Abstract: An information processing system includes a heat treatment apparatus that performs heat treatment on a processing target substrate by using a heating unit, and an information processing apparatus that controls power supplied to the heating unit. The information processing system further includes a heating control unit that controls the power supplied to the heating unit based on a measured temperature and a set temperature, a virtual power output unit that outputs virtual power supplied to a simulation model of the heat treatment apparatus based on the set temperature and a predicted temperature, a temperature prediction unit that outputs the predicted temperature, based on the virtual power, to the virtual power output unit by using the simulation model, and an abnormality detection unit that detects an abnormality in the heat treatment apparatus based on a difference between the power controlled by the heating control unit and the virtual power.

Abstract: An information processing system includes a heat treatment apparatus that forms a film on a processing target substrate by using a heating unit that heats the processing target substrate inside a processing container, and an information processing apparatus that controls power supplied to the heating part, the information processing system comprising a prediction unit configured to predict an influence of a cumulative film adhering inside the processing container, on a temperature of the processing target substrate by using a simulation model of the heat treatment apparatus and an adjuster configured to adjust the power supplied to the heating part based on the predicted influence of the cumulative film adhering inside the processing container, on the temperature of the processing target substrate.

Abstract: A transfer method transfers a substrate between a transfer unit configured to hold and transfer the substrate and a substrate stage serving as a transfer destination or a transfer source of the substrate. The transfer method includes: acquiring positional information of the transfer unit and positional information of the substrate stage; determining whether or not there is a risk for the substrate to contact with the substrate stage, based on the acquired positional information of the transfer unit and positional information of the substrate stage; and when determined that there is a risk for the substrate to contact with the substrate stage, notifying the risk according to the determination at the determining.

Abstract: A substrate processing apparatus includes: a chamber that accommodates a boat; a transfer mechanism that is provided inside the chamber, and transfers a substrate; a first camera that captures an image of a support column of the boat and the substrate; a support member that is inserted through an opening formed in a wall surface of the chamber, and supports the first camera; and a driver that drives the support member in order to move the first camera between a standby position and a measurement position.

Abstract: This coating condition detection method according to one embodiment uses a simple device structure to detect the coating condition of a resin layer of a coated fiber. Under the coating condition detection method, an imaging optical system including a reflection mirror having a guide hole through which the optical fiber passes is prepared, and the imaging optical system is disposed so as to cause an object plane conjugate with an imaging plane to intersect the optical fiber that has passed through the reflection mirror and forms an image of light released from the optical fiber on the imaging plane to detect intensity of light at each point on the imaging plane with the intensity of light associated with information on a corresponding position on the object plane.

Abstract: An information processing apparatus executes a simulation of a process state being executed in a semiconductor manufacturing apparatus using a simulation model of the semiconductor manufacturing apparatus. The information processing apparatus includes: a physical sensor data acquisition unit that acquires physical sensor data measured at the semiconductor manufacturing apparatus that executes a process according to a process parameter; and a simulation execution unit that executes a simulation by the simulation model according to the process parameter including the physical sensor data, and calculate virtual sensor data and virtual process result data. The physical sensor data acquired by the physical sensor data acquisition unit includes a temperature of a gas introduced into the semiconductor manufacturing apparatus that executes the process.

Abstract: A measurement jig for measuring the conditions in a device and a processing method are provided. A measurement jig having a substrate, a back-surface camera provided on a back-surface side of the substrate, and a controller configured to control the back-surface camera.

Abstract: A semiconductor manufacturing apparatus includes: a gas introduction pipe connected to a processing container of the semiconductor manufacturing apparatus in order to introduce a gas into the processing container; and a temperature sensor provided in the gas introduction pipe in order to measure a temperature of a gas in the gas introduction pipe.

Abstract: An information processing apparatus for controlling a conveying apparatus to convey a substrate to be processed by a substrate processing apparatus includes a processor that performs operations including controlling the conveying apparatus, according to teaching data, to perform a first movement operation including putting the substrate into a container configured to carry the substrate and a second movement operation including getting the substrate from the container, acquiring image data including an image of a placement position for the substrate in the container during the first movement operation and the second movement operation, performing image processing on the image data to quantify a relationship between a position of the container and a position of the substrate, determining the quantified relationship to yield a determination result, and outputting correction data for correcting the conveying apparatus with respect to the first movement operation and the second movement operation, based on the de

Abstract: An information processing apparatus of a substrate processing apparatus including a transport device includes an image data acquisition unit that acquires image data of a disposing position of a processing target substrate, a first image processing unit that digitizes a positional relationship among the transport source object, the transport device, and the substrate, a second image processing unit that digitizes a positional relationship among the transport destination object, the transport device, and the substrate, a first transfer teaching unit that outputs first correction data of the moving operation of the transport device of receiving the substrate from the transport source object, and a second transfer teaching unit that outputs second correction data of the moving operation of the transport device of disposing the substrate in the transport destination object.

Abstract: An An information processing system includes a temperature measuring unit configured to measure a temperature distribution, in an array direction of substrates to be treated, at positions between a heater and the substrates in a treatment chamber, a memory, and a processor coupled to the memory and configured to perform a simulation of the temperature distribution during performing the heat treatment on the substrates in the treatment chamber, to obtain a standard-simulation temperature distribution by using a standard-simulation model of the heat treatment apparatus, modify the standard-simulation model to obtain an individual-simulation model in which an individual difference of the heat treatment apparatus is reflected, based on a difference between the measured temperature distribution and the obtained standard-simulation temperature distribution, perform the simulation of the temperature distribution to obtain an individual-simulation temperature distribution by using the obtained individual-simulation m

Abstract: An information processing apparatus executes a simulation of a state of a process which is being performed in a semiconductor manufacturing apparatus, by using a simulation model of the semiconductor manufacturing apparatus. The information processing apparatus includes: a physical sensor data acquisition unit that acquires physical sensor data measured in the semiconductor manufacturing apparatus that is performing the process according to process parameters; a simulation execution unit that executes the simulation by the simulation model according to the process parameters, thereby outputting virtual sensor data; a simulation result determination unit that performs a pre-detection of a part of the semiconductor manufacturing apparatus that needs to be replaced, based on a difference between the physical sensor data and the virtual sensor data; and a part order unit that orders the part of the semiconductor manufacturing apparatus based on a result of the pre-detection.

