Patents by Inventor Tomihiro Hashizume

Tomihiro Hashizume has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10073116
    Abstract: This sample holder for a scanning probe microscope is constituted of (1) a container that retains a liquid and (2) a flat-plate-shaped upper cover that covers an upper opening of the container and that has a narrow slit above the position where a sample is placed. In the upper cover, the slit has a slit width with which a thin film of the liquid is formed over the upper surface of the sample when the liquid fills the space between the container and the upper cover. The thin film of the liquid has a film thickness smaller than the distance between the upper surface of the sample and the upper cover.
    Type: Grant
    Filed: December 24, 2014
    Date of Patent: September 11, 2018
    Assignee: HITACHI, LTD.
    Inventors: Sanato Nagata, Tomihiro Hashizume, Akira Nambu, Hideaki Koizumi
  • Patent number: 9875878
    Abstract: Sample transferring can be securely and easily performed between an FIB device, an electron microscope, and an atom probe device, and atom probe analysis can be performed to a material that easily alters due to atmospheric exposure. A sample holder that holds a sample (12) is provided with an atmosphere-isolation mechanism that prevents the sample from altering due to the atmospheric exposure upon the sample transferring between the devices. There is provided a structure enabling of attaching and detaching a housing (21) of a sample holder leading end of a part of the atmosphere-isolation mechanism in an analytical vacuum device, such as the atom probe device.
    Type: Grant
    Filed: December 5, 2013
    Date of Patent: January 23, 2018
    Assignee: Hitachi, Ltd.
    Inventors: Takeshi Nakayama, Tomihiro Hashizume, Akira Sugawara
  • Publication number: 20170343580
    Abstract: This sample holder for a scanning probe microscope is constituted of (1) a container that retains a liquid and (2) a flat-plate-shaped upper cover that covers an upper opening of the container and that has a narrow slit above the position where a sample is placed. In the upper cover, the slit has a slit width with which a thin film of the liquid is formed over the upper surface of the sample when the liquid fills the space between the container and the upper cover. The thin film of the liquid has a film thickness smaller than the distance between the upper surface of the sample and the upper cover.
    Type: Application
    Filed: December 24, 2014
    Publication date: November 30, 2017
    Applicant: HITACHI, LTD.
    Inventors: Sanato NAGATA, Tomihiro HASHIZUME, Akira NAMBU, Hideaki KOIZUMI
  • Publication number: 20170229277
    Abstract: A gas field ionization source in which an ion beam current is stable for a long time is achieved in an ion beam apparatus equipped with a field ionization source that supplies gas to a chamber, ionizes the gas, and applies the ion beam to a sample. The ion beam apparatus includes an emitter electrode having a needle-like extremity; a chamber inside which the emitter electrode is installed; a gas supply unit that supplies the gas to the chamber; a cooling unit that is connected to the chamber and cools the emitter electrode; a discharge type exhaust unit that exhausts gas inside the chamber; and a trap type exhaust unit that exhausts gas inside the chamber. The exhaust conductance of the discharge type exhaust unit is larger than the total exhaust conductance of the trap type exhaust unit.
    Type: Application
    Filed: July 31, 2015
    Publication date: August 10, 2017
    Inventors: Shinichi MATSUBARA, Hiroyasu SHICHI, Yoshimi KAWANAMI, Tomihiro HASHIZUME
  • Publication number: 20170004952
    Abstract: Sample transferring can be securely and easily performed between an FIB device, an electron microscope, and an atom probe device, and atom probe analysis can be performed to a material that easily alters due to atmospheric exposure. A sample holder that holds a sample (12) is provided with an atmosphere-isolation mechanism that prevents the sample from altering due to the atmospheric exposure upon the sample transferring between the devices. There is provided a structure enabling of attaching and detaching a housing (21) of a sample holder leading end of a part of the atmosphere-isolation mechanism in an analytical vacuum device, such as the atom probe device.
