Abstract: Provided is a sliding door device which is capable of retracting a sliding door diagonally. Such a sliding door device 1 includes rails 7a and 7b for guiding the sliding door 2 to move in a retracting direction A from an open position to a closed position with respect to a main body 3 and guiding the sliding door 2 to move forward or backward in a front view of the sliding door 2 until reaching the closed position, a rod-shaped trigger 8 provided on one of the main body 3 and the sliding door 2, and a retracting device 9? provided on the other of the main body 3 and the sliding door 2 and retracting the trigger 8 while sliding in an axial direction D of the trigger 8 so that the sliding door 2 can move forward or backward.

Abstract: A diesel engine, includes: an exhaust gas recirculation device that recirculates an exhaust gas emitted from the diesel engine to an intake side of the diesel engine; an intake air amount sensor that measures an intake air amount of the diesel engine; a NOx measurement sensor that measures NOx contained in the exhaust gas emitted from the diesel engine; and a control device that obtains a correction value for correcting a measured value by the intake air amount sensor based on a difference between first information on NOx obtained based on information on a rotation speed of the diesel engine and information on a load and second information on NOx measured by the NOx measurement sensor to control the exhaust gas recirculation device based on the measured value by the intake air amount sensor corrected using the correction value.

Abstract: An exhaust gas processing device includes a NOx detection sensor, a first catalyst provided to a first branch pipe, a second catalyst provided to a second branch pipe, a first pressure sensor and a second pressure sensor which are arranged on the upstream side of the first catalyst and the second catalyst and which detect pressures in the first branch pipe and the second branch pipe, and a control device that obtains flow rates of exhaust gas flowing through the first branch pipe and the second branch pipe based on detection values of the first pressure sensor and the second pressure sensor and obtains amounts of reducing agent to be given to the first catalyst and the second catalyst from the obtained flow rates and a concentration of NOx of the exhaust gas.

Abstract: An engine unit mounted to a vehicle frame, the engine unit includes: an engine; an engine support mechanism to be coupled to the vehicle frame, with at least one vibration absorbing mechanism disposed on each of both sides of the engine in an orthogonal direction to a crankshaft of the engine, to support the engine; an aftertreatment device to purify exhaust gas emitted from the engine; a base bracket provided to the engine support mechanism; and an upper bracket detachably fixed and mounted to the base bracket, the upper bracket supporting the aftertreatment device.

Abstract: According to one embodiment, a solid-state imaging device includes a first light-receiving portion and a first light guide layer. The first light-receiving portion is formed in the surface of a semiconductor substrate. The first light guide layer is formed to correspond to a portion above the first light-receiving portion, and has an inverse tapered shape in which the width becomes larger from an upper surface a lower surface. The inverse tapered shape ranges from the upper surface the lower surface.

Abstract: An exhaust gas processing device includes a NOx detection sensor, a first catalyst provided to a first branch pipe, a second catalyst provided to a second branch pipe, a first pressure sensor and a second pressure sensor which are arranged on the upstream side of the first catalyst and the second catalyst and which detect pressures in the first branch pipe and the second branch pipe, and a control device that obtains flow rates of exhaust gas flowing through the first branch pipe and the second branch pipe based on detection values of the first pressure sensor and the second pressure sensor and obtains amounts of reducing agent to be given to the first catalyst and the second catalyst from the obtained flow rates and a concentration of NOx of the exhaust gas.

Abstract: A diesel engine, includes: an exhaust gas recirculation device that recirculates an exhaust gas emitted from the diesel engine to an intake side of the diesel engine; an intake air amount sensor that measures an intake air amount of the diesel engine; a NOx measurement sensor that measures NOx contained in the exhaust gas emitted from the diesel engine; and a control device that obtains a correction value for correcting a measured value by the intake air amount sensor based on a difference between first information on NOx obtained based on information on a rotation speed of the diesel engine and information on a load and second information on NOx measured by the NOx measurement sensor to control the exhaust gas recirculation device based on the measured value by the intake air amount sensor corrected using the correction value.

Abstract: An engine unit mounted to a vehicle frame, the engine unit includes: an engine; an engine support mechanism to be coupled to the vehicle frame, with at least one vibration absorbing mechanism disposed on each of both sides of the engine in an orthogonal direction to a crankshaft of the engine, to support the engine; an aftertreatment device to purify exhaust gas emitted from the engine; a base bracket provided to the engine support mechanism; and an upper bracket detachably fixed and mounted to the base bracket, the upper bracket supporting the aftertreatment device.

Abstract: According to one embodiment, a solid-state imaging device includes a first light-receiving portion and a first light guide layer. The first light-receiving portion is formed in the surface of a semiconductor substrate. The first light guide layer is formed to correspond to a portion above the first light-receiving portion, and has an inverse tapered shape in which the width becomes larger from an upper surface a lower surface. The inverse tapered shape ranges from the upper surface the lower surface.

Abstract: A reducing agent aqueous solution mixing device includes an exhaust pipe, an injector, an inner pipe and a tubular guide member. The exhaust pipe includes an elbow part having a curved portion, and a linear part disposed downstream of the elbow part. The injector is disposed outside of the curved portion, and injects a reducing agent aqueous solution into the elbow part towards the linear part. The inner pipe is disposed downstream of the injector within the exhaust pipe. The inner pipe has an inlet portion opening facing the injector and an outer peripheral surface spaced apart from the inner wall of the linear part. The inner pipe allows the exhaust gas to flow through the inside of the inner pipe and along the outer periphery of the inner pipe. The tubular guide member directs the reducing agent aqueous solution injected from the injector to the inner pipe.

