Patents by Inventor Toshio Takizawa

Toshio Takizawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10283156
    Abstract: A magnetic-disk glass substrate of the present invention has an average value of squares of inclinations of 0.0025 or less and a frequency at which squares of inclinations are 0.004 or more of 15% or less, in a case where samples of inclinations on a main surface are obtained at intervals of 10 nm.
    Type: Grant
    Filed: January 9, 2017
    Date of Patent: May 7, 2019
    Assignees: HOYA CORPORATION, HOYA GLASS DISK VIETNAM II LTD.
    Inventors: Masanobu Itaya, Kinobu Osakabe, Toshio Takizawa
  • Patent number: 10155886
    Abstract: A polishing liquid for CMP, comprising: an abrasive grain including a cerium-based compound; a 4-pyrone-based compound; a polymer compound having an aromatic ring and a polyoxyalkylene chain; a cationic polymer; and water.
    Type: Grant
    Filed: April 28, 2014
    Date of Patent: December 18, 2018
    Assignee: HITACHI CHEMICAL COMPANY, LTD.
    Inventors: Munehiro Oota, Toshio Takizawa, Hisataka Minami, Toshiaki Akutsu, Tomohiro Iwano
  • Publication number: 20170270956
    Abstract: A magnetic disk substrate having a flat main surface, an end face, and a chamfered face formed between the main surface and the end face. The substrate has an offset portion, present on the main surface within a range of 92.0 to 97.0% in a radial direction from a center of the substrate. A distance from the center of the substrate to the end face of the substrate in a radial direction is 100%, the offset portion being raised or lowered with respect to a virtual straight line connecting two points on the main surface, set at positions of 92.0% and 97.0%. A maximum distance from the virtual straight line to the offset portion in a direction perpendicular to the virtual straight line is a “maximum offset value.
    Type: Application
    Filed: June 1, 2017
    Publication date: September 21, 2017
    Applicants: HOYA CORPORATION, HOYA GLASS DISK (Thailand) LTD.
    Inventors: Toshio TAKIZAWA, Kraisorn PHANDON, Kenichi NISHIMORI
  • Patent number: 9697861
    Abstract: A magnetic disk substrate having a flat main surface, an end face, and a chamfered face formed between the main surface and the end face. The substrate has an offset portion, present on the main surface within a range of 92.0 to 97.0% in a radial direction from a center of the substrate. A distance from the center of the substrate to the end face of the substrate in a radial direction is 100%, the offset portion being raised or lowered with respect to a virtual straight line connecting two points on the main surface, set at positions of 92.0% and 97.0%. A maximum distance from the virtual straight line to the offset portion in a direction perpendicular to the virtual straight line is a “maximum offset value.
    Type: Grant
    Filed: August 5, 2015
    Date of Patent: July 4, 2017
    Assignees: HOYA CORPORATION, HOYA GLASS DISK (Thailand) LTD.
    Inventors: Toshio Takizawa, Kraisorn Phandon, Kenichi Nishimori
  • Publication number: 20170186459
    Abstract: A magnetic-disk glass substrate of the present invention has an average value of squares of inclinations of 0.0025 or less and a frequency at which squares of inclinations are 0.004 or more of 15% or less, in a case where samples of inclinations on a main surface are obtained at intervals of 10 nm.
    Type: Application
    Filed: January 9, 2017
    Publication date: June 29, 2017
    Applicants: HOYA CORPORATION, HOYA GLASS DISK VIETNAM II LTD.
    Inventors: Masanobu ITAYA, Kinobu OSAKABE, Toshio TAKIZAWA
  • Publication number: 20170133237
    Abstract: Provided is a polishing liquid including cerium oxide particles, an organic acid A, a polymer compound B having a carboxyl acid group or a carboxylate group, and water, wherein the organic acid A has at least one group selected from the group consisting of —COOM group, -Ph-OM group, —SO3M group and —PO3M2 group, pKa of the organic acid A is less than 9, a content of the organic acid A is 0.001 to 1 mass % with respect to the total mass of the polishing liquid, and a content of the polymer compound B is 0.01 to 0.50 mass % with respect to the total mass of the polishing liquid, and pH is in the range of 4.0 to 7.0.
