Patents by Inventor Takanori Kudo
Takanori Kudo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11918759Abstract: A medical braided tube assembly includes a braided tube including a hollow cylindrical inner resin layer, a braided wire including braided strands and being provided over a periphery of the inner resin layer, and an outer resin layer provided to cover peripheries of the inner resin layer and the braided wire, and a connector provided at an end portion of the braided tube. The connector includes a tube housing section for accommodating the end portion of the braided tube. The braided tube accommodated in the tube housing section are adhesively fixed by an adhesive. The adhesive is provided to seal an entire periphery of the braided wire at an end face of the braided tube.Type: GrantFiled: September 28, 2020Date of Patent: March 5, 2024Assignee: PROTERIAL, LTD.Inventors: Kotaro Tanaka, Takanobu Watanabe, Kimika Kudo, Takanori Komuro
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Publication number: 20230119980Abstract: The present invention pertains to a method of manufacturing segregated layers above a substrate. The invention also pertains to methods of manufacturing a photoresist layer, photoresist patterns, a processed substrate and a device.Type: ApplicationFiled: March 8, 2021Publication date: April 20, 2023Inventors: Daniel HUDSON, Changsheng WANG, Kornel OCYTKO, Graham MORSE, Ben JEFFERY, Ralph R. DAMMEL, Takanori KUDO
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Publication number: 20220404702Abstract: The disclosed subject matter relates to resist compositions comprising a phenolic resin component, a photoactive 2,1,5-diazonaphthoquinonesulfonate component (PAC), a solvent component that do not include or require the use of an added photo acid generator (PAG). The PAC is a free PAC, a coupled PAC (PACb) or a combination thereof that includes a substituted or unsubstituted 2,1,5-DNQ material or compound onto which a substituted or unsubstituted 2,1,5-DNQ material is appended that, when UV exposed, do not form sulfonic acid. The phenolic resin component is a Novolak derivative in which some or all of the free hydroxy groups are protected with an acid cleavable acetal moiety which can include a PACb moiety. The disclosed subject matter also relates to the methods of using the present compositions in either in thick for thin film photoresist device manufacturing methodologies.Type: ApplicationFiled: November 17, 2020Publication date: December 22, 2022Inventors: Takanori KUDO, Hung-Yang CHEN
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Publication number: 20220365432Abstract: The present invention relates to resist compositions comprising (A) a polymer component, (B) a photoacid generator component, (C) a photoactive diazonaphthoquinone component, and (D) a solvent. The polymer component comprises a mixture of a Novolak derivative and a polymer comprising hydroxystyrene repeat units. The polymer component comprises repeat units with free phenolic hydroxy moieties and repeat units with phenolic hydroxy moieties protected with an acid cleavable acetal moiety. The positive photoresist composition is suitable for manufacturing electronic devices.Type: ApplicationFiled: November 23, 2020Publication date: November 17, 2022Inventors: Takanori KUDO, Fan YANG
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Publication number: 20210382390Abstract: The present invention relates to resist compositions comprising a polymer component, a photoacid generator component (PAG), a photoactive diazonaphthoquinone component (PAC), a base component, a solvent component, and optionally, a heterocyclic thiol component. The polymer component is a Novolak derivative, comprising Novolak repeat units with free phenolic hydroxy moieties, and Novolak repeat units comprising phenolic hydroxy moieties protected with an acid cleavable acetal moiety.Type: ApplicationFiled: May 22, 2019Publication date: December 9, 2021Inventors: Medhat A. Toukhy, Weihong Liu, Takanori Kudo, Hung-Yang Chen, Jian Yin