Abstract: A reducing agent aqueous solution mixing device includes an exhaust pipe, an injector, a mixing pipe, an inner pipe and a flow section. The exhaust pipe includes an elbow part and a linear part. The injector is disposed in the elbow part and injects a reducing agent aqueous solution. The mixing pipe receives the reducing agent aqueous solution injected from the injector, and includes an outlet portion formed spaced apart from an inner wall of the exhaust pipe, and a plurality of openings formed on the outer peripheral surface thereof. The inner pipe is disposed in the linear part and allows the exhaust gas to flow through the inside and the outer periphery thereof. The flow section is formed between the outlet portion of the mixing pipe and the inner wall of the exhaust pipe to direct the exhaust gas to the inner pipe.

Abstract: An air cleaner includes a case in which an inner cylindrical filter and an outer cylindrical filter are housed, the case having a case body that defines an opening end surface closed by a cover member. The case includes an air inlet provided to an outer circumference of the case body for supplying outside air and an exhaust outlet provided to a bottom of the case body at a downstream side in an air-flowing direction for discharging the air supplied through the air inlet and filtered through the inner cylindrical filter and the outer cylindrical filter. A mass flow rate sensor is provided in the exhaust outlet to measure the flow rate of the air. A flow straightening grid is provided at the upstream side of the mass flow rate sensor to straighten the flow of the air.

Abstract: A first conducting layer is formed on a side of a main surface on which an electrode terminal of a semiconductor device is provided in a semiconductor substrate. The first conducting layer is electrically connected to the electrode terminal of the semiconductor device. A mask layer that has an opening at a predetermined position is formed on the first conducting layer. A second conducting layer is formed inside the opening of the mask layer. The mask layer is removed. A relocation wiring that includes the first conducting layer and electrically draws out the electrode terminal is formed by performing anisotropic etching for the first conducting layer using the second conducting layer as a mask. Finally, a bump is formed on the relocation wiring by causing the second conducting layer to reflow.

Abstract: In a method for manufacturing a semiconductor device according to an embodiment, an epitaxial semiconductor layer is epitaxially grown on a semiconductor substrate, a photoelectric converting portion is formed on the epitaxial semiconductor layer, a wiring layer is formed on the epitaxial semiconductor layer after forming the photoelectric converting portion, a support substrate is bonded onto the wiring layer, and the semiconductor substrate is etched from an opposite surface side to a side for the bonding after the bonding. In the method for manufacturing a semiconductor device, an amorphous Si layer is formed on the opposite surface side of the epitaxial semiconductor layer after the etching and an antireflection film and a color filter are formed on the amorphous Si layer in sequence.

Abstract: A reducing agent aqueous solution mixing device includes an exhaust pipe, an injector, a mixing pipe, an inner pipe and a flow section. The exhaust pipe includes an elbow part and a linear part. The injector is disposed in the elbow part and injects a reducing agent aqueous solution. The mixing pipe is disposed to enclose a surrounding of the reducing agent aqueous solution injected from the injector, and includes an outlet portion formed spaced apart from an inner wall of the exhaust pipe, and a plurality of openings formed on the outer peripheral surface thereof. The inner pipe is disposed in the linear part and allows the exhaust gas to flow through the inside and the outer periphery thereof. The flow section is formed between the outlet portion of the mixing the inner wall of the exhaust pipe and directs the exhaust gas to the inner pipe.

Abstract: A reducing agent aqueous solution mixing device includes an exhaust pipe, an injector, a mixing pipe and an inner pipe. The exhaust pipe includes an elbow part having a curved portion, and a linear part disposed on the downstream side of the elbow part. The injector is disposed outside the curved portion and injects the reducing agent aqueous solution towards the linear part. The mixing pipe is disposed inside the elbow part to enclose a surrounding of the reducing agent aqueous solution injected from the injector, and includes a plurality of openings on an outer peripheral surface thereof. The inner pipe is disposed on the downstream side of the mixing pipe and spaced apart from an outlet portion of the mixing pipe and from an inner wall of the linear part, and allows the exhaust gas to flow through the inside thereof and the outer periphery thereof.

Abstract: A reducing agent aqueous solution mixing device includes an exhaust pipe, an injector, an inner pipe and a tubular guide member. The exhaust pipe includes an elbow part having a curved portion, and a linear part disposed on a downstream side of the elbow part. The injector is disposed outside the curved portion and injects only a reducing agent aqueous solution into the elbow part towards the linear part. The inner pipe is disposed on an exhaust stream downstream side of the injector within the exhaust pipe with an inlet portion opening thereof facing the injector and an outer peripheral surface thereof being spaced apart from the inner wail of the linear art. The inner pipe allows the exhaust as to flow through the inside thereof and the outer periphery thereof. A tubular guide member directs the reducing agent aqueous solution injected from the injector to the inner pipe.

Abstract: In a method for manufacturing a semiconductor device according to an embodiment, a trench is formed in an outer peripheral portion of a chip region on a bonding surface of a support substrate, and a semiconductor substrate having a chip ring in the outer peripheral portions of the chip regions on an inside of a dicing line respectively and the support substrate are bonded to position the trench from above the chip ring to the inside of the dicing line. In the method for manufacturing a semiconductor device, furthermore, the semiconductor substrate and the support substrate which are bonded to each other are subjected to dicing along the dicing line.

Abstract: According to one embodiment, a manufacturing method of a semiconductor device attained as follows. A dielectric layer having a first opening and a second opening reaching an electrode terminal is formed by modifying a photosensitive resin film on a substrate on which the electrode terminal of a first conductive layer is provided. Next, a second conductive layer that is electrically connected to the electrode terminal is formed on the dielectric layer that includes inside of the first opening, and a third conductive layer that has an oxidation-reduction potential of which difference from the oxidation-reduction potential of the first conductive layer is smaller than a difference of the oxidation-reduction potential between the first conductive layer and the second conductive layer is formed on the second conductive layer.