    Type: Application
    Filed: December 1, 2016
    Publication date: May 11, 2017
    Inventors: Munehiro Oota, Takaaki Tanaka, Toshio Takizawa, Shigeru Yoshikawa, Takaaki Matsumoto, Takahiro Yoshikawa, Takashi Shinoda
  • Patent number: 9564166
    Abstract: A magnetic-disk glass substrate of the present invention has an average value of squares of inclinations of 0.0025 or less and a frequency at which squares of inclinations are 0.004 or more of 15% or less, in a case where samples of inclinations on a main surface are obtained at intervals of 10 nm.
    Type: Grant
    Filed: June 28, 2013
    Date of Patent: February 7, 2017
    Assignees: HOYA CORPORATION, HOYA GLASS DISK VIETNAM II LTD.
    Inventors: Masanobu Itaya, Kinobu Osakabe, Toshio Takizawa
  • Patent number: 9564337
    Abstract: Provided is a polishing liquid including cerium oxide particles, an organic acid A, a polymer compound B having a carboxyl acid group or a carboxylate group, and water, wherein the organic acid A has at least one group selected from the group consisting of —COOM group, -Ph-OM group, —SO3M group and —PO3M2 group, pKa of the organic acid A is less than 9, a content of the organic acid A is 0.001 to 1 mass % with respect to the total mass of the polishing liquid, and a content of the polymer compound B is 0.01 to 0.50 mass % with respect to the total mass of the polishing liquid, and pH is in the range of 4.0 to 7.0.
    Type: Grant
    Filed: December 22, 2011
    Date of Patent: February 7, 2017
    Assignee: HITACHI CHEMICAL CO., LTD.
    Inventors: Munehiro Oota, Takaaki Tanaka, Toshio Takizawa, Shigeru Yoshikawa, Takaaki Matsumoto, Takahiro Yoshikawa, Takashi Shinoda
  • Publication number: 20160137881
    Abstract: A polishing liquid for CMP, comprising: an abrasive grain including a cerium-based compound; a 4-pyrone-based compound; a polymer compound having an aromatic ring and a polyoxyalkylene chain; a cationic polymer; and water.
    Type: Application
    Filed: April 28, 2014
    Publication date: May 19, 2016
    Inventors: Munehiro OOTA, Toshio TAKIZAWA, Hisataka MINAMI, Toshiaki AKUTSU, Tomohiro IWANO
  • Publication number: 20150340054
    Abstract: A magnetic disk substrate having a flat main surface, an end face, and a chamfered face formed between the main surface and the end face. The substrate has an offset portion, present on the main surface within a range of 92.0 to 97.0% in a radial direction from a center of the substrate. A distance from the center of the substrate to the end face of the substrate in a radial direction is 100%, the offset portion being raised or lowered with respect to a virtual straight line connecting two points on the main surface, set at positions of 92.0% and 97.0%. A maximum distance from the virtual straight line to the offset portion in a direction perpendicular to the virtual straight line is a “maximum offset value.
    Type: Application
    Filed: August 5, 2015
    Publication date: November 26, 2015
    Applicants: HOYA CORPORATION, HOYA GLASS DISK (Thailand) LTD.
    Inventors: Toshio TAKIZAWA, Kraisorn PHANDON, Kenichi NISHIMORI
  • Patent number: 9183866
    Abstract: A magnetic disk substrate having a flat main surface, an end face, and a chamfered face formed between the main surface and the end face. The substrate has an offset portion, present on the main surface within a range of 92.0 to 97.0% in a radial direction from a center of the substrate. A distance from the center of the substrate to the end face of the substrate in a radial direction is 100%, the offset portion being raised or lowered with respect to a virtual straight line connecting two points on the main surface, set at positions of 92.0% and 97.0%. A maximum distance from the virtual straight line to the offset portion in a direction perpendicular to the virtual straight line is a “maximum offset value.
    Type: Grant
    Filed: November 24, 2014
    Date of Patent: November 10, 2015
    Assignees: HOYA CORPORATION, HOYA GLASS DISK (Thailand) LTD.
    Inventors: Toshio Takizawa, Kraisorn Phandon, Kenichi Nishimori
  • Publication number: 20150213826
    Abstract: A magnetic-disk glass substrate of the present invention has an average value of squares of inclinations of 0.0025 or less and a frequency at which squares of inclinations are 0.004 or more of 15% or less, in a case where samples of inclinations on a main surface are obtained at intervals of 10 nm.