Abstract: There is provided a teaching method for a transfer device configured to transfer a substrate between a transfer source object and a transfer destination object on which the substrate is disposable. The teaching method includes: generating three-dimensional image data of a shape of the transfer source object, a shape of the transfer destination object, and a state of the substrate based on captured image data of the transfer source object, the transfer destination object, and the substrate captured by a capturing unit, and based on design data of the transfer source object, the transfer destination object, and the substrate; and teaching the transfer device based on the three-dimensional image data so that the substrate is transferred between the transfer source object and the transfer destination object without colliding with the transfer source object and the transfer destination object.

Abstract: An information processing system includes: a physical sensor data acquisition unit configured to acquire physical sensor data measured by a semiconductor manufacturing apparatus that executes a process according to a process parameter; a simulation execution unit configured to execute a simulation by a simulation model of the semiconductor manufacturing apparatus according to the process parameter and calculate virtual sensor data and virtual process result data; and a display controller that visualizes a process state of the semiconductor manufacturing apparatus and displays the process state on a display unit during the execution of the process using the physical sensor data, the virtual sensor data, and the virtual process result data.

Abstract: A transfer method transfers a substrate between a transfer unit configured to hold and transfer the substrate and a substrate stage serving as a transfer destination or a transfer source of the substrate. The transfer method includes: acquiring positional information of the transfer unit and positional information of the substrate stage; determining whether or not there is a risk for the substrate to contact with the substrate stage, based on the acquired positional information of the transfer unit and positional information of the substrate stage; and when determined that there is a risk for the substrate to contact with the substrate stage, notifying the risk according to the determination at the determining.

Abstract: Provided is an optical fiber in which a primary coating layer and a secondary coating layer are formed on an outer circumference of a bare optical fiber including a core and a cladding. A Young's modulus of the primary coating layer is 0.1 to 1.0 MPa, a relationship between lateral rigidity D and flexural rigidity H of the optical fiber as expressed by formulas below satisfies D/H2?3×1017 N?1 m?6, the primary coating layer contains 0.3 to 2.0 wt % of a photoinitiator including phosphorus, and the primary coating layer contains polypropylene glycol having a weight-average molecular weight of 1000 to 5000. The formulas include H = H g + H s = ? ? ? r g 4 ? E g + ? ? ( r s ? 4 - r p 4 ) ? E s ? ? and D = 0.897 ? E p + 2.873 ? ( E s - E p ) ? ( E p E s ) 0.8311 ? ( 2 ? r s - r p r s - r g ) 1.

Abstract: Provided is an optical fiber in which a primary coating layer and a secondary coating layer are formed on an outer circumference of a bare optical fiber including a core and a cladding. A Young's modulus of the primary coating layer is 0.1 to 1.0 MPa, a relationship between lateral rigidity D and flexural rigidity H of the optical fiber as expressed by formulas below satisfies D/H2?3×1017 N?1m?6, the primary coating layer contains 0.3 to 2.0 wt % of a photoinitiator including phosphorus, and the primary coating layer contains polypropylene glycol having a weight-average molecular weight of 1000 to 5000. The formulas include H = H g + H s = ? ? ? r g 4 ? E g + ? ? ( r s ? 4 - r p 4 ) ? E s ? ? and D = 0.897 ? E p + 2.873 ? ( E s - E p ) ? ( E p E s ) 0.8311 ? ( 2 ? r s - r p r s - r g ) 1.

Abstract: The present embodiment relates to a production method for matching a shape of a refractive index profile of a core preform with an ideal curve with high precision and in a short time. Prior to a glass synthesis step of stacking a plurality of glass layers including a refractive index adjusting agent of a predetermined amount on an inner peripheral surface or on an outer peripheral surface of a glass deposition substrate, glass synthesis actual-result data is created from production condition data of a glass preform produced in the past and refractive index profile data of a core preform obtained from the glass preform. In each glass synthesis section where the glass synthesis step is executed, a doping amount of the refractive index adjusting agent is adjusted on the basis of the glass synthesis actual-result data.

Abstract: Disclosed is a magnetizing apparatus including: a placing table configured to place thereon a storage container storing a plurality of substrates; a magnetizing chamber configured to accommodate the storage container and apply a magnetic field to the plurality of substrates in the storage container; and a conveying mechanism configured to convey the storage container from the placing table into the magnetizing chamber.

Abstract: Disclosed is a magnetic annealing apparatus including a processing container that performs a magnetic annealing processing on a plurality of substrates accommodated therein in a magnetic field; a substrate holder that holds the plurality of substrates substantially horizontally in the processing container; a division heater including a plurality of sub-division heaters and covering a substantially entire circumferential surface of an outer periphery of a predetermined region of the processing container along a longitudinal direction; a magnet installed to cover an outside of the division heater; and a controller configured to feedback-control a temperature of a predetermined control target heater among the plurality of sub-division heaters, and to control temperatures of the plurality of sub-division heaters other than the predetermined control target heater based on a control output obtained by multiplying a control output of the predetermined control target heater and a predetermined ratio.