    Type: Application
    Filed: December 5, 2013
    Publication date: January 5, 2017
    Inventors: Takeshi NAKAYAMA, Tomihiro HASHIZUME, Akira SUGAWARA
  • Patent number: 9423416
    Abstract: Provided is a scanning probe microscope that takes measurements at high spatial resolution on physical information such as array structure of water molecules at a specimen-culture fluid interface in a culture fluid as well as irregularities of the surface of a specimen and composition distribution and array structure of molecules, proteins, etc. even in the atmosphere, an ambient air, vacuum, among others. The scanning probe microscope includes: a probing needle (1); a specimen holder (11) in which a specimen (3) is mounted; an oscillator (2) that produces a periodic oscillation to change the probing needle position; a pulse oscillation type laser light source (27, 28) that emits light toward a spot, which is put under measurement by the probing needle, on the specimen; a detector (25) that measures intensity of output light which is output from the specimen by energy spectroscopy; and a control device (26).
    Type: Grant
    Filed: August 28, 2012
    Date of Patent: August 23, 2016
    Assignee: Hitachi, Ltd.
    Inventors: Akira Nambu, Tsuyoshi Yamamoto, Hideaki Koizumi, Tomihiro Hashizume, Seiji Heike
  • Publication number: 20150192604
    Abstract: At the time of carrying out measurement of a biological tissue with a probe microscope, measurement is to be realized while maintain survival conditions for a cell. As a holder for the probe microscope, a measurement holder including: a container in which a measurement object is housed; a first cover section which covers at least a part of the measurement object and has an aperture for inserting a measurement probe; and a second cover section which is connected to the first cover section, covers the container, and has an aperture for inserting the measurement probe, is used.
    Type: Application
    Filed: July 27, 2012
    Publication date: July 9, 2015
    Applicant: HITACHI, LTD.
    Inventors: Tsuyoshi Yamamoto, Seiji Heike, Akira Nambu, Tomihiro Hashizume, Hideaki Koizumi
  • Publication number: 20150177275
    Abstract: Provided is a scanning probe microscope that takes measurements at high spatial resolution on physical information such as array structure of water molecules at a specimen-culture fluid interface in a culture fluid as well as irregularities of the surface of a specimen and composition distribution and array structure of molecules, proteins, etc. even in the atmosphere, an ambient air, vacuum, among others. The scanning probe microscope includes: a probing needle (1); a specimen holder (11) in which a specimen (3) is mounted; an oscillator (2) that produces a periodic oscillation to change the probing needle position; a pulse oscillation type laser light source (27, 28) that emits light toward a spot, which is put under measurement by the probing needle, on the specimen; a detector (25) that measures intensity of output light which is output from the specimen by energy spectroscopy; and a control device (26).
    Type: Application
    Filed: August 28, 2012
    Publication date: June 25, 2015
    Inventors: Akira Nambu, Tsuyoshi Yamamoto, Hideaki Koizumi, Tomihiro Hashizume, Seiji Heike
  • Patent number: 8847173
    Abstract: To provide a gas field ion source having a high angular current density, the gas field ion source is configured such that at least a base body of an emitter tip configuring the gas field ion source is a single crystal metal, such that the apex of the emitter tip is formed into a pyramid shape or a cone shape having a single atom at the top, and such that the extraction voltage in the case of ionizing helium gas by the single atom is set to 10 kV or more.
    Type: Grant
    Filed: July 13, 2011
    Date of Patent: September 30, 2014
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Yoshimi Kawanami, Shinichi Matsubara, Hironori Moritani, Noriaki Arai, Hiroyasu Shichi, Tomihiro Hashizume, Hiroyasu Kaga, Norihide Saho, Hiroyuki Muto, Yoichi Ose
  • Publication number: 20130279652
    Abstract: Provided is a measuring apparatus which is capable of measuring the distribution of a specific element in a specimen by soft X rays in a state where there is no effect by a staining agent and the like even though the specimen is composed of living single cells or cell aggregates living as they are, extracted in vitro from an organism. A measuring apparatus using soft X rays includes a connection part which is connected with a soft X ray beam line, a mechanism which light-collects a spot size of soft X rays into a micro beam, and a low vacuum vessel having a measurement chamber in which a specimen is disposed.
    Type: Application
    Filed: March 15, 2013
    Publication date: October 24, 2013
    Applicant: HITACHI, LTD.
