Patents by Inventor Tomihiro Hashizume

Tomihiro Hashizume has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20040257894
    Abstract: Magnetoresistive devices with increased response sensitivity to external magnetic fields and an increased magnetoresistive ratio (MR ratio) to cope with rapid advances made in a high-density magnetic recording device. A patterned dielectric layer is laminated in a flat shape on a substrate capable of being doped with carriers (holes) in an electric field, and an FET structure with gate electrodes is then fabricated on that dielectric layer, and the substrate spatially modulated by applying a non-uniform electrical field to induce a first ferromagnetic domain, a nonmagnetic domain and a second ferromagnetic domain.
    Type: Application
    Filed: June 8, 2004
    Publication date: December 23, 2004
    Inventors: Toshiyuki Onogi, Masahiko Ichimura, Tomihiro Hashizume
  • Publication number: 20040228024
    Abstract: In place of a magnetic field in which it is difficult to write onto and read a hard disk at high density, there is provided an information storage apparatus capable of writing and reading by means of a metal probe which applies a voltage to a thin film structure in a non contact manner to change the relative magnetization direction in the thin film layers to store information. Changes in a tunnel current between the thin film layers is then used to detect the relative magnetization direction and to read the stored information. At least a three-layer thin film structure including a magnetic metallic layer, a non-magnetic metallic layer and a magnetic metallic layer may be formed. A metal probe is brought close to the surface of this multilayer film at distance on the order of one nanometer.
    Type: Application
    Filed: November 18, 2003
    Publication date: November 18, 2004
    Applicant: Hitachi, Ltd.
    Inventors: Susumu Ogawa, Tomihiro Hashizume, Masahiko Ichimura, Toshiyuki Onogi
  • Publication number: 20040207961
    Abstract: Disclosed is a magnetoresistance device which uses a ferromagnetic tunnel junction formed by inserting an insulating layer between two ferromagnetic layers and whose application to a magnetic head and a magnetoresistance memory is promising. The magnetoresistance device has a multilayer structure which has a ferromagnetic tunnel junction formed by lamination of a first ferromagnetic layer, an insulating layer and a second ferromagnetic layer, and in which at least one of the first and second ferromagnetic layers is a half-metallic ferromagnet formed of a material having such an electronic structure that one spin having a metallic band near Fermi energy has a gap at a level of higher energy than the Fermi energy and the other spin has a metallic band at the same level.
    Type: Application
    Filed: November 5, 2003
    Publication date: October 21, 2004
    Inventors: Masahiko Ichimura, Tomihiro Hashizume, Toshiyuki Onogi, Kenchi Ito, Hideyuki Matsuoka
  • Patent number: 6780698
    Abstract: A method for producing a semiconductor device which comprises causing a dopant present in a semiconductor substrate to segregate in the surface of said semiconductor substrate, thereby forming a thin layer which has a higher dopant concentration than said substrate. The thin layer formed by segregation prevents punch-through which occurs as the result of miniaturization of MOSFET. This method permits economical delta doping without sacrificing the device characteristics.
    Type: Grant
    Filed: July 15, 2002
    Date of Patent: August 24, 2004
    Assignee: Hitachi, Ltd.
    Inventors: Yuji Suwa, Tomihiro Hashizume, Ken Yamaguchi, Masaaki Fujimori
  • Patent number: 6670622
    Abstract: Current passed through a resist layer or insulating layer is controlled by changing the amplitude of an AC voltage to provide an electron exposure device or electric characteristics evaluation device using a scanning probe.
    Type: Grant
    Filed: February 26, 2002
    Date of Patent: December 30, 2003
    Assignee: Hitachi, Ltd.
    Inventors: Seiji Heike, Masayoshi Ishibashi, Tomihiro Hashizume
  • Publication number: 20030119247
    Abstract: A method for producing a semiconductor device which comprises causing a dopant present in a semiconductor substrate to segregate in the surface of said semiconductor substrate, thereby forming a thin layer which has a higher dopant concentration than said substrate. The thin layer formed by segregation prevents punch-through which occurs as the result of miniaturization of MOSFET. This method permits economical delta doping without sacrificing the device characteristics.
    Type: Application
    Filed: July 15, 2002
    Publication date: June 26, 2003
    Inventors: Yuji Suwa, Tomihiro Hashizume, Ken Yamaguchi, Masaaki Fujimori
  • Publication number: 20030107007
    Abstract: Current passed through a resist layer or insulating layer is controlled by changing the amplitude of an AC voltage to provide an electron exposure device or electric characteristics evaluation device using a scanning probe.
