Patents by Inventor Tamami Takahashi
Tamami Takahashi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 10532321Abstract: An energy recovery device is provided in a seawater desalination system for desalinating seawater by removing salinity from the seawater. A pressure exchange chamber for pressurizing seawater by a pressure of concentrated seawater discharged from a reverse-osmosis membrane-separation apparatus includes a first supply and discharge port connected to a switching valve for performing supply and discharge of liquid, a second supply and discharge port connected to a directional control valve for performing supply and discharge of liquid, a flow resistor provided at the first supply and discharge port side in the chamber and configured to regulate the flow, and a flow resistor provided at the second supply and discharge port side in the chamber and configured to regulate the flow, and a flowmeter provided between the two flow resistors and configured to measure a flow rate of the liquid in the chamber.Type: GrantFiled: October 22, 2014Date of Patent: January 14, 2020Assignee: EBARA CORPORATIONInventor: Tamami Takahashi
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Patent number: 10232315Abstract: A seawater desalination system for desalinating seawater by removing salinity from the seawater and an energy recovery apparatus which is preferably used in the seawater desalination system. The energy recovery apparatus includes a cylindrical chamber being installed such that a longitudinal direction of the chamber is placed in a vertical direction, a concentrated seawater port for supplying and discharging the concentrated seawater, a seawater port for supplying and discharging the seawater, a flow resistor provided at a concentrated seawater port side in the chamber, and a flow resistor provided at a seawater port side in the chamber. Each of the flow resistor provided at the concentrated seawater port side and the seawater port side comprises at least one perforated circular plate, and each perforated circular plate has a plurality of holes formed in an outer circumferential area outside a circle having a predetermined diameter on the perforated circular plate.Type: GrantFiled: September 21, 2018Date of Patent: March 19, 2019Assignee: EBARA CORPORATIONInventors: Akira Goto, Tamami Takahashi, Motohiko Nohmi, Masanori Goto
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Patent number: 10207224Abstract: An energy recovery apparatus which is used in a seawater desalination system includes a cylindrical chamber (CH) being installed such that a longitudinal direction of the chamber is placed in a vertical direction, a concentrated seawater port (P1) for supplying and discharging the concentrated seawater, a seawater port (P2) for supplying and discharging the seawater, a flow resistor (23) provided at a concentrated seawater port (P1) side in the chamber (CH), and a flow resistor (23) provided at a seawater port (P2) side in the chamber (CH). The flow resistor (23) provided at the concentrated seawater port (P1) side and the flow resistor (23) provided at the seawater port (P2) side comprise at least one perforated circular plate, and the perforated circular plate has holes formed at an outer circumferential area outside a predetermined diameter of the circular plate.Type: GrantFiled: March 28, 2014Date of Patent: February 19, 2019Assignee: EBARA CORPORATIONInventors: Tamami Takahashi, Masanori Goto, Akira Goto, Motohiko Nohmi, Kazuya Hirata
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Publication number: 20190022587Abstract: A seawater desalination system for desalinating seawater by removing salinity from the seawater and an energy recovery apparatus which is preferably used in the seawater desalination system. The energy recovery apparatus includes a cylindrical chamber being installed such that a longitudinal direction of the chamber is placed in a vertical direction, a concentrated seawater port for supplying and discharging the concentrated seawater, a seawater port for supplying and discharging the seawater, a flow resistor provided at a concentrated seawater port side in the chamber, and a flow resistor provided at a seawater port side in the chamber. Each of the flow resistor provided at the concentrated seawater port side and the seawater port side comprises at least one perforated circular plate, and each perforated circular plate has a plurality of holes formed in an outer circumferential area outside a circle having a predetermined diameter on the perforated circular plate.Type: ApplicationFiled: September 21, 2018Publication date: January 24, 2019Inventors: Akira GOTO, Tamami TAKAHASHI, Motohiko NOHMI, Masanori GOTO