    Inventors: Akira NAMBU, Kazuhiro UEDA, Tsuyoshi YAMAMOTO, Hideaki KOIZUMI, Tomihiro HASHIZUME
  • Patent number: 8530865
    Abstract: A gas field ion source that can simultaneously increase a conductance during rough vacuuming and reduce an extraction electrode aperture diameter from the viewpoint of the increase of ion current. The gas field ion source has a mechanism to change a conductance in vacuuming a gas molecule ionization chamber. That is, the conductance in vacuuming a gas molecule ionization chamber is changed in accordance with whether or not an ion beam is extracted from the gas molecule ionization chamber. By forming lids as parts of the members constituting the mechanism to change the conductance with a bimetal alloy, the conductance can be changed in accordance with the temperature of the gas molecule ionization chamber, for example the conductance is changed to a relatively small conductance at a relatively low temperature and to a relatively large conductance at a relatively high temperature.
    Type: Grant
    Filed: January 20, 2012
    Date of Patent: September 10, 2013
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Hiroyasu Shichi, Shinichi Matsubara, Takashi Ohshima, Satoshi Tomimatsu, Tomihiro Hashizume, Tohru Ishitani
  • Publication number: 20130119252
    Abstract: To provide a gas field ion source having a high angular current density, the gas field ion source is configured such that at least a base body of an emitter tip configuring the gas field ion source is a single crystal metal, such that the apex of the emitter tip is formed into a pyramid shape or a cone shape having a single atom at the top, and such that the extraction voltage in the case of ionizing helium gas by the single atom is set to 10 kV or more.
    Type: Application
    Filed: July 13, 2011
    Publication date: May 16, 2013
    Inventors: Yoshimi Kawanami, Shinichi Matsubara, Hironori Moritani, Noriaki Arai, Hiroyasu Shichi, Tomihiro Hashizume, Hiroyasu Kaga, Norihide Saho, Hiroyuki Muto, Yoichi Ose
  • Publication number: 20120185173
    Abstract: The present invention provides a neural activity measurement system for measuring the electrical response of a neuron itself to achieve an electrical measurement of the neural activity itself, by providing a stimulator for applying an electrical stimulus to the neuron, as well as a Kelvin probe including a cantilever for detecting the electrical signal propagated through the neuron.
    Type: Application
    Filed: January 9, 2012
    Publication date: July 19, 2012
    Inventors: Tsuyoshi YAMAMOTO, Hideaki KOIZUMI, Tomihiro HASHIZUME, Seiji HEIKE
  • Publication number: 20120119086
    Abstract: A gas field ion source that can simultaneously increase a conductance during rough vacuuming and reduce an extraction electrode aperture diameter from the viewpoint of the increase of ion current. The gas field ion source has a mechanism to change a conductance in vacuuming a gas molecule ionization chamber. That is, the conductance in vacuuming a gas molecule ionization chamber is changed in accordance with whether or not an ion beam is extracted from the gas molecule ionization chamber. By forming lids as parts of the members constituting the mechanism to change the conductance with a bimetal alloy, the conductance can be changed in accordance with the temperature of the gas molecule ionization chamber, for example the conductance is changed to a relatively small conductance at a relatively low temperature and to a relatively large conductance at a relatively high temperature.
    Type: Application
    Filed: January 20, 2012
    Publication date: May 17, 2012
    Applicant: Hitachi High-Technologies Corporation
    Inventors: Hiroyasu Shichi, Shinichi Matsubara, Takashi Ohshima, Satoshi Tomimatsu, Tomihiro Hashizume, Tohru Ishitani
  • Patent number: 8115184
    Abstract: A gas field ion source that can simultaneously increase a conductance during rough vacuuming and reduce an extraction electrode aperture diameter from the viewpoint of the increase of ion current. The gas field ion source has a mechanism to change a conductance in vacuuming a gas molecule ionization chamber. That is, the conductance in vacuuming a gas molecule ionization chamber is changed in accordance with whether or not an ion beam is extracted from the gas molecule ionization chamber. By forming lids as parts of the members constituting the mechanism to change the conductance with a bimetal alloy, the conductance can be changed in accordance with the temperature of the gas molecule ionization chamber, for example the conductance is changed to a relatively small conductance at a relatively low temperature and to a relatively large conductance at a relatively high temperature.
