Abstract: An edge ring includes a first edge ring, and a second edge ring that has a side surface adjacent to a side surface of the first edge ring and is movable in a vertical direction along the side surface of the first edge ring. Further, the side surface of the first edge ring and the side surface of the second edge ring at least partially face each other in a movement range of the second edge ring.

Abstract: In a plasma processing apparatus, a table has a wafer support to hold a wafer and a peripheral segment surrounding the wafer support and having through-holes. The peripheral segment has an upper surface lower than that of the wafer support. An outer focus ring is disposed over the peripheral segment and has a recess or a cutout at an inner portion of the outer focus ring, and the recess or cutout has through-holes. An inner focus ring is disposed in the recess or cutout of the outer focus ring. Lift pins respectively extend through the through-holes of the peripheral segment and the through-holes of the recess or cutout of the outer focus ring. Shift mechanisms control shift of the respective lift pins.

Abstract: An object of the present disclosure is to provide a charged particle beam device that can suppress an influence to a device generated according to the preliminary exhaust. In order to achieve the object, suggested is a charged particle beam device including a vacuum sample chamber that maintains an atmosphere around a sample to be irradiated with a charged particle beam in a vacuum state; and a preliminary exhaust chamber to which a vacuum pump for vacuuming an atmosphere of the sample introduced into the vacuum sample chamber is connected, in which the vacuum sample chamber is a box-shaped body including a top plate, and a portion between the top plate and a side wall of the box-shaped body positioned below the top plate includes a portion in which the top plate and the side wall are not in contact with each other.

Abstract: A semiconductor processing apparatus according to the present invention includes a main body cover that covers a main body device and a control device. The main body cover has a transfer opening for transferring a semiconductor, and the main body cover further has an intake port that generates an air flow in a horizontal direction inside the main body cover.

Abstract: An object of the present disclosure is to provide a charged particle beam device that can suppress an influence to a device generated according to the preliminary exhaust. In order to achieve the object, suggested is a charged particle beam device including a vacuum sample chamber that maintains an atmosphere around a sample to be irradiated with a charged particle beam in a vacuum state; and a preliminary exhaust chamber to which a vacuum pump for vacuuming an atmosphere of the sample introduced into the vacuum sample chamber is connected, in which the vacuum sample chamber is a box-shaped body including a top plate, and a portion between the top plate and a side wall of the box-shaped body positioned below the top plate includes a portion in which the top plate and the side wall are not in contact with each other.

Abstract: An edge ring includes a first edge ring, and a second edge ring that has a side surface adjacent to a side surface of the first edge ring and is movable in a vertical direction along the side surface of the first edge ring. Further, the side surface of the first edge ring and the side surface of the second edge ring at least partially face each other in a movement range of the second edge ring.

Abstract: A substrate processing apparatus includes an inner wall formed of a heat conductive material, a quartz liner that covers the inner wall, and a cooling unit that cools the inner wall. A gap is formed between the inner wall and the quartz liner, and a sealing member is provided in the gap to seal the gap. The gap is filled with a heat conductive medium.

Abstract: In a plasma processing apparatus, a table has a wafer support to hold a wafer and a peripheral segment surrounding the wafer support and having through-holes. The peripheral segment has an upper surface lower than that of the wafer support. An outer focus ring is disposed over the peripheral segment and has a recess or a cutout at an inner portion of the outer focus ring, and the recess or cutout has through-holes. An inner focus ring is disposed in the recess or cutout of the outer focus ring. Lift pins respectively extend through the through-holes of the peripheral segment and the through-holes of the recess or cutout of the outer focus ring. Shift mechanisms control shift of the respective lift pins.

Abstract: Disclosed is a method for epoxidizing olefins, which enables an epoxy compound containing no halogen atom with high yield. Specifically disclosed is an oxidizing agent composition for epoxidation of olefins, which is characterized by containing peroxide which exhibits basicity when dissolved in water and an acid anhydride.

Abstract: Disclosed is a method for epoxidizing olefins, which enables an epoxy compound containing no halogen atom with high yield. Specifically disclosed is an oxidizing agent composition for epoxidation of olefins, which is characterized by containing peroxide which exhibits basicity when dissolved in water and an acid anhydride.

Abstract: The invention aims at providing an oxidizing agent composition capable of producing halogen-free epoxy compounds in high yield; and a process for the epoxidation of olefins with the composition. In order to attain the aim, the invention provides an oxidizing agent composition for the epoxidation of olefins which is characterized by containing an acid anhydride and a solid hydrogen peroxide adduct; and a process for the epoxidation of olefins which is characterized by reacting an olefin with a mixture obtained by mixing an acid anhydride with a solid hydrogen peroxide adduct.

Abstract: A crushing apparatus for crushing closed cells in a pad material which has been molded integral with a frame upon foaming. The crushing apparatus comprises upper and lower counterparts disposed contactable with each other. The upper counterpart includes an upper frame, and an upper sheet-like flexible member secured to the upper frame, and the lower counterpart includes a lower frame which is rotatable around its one side, and a lower sheet-like flexible member secured to the lower frame. The upper and lower sheet-like flexible members are non-air permeable and contactable with each other so as to form an air-tight seal condition between the upper and lower sheet-like flexible members. One of the upper and lower frames has a suction opening which is able to be sealingly connected to a space formed between the upper and lower sheet-like flexible members. An air-sucking device is connected to the suction opening so as to suck air in the space formed between the upper and lower sheet-like members.