Abstract: An embodiment of the invention relates to a GI-MMF with a structure for achieving widening of bandwidth in a wider wavelength range and improving manufacturing easiness of a refractive index profile in a core. In an example of the GI-MMF, a whole region of the core is doped with Ge and a part of the core is doped with P. Namely, the Ge-doped region coincides with the whole region of the core and the Ge-doped region is comprised of a partially P-doped region doped with Ge and P; and a P-undoped region doped with Ge but not intentionally doped with P.

Abstract: An embodiment of the invention relates to a MMF with a structure for enabling stable manufacture of the MMF suitable for wide-band multimode optical transmission, for realizing faster short-haul information transmission than before. In the MMF, when an input position of a DMD measurement pulse on an input end face is represented by a distance r from a center of a core with a radius a, a power of the DMD measurement pulse on an output end face with the input position r of the DMD measurement pulse being 0.8a is not more than 70% of a power of the DMD measurement pulse on the output end face with the input position r of the DMD measurement pulse being 0.

Abstract: The present invention relates to an MMF with a structure for relaxing wavelength dependence of transmission bandwidth. In the MMF, a doping amount of a dopant for control of refractive index is adjusted, so as to make each of an OFL bandwidth at a wavelength of 850 nm and an OFL bandwidth at a wavelength of at least one of 980 nm, 1060 nm, and 1300 nm become not less than 1500 MHz·km, make the OFL bandwidth at the wavelength of at least one of 980 nm, 1060 nm, and 1300 nm become wider than the OFL bandwidth at the wavelength of 850 nm, and effectively suppress increase in transmission loss.

Abstract: The present invention relates to an MMF with a structure for relaxing wavelength dependence of transmission bandwidth. In the MMF, a doping amount of a dopant for control of refractive index is adjusted, so as to make each of an OFL bandwidth at a wavelength of 850 nm and an OFL bandwidth at a wavelength of at least one of 980 nm, 1060 nm, and 1300 nm become not less than 1500 MHz·km, make the OFL bandwidth at the wavelength of at least one of 980 nm, 1060 nm, and 1300 nm become wider than the OFL bandwidth at the wavelength of 850 nm, and effectively suppress increase in transmission loss.

Abstract: Disclosed is a magnetizing apparatus including: a placing table configured to place thereon a storage container storing a plurality of substrates; a magnetizing chamber configured to accommodate the storage container and apply a magnetic field to the plurality of substrates in the storage container; and a conveying mechanism configured to convey the storage container from the placing table into the magnetizing chamber.

Abstract: An embodiment of the invention relates to a MMF with a structure for enabling stable manufacture of the MMF suitable for wide-band multimode optical transmission, for realizing faster short-haul information transmission than before. In the MMF, when an input position of a DMD measurement pulse on an input end face is represented by a distance r from a center of a core with a radius a, a power of the DMD measurement pulse on an output end face with the input position r of the DMD measurement pulse being 0.8a is not more than 70% of a power of the DMD measurement pulse on the output end face with the input position r of the DMD measurement pulse being 0.

Abstract: An embodiment of the present invention relates to an MMF with a structure for reducing length dependence of optical characteristics while maintaining bend-insensitivity. The MMF has a trench portion provided between a core portion and a cladding portion and having a refractive index lower than that of the cladding portion. In a cross section of the MMF, the trench portion in at least a partial section of the MMF has a non-circularly symmetric shape with respect to an intersection between the optical axis and the cross section.

Abstract: An apparatus includes a susceptor and a protective pipe. A gas containing 50% or more of argon or nitrogen is used as a gas to be supplied into the susceptor. The protective pipe has a heat insulating region (17a) enclosed with a heat insulator (18) with a length of Db (mm) at the upper section thereof and a non-heat insulating region (17b) not enclosed with any heat insulators at the lower section thereof. The temperature of the glass fiber at the outlet of the protective pipe becomes 1700° C. or less. The outer diameter of the glass fiber at the outlet of the protective pipe is within a range of the target outer diameter of the glass fiber+6 ?m or less.

Abstract: An embodiment of the invention relates to a GI-MMF with a structure for achieving widening of bandwidth in a wider wavelength range and improving manufacturing easiness of a refractive index profile in a core. In an example of the GI-MMF, a whole region of the core is doped with Ge and a part of the core is doped with P. Namely, the Ge-doped region coincides with the whole region of the core and the Ge-doped region is comprised of a partially P-doped region doped with Ge and P; and a P-undoped region doped with Ge but not intentionally doped with P.

Abstract: An embodiment of the present invention relates to an MMF with a structure for reducing length dependence of optical characteristics while maintaining bend-insensitivity. The MMF has a trench portion provided between a core portion and a cladding portion and having a refractive index lower than that of the cladding portion. In a cross section of the MMF, the trench portion in at least a partial section of the MMF has a non-circularly symmetric shape with respect to an intersection between the optical axis and the cross section.

Abstract: A vacuum processing apparatus is configured to include a process chamber, a turntable provided in the process chamber, and a substrate receiving area provided in one surface of the turntable and including a regulation part formed therearound to regulate a position of a substrate. A transfer mechanism is provided outside the process chamber, and a lifting member is configured to support the substrate and to move up and down in order to transfer the substrate between the transfer mechanism and the turntable. An exhaust mechanism is configured to selectively evacuate a gap between the substrate receiving area and the substrate before the lifting member places the substrate on the substrate receiving area.