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Patent number: 9274426Abstract: The present invention relates to a novel absorbing antireflective coating composition comprising a novel crosslinkable polymer comprising at least one repeat unit (A) having structure (1), at least one repeat unit (B) having a structure (2), and at least one repeat unit (C) having structure (3) where D is a direct valence bound or C(R1)(R2) methylene moiety where R1 and R2 are independently H, C1-C8 alkyl, C3-C24 cycloalkyl or C6-C24 aryl; Ari, Arii, Ariii and Ariv are independently phenylenic and naphthalenic moiety, R3 and R4 are independently hydrogen or C1-C8 alkyl; and R5 and R6 are independently hydrogen or C1-C8 alkyl; and a solvent. The invention also relates to a process for forming an image using the novel antireflective coating composition.Type: GrantFiled: June 4, 2014Date of Patent: March 1, 2016Assignee: AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.Inventors: M. Dalil Rahman, Takanori Kudo, Alberto D. Dioses, Douglas McKenzie, Clement Anyadiegwu, Munirathna Padmanaban, Salem K. Mullen
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Publication number: 20150309403Abstract: The present invention relates to a novel absorbing antireflective coating composition comprising a novel crosslinkable polymer comprising at least one repeat unit (A) having structure (1), at least repeat (B) unit having a structure (2), and at least one repeat unit (C) having structure (3) where D is a direct valence bound or C(R1)(R2) methylene moiety where R1 and R2 are independently H, C1-C8 alkyl, C3-C24 cycloalkyl or C6-C24 aryl; Ari, Arii, Ariii and Ariv are independently phenylenic and naphthalenic moiety, R3 and R4 are independently hydrogen or C1-C8 alkyl; and R5 and R6 are independently hydrogen or C1-C8 alkyl; and a solvent. The invention also relates to a process for forming an image using the novel antireflective coating composition.Type: ApplicationFiled: April 29, 2014Publication date: October 29, 2015Applicant: AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.Inventors: M. Dalil RAHMAN, Takanori KUDO, Alberto D. DIOSES, Douglas MCKENZIE, Clement ANYADIEGWU, Munirathna PADMANABAN, Salem K. Mullen
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Publication number: 20150309410Abstract: The present invention relates to a novel absorbing antireflective coating composition comprising a novel crosslinkable polymer comprising at least one repeat unit (A) having structure (1), at least one repeat unit (B) having a structure (2), and at least one repeat unit (C) having structure (3) where D is a direct valence bound or C(R1)(R2) methylene moiety where R1 and R2 are independently H, C1-C5 alkyl, C3-C24 cycloalkyl or C6-C24 aryl; Ari, Arii, Ariii and Ariv are independently phenylenic and naphthalenic moiety, R3 and R4 are independently hydrogen or C1-C8 alkyl; and R5 and R6 are independently hydrogen or C1-C8 alkyl; and a solvent. The invention also relates to a process for forming an image using the novel antireflective coating composition.Type: ApplicationFiled: June 4, 2014Publication date: October 29, 2015Inventors: M. Dalil RAHMAN, Takanori KUDO, Alberto D. DIOSES, Douglas MCKENZIE, Clement ANYADIEGWU, Munirathna PADMANABAN, Salem K. MULLEN
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Patent number: 9152051Abstract: The present invention relates to an absorbing hard mask antireflective coating composition comprising a novel polymer, where the novel polymer comprises in the backbone of the polymer four repeat units -A-, -B-, -C- and -D-, where A is repeat unit which comprises a fused aromatic ring in its backbone, B has the structure (1), C is a hydroxylbiphenyl of structure (2) and D is a derivatized fluorene of structure (3), where R1 is C1-C4alkyl, R2 is C1-C4alkyl, R3 and R4 are independently hydrogen or C1-C4 alkyl, and Ar? and Ar? are independently phenylenic, or naphthalenic derived moieties, R5 and R6 are independently —OH or —(CH2)nOH where n=2-4, and R7 and R8 are independently hydrogen or C1-C4 alkyl. This invention also relates to a process for forming an image using the novel antireflective coating composition.Type: GrantFiled: June 13, 2013Date of Patent: October 6, 2015Assignee: AZ ELECTRONICS MATERIALS (LUXEMBOURG) S.A.R.L.Inventors: M. Dalil Rahman, Clement Anyadiegwu, Douglas McKenzie, Takanori Kudo, Elizabeth Wolfer, Salem K. Mullen
