2010
    Date of Patent: August 6, 2013
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Anthony Zampini, Vipul Jain, Cong Liu, Suzanne Coley, Owendi Ongayi
  • COATING COMPOSITIONS FOR USE WITH AN OVERCOATED PHOTORESIST
    Publication number: 20130004901
    Abstract: Organic coating compositions, particularly antireflective coating compositions, are provided that comprise that comprise a component that comprises one or more uracil moieties. Preferred compositions of the invention are useful to reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and/or function as a planarizing, conformal or via-fill layer.
    Type: Application
    Filed: December 30, 2011
    Publication date: January 3, 2013
    Applicant: Rohm and Haas Electronic Materials LLC
    Inventors: Owendi ONGAYI, Vipul JAIN, Suzanne COLEY, Anthony ZAMPINI
  • COATING COMPOSITIONS FOR USE WITH AN OVERCOATED PHOTORESIST
    Publication number: 20130004893
    Abstract: Organic coating compositions, particularly antireflective coating compositions, are provided that comprise that comprise a component that comprises one or more parabanic acid moieties. Preferred compositions of the invention are useful to reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and/or function as a planarizing, conformal or via-fill layer.
    Type: Application
    Filed: December 30, 2011
    Publication date: January 3, 2013
    Applicant: Rohm and Haas Electronic Materials LLC
    Inventors: Vipul Jain, Owendi Ongayi, Suzanne Coley, Anthony Zampini
  • COATING COMPOSITION FOR USE WITH AN OVERCOATED PHOTORESIST
    Publication number: 20120034562
    Abstract: In a first aspect, organic coating compositions are provided, particularly spin-on antireflective coating compositions, that contain a polyester resin component. In a further aspect, coating compositions are provided that contain a resin component obtained by polymerization of a multi-hydroxy compound. Coating compositions of the invention are particularly useful employed in combination with an overcoated photoresist layer to manufacture integrated circuits.
    Type: Application
    Filed: August 31, 2009
    Publication date: February 9, 2012
    Inventors: Gerald B. Wayton, Peter Trefonas, III, Suzanne Coley, Tomoki Kurihara
  • COATING COMPOSITIONS FOR USE WITH AN OVERCOATED PHOTORESIST
    Publication number: 20110033801
    Abstract: Coating compositions for use with an overcoated photoresist are provided where the coating composition comprises a resin containing cyanurate groups and hydrophobic groups. The coating composition can enhance resolution of an overcoated photoresist relief image.
    Type: Application
    Filed: May 18, 2010
    Publication date: February 10, 2011
    Applicant: Rohm and Haas Electronic Materials LLC
    Inventors: Anthony Zampini, Gerald B. Wayton, Vipul Jain, Cong Liu, Suzanne Coley, Owendi Ongayi
  • COATING COMPOSITIONS FOR USE WITH AN OVERCOATED PHOTORESIST
    Publication number: 20110033800
    Abstract: Cyanurate compositions are provided that are particularly useful as a reagent to form a resin component of a coating composition underlying an overcoated photoresist. Preferred isocyanurates compound comprise substitution of multiple cyanurate nitrogen ring atoms by at least two distinct carboxy and/or carboxy ester groups.
    Type: Application
    Filed: May 18, 2010
    Publication date: February 10, 2011
    Applicant: Rohm and Haas Electronic Materials LLC
    Inventors: Anthony ZAMPINI, Vipul Jain, Cong Liu, Suzanne Coley, Owendi Ongayi
  • Coating compositions for use with an overcoated photoresist
    Patent number: 7582360
    Abstract: In a first aspect, organic coating compositions are provided, particularly spin-on antireflective coating compositions, that contain a polyester resin component. In a further aspect, coating compositions are provided that contain a resin component obtained by polymerization of a multi-hydroxy compound. Coating compositions of the invention are particularly useful employed in combination with an overcoated photoresist layer to manufacture integrated circuits.
    Type: Grant
    Filed: December 5, 2006
    Date of Patent: September 1, 2009
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Gerald B. Wayton, Peter Trefonas, III, Suzanne Coley, Tomoki Kurihara
  • Antireflective coatings with increased etch rates
    Patent number: 7183037
    Abstract: The present invention provides new light absorbing compositions suitable for use as an antireflective coating (“ARC”) with an overcoated resist layer. ARCs of the invention exhibit increased etch rates in standard plasma etchants. Preferred ARCs of invention have significantly increased oxygen content relative to prior compositions.
    Type: Grant
    Filed: August 17, 2001
    Date of Patent: February 27, 2007
    Assignee: Shipley Company, L.L.C.
    Inventors: Zhibiao Mao, Suzanne Coley, Timothy G. Adams
  • Coating compositions for use with an overcoated photoresist
    Patent number: 7163751
    Abstract: In a first aspect, organic coating compositions are provided, particularly spin-on antireflective coating compositions, that contain a polyester resin component. In a further aspect, coating compositions are provided that contain a resin component obtained by polymerization of a multi-hydroxy compound. Coating compositions of the invention are particularly useful employed in combination with an overcoated photoresist layer to manufacture integrated circuits.
    Type: Grant
    Filed: May 12, 2004
    Date of Patent: January 16, 2007
    Assignee: Shipley Company, L.L.C.
    Inventors: Gerald B. Wayton, Peter Trefonas, III, Suzanne Coley, Tomoki Kurihara
  • Coating compositions for use with an overcoated photoresist
    Publication number: 20060068335
    Abstract: Compositions and methods are provided that can reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and/or function as a planarizing or via-fill layer. Preferred coating composition and methods of the invention can provide enhanced resolution of a patterned overcoated photoresist layer and include use of low activation temperature thermal acid generators as well as multiple thermal treatments to process a layer of the underlying coating composition.
    Type: Application
    Filed: May 18, 2005
    Publication date: March 30, 2006
    Applicant: Rohm and Haas Electronic Materials, L.L.C.
    Inventors: Suzanne Coley, Peter Trefonas, Patricia Fallon, Gerald Wayton
  • Planarizing antireflective coating compositions
    Patent number: 6855466
    Abstract: The present invention provides new light absorbing compositions suitable for use as antireflective coating compositions (“ARCs”), including for deep UV applications. The antireflective compositions of the invention are particularly useful where a planarizing coating layer is required. ARCs of the invention contain a low molecular weight resin, a plasticizer compound and/or a low Tg resin. The invention also includes methods for applying forming planarizing ARC coating layers.
    Type: Grant
    Filed: September 15, 2001
    Date of Patent: February 15, 2005
    Assignee: Shipley Company, L.L.C.
    Inventors: Edward K. Pavelchek, Timothy G. Adams, Manuel doCanto, Suzanne Coley, George G. Barclay
  • Coating compositions for use with an overcoated photoresist
    Patent number: 6852421
    Abstract: In a first aspect, organic coating compositions are provided, particularly spin-on antireflective coating compositions, that contain a polyester resin component. In a further aspect, coating compositions are provided that contain a resin component obtained by polymerization of a multi-hydroxy compound. Coating compositions of the invention are particularly useful employed in combination with an overcoated photoresist layer to manufacture integrated circuits.
    Type: Grant
    Filed: September 26, 2002
    Date of Patent: February 8, 2005
    Assignee: Shipley Company, L.L.C.
    Inventors: Gerald B. Wayton, Peter Trefonas, III, Suzanne Coley, Tomoki Kurihara