Abstract: A substrate processing apparatus includes first and second polishing units for polishing a peripheral portion of a substrate, a primary cleaning unit for cleaning the substrate, a secondary cleaning and drying unit for drying the substrate cleaned in the primary cleaning unit, and a measurement unit for measuring the peripheral portion of the substrate. The measurement unit includes a mechanism for measurement required for polishing in the first and second polishing units, such as a diameter measurement mechanism, a cross-sectional shape measurement mechanism, or a surface condition measurement mechanism.

Abstract: An energy recovery apparatus used in the seawater desalination system includes a cylindrical chamber (CH) having a space for containing concentrated seawater and seawater therein and being installed such that a longitudinal direction of the chamber is placed in a vertical direction, a concentrated seawater port (P1) provided at the lower part of the chamber (CH) for supplying and discharging the concentrated seawater, a seawater port (P2) provided at the upper part of the chamber (CH) for supplying and discharging the seawater, a flow resistor (23) provided at a concentrated seawater port side in the chamber, and a flow resistor (23) provided at a seawater port side in the chamber. A circular plate (30) having a hole at the center thereof is provided between the concentrated seawater port (P1) and the flow resistor (23), or between the seawater port (P2) and the flow resistor (23).

Abstract: An energy recovery apparatus which is used in a seawater desalination system includes a cylindrical chamber (CH) being installed such that a longitudinal direction of the chamber is placed in a vertical direction, a concentrated seawater port (P1) for supplying and discharging the concentrated seawater, a seawater port (P2) for supplying and discharging the seawater, a flow resistor (23) provided at a concentrated seawater port (P1) side in the chamber (CH), and a flow resistor (23) provided at a seawater port (P2) side in the chamber (CH). The flow resistor (23) provided at the concentrated seawater port (P1) side and the flow resistor (23) provided at the seawater port (P2) side comprise at least one perforated circular plate, and the perforated circular plate has holes formed at an outer circumferential area outside a predetermined diameter of the circular plate.

Abstract: A polishing apparatus polishes a periphery of a substrate by bringing a polishing tool into sliding contact with the substrate. The polishing apparatus includes a substrate-holding mechanism configured to hold a substrate and rotate the substrate, a polishing mechanism configured to press a polishing tool against a periphery of the substrate so as to polish the periphery, and a periphery-supporting mechanism configured to support the periphery of the substrate by a fluid. The periphery-supporting mechanism is configured to support a surface of the substrate from an opposite side or the same side of the periphery of the substrate.

Abstract: A polishing apparatus polishes a periphery of a substrate by bringing a polishing tool into sliding contact with the substrate. The polishing apparatus includes a substrate-holding mechanism configured to hold a substrate and rotate the substrate, a polishing mechanism configured to press a polishing tool against a periphery of the substrate so as to polish the periphery, and a periphery-supporting mechanism configured to support the periphery of the substrate by a fluid. The periphery-supporting mechanism is configured to support a surface of the substrate from an opposite side or the same side of the periphery of the substrate.

Abstract: In a seawater desalination system for producing fresh water from seawater by passing the seawater pressurized by a pump through a reverse-osmosis membrane-separation apparatus to separate the seawater into fresh water and concentrated seawater, an energy exchange chamber for utilizing pressure energy of the concentrated seawater discharged from the reverse-osmosis membrane-separation apparatus as energy for pressurizing part of the seawater is provided. The energy exchange chamber includes a concentrated seawater port for introducing and discharging the concentrated seawater, a seawater port for introducing and discharging the seawater, a plurality of flow regulators, and a plurality of partitioned fluid passages provided in the chamber to allow the concentrated seawater port and the seawater port to communicate with each other.