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Publication number: 20140370444Abstract: The present invention relates to an absorbing hard mask antireflective coating composition comprising a novel polymer, where the novel polymer comprises in the backbone of the polymer four repeat units -A-, -B-, -C- and -D-, where A is repeat unit which comprises a fused aromatic ring in its backbone, B has the structure (1), C is a hydroxylbiphenyl of structure (2) and D is a derivatized fluorene of structure (3), where R1 is C1-C4alkyl, R2 is C1-C4alkyl, R3 and R4 are independently hydrogen or C1-C4 alkyl, and Ar? and Ar? are independently phenylenic, or naphthalenic derived moieties, R5 and R6 are independently —OH or —CH2)nOH where n=2-4, and R7 and R8 are independently hydrogen or C1-C4 alkyl. This invention also relates to a process for forming an image using the novel antireflective coating composition.Type: ApplicationFiled: June 13, 2013Publication date: December 18, 2014Applicant: AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.Inventors: M. Dalil RAHMAN, Clement ANYADIEGWU, Douglas MCKENZIE, Takanori KUDO, Elizabeth WOLFER, Salem K. MULLEN
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Patent number: 8623589Abstract: The present invention relates to an antireflective coating composition comprising a crosslinking agent, a polymer comprising at least one chromophore group and at least one hydroxyl and/or a carboxyl group, and an additive, further where the additive has structure 1 and comprises at least one arylene-hydroxyl moiety, where Y is selected from an carboxylate anion or sulfonate anion, R1, R2, and R3 are independently selected from unsubstituted C1-C8 alkyl, substituted C1-C8 alkyl, aryl and arylene-hydroxyl; X1, X2, and X3 are independently selected from direct valence bond and C1-C8 alkylene group, and, n=1, 2 or 3. The invention further relates to a process for using the composition.Type: GrantFiled: June 6, 2011Date of Patent: January 7, 2014Assignee: AZ Electronic Materials USA Corp.Inventors: Takanori Kudo, Alberto Dioses, Edward Ng, Srinivasan Chakrapani, Munirathna Padmanaban
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Publication number: 20120308939Abstract: The present invention relates to an antireflective coating composition comprising a crosslinking agent, a polymer comprising at least one chromophore group and at least one hydroxyl and/or a carboxyl group, and an additive, further where the additive has structure 1 and comprises at least one arylene-hydroxyl moiety, where Y is selected from an carboxylate anion or sulfonate anion, R1, R2, and R3 are independently selected from unsubstituted C1-C8 alkyl, substituted C1-C8 alkyl, aryl and arylene-hydroxyl; X1, X2, and X3 are independently selected from direct valence bond and C1-C8 alkylene group, and, n=1, 2 or 3. The invention further relates to a process for using the composition.Type: ApplicationFiled: June 6, 2011Publication date: December 6, 2012Applicant: AZ ELECTRONIC MATERIALS USA CORP.Inventors: Takanori Kudo, Alberto Dioses, Edward Ng, Srinivasan Chakrapani, Munirathna Padmanaban
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Patent number: 8252503Abstract: Photoresist compositions are disclosed.Type: GrantFiled: August 24, 2007Date of Patent: August 28, 2012Assignee: AZ Electronic Materials USA Corp.Inventors: Srinivasan Chakrapani, Munirathna Padmanaban, Muthiah Thiyagarajan, Takanori Kudo, David L. Rentkiewicz
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Publication number: 20120122029Abstract: The present invention relates to a photoimageable underlayer composition comprising a polymer, a crosslinker comprising a vinyl ether group, and a thermal acid generator comprising a salt of a mono or polycarboxylic acid and an amine, where the amine has a boiling point of at least 150° C. The invention also relates to a process for forming an image in the underlayer comprising the novel composition.Type: ApplicationFiled: November 11, 2010Publication date: May 17, 2012Inventors: Takanori Kudo, Alberto Dioses, Edward Ng, Srinivasan Chakrapani, Munirathna Padmanaban
