Patents by Inventor Suzanne Coley

Suzanne Coley has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Coating compositions for use with an overcoated photoresist
    Publication number: 20040209200
    Abstract: In a first aspect, organic coating compositions are provided, particularly spin-on antireflective coating compositions, that contain a polyester resin component. In a further aspect, coating compositions are provided that contain a resin component obtained by polymerization of a multi-hydroxy compound. Coating compositions of the invention are particularly useful employed in combination with an overcoated photoresist layer to manufacture integrated circuits.
    Type: Application
    Filed: May 12, 2004
    Publication date: October 21, 2004
    Applicant: Shipley Company, L.L.C.
    Inventors: Gerald B. Wayton, Peter Trefonas, Suzanne Coley, Tomoki Kurihara
  • Reduction of inorganic contaminants in polymers and photoresist compositions comprising same
    Patent number: 6773872
    Abstract: The present invention provides polymers which are substantially or completely free of inorganic contaminants and the use of such polymers as a resin component for photoresist compositions, particularly chemically-amplified positive-acting resists. Polymers of the invention also are suitable for use as a resin component for antireflective coating compositions (ARCs). More particularly, the invention provides methods for reducing such contaminants in polymerization initiators, particularly free radical initiators.
    Type: Grant
    Filed: December 27, 2001
    Date of Patent: August 10, 2004
    Assignee: Shipley Company, L.L.C.
    Inventors: Dana A. Gronbeck, Suzanne Coley, Chi Q. Truong, Ashish Pandya
  • Coating compositions for use with an overcoated photoresist
    Publication number: 20040067437
    Abstract: In a first aspect, organic coating compositions are provided, particularly spin-on antireflective coating compositions, that contain a component such as a resin that comprises an aryl dicarboxylate group. In a further aspect, organic coating compositions are provided, particularly spin-on antireflective coating compositions, that comprises a solvent component that comprises one or more oxyisobutyric acid esters such as methyl-2-hydroxyisobutyrate.
    Type: Application
    Filed: October 6, 2002
    Publication date: April 8, 2004
    Applicant: Shipley Company, L.L.C.
    Inventors: Gerald B. Wayton, Peter Trefonas, Suzanne Coley, Tomoki Kurihara
  • Acetal/alicyclic polymers and photoresist compositions
    Publication number: 20030232273
    Abstract: The invention includes polymers that contain an alicyclic group (cage group) and acetal group which can undergo a deblocking reaction in the presence of photogenerated acid. The invention also provides photoresists that contain such polymers, particularly for imaging at short wavelengths such as sub-300 nm and sub-200 nm.
    Type: Application
    Filed: October 9, 2002
    Publication date: December 18, 2003
    Applicant: Shipley Company, L.L.C.
    Inventors: Timothy G. Adams, Suzanne Coley
  • Coating compositions for use with an overcoated photoresist
    Publication number: 20030180559
    Abstract: In a first aspect, organic coating compositions are provided, particularly spin-on antireflective coating compositions, that contain a polyester resin component. In a further aspect, coating compositions are provided that contain a resin component obtained by polymerization of a multi-hydroxy compound. Coating compositions of the invention are particularly useful employed in combination with an overcoated photoresist layer to manufacture integrated circuits.
    Type: Application
    Filed: September 26, 2002
    Publication date: September 25, 2003
    Applicant: Shipley Company, L.L.C.
    Inventors: Gerald B. Wayton, Peter Trefonas, Suzanne Coley, Tomoki Kurihara
  • Reduction of inorganic contaminants in polymers and photoresist compositions comprising same
    Publication number: 20020142246
    Abstract: The present invention provides polymers which are substantially or completely free of inorganic contaminants and the use of such polymers as a resin component for photoresist compositions, particularly chemically-amplified positive-acting resists. Polymers of the invention also are suitable for use as a resin component for antireflective coating compositions (ARCs). More particularly, the invention provides methods for reducing such contaminants in polymerization initiators, particularly free radical initiators.
    Type: Application
    Filed: December 27, 2001
    Publication date: October 3, 2002
    Applicant: Shipley Company, L.L.C.
    Inventors: Dana A. Gronbeck, Suzanne Coley, Chi Q. Truong, Ashish Pandya
  • Etch resistant antireflective coating compositions
    Publication number: 20020028408
    Abstract: The present invention provides new light absorbing compositions suitable for use as an antireflective coating (“ARC”) with an overcoated resist layer. ARCs of the invention are etch resistant and that exhibit increased etch rates in standard plasma etchants. Preferred ARCs of the invention have significantly increased oxygen content relative to prior compositions.
    Type: Application
    Filed: August 17, 2001
    Publication date: March 7, 2002
    Applicant: Shipley Company, L.L.C.
    Inventors: Zhibiao Mao, Suzanne Coley, Timothy G. Adams
  • Planarizing antireflective coating compositions
    Publication number: 20020022196
    Abstract: The present invention provides new light absorbing compositions suitable for use as antireflective coating compositions (“ARCs”), including for deep UV applications. The antireflective compositions of the invention are particularly useful where a planarizing coating layer is required. ARCs of the invention contain a low molecular weight resin, a plasticizer compound and/or a low Tg resin. The invention also includes methods for applying forming planarizing ARC coating layers.
    Type: Application
    Filed: September 15, 2001
    Publication date: February 21, 2002
    Applicant: Shipley Company, L.L.C.
    Inventors: Edward K. Pavelchek, Timothy G. Adams, Manuel doCanto, Suzanne Coley, George G. Barclay
  • Planarizing antireflective coating compositions
    Patent number: 6316165
    Abstract: The present invention provides new light absorbing compositions suitable for use as antireflective coating compositions (“ARCs”), including for deep UV applications. The antireflective compositions of the invention are particularly useful where a planarizing coating layer is required. ARCs of the invention contain a low molecular weight resin, a plasticizer compound and/or a low Tg resin. The invention also includes methods for applying forming planarizing ARC coating layers.
    Type: Grant
    Filed: March 8, 1999
    Date of Patent: November 13, 2001
    Assignee: Shipley Company, L.L.C.
    Inventors: Edward K. Pavelchek, Timothy G. Adams, Manuel doCanto, Suzanne Coley, George G. Barclay