Abstract: An energy exchange chamber is used for exchanging pressure energy between concentrated seawater discharged from a reverse-osmosis membrane-separation apparatus and a part of seawater to be treated by the reverse-osmosis membrane separation apparatus in a seawater desalination system. The energy exchange chamber includes a concentrated seawater distributor communicating with a concentrated seawater port and configured to distribute a flow of concentrated seawater all over a horizontal plane of an interior of a chamber, and a seawater distributor communicating with a seawater port and configured to distribute a flow of seawater all over the horizontal plane of the interior of the chamber. The concentrated seawater and the seawater introduced into the chamber are brought into direct contact with each other over the horizontal plane of the interior of the chamber to exchange pressure energy between the concentrated seawater and the seawater introduced into the chamber.

Abstract: A polishing apparatus polishes a periphery of a substrate. This polishing apparatus includes a rotary holding mechanism configured to hold the substrate horizontally and rotate the substrate, plural polishing head assemblies provided around the substrate, plural tape supplying and recovering mechanisms configured to supply polishing tapes to the plural polishing head assemblies and recover the polishing tapes from the plural polishing head assemblies, and plural moving mechanisms configured to move the plural polishing head assemblies in radial directions of the substrate held by the rotary holding mechanism. The tape supplying and recovering mechanisms are located outwardly of the plural polishing head assemblies in the radial directions of the substrate, and the tape supplying and recovering mechanisms are fixed in position.

Abstract: A projecting/receiving unit (52) projects a laser light to a peripheral portion (30) and receives the reflected light while a liquid is being fed to a substrate (14) and is flowing on the peripheral portion (30). A signal processing controller (54) processes the electric signal of the reflected light to decide the state of the peripheral portion (30). The state of the peripheral portion being polished is monitored. Moreover, the polish end point is detected. A transmission wave other than the laser light may also be used. The peripheral portion (30) may also be enclosed by a passage forming member thereby to form a passage properly. The peripheral portion can be properly measured even in the situation where the liquid is flowing on the substrate peripheral portion.

Abstract: A polishing apparatus polishes a periphery of a substrate. This polishing apparatus includes a rotary holding mechanism configured to hold the substrate horizontally and rotate the substrate, plural polishing head assemblies provided around the substrate, plural tape supplying and recovering mechanisms configured to supply polishing tapes to the plural polishing head assemblies and recover the polishing tapes from the plural polishing head assemblies, and plural moving mechanisms configured to move the plural polishing head assemblies in radial directions of the substrate held by the rotary holding mechanism. The tape supplying and recovering mechanisms are located outwardly of the plural polishing head assemblies in the radial directions of the substrate, and the tape supplying and recovering mechanisms are fixed in position.

Abstract: A seawater desalination system which can solve a problem of wear of a sliding member and can suppress mixing of concentrated seawater and seawater by making an energy exchange chamber no-piston configuration is provided. In a seawater desalination system for producing fresh water from seawater by passing the seawater pressurized by a pump through a reverse-osmosis membrane-separation apparatus (4) to separate the seawater into fresh water and concentrated seawater, an energy exchange chamber (20) for utilizing pressure energy of the concentrated seawater discharged from the reverse-osmosis membrane-separation apparatus (3) as energy for pressurizing part of the seawater is provided.

Abstract: A seawater desalination system produces fresh water from seawater by passing the seawater pressurized by a pump through a reverse-osmosis membrane-separation apparatus to separate the seawater into fresh water and concentrated seawater. An energy exchange chamber is provided for utilizing pressure energy of the concentrated seawater discharged from the reverse-osmosis membrane-separation apparatus as energy for pressurizing part of the seawater. The energy exchange chamber includes a concentrated seawater port for introducing and discharging the concentrated seawater, a seawater port for introducing and discharging the seawater, and a plurality of partitioned fluid passages provided in the chamber to allow the concentrated seawater port and the seawater port to communicate with each other.