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Publication number: 20110086312Abstract: The present invention relates to a positive bottom photoimageable antireflective coating composition which is capable of being developed in an aqueous alkaline developer, wherein the antireflective coating composition comprises a polymer comprising at least one recurring unit with a chromophore group and one recurring unit with a hydroxyl and/or a carboxyl group, a vinyl ether terminated crosslinking agent of structure (7), and optionally, a photoacid generator and/or an acid and/or a thermal acid generator, where structure (7) is wherein W is selected from (C1-C30) linear, branched or cyclic alkyl moiety, substituted or unsubstituted (C3-C40) alicyclic hydrocarbon moiety and substituted is or unsubstituted (C3-C40) cycloalkylalkylene moiety; R is selected from C1-C10 linear or branched alkylene and n?2. The invention further relates to a process for using such a composition.Type: ApplicationFiled: October 9, 2009Publication date: April 14, 2011Inventors: Ralph R. Dammel, Srinivasan Chakrapani, Munirathna Padmanaban, Shinji Miyazaki, Edward W. Ng, Takanori Kudo, Alberto D. Dioses, Francis M. Houlihan
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Patent number: 7601480Abstract: The present application relates to a compound of formula where X is selected from the group CF3SO3, C4F9SO3, N(SO2C2F5)2, N(SO2CF3SO2C4F9), N(SO2C3F7)2, N(SO2C4F9)2, CF3CHFO(CF2)2SO3, and CH3CH2CH2O(CF2)4SO3. A photoresist composition comprising a polymer containing an acid labile group, the above compounds, and one or more additional photoacid generators is also provided for.Type: GrantFiled: December 20, 2006Date of Patent: October 13, 2009Assignee: AZ Electronic Materials USA Corp.Inventors: M. Dalil Rahman, Takanori Kudo
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Patent number: 7595141Abstract: The present invention relates to an aqueous coating composition for coating a photoresist pattern comprising a polymer containing amino group. The present invention also relates to a process for manufacturing a microelectronic device comprising providing a substrate with a photoresist pattern, coating the photoresist pattern with the novel coating material reacting a portion of the coating material in contact with the photoresist pattern, and removing a portion of the coating material which is not reacted with a removal solution.Type: GrantFiled: October 26, 2004Date of Patent: September 29, 2009Assignee: AZ Electronic Materials USA Corp.Inventors: Takanori Kudo, Munirathna Padmanaban, Ralph R. Dammel
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Publication number: 20090053652Abstract: Photoresist compositions are disclosed.Type: ApplicationFiled: August 24, 2007Publication date: February 26, 2009Inventors: Srinivasan Chakrapani, Munirathna Padmanaban, Muthiah Thiyagarajan, Takanori Kudo, David L. Rentkiewicz
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Publication number: 20080153032Abstract: The present application relates to a compound of formula where X is selected from the group CF3SO3, C4F9SO3, N(SO2C2F5)2, N(SO2CF3SO2C4F9), N(SO2C3F7)2, N(SO2C4F9)2, CF3CHFO(CF2)2SO3, and CH3CH2CH2O(CF2)4SO3. A photoresist composition comprising a polymer containing an acid labile group, the above compounds, and one or more additional photoacid generators is also provided for.Type: ApplicationFiled: December 20, 2006Publication date: June 26, 2008Inventors: M. Dalil Rahman, Takanori Kudo
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Patent number: 7122291Abstract: The present invention provides for a photoresist composition comprising a mixture of two different copolymers.Type: GrantFiled: August 2, 2004Date of Patent: October 17, 2006Assignee: AZ Electronic Materials USA Corp.Inventors: Munirathna Padmanaban, Guanyang Lin, Takanori Kudo, Chi-Sun Hong, M. Dalil Rahman