Abstract: One aim of the present invention is to treat or prevent chronic kidney disease. Provided is a treatment or prophylactic pharmaceutical composition for chronic kidney disease, that contains an SGLTl-inhibiting compound or a pharmaceutically acceptable salt thereof.

Abstract: The present invention aims to provide novel pharmaceutical use of compound A or a pharmaceutically acceptable salt thereof, or a monohydrate of compound A. The present invention relates to a therapeutic or prophylactic agent for chronic kidney diseases containing compound A or a pharmaceutically acceptable salt thereof, or a monohydrate of compound A as the active ingredient.

Abstract: The line narrowed laser apparatus configured to perform a plurality of burst oscillations including a first burst oscillation and a second burst oscillation next to the first burst oscillation to output a pulse laser beam. The line narrowed laser apparatus comprises a laser resonator, a chamber provided in the laser resonator, a pair of electrodes provided in the chamber, an electric power source configured to apply pulsed voltage to the pair of electrodes, a wavelength selecting element provided in the laser resonator, a spectral width varying unit provided in the laser resonator, and a controller. The controller is configured to measure a duty in a predetermined period before starting the second burst oscillation and a length of a suspension period from a time of ending the first burst oscillation to a time of starting the second burst oscillation, and perform a first control of the spectral width varying unit based on the duty and the length of the suspension period.

Abstract: A laser unit management system may include a server configured to hold first information provided with access limitation that allows an access with a first access authorization, second information provided with access limitation that allows an access with a second access authorization, and third information provided with access limitation that allows both an access with the first access authorization and an access with the second access authorization; and a laser unit including a laser output section and a controller, the laser output section being configured to output pulsed laser light toward an exposure unit that is configured to perform wafer exposure, the controller being configured to store the first information, the second information, and the third information in the server. The second information may include wafer-exposure-related information on the exposure unit and laser-control-related information on the laser unit that are in association with each other.

Abstract: A lens holder includes a holder body and a winding wire wound around the holder body. The holder body includes a winding body, a first projection and a second projection each projecting from a surface of the holder body, and a winding terminal positioned between the first projection and the second projection, and provided on the surface of the holder body. A part of the winding wire is wound around the winding body to form a coil. An end of the winding wire is wound around the second projection and connected to the winding terminal.

Abstract: The line narrowed laser apparatus configured to perform a plurality of burst oscillations including a first burst oscillation and a second burst oscillation next to the first burst oscillation to output a pulse laser beam. The line narrowed laser apparatus comprises a laser resonator, a chamber provided in the laser resonator, a pair of electrodes provided in the chamber, an electric power source configured to apply a pulsed voltage to the pair of electrodes, a wavelength-selecting element provided in the laser resonator, a spectral width varying unit provided in the laser resonator, a wavelength variable unit configured to change a selected wavelength selected by the wavelength-selecting element, and a controller. The controller is configured to control the wavelength variable unit based on an amount of control of the spectral width varying unit in a period from a time of ending the first burst oscillation to a time of starting the second burst oscillation.

Abstract: There may be provided a laser unit including a display configured to display one or both of electric power consumed by the laser unit and electric energy consumed by the laser unit.

Abstract: There may be provided a laser unit including a display configured to display one or both of electric power consumed by the laser unit and electric energy consumed by the laser unit.

Abstract: The line narrowed laser apparatus configured to perform a plurality of burst oscillations including a first burst oscillation and a second burst oscillation next to the first burst oscillation to output a pulse laser beam. The line narrowed laser apparatus comprises a laser resonator, a chamber provided in the laser resonator, a pair of electrodes provided in the chamber, an electric power source configured to apply a pulsed voltage to the pair of electrodes, a wavelength-selecting element provided in the laser resonator, a spectral width varying unit provided in the laser resonator, a wavelength variable unit configured to change a selected wavelength selected by the wavelength-selecting element, and a controller. The controller is configured to control the wavelength variable unit based on an amount of control of the spectral width varying unit in a period from a time of ending the first burst oscillation to a time of starting the second burst oscillation.

Abstract: A lens holder includes a holder body and a winding wire wound around the holder body. The holder body includes a winding body, a first projection and a second projection each projecting from a surface of the holder body, and a winding terminal positioned between the first projection and the second projection, and provided on the surface of the holder body. A part of the winding wire is wound around the winding body to form a coil. An end of the winding wire is wound around the second projection and connected to the winding terminal.