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Patent number: 10166647Abstract: A polishing apparatus polishes a periphery of a substrate. This polishing apparatus includes a rotary holding mechanism configured to hold the substrate horizontally and rotate the substrate, plural polishing head assemblies provided around the substrate, plural tape supplying and recovering mechanisms configured to supply polishing tapes to the plural polishing head assemblies and recover the polishing tapes from the plural polishing head assemblies, and plural moving mechanisms configured to move the plural polishing head assemblies in radial directions of the substrate held by the rotary holding mechanism. The tape supplying and recovering mechanisms are located outwardly of the plural polishing head assemblies in the radial directions of the substrate, and the tape supplying and recovering mechanisms are fixed in position.Type: GrantFiled: November 2, 2016Date of Patent: January 1, 2019Assignee: EBARA CORPORATIONInventors: Tamami Takahashi, Masaya Seki, Hiroaki Kusa, Kenji Yamaguchi, Masayuki Nakanishi
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Patent number: 10137552Abstract: A polishing apparatus polishes a periphery of a substrate by bringing a polishing tool into sliding contact with the substrate. The polishing apparatus includes a substrate-holding mechanism configured to hold a substrate and rotate the substrate, a polishing mechanism configured to press a polishing tool against a periphery of the substrate so as to polish the periphery, and a periphery-supporting mechanism configured to support the periphery of the substrate by a fluid. The periphery-supporting mechanism is configured to support a surface of the substrate from an opposite side or the same side of the periphery of the substrate.Type: GrantFiled: April 12, 2017Date of Patent: November 27, 2018Assignee: EBARA CORPORATIONInventors: Kazuaki Maeda, Tamami Takahashi, Masaya Seki, Hiroaki Kusa
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Patent number: 10134614Abstract: A projecting/receiving unit (52) projects a laser light to a peripheral portion (30) and receives the reflected light while a liquid is being fed to a substrate (14) and is flowing on the peripheral portion (30). A signal processing controller (54) processes the electric signal of the reflected light to decide the state of the peripheral portion (30). The state of the peripheral portion being polished is monitored. Moreover, the polish end point is detected. A transmission wave other than the laser light may also be used. The peripheral portion (30) may also be enclosed by a passage forming member thereby to form a passage properly. The peripheral portion can be properly measured even in the situation where the liquid is flowing on the substrate peripheral portion.Type: GrantFiled: December 22, 2014Date of Patent: November 20, 2018Assignee: Ebara CorporationInventors: Mitsuo Tada, Yasunari Suto, Hirofumi Ichihara, Kenya Ito, Tamami Takahashi
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Patent number: 10124295Abstract: The present invention relates to a seawater desalination system for desalinating seawater by removing salinity from the seawater and an energy recovery apparatus which is preferably used in the seawater desalination system. The energy recovery apparatus includes a cylindrical chamber (CH) being installed such that a longitudinal direction of the chamber is placed in a vertical direction, a concentrated seawater port (P1) for supplying and discharging the concentrated seawater, a seawater port (P2) for supplying and discharging the seawater, a flow resistor (23) provided at a concentrated seawater port (P1) side in the chamber (CH), and a flow resistor (23) provided at a seawater port (P2) side in the chamber (CH).Type: GrantFiled: May 11, 2018Date of Patent: November 13, 2018Assignee: EBARA CORPORATIONInventors: Akira Goto, Tamami Takahashi, Motohiko Nohmi, Masanori Goto
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Publication number: 20180257035Abstract: The present invention relates to a seawater desalination system for desalinating seawater by removing salinity from the seawater and an energy recovery apparatus which is preferably used in the seawater desalination system. The energy recovery apparatus includes a cylindrical chamber (CH) being installed such that a longitudinal direction of the chamber is placed in a vertical direction, a concentrated seawater port (P1) for supplying and discharging the concentrated seawater, a seawater port (P2) for supplying and discharging the seawater, a flow resistor (23) provided at a concentrated seawater port (P1) side in the chamber (CH), and a flow resistor (23) provided at a seawater port (P2) side in the chamber (CH).Type: ApplicationFiled: May 11, 2018Publication date: September 13, 2018Inventors: Akira GOTO, Tamami TAKAHASHI, Motohiko NOHMI, Masanori GOTO
