Abstract: Provided is art capable of recognizing the states of a plurality of target objects arranged in a prescribed space region. This target object recognition device is provided with: a plurality of calculation processing units (21, 22) which each calculate the attitude state of a target object in a prescribed space region using a different technique; a state recognition unit (23) which recognizes the layout state of all of a plurality of target objects arranged in the space region; a method determination unit (24) which, in accordance with the result of the recognition by the state recognition unit (23), determines a method for using the results of the calculation performed by the calculation processing units (21, 22); and a target object recognition unit (25) which recognizes the attitude states of the target objects by means of the determined method for using the results of the calculation.

Abstract: There is provided a metal plate antenna transmitting and receiving wireless signals conforming to a prescribed communication standard, wherein an antenna width is designed to satisfy radiation resistance achieving a prescribed standing wave ratio in a resonant mode in which a loop length of the metal plate antenna is 1.5 wavelength of a wireless signal conforming to the prescribed communication standard.

Abstract: A lighting system includes a plurality of lighting devices and a control device. The plurality of lighting devices are installed in a facility. The control device controls the plurality of lighting devices. The control device controls lighting light projected by at least one lighting device, belonging to the plurality of lighting devices, into colored lighting light, of which a color is different from a color white, to give, upon acquiring information about an event in question, a sign depending on the event in question.

Abstract: The environmental change proposing system includes: an acquiring unit configured to acquire processing information regarding processing of a conveyance task from a conveyance robot that has executed the conveyance task using an environmental map; an evaluation computing unit configured to perform an evaluation computation for evaluating, based on the processing information, a virtual layout in which the arrangement of installation objects on the environmental map has been changed; and an output unit configured to generate and output proposal information regarding a change in arrangement of the installation objects, based on an evaluation result of the evaluation computing unit.

Abstract: According to one embodiment, a semiconductor manufacturing apparatus member is used inside a chamber of a semiconductor manufacturing apparatus. The member includes a base material and a ceramic layer. The base material includes a first surface, a second surface, and at least one hole. The at least one hole extends through the first and second surfaces. The ceramic layer is located on the first surface. The at least one hole includes an oblique surface and a perpendicular surface. The oblique surface is continuous with the first surface and is oblique to a first direction from the first surface toward the second surface. The perpendicular surface is positioned between the second surface and the oblique surface in the first direction and extends along the first direction. An angle between the first surface and the oblique surface is greater than an angle between the perpendicular surface and the oblique surface.

Abstract: A route planning system according to one or more embodiments may include an obtaining unit configured to obtain an environmental map indicating, for any obstacle, a location and a degree of certainty that the obstacle is present at that location, a planning unit configured to plan a movement route along which a mobile robot moves, excluding any obstacles in the environmental map, that have a degree of certainty that does not satisfy a predetermined standard, and an output unit configured to output route information, which is information on the planned movement route, to the mobile robot.

Abstract: An ECU is configured to execute SOC estimation control for estimating an SOC of a battery. The ECU obtains “first voltage” indicating an OCV of the battery in the SOC estimation control. The ECU controls an engine and a PCU such that the battery is charged with an amount of electric power equal to or larger than a prescribed amount, when the first voltage is within a voltage range where hysteresis occurs. The ECU obtains “second voltage” indicating an OCV of the charged battery, and estimates the SOC of the battery from the second voltage.

Abstract: According to one embodiment, a semiconductor manufacturing apparatus member is used inside a chamber of a semiconductor manufacturing apparatus. The member includes a composite structure. The composite structure includes a base material and a ceramic layer. The ceramic layer includes a first part located on a surface of the base material and is exposed. The composite structure includes a through-hole extending through the base material and the ceramic layer. The through-hole extends in a first direction. The through-hole includes a first hole region, a second hole region and a third hole region. The first hole region is continuous with a surface of the first part. The third hole region is positioned between the first hole region and the second hole region in the first direction. A hardness of the third hole region is greater than a hardness of the first hole region.

Abstract: According to one embodiment, a semiconductor manufacturing apparatus member is used inside a chamber of a semiconductor manufacturing apparatus. The member includes a base material and a ceramic layer. The base material includes a first surface, a second surface at a side opposite to the first surface, and at least one hole extending through the first and second surfaces. The ceramic layer is a ceramic layer located on the base material. The at least one hole includes a first hole part continuous with the first surface. The ceramic layer includes a first part and a second part. The first part is located on the first surface. The first part is exposed. The second part is located on the first hole part. An arithmetical mean height Sa of a surface of the first part is less than an arithmetical mean height Sa of a surface of the second part.

Abstract: According to one embodiment, a semiconductor manufacturing apparatus member is used inside a chamber of a semiconductor manufacturing apparatus. The member includes a base material and a ceramic layer located on the base material. The base material includes a first surface, a second surface, and at least one hole extending through the first and second surfaces. The at least one hole includes a first, a second and a third hole part. The first hole part is continuous with the first surface and is oblique. The second hole part is between the second surface and the first hole part. The third hole part is between the first hole part and the second hole part and is oblique. The ceramic layer includes a first part located on the first surface and a second part located on the first hole part.

