Abstract: A stream information setting unit (108) sets, with respect to a plurality of information collection object apparatuses, either a first transmission setting of a first data transmission of which a transmission cycle is designated or a second transmission setting of a second data transmission which uses a predetermined transmission cycle. A telemetry data receiving unit (106) receives data from the information collection object apparatuses by the first data transmission executed according to the first transmission setting and the second data transmission executed according to the second transmission setting performed by the stream information setting unit (108). A measuring unit (103) measures a transmission time of data by the first data transmission. A comparing unit (104) determines whether or not the transmission time measured by the measuring unit (103) exceeds the designated transmission cycle.

Abstract: A control system (10) includes, for each type of Virtual Network Function (VNF), a VNF compatibility condition indicating a condition of allocation of resources by which the VNF corresponding to the type is allowed to coexist with other VNFs in an identical computer, and resource usage information indicating resources in use by the VNF in the computer and unused resources. The control system (10) includes a VNF deploy control unit (14) referencing, in a case of receiving an instruction to additionally install a VNF, the type of the VNF to be additionally installed, the VNF compatibility condition, and the resource usage information to determine, from among the unused resources, resources allocated to the VNF to be additionally installed, and a resource allocation processing unit allocating the determined resources to the VNF to be additionally installed.

Abstract: A filter setting device (20) includes a shared filter DB (21) having a shared filter information table (211) in which information of each shared filter is recorded and a shared filter application destination table (212) in which a transfer device of an application destination of each shared filter is recorded; a shared filter creation unit (22) for determining new creation of a shared filter or diversion of an existing shared filter by referring to a shared filter information table (211) and a shared filter application destination table (212) on the basis of an instruction of a host server (10), in the L3 transfer technology; and a configuration input unit (23) for generating a configuration on the basis of a determination result of the shared filter creation unit (22), and setting a shared filter to be shared among a plurality of IF in a transfer device (30).

Abstract: The invention is to appropriately support work of a worker. A work support system includes an imaging unit, a control unit, and a display unit. The imaging unit captures an image of a work site. The control unit specifies a region selected by the worker at the work site in the image as a work target region including a work target. The display unit displays text for supporting the work of the worker in the vicinity of the work target region of the image. The work support system includes a sensor unit configured to recognize a line of sight of the worker, and the control unit specifies a predetermined region from a center of the line of sight recognized by the sensor unit as the work target region.

Abstract: A resist composition comprising a base polymer and an acid generator containing a sulfonium salt which is structured such that an iodized or brominated hydrocarbyl group (exclusive of iodized or brominated aromatic ring) is bonded to a benzene ring via an ester bond-containing group offers a high sensitivity, minimal LWR and improved CDU independent of whether it is of positive or negative tone.

Abstract: An onium salt compound consisting of a sulfonate anion having the structure that a polymerizable unsaturated bond is linked to an iodized aromatic group via a carbon chain of two or more carbon atoms and a sulfonium or iodonium cation is provided. A resist composition comprising a polymer comprising repeat units derived from the onium salt has a high sensitivity and forms a pattern with improved LWR or CDU, independent of whether it is of positive or negative tone.

Abstract: A collection unit (132) collects information about at least either of user accommodation status and resource consumption status from plural communications devices accommodating users who receive communications services. An estimation unit (131) estimates an amount of resource consumption of a first user for whom an accommodation device is to be determined. A judgment unit (133) judges whether each of the communications devices satisfies a predetermined restricting condition, based on the information collected by the collection unit (132) and the amount of resource consumption of the first user estimated by the estimation unit (131). A determination unit (134) determines a communications device judged by the judgment unit (133) to satisfy the restricting condition among the communications devices, as the accommodation device for the first user.

Abstract: A resist composition comprising a base polymer and a quencher in the form of a heterocyclic amine compound having a tertiary ester structure offers a high sensitivity and minimal LWR or improved CDU, independent of whether it is of positive or negative tone.

Abstract: A content presentation system includes: a trainee terminal that presents training content to the trainee; a worker terminal used by a worker; a tool recognition device that acquires a work video of the worker and recognizes the tool being used by the worker; a determination device that determines success or failure of the work at a specific stage based on the information about the work tool recognized by the tool recognition device; and a content creation device that creates and updates the training content based on the determination result of the determination device. When the determination result is determined to be the failure of the work by the determination device, the content creation device identifies a portion of the training content corresponding to the specific stage in the work procedure and updates the portion of the training content so as to suppress a factor of the failure.