Abstract: A laser unit management system may include a server configured to hold first information provided with access limitation that allows an access with a first access authorization, second information provided with access limitation that allows an access with a second access authorization, and third information provided with access limitation that allows both an access with the first access authorization and an access with the second access authorization; and a laser unit including a laser output section and a controller, the laser output section being configured to output pulsed laser light toward an exposure unit that is configured to perform wafer exposure, the controller being configured to store the first information, the second information, and the third information in the server. The second information may include wafer-exposure-related information on the exposure unit and laser-control-related information on the laser unit that are in association with each other.

Abstract: The line narrowed laser apparatus configured to perform a plurality of burst oscillations including a first burst oscillation and a second burst oscillation next to the first burst oscillation to output a pulse laser beam. The line narrowed laser apparatus comprises a laser resonator, a chamber provided in the laser resonator, a pair of electrodes provided in the chamber, an electric power source configured to apply pulsed voltage to the pair of electrodes, a wavelength selecting element provided in the laser resonator, a spectral width varying unit provided in the laser resonator, and a controller. The controller is configured to measure a duty in a predetermined period before starting the second burst oscillation and a length of a suspension period from a time of ending the first burst oscillation to a time of starting the second burst oscillation, and perform a first control of the spectral width varying unit based on the duty and the length of the suspension period.

Abstract: Problem: to suppress the number of times complete gas replacement in a laser chamber. Solution: this excimer laser apparatus may include a gas supply unit, connected to a first receptacle that holds a first laser gas containing halogen gas and a second receptacle that holds a second laser gas having a lower halogen gas concentration than the first laser gas, that supplies the first laser gas and the second laser gas to the interior of the laser chamber. Then, gas pressure control in which the gas supply unit supplies the second laser gas to the interior of the laser chamber or a gas exhaust unit partially exhausts gas from within the laser chamber, and partial gas replacement control in which the gas supply unit supplies the first laser gas and the second laser gas to the interior of the laser chamber and the gas exhaust unit partially exhausts gas from within the laser chamber sequentially, may be selectively performed.

Abstract: A narrow band laser apparatus may include: a laser resonator; a pair of discharge electrodes; a power supply; a first wavelength measurement device configured to output a first measurement result; a second wavelength measurement device configured to output a second measurement result; and a control unit. The control unit calibrates the first measurement result, based on a difference between the second measurement result derived when the control unit controls the power supply to apply a pulsed voltage to the pair of discharge electrodes with a first repetition frequency and the second measurement result derived when the control unit controls the power supply to apply the pulsed voltage to the pair of discharge electrodes with a second repetition frequency, the second repetition frequency being higher than the first repetition frequency.

Abstract: There may be provided a laser unit including a display configured to display one or both of electric power consumed by the laser unit and electric energy consumed by the laser unit.

Abstract: There may be provided a laser unit including a display configured to display one or both of electric power consumed by the laser unit and electric energy consumed by the laser unit.

Abstract: A narrow band laser apparatus may include: a laser resonator; a pair of discharge electrodes; a power supply; a first wavelength measurement device configured to output a first measurement result; a second wavelength measurement device configured to output a second measurement result; and a control unit. The control unit calibrates the first measurement result, based on a difference between the second measurement result derived when the control unit controls the power supply to apply a pulsed voltage to the pair of discharge electrodes with a first repetition frequency and the second measurement result derived when the control unit controls the power supply to apply the pulsed voltage to the pair of discharge electrodes with a second repetition frequency, the second repetition frequency being higher than the first repetition frequency.

Abstract: A laser apparatus includes: an oscillator configured to output seed light; an amplifier including a laser chamber provided in an optical path of the seed light and a pair of discharge electrodes provided inside the laser chamber; and a transform optical system provided in the optical path of the seed light between the oscillator and the amplifier and configured to transform the seed light in a way that suppresses a decrease in purity of polarization of a laser beam that is outputted from the amplifier.

Abstract: Problem: to suppress the number of times complete gas replacement in a laser chamber. Solution: this excimer laser apparatus may include a gas supply unit, connected to a first receptacle that holds a first laser gas containing halogen gas and a second receptacle that holds a second laser gas having a lower halogen gas concentration than the first laser gas, that supplies the first laser gas and the second laser gas to the interior of the laser chamber. Then, gas pressure control in which the gas supply unit supplies the second laser gas to the interior of the laser chamber or a gas exhaust unit partially exhausts gas from within the laser chamber, and partial gas replacement control in which the gas supply unit supplies the first laser gas and the second laser gas to the interior of the laser chamber and the gas exhaust unit partially exhausts gas from within the laser chamber sequentially, may be selectively performed.

Abstract: There may be provided a laser unit including a display configured to display one or both of electric power consumed by the laser unit and electric energy consumed by the laser unit.