Patents by Inventor Thomas Dory

Thomas Dory has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • ETCHING COMPOSITIONS
    Publication number: 20240059968
    Abstract: The present disclosure is directed to etching compositions that are useful for, e.g., selectively removing silicon from a semiconductor substrate as an intermediate step in a multistep semiconductor manufacturing process.
    Type: Application
    Filed: August 16, 2023
    Publication date: February 22, 2024
    Inventors: Dmitry Dinega, Thomas Dory
  • Cleaning compositions
    Patent number: 11898123
    Abstract: This disclosure relates to a cleaning composition that contains 1) at least one redox agent; 2) at least one chelating agent, the chelating agent being a polyaminopolycarboxylic acid; 3) at least one corrosion inhibitor, the corrosion inhibitor being a substituted or unsubstituted benzotriazole; 4) at least one sulfonic acid; and 5) water.
    Type: Grant
    Filed: August 27, 2021
    Date of Patent: February 13, 2024
    Assignee: Fujifilm Electronic Materials U.S.A., Inc.
    Inventors: Emil A. Kneer, Thomas Dory, Atsushi Mizutani
  • Cleaning Compositions
    Publication number: 20240010952
    Abstract: This disclosure relates to compositions for cleaning post etching residues on a semiconductor substrate, as well as related cleaning methods.
    Type: Application
    Filed: April 26, 2023
    Publication date: January 11, 2024
    Inventors: Jieying Jiao, Thomas Dory
  • ETCHING COMPOSITIONS
    Publication number: 20230313041
    Abstract: The present disclosure is directed to etching compositions that are useful for, e.g., selectively removing silicon from a semiconductor substrate as an intermediate step in a multistep semiconductor manufacturing process.
    Type: Application
    Filed: February 14, 2023
    Publication date: October 5, 2023
    Inventors: Dmitry Dinega, Thomas Dory
  • Cleaning formulation for removing residues on surfaces
    Patent number: 11639487
    Abstract: This disclosure relates to a cleaning composition that contains 1) hydroxylamine; 2) a chelating agent; 3) an alkylene glycol; 4) water. This disclosure also relates to a method of using the above composition for cleaning a semiconductor substrate.
    Type: Grant
    Filed: November 2, 2022
    Date of Patent: May 2, 2023
    Assignee: Fujifilm Electronic Materials U.S.A., Inc.
    Inventors: Tomonori Takahashi, Bing Du, William A. Wojtczak, Thomas Dory, Emil A. Kneer
  • Cleaning formulation for removing residues on surfaces
    Patent number: 11618867
    Abstract: This disclosure relates to a cleaning composition that contains 1) hydroxylamine; 2) a chelating agent; 3) an alkylene glycol; and 4) water. This disclosure also relates to a method of using the above composition for cleaning a semiconductor substrate.
    Type: Grant
    Filed: November 2, 2022
    Date of Patent: April 4, 2023
    Assignee: Fujifilm Electronic Materials U.S.A., Inc.
    Inventors: Tomonori Takahashi, Bing Du, William A. Wojtczak, Thomas Dory, Emil A. Kneer
  • CLEANING FORMULATION FOR REMOVING RESIDUES ON SURFACES
    Publication number: 20230100080
    Abstract: This disclosure relates to a cleaning composition that contains 1) hydroxylamine; 2) a chelating agent; 3) an alkylene glycol; 4) water. This disclosure also relates to a method of using the above composition for cleaning a semiconductor substrate.
    Type: Application
    Filed: November 2, 2022
    Publication date: March 30, 2023
    Inventors: Tomonori Takahashi, Bing Du, William A. Wojtczak, Thomas Dory, Emil A. Kneer
  • CLEANING FORMULATION FOR REMOVING RESIDUES ON SURFACES
    Publication number: 20230066300
    Abstract: This disclosure relates to a cleaning composition that contains 1) hydroxylamine; 2) a chelating agent; 3) an alkylene glycol; and 4) water. This disclosure also relates to a method of using the above composition for cleaning a semiconductor substrate.