Abstract: Disclosed is a magnetic annealing apparatus including a processing container that performs a magnetic annealing processing on a plurality of substrates accommodated therein in a magnetic field; a substrate holder that holds the plurality of substrates substantially horizontally in the processing container; a division heater including a plurality of sub-division heaters and covering a substantially entire circumferential surface of an outer periphery of a predetermined region of the processing container along a longitudinal direction; a magnet installed to cover an outside of the division heater; and a controller configured to feedback-control a temperature of a predetermined control target heater among the plurality of sub-division heaters, and to control temperatures of the plurality of sub-division heaters other than the predetermined control target heater based on a control output obtained by multiplying a control output of the predetermined control target heater and a predetermined ratio.

Abstract: A substrate processing apparatus includes a processing chamber; process areas each of which supplies a reaction gas; a turntable that rotates to cause a substrate to pass through the process areas; a gas nozzle provided in one of the process areas; a separating area that supplies a separation gas to separate atmospheres of the process areas; and a cover part configured to cover the gas nozzle and cause the reaction gas supplied from the gas nozzle to remain around the gas nozzle. The cover part includes an upstream side wall, a downstream side wall, and an upper wall. The cover part also includes a guide surface configured to guide the separation gas to flow over a lower part of the upstream side wall to a space above the upper wall. The distance between the gas nozzle and the upstream side wall is greater than or equal to 8 mm.

Abstract: The present invention provides a glass preform heating furnace in which the occurrence of arching is suppressed. The glass preform heating furnace is equipped with a susceptor (3); a slit heater (4); an insulator; and a furnace body, wherein, in the case that the space between the slit heater (4) and the susceptor or between the slit heater (4) and the conductive member closest to the slit heater is D, that the maximum value of the electric field in this space is E1, that the number of the slits in the slit heater is N, that the slit width of the slit heater is S, and that the maximum value of the electric field in the slit space is E2, the values of D, N and S are set so that E1?E2 is established.

Abstract: A vacuum processing apparatus is configured to include a process chamber, a turntable provided in the process chamber, and a substrate receiving area provided in one surface of the turntable and including a regulation part formed therearound to regulate a position of a substrate. A transfer mechanism is provided outside the process chamber, and a lifting member is configured to support the substrate and to move up and down in order to transfer the substrate between the transfer mechanism and the turntable. An exhaust mechanism is configured to selectively evacuate a gap between the substrate receiving area and the substrate before the lifting member places the substrate on the substrate receiving area.

Abstract: When a lower gauge pressure of a cooling tube part is set at A, and the number of divided units of the cooling tube part is set at N, and a length of each of the divided units of the cooling tube part is set at Li (i=1 to N), and a radius of each of the divided units of the cooling tube part is set at Ri (i=1 to N), and a gas flow rate of a coolant gas passed through each of the divided units of the cooling tube part is set at Qi (i=1 to N), and a viscosity coefficient of a coolant gas is set at ?1, and a radius of an optical fiber is set at r1, and a drawing speed of the optical fiber is set at V1, and a pressure loss of a straight tube part is set at B, and the number of divided units of the straight tube part is set at n, and a length of each of the divided units of the straight tube part is set at LLj (j=1 to n), and a radius of each of the divided units of the straight tube part is set at RRj (j=1 to n), and a gas flow rate of a pressurized gas passed through the straight tube part is set at Qgas, and a

Abstract: The present invention relates to a multimode optical fiber having a stably manufacturable structure as a transmission medium suitable for wide-band multimode transmission. In the multimode optical fiber, a core has a refractive-index profile a shape of which is defined by the exponent ? which varies along a radial direction from a center of the core and an average of radial variation of which is positive in a predetermined range in the radial direction.

Abstract: An apparatus includes a susceptor and a protective pipe. A gas containing 50% or more of argon or nitrogen is used as a gas to be supplied into the susceptor. The protective pipe has a heat insulating region (17a) enclosed with a heat insulator (18) with a length of Db (mm) at the upper section thereof and a non-heat insulating region (17b) not enclosed with any heat insulators at the lower section thereof. The temperature of the glass fiber at the outlet of the protective pipe becomes 1700° C. or less. The outer diameter of the glass fiber at the outlet of the protective pipe is within a range of the target outer diameter of the glass fiber+6 ?m or less.

Abstract: The present invention provides a glass preform heating furnace in which the occurrence of arching is suppressed. The glass preform heating furnace is equipped with a susceptor (3); a slit heater (4); an insulator; and a furnace body, wherein, in the case that the space between the slit heater (4) and the susceptor or between the slit heater (4) and the conductive member closest to the slit heater is D, that the maximum value of the electric field in this space is E1, that the number of the slits in the slit heater is N, that the slit width of the slit heater is S, and that the maximum value of the electric field in the slit space is E2, the values of D, N and S are set so that E1?E2 is established.

Abstract: The present invention relates to a preform manufacturing method and others for effectively reducing variation in refractive index due to chlorine used in manufacture of an optical fiber preform. The manufacturing method includes a dechlorination step carried out between a point of an end time of a dehydration step and a point of a start time of a sintering step, the dechlorination step being a step of heating a porous preform after dehydrated, in an atmosphere containing no chlorine-based dehydrating agent, for a given length of time while maintaining a temperature lower than a sintering temperature, thereby removing chlorine from the porous preform after dehydrated.