Patents by Inventor Toshio Awaji
Toshio Awaji has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20230302186Abstract: A virus removal device providing a high virus removal probability, a small pressure loss of a flowing gas, and miniaturization with respect to an amount of air to be treated, by adopting a wet mechanism for removing a virus from a gas, the virus removal device includes a cylindrical treatment room to introduce a gas and remove a virus, a catcher formed of a rotary brush, installed in the treatment room and configured to collect the virus contained in the gas, a liquid spraying mechanism in the treatment room, a rotary driving mechanism to rotate the catcher, a gas introducing portion to introduce the gas to the treatment room, a gas discharging portion to discharge the gas from which the virus has been removed from the treatment room, and a liquid discharging portion to discharge a liquid containing the virus that has been removed from the gas.Type: ApplicationFiled: October 11, 2021Publication date: September 28, 2023Inventor: Toshio AWAJI
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Publication number: 20230233980Abstract: In order to provide a dust-containing gas treatment apparatus which can smoothly achieve the treatment of gas containing dust of high concentration, the apparatus is equipped with a cylindrical treatment room 1 to introduce gas containing dust and remove the dust from the gas, catcher 2 consisting of brush with the hair 22 planted in the support 21 installed in the treatment room 1 to catch the dust contained in the gas, liquid spraying mechanism 3 installed in the treatment room 1, rotary driving mechanism 6 to rotate the catcher 2 and stirrer 4, gas introducing portion 7 to introduce the gas containing dust, gas discharging portion 8 to discharge the gas, the dust removed, from the treatment room 1 and liquid discharging portion 9 to discharge the liquid containing the dust removed from the gas.Type: ApplicationFiled: March 24, 2023Publication date: July 27, 2023Inventor: Toshio AWAJI
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Patent number: 11633689Abstract: In order to provide a dust-containing gas treatment apparatus which can smoothly achieve the treatment of gas containing dust of high concentration, the apparatus is equipped with a cylindrical treatment room to introduce gas containing dust and remove the dust from the gas, catcher consisting of brush with the hair planted in the support installed in the treatment room to catch the dust contained in the gas, liquid spraying mechanism installed in the treatment room, rotary driving mechanism to rotate the catcher and stirrer, gas introducing portion to introduce the gas containing dust, gas discharging portion to discharge the gas, the dust removed, from the treatment room and liquid discharging portion to discharge the liquid containing the dust removed from the gas.Type: GrantFiled: November 20, 2018Date of Patent: April 25, 2023Assignee: CLEAN TECHNOLOGY CO., LTD.Inventor: Toshio Awaji
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Publication number: 20210178312Abstract: In order to provide a dust-containing gas treatment apparatus which can smoothly achieve the treatment of gas containing dust of high concentration, the apparatus is equipped with a cylindrical treatment room to introduce gas containing dust and remove the dust from the gas, catcher consisting of brush with the hair planted in the support installed in the treatment room to catch the dust contained in the gas, liquid spraying mechanism installed in the treatment room, rotary driving mechanism to rotate the catcher and stirrer, gas introducing portion to introduce the gas containing dust, gas discharging portion to discharge the gas, the dust removed, from the treatment room and liquid discharging portion to discharge the liquid containing the dust removed from the gas.Type: ApplicationFiled: November 20, 2018Publication date: June 17, 2021Inventor: Toshio AWAJI
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Patent number: 9675930Abstract: A plasma control method for an exhaust gas treating apparatus includes providing an exhaust gas treating apparatus having a plasma discharge space, a coil disposed on an outer circumference of the plasma discharge space, an upper electrode, and a lower electrode; generating plasma in the plasma discharge space; controlling the state of the plasma generated in the plasma discharge space by generating a magnetic field in the plasma discharge space between the upper electrode and the lower electrode; and cooling the reaction tube using a water cooled jacket disposed around the reaction tube. The magnetic field is generated by applying a current to the coil.Type: GrantFiled: April 1, 2010Date of Patent: June 13, 2017Assignee: CLEAN TECHNOLOGY CO., LTD.Inventors: Toshio Awaji, Takashi Nakayama, Toshio Tanaka
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Patent number: 8877134Abstract: The present invention, aiming at providing an exhaust gas treating system capable of increasing the exhaust gas treating volume, through increase of the diameter of the reaction tube, stabilizing the state of generation of plasma without requiring any water membrane, and improving the harmful matters removing performance by extending the plasma length, comprises a reaction tube 1 for introducing exhaust gas G, an upper electrode 2 disposed in the air on the top side of the reaction tube 1, a lower electrode 3 disposed on the bottom side of the reaction tube 1, and a spray nozzle 4 for spraying an electrolytic solution D between the upper electrode 2 and the lower electrode 3, so as to form a path of electric current between the electrodes 2, 3 and generate plasma P in the reaction tube 1, by spraying an electrolytic solution D between the upper electrode 2 and the lower electrode 3.Type: GrantFiled: February 5, 2008Date of Patent: November 4, 2014Assignee: Clean Technology Co., Ltd.Inventors: Toshio Awaji, Takashi Nakayama