Abstract: An energy recovery apparatus exchanges pressure energy between concentrated seawater discharged from a reverse-osmosis membrane-separation apparatus and a part of seawater to be treated by the reverse-osmosis membrane-separation apparatus in a seawater desalination system for producing fresh water from the seawater. The energy recovery apparatus includes two perforated plates provided at a concentrated seawater port side in a chamber, and two perforated plates provided at a seawater port side in the chamber. The two perforated plates comprises a first perforated plate and a second perforated plate. The first perforated plate and the second perforated plate at the concentrated seawater port side and the seawater port side are arranged to meet certain requirements including one of an open area ratio of the first perforated plate, an open area ratio of the second perforated plate, and a distance between the first perforated plate and the second perforated plate.

Abstract: A polishing apparatus includes a substrate holder configured to hold and rotate a substrate, a press pad configured to press a polishing tape having a polishing surface against a bevel portion of the substrate held by the substrate holder, and a feeding mechanism configured to cause the polishing tape to travel in its longitudinal direction. The press pad includes a hard member having a pressing surface for pressing the bevel portion of the substrate through the polishing tape, and at least one elastic member for pressing the hard member against the bevel portion of the substrate through the belt-shaped polishing tool.

Abstract: A substrate holder is a mechanism for holding a substrate, to be polished, by vacuum suction. The substrate holder includes a substrate-holding stage having a suction surface for the substrate, and a fluid passage selectively coupled to a vacuum source and a fluid supply source. The suction surface has a plurality of closed sections surrounded by convexities, and the fluid passage includes a plurality of communication passages which are in fluid communication with the plurality of closed segments respectively and independently.

Abstract: A polishing apparatus polishes a periphery (a bevel portion, a notch portion, an edge-cut portion) of a substrate by bringing a polishing tool into sliding contact with the periphery of the substrate. The polishing apparatus includes a substrate holder configured to hold the substrate, and a polishing head configured to polish the periphery of the substrate held by the substrate holder using the polishing tool. The polishing head includes a press pad for pressing the polishing tool against the periphery of the substrate, and a linear motor configured to reciprocate the press pad.

Abstract: An energy exchange chamber is used for exchanging pressure energy between concentrated seawater discharged from a reverse-osmosis membrane-separation apparatus and a part of seawater to be treated by the reverse-osmosis membrane separation apparatus in a seawater desalination system. The energy exchange chamber includes a concentrated seawater distributor communicating with a concentrated seawater port and configured to distribute a flow of the concentrated seawater flowing therein all over a horizontal plane of an interior of a chamber, and a seawater distributor communicating with a seawater port and configured to distribute a flow of the seawater flowing therein all over a horizontal plane of the interior of the chamber. The concentrated seawater and the seawater introduced into the chamber are brought into direct contact with each other over the horizontal plane of the interior of the chamber to exchange pressure energy between the concentrated seawater and the seawater.

Abstract: A polishing apparatus polishes a periphery of a substrate. This polishing apparatus includes a rotary holding mechanism configured to hold the substrate horizontally and rotate the substrate, plural polishing head assemblies provided around the substrate, plural tape supplying and recovering mechanisms configured to supply polishing tapes to the plural polishing head assemblies and recover the polishing tapes from the plural polishing head assemblies, and plural moving mechanisms configured to move the plural polishing head assemblies in radial directions of the substrate held by the rotary holding mechanism. The tape supplying and recovering mechanisms are located outwardly of the plural polishing head assemblies in the radial directions of the substrate, and the tape supplying and recovering mechanisms are fixed in position.

Abstract: A polishing apparatus polishes a periphery of a substrate. This polishing apparatus includes a rotary holding mechanism configured to hold the substrate horizontally and rotate the substrate, plural polishing head assemblies provided around the substrate, plural tape supplying and recovering mechanisms configured to supply polishing tapes to the plural polishing head assemblies and recover the polishing tapes from the plural polishing head assemblies, and plural moving mechanisms configured to move the plural polishing head assemblies in radial directions of the substrate held by the rotary holding mechanism. The tape supplying and recovering mechanisms are located outwardly of the plural polishing head assemblies in the radial directions of the substrate, and the tape supplying and recovering mechanisms are fixed in position.