Abstract: A resist composition comprising a base polymer and a sulfonium salt of a carboxylic acid having an iodine or bromine-substituted hydrocarbyl group offers a high sensitivity, minimal LWR and improved CDU, independent of whether it is of positive or negative tone.

Abstract: A positive resist composition is provided comprising (A) a specific sulfonium salt as quencher, (B) a sulfonium salt consisting of a fluorinated sulfonate anion and a sulfonium cation as acid generator, and (C) a base polymer comprising repeat units having an acid labile group. The resist composition has a high sensitivity and resolution, improved LWR or CDU, and a broad process window and forms a pattern of good profile after exposure.

Abstract: The present invention is a positive resist material containing: an acid generator being a sulfonium salt of a sulfonate ion bonded to a polymer main chain; and a quencher being a sulfonium salt shown by the following general formula (1). R1 represents a fluorine atom, phenyl group, phenyloxycarbonyl group, alkyl group, alkoxy group, alkenyl group, alkynyl group, or alkoxycarbonyl group. Hydrogen atoms of these groups are optionally substituted. R2 to R4 each independently represent a halogen atom or hydrocarbyl group. R2 and R3, or R2 and R4, are optionally bonded with each other to form a ring with a sulfur atom that is bonded thereto. Thus, the present invention provides: a positive resist material having higher sensitivity than conventional positive resist materials, and having little edge roughness (LWR) and dimensional variation (CDU) in an exposure pattern; and a patterning process using the positive resist material.

Abstract: The present invention addresses the problem of providing a prepreg that has excellent short-time and low-pressure handling properties, during pasting and layering work. In order to solve the problem, this invention has the following configuration. The prepreg includes reinforcing fibers and an epoxy resin composition, has a fiber content of 90 mass % or less, and satisfies conditions (a) and (b) below. (a) When the average thickness of the prepreg is set as D (D being 3 ?m or greater), the viscosity at 25° C. of the epoxy resin composition at a site (I) located at a depth of D/4 to 3D/4 from the surface on one side of the prepreg is 50,000 to 300,000 Pa·s inclusive. (b) From among sites (II) located at a depth of up to 0.5 ?m from each surface on both sides of the prepreg, the viscosity at 25° C. of the epoxy resin composition at least at a site (II) on the one side is 10,000 to 40,000 Pa·s inclusive.

Abstract: A positive resist composition comprising a base polymer comprising recurring units (a) having the structure of an ammonium salt of N-carbonylsulfonamide having an iodized aromatic ring, and recurring units (b1) having an acid labile group-substituted carboxyl group and/or recurring units (b2) having an acid labile group-substituted phenolic hydroxyl group exhibits a high sensitivity, high resolution, low edge roughness and dimensional uniformity, and forms a pattern of good profile after exposure and development.

Abstract: A resist composition comprising a base polymer and a quencher in the form of an ammonium salt consisting of an ammonium cation having an iodized aromatic ring bonded to the nitrogen atom via a C1-C20 hydrocarbylene group which may contain an ester bond or ether bond and a carboxylate anion having an iodized or brominated hydrocarbyl group offers a high sensitivity and minimal LWR or improved CDU, independent of whether it is of positive or negative tone.

Abstract: A content presentation system includes: a trainee terminal that presents training content to the trainee; a worker terminal used by a worker; a tool recognition device that acquires a work video of the worker and recognizes the tool being used by the worker; a determination device that determines success or failure of the work at a specific stage based on the information about the work tool recognized by the tool recognition device; and a content creation device that creates and updates the training content based on the determination result of the determination device. When the determination result is determined to be the failure of the work by the determination device, the content creation device identifies a portion of the training content corresponding to the specific stage in the work procedure and updates the portion of the training content so as to suppress a factor of the failure.

Abstract: A resist composition comprising a base polymer and a quencher in the form of an ammonium salt consisting of an ammonium cation having an iodized aromatic ring bonded to the nitrogen atom via a C1-C20 hydrocarbylene group and an anion derived from an iodized or brominated phenol offers a high sensitivity and minimal LWR or improved CDU, independent of whether it is of positive or negative tone.

Abstract: A resist composition comprising a base polymer and a quencher in the form of an amine compound having an iodized aromatic ring and a tertiary ester structure offers a high sensitivity and minimal LWR or improved CDU, independent of whether it is of positive or negative tone.