Abstract: A resist composition comprising an iodized base polymer and an iodized benzene ring-containing quencher has a high sensitivity and improved LWR and CDU.

Abstract: An onium salt having formula (1) serving as an acid diffusion inhibitor and a chemically amplified resist composition comprising the acid diffusion inhibitor are provided. When processed by lithography, the resist composition exhibits dissolution contrast, acid diffusion suppressing effect, and excellent lithography performance factors such as CDU, LWR and sensitivity.

Abstract: A resist composition containing: (A) a resin containing a repeating unit having an acid-labile group; (B) a photo-acid generator shown by a general formula (B-1); and (C) a solvent, where W1 represents a cyclic divalent hydrocarbon group having 4 to 12 carbon atoms and containing a heteroatom; W2 represents a cyclic monovalent hydrocarbon group having 4 to 14 carbon atoms and not containing a heteroatom; Rf represents a divalent organic group shown by the following general formula; and M+ represents an onium cation. This provides a resist composition and a patterning process that uses the resist composition that show a particularly favorable mask dimension dependency (mask error factor: MEF), LWR, and critical dimension uniformity (CDU) particularly in photolithography where a high-energy beam such as an ArF excimer laser beam is used as a light source.

Abstract: A resist composition comprising a base polymer and an acid generator containing a sulfonium salt having the formula (1) or an iodonium salt having the formula (2).

Abstract: A resist composition containing: (A) a resin containing a repeating unit having an acid-labile group; (B) a photo-acid generator shown by a general formula (B-1); and (C) a solvent, where W1 represents a cyclic divalent hydrocarbon group having 4 to 12 carbon atoms and containing a heteroatom; W2 represents a cyclic monovalent hydrocarbon group having 4 to 14 carbon atoms and not containing a heteroatom; Rf represents a divalent organic group shown by the following general formula; and M+ represents an onium cation. This provides a resist composition and a patterning process that uses the resist composition that show a particularly favorable mask dimension dependency (mask error factor: MEF), LWR, and critical dimension uniformity (CDU) particularly in photolithography where a high-energy beam such as an ArF excimer laser beam is used as a light source.

Abstract: A salt having formula (1) or (2) serving as an acid diffusion inhibitor is provided as well as a resist composition comprising the acid diffusion inhibitor. When processed by lithography, the resist composition exhibits a high sensitivity, and excellent lithography properties such as CDU and LWR.

Abstract: A resist composition comprising a base polymer and an acid generator containing a sulfonium or iodonium salt of iodized benzamide group-containing fluorinated sulfonic acid offers a high sensitivity, minimal LWR and improved CDU independent of whether it is of positive or negative tone.

Abstract: A positive resist composition comprising a base polymer comprising recurring units (a) having the structure of an ammonium salt of fluorosulfonic acid having an iodized or brominated aromatic ring, and recurring units (b1) having an acid labile group-substituted carboxyl group and/or recurring units (b2) having an acid labile group-substituted phenolic hydroxyl group exhibits a high sensitivity, high resolution, low edge roughness and dimensional uniformity, and forms a pattern of good profile after exposure and development.

Abstract: An onium salt consisting of an anion containing an iodized aromatic group and two sulfonate groups and a sulfonium or iodonium cation is a useful photoacid generator. A chemically amplified resist composition comprising the photoacid generator forms a pattern of rectangular profile with a good balance of sensitivity, CDU, LWR, MEF, and DOF when it is processed by photolithography using high-energy radiation.

Abstract: A chemically-amplified negative resist composition includes: (A) an acid generator containing an onium salt (s) shown by the following formula(e) (A-1) and/or (A-2); and (B) a base polymer containing repeating units shown by the following formulae (B1) and (B2). Thus, the present invention provides: a chemically-amplified negative resist composition which provides a pattern with high sensitivity, low LWR and CDU, and favorable profile; and a resist patterning process using the composition.

Abstract: A resist composition comprising a base polymer and a sulfonium salt of a carboxylic acid having an iodine or bromine-substituted hydrocarbyl group offers a high sensitivity, minimal LWR and improved CDU, independent of whether it is of positive or negative tone.