Abstract: According to one embodiment, a semiconductor manufacturing apparatus member is used inside a chamber of a semiconductor manufacturing apparatus. The member includes a base material and a ceramic layer. The base material includes a first surface, a second surface, and at least one hole. The at least one hole extends through the first and second surfaces. The ceramic layer is located on the first surface. The at least one hole includes an oblique surface and a perpendicular surface. The oblique surface is continuous with the first surface and is oblique to a first direction from the first surface toward the second surface. The perpendicular surface is positioned between the second surface and the oblique surface in the first direction and extends along the first direction. An angle between the first surface and the oblique surface is greater than an angle between the perpendicular surface and the oblique surface.

Abstract: The present invention provides a surface treatment liquid for metal having a sufficiently high film-forming property. The present invention relates to a surface treatment liquid for metal comprising an azole silane coupling agent, the surface treatment liquid further comprises (A) an organic acid ion having one to three acidic groups in one molecule; (B) an inorganic acid (or mineral acid) ion; (C) an alkali metal ion and/or an ammonium ion; and (D) a copper ion.

Abstract: Provided is art capable of recognizing the states of a plurality of target objects arranged in a prescribed space region. This target object recognition device is provided with: a plurality of calculation processing units (21, 22) which each calculate the attitude state of a target object in a prescribed space region using a different technique; a state recognition unit (23) which recognizes the layout state of all of a plurality of target objects arranged in the space region; a method determination unit (24) which, in accordance with the result of the recognition by the state recognition unit (23), determines a method for using the results of the calculation performed by the calculation processing units (21, 22); and a target object recognition unit (25) which recognizes the attitude states of the target objects by means of the determined method for using the results of the calculation.

Abstract: The present disclosure aims to improve circulation of intake air and distribution of bypass intake air to cylinders, while reducing an increase in the overall height of an engine. A supercharger extends along a cylinder bank at a side of a surge tank extending along the cylinder bank. A bypass pipe branching off from an upstream intake pipe configured to introduce the intake air into the supercharger extends along the cylinder bank above the supercharger. A downstream side intake pipe configured to guide the intake air from the supercharger to the surge tank extends downward from the supercharger. The downstream intake pipe is, in a U-shape as viewed along the cylinder bank, connected to the surge tank.

Abstract: The present disclosure aims to improve circulation of intake air and distribution of bypass intake air to cylinders, while reducing an increase in the overall height of an engine. A supercharger extends along a cylinder bank at a side of a surge tank extending along the cylinder bank. A bypass pipe branching off from an upstream intake pipe configured to introduce the intake air into the supercharger extends along the cylinder bank above the supercharger. A downstream side intake pipe configured to guide the intake air from the supercharger to the surge tank extends downward from the supercharger. The downstream intake pipe is, in a U-shape as viewed along the cylinder bank, connected to the surge tank.

Abstract: The present disclosure aims to stabilize, in an engine with a supercharger, a detection result of an intake air temperature sensor interposed between the supercharger and an intercooler. A gas outlet of a supercharger and a gas inlet of an intercooler are connected together via a second passage. The second passage includes, in its middle position, a narrow region with a smaller cross-sectional area than the part of the second passage extending from an upstream end of the second passage to the middle position. The narrow region is provided with the intake air temperature sensor configured to detect the gas temperature in the narrow region.

Abstract: Provided is an exhaust device connected to an engine body. The exhaust device includes a plurality of independent exhaust pipes, each of which has a circular cross section, and which are connected to exhaust ports of cylinders of the engine body; and a mixing pipe having a circular cross section, connected to downstream ends of the independent exhaust pipes, and through which exhaust gas that has passed through the independent exhaust pipes flows in. The independent exhaust pipes are connected to an upstream end of the mixing pipe in such a manner that parts of internal spaces of the circular cross sections overlap each other in a predetermined section from the downstream ends of the independent exhaust pipes toward upstream, and a ratio of overlapping portions of the circular cross sections gradually increases from upstream toward downstream.

Abstract: An ECU is configured to execute SOC estimation control for estimating an SOC of a battery. The ECU obtains “first voltage” indicating an OCV of the battery in the SOC estimation control. The ECU controls an engine and a PCU such that the battery is charged with an amount of electric power equal to or larger than a prescribed amount, when the first voltage is within a voltage range where hysteresis occurs. The ECU obtains “second voltage” indicating an OCV of the charged battery, and estimates the SOC of the battery from the second voltage.

Abstract: Intake ports include a second port configured such that a flow rate of flowing gas is adjusted via a swirl control valve. When a surge tank is viewed in a cylinder axis direction, first and second branched passages are connected with a space being interposed therebetween in a cylinder array direction, and are connected to the surge tank on extension lines, each of which extends from an upstream end portion of an independent passage connected to the second port to an opposite side of each cylinder.

Abstract: An ECU obtains an OCV and an internal pressure, obtains a first estimated value of an SOC corresponding to the time of charging and a second estimated value of the SOC corresponding to the time of discharging using the obtained OCV and a first correspondence, obtains a third estimated value of an SOC corresponding to the time of charging and a fourth estimated value of the SOC corresponding to the time of discharging using the obtained internal pressure and a second correspondence, estimates the SOC using at least one of the first or the third estimated value when a first difference between the first and the third estimated value is less than a second difference between the second and the fourth estimated value, and estimates the SOC using at least one of the second or the fourth estimated value when the second difference is less than the first difference.