Abstract: A collection unit (132) collects information about at least either of user accommodation status and resource consumption status from plural communications devices accommodating users who receive communications services. An estimation unit (131) estimates an amount of resource consumption of a first user for whom an accommodation device is to be determined. A judgment unit (133) judges whether each of the communications devices satisfies a predetermined restricting condition, based on the information collected by the collection unit (132) and the amount of resource consumption of the first user estimated by the estimation unit (131). A determination unit (134) determines a communications device judged by the judgment unit (133) to satisfy the restricting condition among the communications devices, as the accommodation device for the first user.

Abstract: A resist composition comprising a sulfonium salt having formula (1) as PAG, a base polymer, and an organic solvent, when processed by lithography, has light transmittance, acid diffusion suppressing effect, and excellent lithography performance factors such as DOF, LWR and MEF. A lithography process for forming a resist pattern from the composition is also provided.

Abstract: A novel carboxylic acid iodonium salt and a resist composition comprising the same as a quencher are provided. When resist composition is processed by photolithography using KrF or ArF excimer laser, EB or EUV, there is formed a resist pattern which is improved in rectangularity, MEF, LWR, and CDU.

Abstract: A resist composition comprising a base polymer and an onium salt of N-carbonylsulfonamide having iodized benzene ring offers a high sensitivity, minimal LWR and improved CDU, independent of whether it is of positive or negative tone.

Abstract: A communication system includes a programmable switch configured to perform packet transfer and queuing, a plurality of VNFs configured to execute network functions on packets, and a controller configured to control the programmable switch including a queue distribution unit configured to distribute input packets to any of the plurality of VNFs according to an instruction of the controller with respect to a queue group, the plurality of VNFs each include a load measurement unit configured to measure an amount of consumption of server resources and notify the controller of a load status, and the controller includes a load analysis unit configured to analyze a load of each of the plurality of VNFs based on a certain rule, and a queue control unit configured to change a queue distribution rule.

Abstract: A resist composition comprising a base polymer and a quencher in the form of a salt of a cyclic ammonium cation with a carboxylate, sulfonamide, halogenated phenoxide or halide anion offers a high sensitivity and minimal LWR or improved CDU, independent of whether it is of positive or negative tone.

Abstract: There is provided a drug delivery composition containing an acid-resistant cell that encloses a drug in the cell. In addition, there is provided an acid-resistant cell in which a drug is enclosed in the cell, where the drug is localized in the sac-shaped membrane structure included in the acid-resistant.

Abstract: A resist composition comprising a base polymer and a quencher in the form of an amine compound having an iodized aromatic ring bonded to the nitrogen atom via a divalent hydrocarbon group offers a high sensitivity and minimal LWR or improved CDU, independent of whether it is of positive or negative tone.

Abstract: A resist composition containing: (A) a resin containing a repeating unit having an acid-labile group and further containing at least one repeating unit having an aromatic substituent; (B) a photo-acid generator shown by a general formula (B-1); and (C) a solvent, where W1 represents a cyclic divalent hydrocarbon group having 4 to 12 carbon atoms with a heteroatom; W2 represents a cyclic monovalent hydrocarbon group having 4 to 14 carbon atoms without a heteroatom; Rf represents a divalent organic group shown by the following general formula; and M+ represents an onium cation. This provides a resist composition and a patterning process of using it that show a particularly favorable mask dimension dependency and CDU in photolithography where a light source is a high-energy beam such as a KrF excimer laser beam, an electron beam, or an extreme ultraviolet ray.

Abstract: A content presentation system includes: a training content distribution function 431 that presents the training content to the trainee; a work content delivery function 331 that presents a work procedure based on augmented reality; a user operation detection unit 120 that detects a three-dimensional operation of the site worker; a work record analysis function 338 that determines success or failure of the work based on the evaluation reference information; and a content creation/updating function 342 that updates the training content based on the determination result. When a predetermined body motion of the worker is detected, the work record analysis function determines whether the work has failed based on the measurement information of the model worker up to the body motion. When the work is determined to have failed, the content creation/updating function updates the training content so as to suppress the factor of the failure.

Abstract: The present invention provides a biomedical electrode composition capable of forming a living body contact layer for a biomedical electrode that is excellent in conductivity and biocompatibility, is light-weight, can be manufactured at low cost, and can control significant reduction in conductivity even though the biomedical electrode is soaked in water or dried. The present invention was accomplished by a biomedical electrode composition including a polymer compound having both the ionic repeating unit “a” and the repeating unit “b” of (meth)acrylate, in which the ionic repeating unit “a” is a repeating unit of sodium salt, potassium salt, or ammonium salt including a partial structure represented by the following general formula (1), and the repeating unit “b” of (meth)acrylate is a repeating unit represented by the following general formula (2).