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Publication number: 20100284170Abstract: The problem to be solved by the present invention is to provide a light diffuser plate and a process for production thereof, which light diffuser plate can diffuse light selectively in any desired direction even when the number of cold cathode fluorescent lamps as backlights is reduced and the gap between cold cathode fluorescent lamps is increased, so suppressing luminance unevenness and lamp image with good repeatability in stable way and maintaining high luminance. The present invention is also aimed at providing a backlight unit that possesses similar characteristics.Type: ApplicationFiled: November 25, 2008Publication date: November 11, 2010Inventors: Toshio Awaji, Yasutaka Nakatani, Kazuyuki Sugihara, Takehisa Kishimoto, Akira Ueda
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Publication number: 20100252411Abstract: [Problem] To present a control method of plasma by magnetic field in an exhaust gas treating apparatus and an exhaust gas treating apparatus using the same, in a simple method and structure, without extremely increasing the consumption of energy, or without lowering the absolute amount of treatment. [Solving Means] In an exhaust gas treating apparatus for decomposing and treating an exhaust gas introduced into a reaction tube 1 by the plasma generated in the reaction tube 1, by generating a magnetic field in the reaction tube 1, the state of the plasma generated in the reaction tube 1 is controlled.Type: ApplicationFiled: April 1, 2010Publication date: October 7, 2010Inventors: Toshio AWAJI, Takashi Nakayama, Toshio Tanaka
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Patent number: 7426986Abstract: A one-way clutch of package type which includes a one-way clutch comprising an inner race, an outer race and a torque transferring member for transferring torque between the inner race and the outer race and in which a bearing is integrally incorporated between the inner and outer races of the one-way clutch and wherein a biasing member is interposed between an axial end face of at least one of projections of the inner and outer races of the one-way clutch and an axial end face of an inner race or an outer race of the bearing.Type: GrantFiled: January 17, 2006Date of Patent: September 23, 2008Assignee: NSK-Warner K.K.Inventor: Toshio Awaji
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Publication number: 20080190762Abstract: The present invention, aiming at providing an exhaust gas treating system capable of increasing the exhaust gas treating volume, through increase of the diameter of the reaction tube, stabilizing the state of generation of plasma without requiring any water membrane, and improving the harmful matters removing performance by extending the plasma length, comprises a reaction tube 1 for introducing exhaust gas G, an upper electrode 2 disposed in the air on the top side of the reaction tube 1, a lower electrode 3 disposed on the bottom side of the reaction tube 1, and a spray nozzle 4 for spraying an electrolytic solution D between the upper electrode 2 and the lower electrode 3, so as to form a path of electric current between the electrodes 2, 3 and generate plasma P in the reaction tube 1, by spraying an electrolytic solution D between the upper electrode 2 and the lower electrode 3.Type: ApplicationFiled: February 5, 2008Publication date: August 14, 2008Inventors: Toshio Awaji, Takashi Nakayama
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Publication number: 20070104961Abstract: The present invention provides a functional thermoplastic resin sheet including a thin film of at least one layer formed on at least one side of a thermoplastic resin sheet by a transfer method, wherein at least one layer of the thin film has functionality. The functional thermoplastic resin sheet of the first invention has a thin film of at least one layer formed on an uneven surface of a thermoplastic resin sheet having the uneven surface by a transfer method. The production process includes transferring, using a transfer film with a thin film of at least one layer formed on a surface of a base film, the thin film to an uneven surface of a thermoplastic resin sheet having the uneven surface, at which when the glass transition temperature of a thermoplastic resin sheet is denoted as Tg, a surface temperature of the thermoplastic resin sheet is in a range of not lower than (Tg?10° C.) and not higher than (Tg+70° C.Type: ApplicationFiled: November 2, 2006Publication date: May 10, 2007Inventors: Toshio Awaji, Naofumi Tsujino, Kazuhisa Hirata, Takehisa Kishimoto, Akira Ueda, Junichiro Nakagawa, Michio Matsuura
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Publication number: 20060169559Abstract: The present invention provides a one-way clutch of package type which includes a one-way clutch comprising an inner race, an outer race and a torque transferring member for transferring torque between the inner race and the outer race and in which a bearing is integrally incorporated between the inner and outer races of the one-way clutch and wherein a biasing member is interposed between an axial end face of at least one of projections of the inner and outer races of the one-way clutch and an axial end face of an inner race or an outer race of the bearing.Type: ApplicationFiled: January 17, 2006Publication date: August 3, 2006Inventor: Toshio Awaji
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Publication number: 20050192373Abstract: A curable composition for optical parts, including a (meth)acrylic acid ester (A) of a compound having two or more hydroxy groups in one molecule and containing no aromatic hydrocarbon structure, wherein a content of an ether structure represented by the following general formula (1): —(O—CH2—CHR1)n—??(1) wherein n is in the range of 1 to 100 and R1 is at least one selected from the group consisting of hydrogen, methyl, and ethyl, in the composition is 5% by weight or higher, and a content of sulfonic acid and/or a sulfonic acid ester in the composition is 100 ppm or lower in terms of sulfur atom content. This curable composition makes it possible to obtain optical parts by curing, which are transparent and hardly cause coloration, denaturation, and deterioration to light from a light source having an emission wavelength distribution extending from a short wavelength region of visible light to an ultraviolet region.Type: ApplicationFiled: February 25, 2005Publication date: September 1, 2005Inventors: Toshio Awaji, Kaoru Mori, Akihiko Fukada, Masanori Yoshimune