    Type: Application
    Filed: November 2, 2022
    Publication date: March 2, 2023
    Inventors: Tomonori Takahashi, Bing Du, William A. Wojtczak, Thomas Dory, Emil A. Kneer
  • Surface Treatment Compositions and Methods
    Publication number: 20230048767
    Abstract: This disclosure relates to methods and compositions for treating a semiconductor substrate having a pattern disposed on a surface of the substrate.
    Type: Application
    Filed: October 19, 2022
    Publication date: February 16, 2023
    Inventors: William A. Wojtczak, Kazutaka Takahashi, Atsushi Mizutani, Thomas Dory, Keeyoung Park
  • Surface treatment compositions and methods
    Patent number: 11508569
    Abstract: This disclosure relates to methods and compositions for treating a semiconductor substrate having a pattern disposed on a surface of the substrate. The methods can include a) supplying a sublimating material to a substrate having a pattern disposed on a surface thereof; b) maintaining the sublimating material on the surface for a time sufficient to modify the surface; c) solidifying the sublimating material on the surface; and d) removing by sublimation the sublimating material disposed on the surface.
    Type: Grant
    Filed: August 3, 2020
    Date of Patent: November 22, 2022
    Assignee: Fujifilm Electronic Materials U.S.A., Inc.
    Inventors: William A. Wojtczak, Kazutaka Takahashi, Atsushi Mizutani, Thomas Dory, Keeyoung Park
  • Cleaning Compositions
    Publication number: 20220306971
    Abstract: This disclosure relates to a cleaning composition that contains 1) hydroxylamine, 2) an amino alcohol, 3) hexylene glycol, and 4) water.
    Type: Application
    Filed: June 2, 2022
    Publication date: September 29, 2022
    Inventors: Thomas Dory, Mick Bjelopavlic, Joshua Guske, Kazutaka Takahashi
  • CLEANING FORMULATION FOR REMOVING RESIDUES ON SURFACES
    Publication number: 20220275313
    Abstract: This disclosure relates to a cleaning composition that contains 1) hydroxylamine; 2) alkanolamine; 3) an alkylene glycol; 4) water. This disclosure also relates to a method of using the above composition for cleaning a semiconductor substrate.
    Type: Application
    Filed: May 20, 2022
    Publication date: September 1, 2022
    Inventors: Tomonori Takahashi, Bing Du, William A. Wojtczak, Thomas Dory, Emil A. Kneer
  • Cleaning compositions
    Patent number: 11407966
    Abstract: This disclosure relates to a cleaning composition that contains 1) hydroxylamine, 2) an amino alcohol, 3) hexylene glycol, and 4) water.
    Type: Grant
    Filed: January 26, 2022
    Date of Patent: August 9, 2022
    Assignee: Fujifilm Electronic Materials U.S.A., Inc.
    Inventors: Thomas Dory, Mick Bjelopavlic, Joshua Guske, Kazutaka Takahashi
  • Cleaning formulation for removing residues on surfaces
    Patent number: 11401487
    Abstract: This disclosure relates to a cleaning composition that contains 1) at least one redox agent; 2) at least one first chelating agent, the first chelating agent being a polyaminopolycarboxylic acid; 3) at least one metal corrosion inhibitor, the metal corrosion inhibitor being a substituted or unsubstituted benzotriazole; 4) at least one pH adjusting agent, the pH adjusting agent being a base free of a metal ion; and 5) water. This disclosure also relates to a method of using the above composition for cleaning a semiconductor substrate.
    Type: Grant
    Filed: January 24, 2022
    Date of Patent: August 2, 2022
    Assignee: Fujifilm Electronics Materials U.S.A., Inc.