    Type: Application
    Filed: February 26, 2002
    Publication date: June 12, 2003
    Applicant: Hitachi, Ltd.
    Inventors: Seiji Heike, Masayoshi Ishibashi, Tomihiro Hashizume
  • Patent number: 6475650
    Abstract: A ferromagnetic material can be formed in a very small size on the order of an atomic size and is capable of being stably magnetized. The ferromagnetic material comprises basic unit structures each consisting of a first atom (11), a second atom (12) of the same kind as the first atom (11), and a third atom (or atomic group) (13) of the same kind as the first atom (11) or of a kind different from that of the first atom (11). In each of the basic unit structures, the atoms are arranged on a surface of a substrate so that a chemical bond (14) is formed between the first atom or molecule and the third atom or molecule, a chemical bond (14) is formed between the second atom or molecule and the third atom or molecule, and a chemical bond or an electron path (15) not passing the third atom is formed between the first and the second atom or molecule, wherein said third atoms or molecules consist of As atoms.
    Type: Grant
    Filed: September 25, 2001
    Date of Patent: November 5, 2002
    Assignee: Hitachi, Ltd.
    Inventors: Satoshi Watanabe, Toshiyuki Onogi, Masahiko Ichimura, Yoshimasa Ono, Tomihiro Hashizume, Yasuo Wada, Yuji Suwa
  • Publication number: 20020101573
    Abstract: To provide an electron exposure apparatus capable of providing high resolution and performing electron exposure at high speed, integrated tips are used, only the tips provided at ends control distances between the tips and the surface of a wafer and the tips used for electron exposure follow the wafer according to deformations of cantilevers, which occur due to the Coulomb force resultant from a voltage applied to each tip.
    Type: Application
    Filed: January 18, 2002
    Publication date: August 1, 2002
    Applicant: Hitachi, Ltd.
    Inventors: Masayoshi Ishibashi, Seiji Heike, Tomihiro Hashizume, Yasuo Wada, Hiroshi Kajiyama
  • Patent number: 6366340
    Abstract: To provide an electron exposure apparatus capable of providing high resolution and performing electron exposure at high speed, integrated tips are used. Only the tips provided at ends control distances between the tips and the surface of a wafer, and the tips used for electron exposure follow the wafer according to deformations of cantilevers, which occur due to the Coulomb force resultant from a voltage applied to each tip.
    Type: Grant
    Filed: June 5, 1998
    Date of Patent: April 2, 2002
    Assignee: Hitachi, Ltd.
    Inventors: Masayoshi Ishibashi, Seiji Heike, Tomihiro Hashizume, Yasuo Wada, Hiroshi Kajiyama
  • Publication number: 20020012813
    Abstract: A ferromagnetic material can be formed in a very small size on the order of an atomic size and is capable of being stably magnetized. The ferromagnetic material comprises basic unit structures each consisting of a first atom (11), a second atom (12) of the same kind as the first atom (11), and a third atom (or atomic group) (13) of the same kind as the first atom (11) or of a kind different from that of the first atom (11). In each of the basic unit structures, the atoms are arranged on a surface of a substrate so that a chemical bond (14) is formed between the first atom or molecule and the third atom or molecule, a chemical bond (14) is formed between the second atom or molecule and the third atom or molecule, and a chemical bond or an electron path (15) not passing the third atom is formed between the first and the second atom or molecule, wherein said third atoms or molecules consist of As atoms.
    Type: Application
    Filed: September 25, 2001
    Publication date: January 31, 2002
    Inventors: Satoshi Watanabe, Toshiyuki Onogi, Masahiko Ichimura, Yoshimasa Ono, Tomihiro Hashizume, Yasuo Wada, Yuji Suwa
  • Patent number: 6299990
    Abstract: A ferromagnetic material can be formed in a very small size on the order of an atomic size and is capable of being stably magnetized. The ferromagnetic material comprises basic unit structures each consisting of a first atom (11), a second atom (12) of the same kind as the first atom (11), and a third atom (or atomic group) (13) of the same kind as the first atom (11) or of a kind different from that of the first atom (11). In each of the basic unit structures, the atoms are arranged on a surface of a substrate so that a chemical bond (14) is formed between the first atom or molecule and the third atom or molecule, a chemical bond (14) is formed between the second atom or molecule and the third atom or molecule, and a chemical bond or an electron path (15) not passing the third atom is formed between the first and the second atom or molecule, wherein said third atoms or molecules consist of As atoms.