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Patent number: 10065152Abstract: An energy recovery apparatus used in the seawater desalination system includes a cylindrical chamber (CH) having a space for containing concentrated seawater and seawater therein and being installed such that a longitudinal direction of the chamber is placed in a vertical direction, a concentrated seawater port (P1) provided at the lower part of the chamber (CH) for supplying and discharging the concentrated seawater, a seawater port (P2) provided at the upper part of the chamber (CH) for supplying and discharging the seawater, a flow resistor (23) provided at a concentrated seawater port side in the chamber, and a flow resistor (23) provided at a seawater port side in the chamber. A circular plate (30) having a hole at the center thereof is provided between the concentrated seawater port (P1) and the flow resistor (23), or between the seawater port (P2) and the flow resistor (23).Type: GrantFiled: March 28, 2014Date of Patent: September 4, 2018Assignee: EBARA CORPORATIONInventors: Tamami Takahashi, Masanori Goto, Kazuaki Maeda
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Patent number: 10005034Abstract: The present invention relates to a seawater desalination system for desalinating seawater by removing salinity from the seawater and an energy recovery apparatus which is preferably used in the seawater desalination system. The energy recovery apparatus includes a cylindrical chamber (CH) being installed such that a longitudinal direction of the chamber is placed in a vertical direction, a concentrated seawater port (P1) for supplying and discharging the concentrated seawater, a seawater port (P2) for supplying and discharging the seawater, a flow resistor (23) provided at a concentrated seawater port (P1) side in the chamber (CH), and a flow resistor (23) provided at a seawater port (P2) side in the chamber (CH).Type: GrantFiled: August 28, 2015Date of Patent: June 26, 2018Assignee: EBARA CORPORATIONInventors: Akira Goto, Tamami Takahashi, Motohiko Nohmi, Masanori Goto
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Publication number: 20170252700Abstract: The present invention relates to a seawater desalination system for desalinating seawater by removing salinity from the seawater and an energy recovery apparatus which is preferably used in the seawater desalination system. The energy recovery apparatus includes a cylindrical chamber (CH) being installed such that a longitudinal direction of the chamber is placed in a vertical direction, a concentrated seawater port (P1) for supplying and discharging the concentrated seawater, a seawater port (P2) for supplying and discharging the seawater, a flow resistor (23) provided at a concentrated seawater port (P1) side in the chamber (CH), and a flow resistor (23) provided at a seawater port (P2) side in the chamber (CH).Type: ApplicationFiled: August 28, 2015Publication date: September 7, 2017Inventors: Akira GOTO, Tamami TAKAHASHI, Motohiko NOHMI, Masanori GOTO
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Publication number: 20170216989Abstract: A polishing apparatus polishes a periphery of a substrate by bringing a polishing tool into sliding contact with the substrate. The polishing apparatus includes a substrate-holding mechanism configured to hold a substrate and rotate the substrate, a polishing mechanism configured to press a polishing tool against a periphery of the substrate so as to polish the periphery, and a periphery-supporting mechanism configured to support the periphery of the substrate by a fluid. The periphery-supporting mechanism is configured to support a surface of the substrate from an opposite side or the same side of the periphery of the substrate.Type: ApplicationFiled: April 12, 2017Publication date: August 3, 2017Inventors: Kazuaki MAEDA, Tamami TAKAHASHI, Masaya SEKI, Hiroaki KUSA
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Patent number: 9649739Abstract: A polishing apparatus polishes a periphery of a substrate by bringing a polishing tool into sliding contact with the substrate. The polishing apparatus includes a substrate-holding mechanism configured to hold a substrate and rotate the substrate, a polishing mechanism configured to press a polishing tool against a periphery of the substrate so as to polish the periphery, and a periphery-supporting mechanism configured to support the periphery of the substrate by a fluid. The periphery-supporting mechanism is configured to support a surface of the substrate from an opposite side or the same side of the periphery of the substrate.Type: GrantFiled: August 18, 2015Date of Patent: May 16, 2017Assignee: EBARA CORPORATIONInventors: Kazuaki Maeda, Tamami Takahashi, Masaya Seki, Hiroaki Kusa