    Inventors: Tomonori Takahashi, Bing Du, William A. Wojtczak, Thomas Dory, Emil A. Kneer
  • Cleaning formulation for removing residues on surfaces
    Patent number: 11359169
    Abstract: This disclosure relates to a cleaning composition that contains 1) at least one redox agent; 2) at least one first chelating agent, the first chelating agent being a polyaminopolycarboxylic acid; 3) at least one metal corrosion inhibitor, the metal corrosion inhibitor being a substituted or unsubstituted benzotriazole; 4) at least one pH adjusting agent, the pH adjusting agent being a base free of a metal ion; and 5) water. This disclosure also relates to a method of using the above composition for cleaning a semiconductor substrate.
    Type: Grant
    Filed: January 24, 2022
    Date of Patent: June 14, 2022
    Assignee: Fujifilm Electronic Materials U.S.A., Inc.
    Inventors: Tomonori Takahashi, Bing Du, William A. Wojtczak, Thomas Dory, Emil A. Kneer
  • Cleaning Compositions
    Publication number: 20220145221
    Abstract: This disclosure relates to a cleaning composition that contains 1) hydroxylamine, 2) an amino alcohol, 3) hexylene glycol, and 4) water.
    Type: Application
    Filed: January 26, 2022
    Publication date: May 12, 2022
    Inventors: Thomas Dory, Mick Bjelopavlic, Joshua Guske, Kazutaka Takahashi
  • CLEANING FORMULATION FOR REMOVING RESIDUES ON SURFACES
    Publication number: 20220145222
    Abstract: This disclosure relates to a cleaning composition that contains 1) at least one redox agent; 2) at least one first chelating agent, the first chelating agent being a polyaminopolycarboxylic acid; 3) at least one metal corrosion inhibitor, the metal corrosion inhibitor being a substituted or unsubstituted benzotriazole; 4) at least one pH adjusting agent, the pH adjusting agent being a base free of a metal ion; and 5) water. This disclosure also relates to a method of using the above composition for cleaning a semiconductor substrate.
    Type: Application
    Filed: January 24, 2022
    Publication date: May 12, 2022
    Inventors: Tomonori Takahashi, Bing Du, William A. Wojtczak, Thomas Dory, Emil A. Kneer
  • Cleaning formulation for removing residues on surfaces
    Patent number: 11286444
    Abstract: This disclosure relates to a cleaning composition that contains 1) at least one redox agent; 2) at least one first chelating agent, the first chelating agent being a polyaminopolycarboxylic acid; 3) at least one metal corrosion inhibitor, the metal corrosion inhibitor being a substituted or unsubstituted benzotriazole; 4) at least one pH adjusting agent, the pH adjusting agent being a base free of a metal ion; and 5) water. This disclosure also relates to a method of using the above composition for cleaning a semiconductor substrate.
    Type: Grant
    Filed: August 20, 2020
    Date of Patent: March 29, 2022
    Assignee: Fujifilm Electronic Materials U.S.A., Inc.
    Inventors: Tomonori Takahashi, Bing Du, William A. Wojtczak, Thomas Dory, Emil A. Kneer
  • Cleaning compositions
    Patent number: 11279903
    Abstract: This disclosure relates to a cleaning composition that contains 1) at least one redox agent; 2) at least one alkylsulfonic acid or a salt thereof, the alkylsulfonic acid containing an alkyl group substituted by OH or NH2; and 3) at least one aminoalcohol.
    Type: Grant
    Filed: July 8, 2020
    Date of Patent: March 22, 2022
    Assignee: Fujifilm Electronic Materials U.S.A., Inc.
    Inventors: Thomas Dory, Mick Bjelopavlic, Joshua Guske, Kazutaka Takahashi
  • Cleaning Compositions
    Publication number: 20220064575
    Abstract: This disclosure relates to a cleaning composition that contains 1) at least one redox agent; 2) at least one chelating agent, the chelating agent being a polyaminopolycarboxylic acid; 3) at least one corrosion inhibitor, the corrosion inhibitor being a substituted or unsubstituted benzotriazole; 4) at least one sulfonic acid; and 5) water.
    Type: Application
    Filed: August 27, 2021
    Publication date: March 3, 2022
    Inventors: Emil A. Kneer, Thomas Dory, Atsushi Mizutani