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Patent number: 6887946Abstract: It is an object of the present invention to provide a compound having a (meth)acryloyl group that is suitably used in various applications, a process for producing such compound simply and under mild conditions, and an useful photo-curable composition and aqueous photo-curable composition comprising such compound.Type: GrantFiled: October 31, 2002Date of Patent: May 3, 2005Assignee: Nippon Shokubai Co., Ltd.Inventors: Akihiko Fukada, Keiji Yurugi, Toshio Awaji, Nobuaki Otsuki
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Patent number: 6713144Abstract: The present invention provides a multilayer material which is excellent in applicability, is satisfactorily prevented from causing poor adhesion to various substrates, gives cured products having sufficient fundamental performance characteristics with improved adhesion strength, durability etc. and, accordingly, can be applied in various fields of use. The present invention is a multilayer material comprising a light-shielding layer (a), a curable molding material layer (b), a tacky layer (c) and a releasing layer (d), with one side of the curable molding material layer (b) having the light-shielding layer (a) and the other side having the tacky layer (c) and releasing layer (d) in that order from the inside.Type: GrantFiled: September 6, 2002Date of Patent: March 30, 2004Assignee: Nippon Shokubai Co., Ltd.Inventors: Masaaki Bundo, Koji Takabatake, Toshio Awaji
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Publication number: 20030134926Abstract: It is an object of the present invention to provide a compound having a (meth)acryloyl group that is suitably used in various applications, a process for producing such compound simply and under mild conditions, and an useful photo-curable composition and aqueous photo-curable composition comprising such compound.Type: ApplicationFiled: October 31, 2002Publication date: July 17, 2003Applicant: NIPPON SHOKUBAI CO., LTD.Inventors: Akihiko Fukada, Keiji Yurugi, Toshio Awaji, Nobuaki Otsuki
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Publication number: 20030099828Abstract: The present invention provides a multilayer material which is excellent in applicability, is satisfactorily prevented from causing poor adhesion to various substrates, gives cured products having sufficient fundamental performance characteristics with improved adhesion strength, durability etc. and, accordingly, can be applied in various fields of use.Type: ApplicationFiled: September 6, 2002Publication date: May 29, 2003Inventors: Masaaki Bundo, Koji Takabatake, Toshio Awaji
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Patent number: 6090183Abstract: A method for processing an exhaust gas produced during manufacturing of semiconductor devices including the steps of introducing a thermally disintegrable or thermally oxidizable exhaust gas produced during manufacturing of semiconductor devices into a processing chamber; heating up this exhaust gas in the processing chamber so that the exhaust gas undergoes thermal disintegration or thermal oxidation and becomes harmless and easy to handle for further processing; capturing fine particles of solid oxides or the like suspended inside the processing chamber with a sweeper provided inside the processing chamber; and sweeping fine particles of solid oxides or the like accumulated on a wall of the processing chamber with the sweeper.Type: GrantFiled: September 25, 1998Date of Patent: July 18, 2000Inventor: Toshio Awaji
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Patent number: 6077879Abstract: The present invention provides a radically polymerizable curable resin obtained by modifying an epoxy resin by reacting a phenol compound having an alcoholic hydroxyl group; and an unsaturated monobasic acid, to the epoxy resin having two or more epoxy groups in a molecule. The epoxy resin is reacted with the phenol compound and the unsaturated monobasic acid. The curable resin is subjected to polymerization curing with heat or light to form a cured product having excellent heat resistance, moisture resistance, and adhesion to substrates. The present invention also provides a curable resin composition containing the curable resin, as well as an alkaline-developable curable resin capable of forming a coating layer having excellent tack-free property, quick developability and excellent properties of cured layer.Type: GrantFiled: November 10, 1998Date of Patent: June 20, 2000Assignee: Nippon Shokubai Co., Ltd.Inventors: Nobuaki Ohtsuki, Toshio Awaji
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Patent number: 6015651Abstract: The photo-curable liquid solder resist ink composition of the present invention mainly comprises a photo-polymerizable resin having sufficient molecular weight and (meth)acryloyl groups which are imparted by both of introduction of (meth)acryloyl groups into a novolak-type epoxy resin having 4 or more of benzene nuclei and polymerization using a chain-extension agent. The composition is useful for a photo-curable type resist, since it can produce a coated film excellent in tack free characteristic and resolution, and can produce a cured film excellent in heat resistance, adhesiveness, and chemical resistance. In addition, by reacting with an acid anhydride, development with alkalis becomes possible.Type: GrantFiled: April 28, 1997Date of Patent: January 18, 2000Assignee: Nippon Shokubai Co., Ltd.Inventors: Toshio Awaji, Nobuaki Otsuki, Motohiro Arakawa, Hiromichi Tanaka