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Publication number: 20170072528Abstract: A polishing apparatus polishes a periphery of a substrate. This polishing apparatus includes a rotary holding mechanism configured to hold the substrate horizontally and rotate the substrate, plural polishing head assemblies provided around the substrate, plural tape supplying and recovering mechanisms configured to supply polishing tapes to the plural polishing head assemblies and recover the polishing tapes from the plural polishing head assemblies, and plural moving mechanisms configured to move the plural polishing head assemblies in radial directions of the substrate held by the rotary holding mechanism. The tape supplying and recovering mechanisms are located outwardly of the plural polishing head assemblies in the radial directions of the substrate, and the tape supplying and recovering mechanisms are fixed in position.Type: ApplicationFiled: November 2, 2016Publication date: March 16, 2017Inventors: Tamami TAKAHASHI, Masaya SEKI, Hiroaki KUSA, Kenji YAMAGUCHI, Masayuki NAKANISHI
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Patent number: 9517544Abstract: A polishing apparatus polishes a periphery of a substrate. This polishing apparatus includes a rotary holding mechanism configured to hold the substrate horizontally and rotate the substrate, plural polishing head assemblies provided around the substrate, plural tape supplying and recovering mechanisms configured to supply polishing tapes to the plural polishing head assemblies and recover the polishing tapes from the plural polishing head assemblies, and plural moving mechanisms configured to move the plural polishing head assemblies in radial directions of the substrate held by the rotary holding mechanism. The tape supplying and recovering mechanisms are located outwardly of the plural polishing head assemblies in the radial directions of the substrate, and the tape supplying and recovering mechanisms are fixed in position.Type: GrantFiled: December 19, 2014Date of Patent: December 13, 2016Assignee: EBARA CORPORATIONInventors: Tamami Takahashi, Masaya Seki, Hiroaki Kusa, Kenji Yamaguchi, Masayuki Nakanishi
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Publication number: 20160250595Abstract: An energy recovery device is provided in a seawater desalination system for desalinating seawater by removing salinity from the seawater. A pressure exchange chamber for pressurizing seawater by a pressure of concentrated seawater discharged from a reverse-osmosis membrane-separation apparatus includes a first supply and discharge port connected to a switching valve for performing supply and discharge of liquid, a second supply and discharge port connected to a directional control valve for performing supply and discharge of liquid, a flow resistor provided at the first supply and discharge port side in the chamber and configured to regulate the flow, and a flow resistor provided at the second supply and discharge port side in the chamber and configured to regulate the flow, and a flowmeter provided between the two flow resistors and configured to measure a flow rate of the liquid in the chamber.Type: ApplicationFiled: October 22, 2014Publication date: September 1, 2016Inventor: Tamami Takahashi
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Publication number: 20160220957Abstract: A seawater desalination system uses a reverse osmosis separation device. According to characteristics of a reverse osmosis membrane, the pressure or flow change rate of seawater is controlled with respect to the membrane at the start and stop of a high-pressure pump. A drive power source control device including a parallel circuit of a reduced voltage starter and a switch is connected between an electric motor for driving the pump and an AC power source. Control of the starter causes an AC voltage supplied to the motor to increase continuously during a start-up adjustment duration to asymptotically approach an AC power source voltage from zero with an upwardly-convex monotonically-increasing function, and to decrease continuously to zero during a stop adjustment duration as far as zero. The switch is closed to supply the AC voltage of the power source directly to the motor when it equals voltage supplied via the starter.Type: ApplicationFiled: September 11, 2014Publication date: August 4, 2016Inventors: Akira Goto, Shigeo Takita, Tamami Takahashi
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Publication number: 20160172221Abstract: A substrate processing apparatus includes first and second polishing units for polishing a peripheral portion of a substrate, a primary cleaning unit for cleaning the substrate, a secondary cleaning and drying unit for drying the substrate cleaned in the primary cleaning unit, and a measurement unit for measuring the peripheral portion of the substrate. The measurement unit includes a mechanism for measurement required for polishing in the first and second polishing units, such as a diameter measurement mechanism, a cross-sectional shape measurement mechanism, or a surface condition measurement mechanism.Type: ApplicationFiled: February 4, 2016Publication date: June 16, 2016Inventors: Tamami TAKAHASHI, Mitsuhiko SHIRAKASHI, Kenya ITO, Kazuyuki INOUE, Kenji YAMAGUCHI, Masaya SEKI
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Patent number: D752507Type: GrantFiled: April 2, 2015Date of Patent: March 29, 2016Assignee: EBARA CORPORATIONInventors: Tamami Takahashi, Akira Goto