    Type: Grant
    Filed: August 17, 1999
    Date of Patent: October 9, 2001
    Assignee: Hitachi, Ltd.
    Inventors: Satoshi Watanabe, Toshiyuki Onogi, Masahiko Ichimura, Yoshimasa Ono, Tomihiro Hashizume, Yasuo Wada, Yuji Suwa
  • Patent number: 6187458
    Abstract: A ferromagnetic fine line has no loss of spontaneous magnetization even when fabricated ultra-small. The magnetization can be controlled by the proximity of the electrodes and the atomic level structure, and is protected from adsorption of impurities by embedding the ferromagnetic fine line in a nonmagnetic atomic layer.
    Type: Grant
    Filed: July 6, 1998
    Date of Patent: February 13, 2001
    Assignee: Hitachi, Ltd.
    Inventors: Tomihiro Hashizume, Satoshi Watanabe, Toshiyuki Onogi, Yasuo Wada, Masahiko Ichimura, Yoshimasa Ono
  • Patent number: 6153500
    Abstract: A fine wire is fabricated by supplying metal atoms to one row or a plurality of rows formed by extraction of terminated atoms or molecules to the surface of substance made non-conductive by terminating all dangling bonds on the surface thereof with atoms or molecules. The conductivity of the fine wire can be attained by supplying metal atoms larger in number to that required for just terminating dangling bonds formed by extraction of terminated atoms or molecules.
    Type: Grant
    Filed: March 9, 2000
    Date of Patent: November 28, 2000
    Assignee: Hitachi, Ltd.
    Inventors: Satoshi Watanabe, Yoshimasa Murayama, Yoshimasa A. Ono, Tomihiro Hashizume, Yasuo Wada
  • Patent number: 6114762
    Abstract: A fine wire is fabricated by supplying metal atoms to one row or a plurality of rows formed by extraction of terminated atoms or molecules at the surface of a substrate made non-conductive by terminating all dangling bonds on the surface thereof with atoms or molecules. The conductivity of the fine wire can be attained by supplying metal atoms larger in number to that required for just terminating dangling bonds formed by extraction of terminated atoms or molecules.
    Type: Grant
    Filed: August 21, 1997
    Date of Patent: September 5, 2000
    Assignee: Hitachi, Ltd.
    Inventors: Satoshi Watanabe, Yoshimasa Murayama, Yoshimasa A. Ono, Tomihiro Hashizume, Yasuo Wada
  • Patent number: 5968677
    Abstract: A ferromagnetic material can be formed in a very small size on the order of an atomic size and is capable of being stably magnetized. The ferromagnetic material comprises basic unit structures each consisting of a first atom (11), a second atom (12) of the same kind as the first atom (11), and a third atom (or atomic group) (13) of the same kind as the first atom (11) or of a kind different from that of the first atom (11). In each of the basic unit structures, the atoms are arranged on a surface of a substrate so that a chemical bond (14) is formed between the first atom or and the third atom or molecule, a chemical bond (14) is formed between the second atom and the third atom or molecule, a chemical bond or an electron path (15) not passing the third atom is formed between the first and the second atom.
    Type: Grant
    Filed: December 18, 1997
    Date of Patent: October 19, 1999
    Assignee: Hitachi, Ltd.
    Inventors: Satoshi Watanabe, Toshiyuki Onogi, Masahiko Ichimura, Yoshimasa Ono, Tomihiro Hashizume, Yasuo Wada
  • Patent number: 5801472
    Abstract: A device according to the present invention is a miniaturized efficient device wherein electromechanical transduction is enabled and which is provided with at least an integrated electrostatic actuator provide with an actuator in which a fixed portion and a movable portion are opposite, a plurality of which are arranged and the relative amount of movement of which is controlled by controlling electrostatic force operating between both, the movable portion moved by the integrated electrostatic actuator and a portion connected to the movable portion which can be operated mechanically. The probe of a scanning probe microscope is provided to the movable portion of the above actuator. The above transducer is provided with the structure in which a large number of such actuators are arranged two- or one-dimensionally.
    Type: Grant
    Filed: August 13, 1996
    Date of Patent: September 1, 1998
    Assignee: Hitchi, Ltd.
    Inventors: Yasuo Wada, Munehisa Mitsuya, Tsuneo Ichiguchi, Tomihiro Hashizume, Seiji Heike, Mark Lutwyche, Satoshi Watanabe