    Type: Grant
    Filed: December 31, 2008
    Date of Patent: February 14, 2012
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Hiroyasu Shichi, Shinichi Matsubara, Takashi Ohshima, Satoshi Tomimatsu, Tomihiro Hashizume, Tohru Ishitani
  • Patent number: 8008654
    Abstract: A method of manufacturing a thin-film transistor device improves performance of a complementary TFT circuit incorporated in a thin- and light-weighted image display device or a flexible electronic device, and reduces power consumption manufacturing cost. Electrodes forming n-type and p-type TFTs and an organic semiconductor are made of the same material in both types of TFT by a solution-process and/or printable process method. A first polarizable thin-film is formed on an interface between a gate insulator and a semiconductor, and a second polarizable thin film provided on an interface between source and drain electrodes and the semiconductor film. A complementary thin-film transistor device is manufactured by selectively exposing either the n-type TFT area or the p-type TFT area to light to remove the polarizing function from the first and second polarizable thin films.
    Type: Grant
    Filed: June 10, 2008
    Date of Patent: August 30, 2011
    Assignee: Hitachi, Ltd.
    Inventors: Takeo Shiba, Tomihiro Hashizume, Yuji Suwa, Tadashi Arai
  • Patent number: 7872254
    Abstract: An organic transistor is formed with a low material cost and low manufacturing cost while still providing high performance and a low contact resistance with an organic semiconductor of the transistor. The organic transistor has electrodes whose bodies are formed mainly of an inexpensive first metal and whose surfaces are formed of a second metal that is expensive but provides high performance properties. To obtain stability of this structure with a low cost, a property of the second metal is used in which the second metal is easily segregated on the surface of the first metal in an alloy of the first metal and the second metal.
    Type: Grant
    Filed: March 19, 2007
    Date of Patent: January 18, 2011
    Assignee: Hitachi, Ltd.
    Inventors: Yuji Suwa, Tomihiro Hashizume, Masaaki Fujimori
  • Patent number: 7872257
    Abstract: An n-type TFT and a p-type TFT are realized by selectively changing only a cover coat without changing a TFT material using an equation for applying the magnitude of a difference in the Fermi energy between an interface of semiconductor and an electrode and between an interface of semiconductor and insulator. At this time, in order to configure a predetermined circuit, the process is performed, as a source electrode and a drain electrode of the p-type TFT and a source electrode and a drain electrode of the n-type TFT being connected all, respectively, and an unnecessary interconnection is cut by irradiating light using a scanning laser exposure apparatus or the like.
    Type: Grant
    Filed: May 29, 2008
    Date of Patent: January 18, 2011
    Assignee: Hitachi, Ltd.
    Inventors: Tomihiro Hashizume, Yuji Suwa, Masaaki Fujimori, Tadashi Arai, Takeo Shiba
  • Patent number: 7807496
    Abstract: To provide a method of easily producing TFT in which the orientation of channel molecules or wires is enhanced, compared with conventional type organic TFT at a low price, a lyophilic TFT pattern encircled by a lyophobic area is formed on a substrate, spontaneous movement is made in a droplet containing organic molecules or nanowires dropped in a channel region by characterizing the form of the pattern, and the organic molecules or the nanowires are oriented in the channel region by the movement.
    Type: Grant
    Filed: August 2, 2005
    Date of Patent: October 5, 2010
    Assignee: Hitachi, Ltd.
    Inventors: Masaaki Fujimori, Tomihiro Hashizume, Masahiko Ando
  • Patent number: 7799701
    Abstract: A method of coating by supplying a liquid material from a nozzle tip to form a film on a substrate surface facing to the nozzle, having the steps of: preparing a translation mechanism, which is capable of moving the nozzle in an in-plane direction and in a thickness direction of the substrate; making the nozzle to come gradually closer to the substrate, after positioning of the nozzle on the in-plane of the substrate, by using the translation mechanism; detecting electric current flowing through the nozzle from the substrate surface, when a semiconductor droplet supplied from the nozzle tip contacts with an electrode installed at the substrate surface; stopping accession of the nozzle to the substrate, when the electric current exceeds threshold value set in advance; and making the nozzle tip apart from the substrate farther than in the stopping, so as to coat the substrate with the liquid material.
    Type: Grant
    Filed: May 28, 2008
    Date of Patent: September 21, 2010
    Assignee: Hitachi, Ltd.
    Inventors: Seiji Heike, Tomihiro Hashizume, Masayoshi Ishibashi