    Type: Application
    Filed: June 28, 2013
    Publication date: July 30, 2015
    Applicants: HOYA GLASS DISK VIETNAM II LTD., HOYA CORPORATION
    Inventors: Masanobu Itaya, Kinobu Osakabe, Toshio Takizawa
  • Patent number: 9038417
    Abstract: When mirror polishing is performed on a glass substrate by bringing a polishing pad into contact with the surface of the glass substrate while supplying a polishing liquid containing polishing grains to the substrate surface, the pH of the polishing liquid is maintained within a certain range or the agglomeration degree or dispersion degree of the polishing liquid is controlled. Consequently, an adequate mirror polishing rate can be maintained and there can be obtained a glass substrate having a good end shape.
    Type: Grant
    Filed: May 12, 2014
    Date of Patent: May 26, 2015
    Assignee: HOYA CORPORATION
    Inventors: Toshio Takizawa, Takumi Koshimizu, Yoshinori Marumo, Masahiro Katagiri
  • Publication number: 20150109703
    Abstract: A magnetic disk substrate highly reliable to prevent the occurrence of crash failure even if a magnetic disk is rotated at high speed, and suitable for a hard disk that starts and stops by the load/unload method, and a magnetic disk using such a substrate. The representative structure of the magnetic disk substrate is a disk-shaped glass substrate 10 having a generally flat main surface 11, an end face 12, a chamfered face 13 formed between the main surface 11 and the end face 12, and an offset portion, at the periphery of the main surface 11, raised or lowered with respect to a flat surface, other than the periphery, of the main surface 11, and characterized in that the magnitude of the offset portion is approximately uniform over the entire circumference of the glass substrate 10.
    Type: Application
    Filed: November 24, 2014
    Publication date: April 23, 2015
    Applicants: HOYA GLASS DISK (Thailand) LTD., HOYA CORPORATION
    Inventors: Toshio TAKIZAWA, Kraisorn PHANDON, Kenichi NISHIMORE
  • Patent number: 8986859
    Abstract: It is an object to provide a magnetic disk substrate highly reliable to prevent the occurrence of crash failure even if a magnetic disk is rotated at high speed, and suitable for a hard disk that starts and stops by the load/unload method, and a magnetic disk using such a substrate. The representative structure of a magnetic disk substrate is a disk-shaped glass substrate 10 having a generally flat main surface 11, an end face 12, a chamfered face 13 formed between the main surface 11 and the end face 12, and an offset portion, at the periphery of the main surface 11, raised or lowered with respect to a flat surface, other than the periphery, of the main surface 11, and characterized in that the magnitude of the offset portion is approximately uniform over the entire circumference of the glass substrate 10.
    Type: Grant
    Filed: July 9, 2012
    Date of Patent: March 24, 2015
    Assignees: Hoya Corporation, Hoya Glass Disk (Thailand) Ltd.
    Inventors: Toshio Takizawa, Kraisorn Phandon, Kenichi Nishimori
  • Publication number: 20140248424
    Abstract: When mirror polishing is performed on a glass substrate by bringing a polishing pad into contact with the surface of the glass substrate while supplying a polishing liquid containing polishing grains to the substrate surface, the pH of the polishing liquid is maintained within a certain range or the agglomeration degree or dispersion degree of the polishing liquid is controlled. Consequently, an adequate mirror polishing rate can be maintained and there can be obtained a glass substrate having a good end shape.
    Type: Application
    Filed: May 12, 2014
    Publication date: September 4, 2014
    Applicant: HOYA CORPORATION
    Inventors: Toshio TAKIZAWA, Takumi KOSHIMIZU, Yoshinori MARUMO, Masahiro KATAGIRI
  • Patent number: 8763428
    Abstract: When mirror polishing is performed on a glass substrate by bringing a polishing pad into contact with the surface of the glass substrate while supplying a polishing liquid containing polishing grains to the substrate surface, the pH of the polishing liquid is maintained within a certain range or the agglomeration degree or dispersion degree of the polishing liquid is controlled. Consequently, an adequate mirror polishing rate can be maintained and there can be obtained a glass substrate having a good end shape.
    Type: Grant
    Filed: March 16, 2007
    Date of Patent: July 1, 2014
    Assignee: Hoya Corporation
    Inventors: Toshio Takizawa, Takumi Koshimizu, Yoshinori Marumo, Masahiro Katagiri
  • Publication number: 20130260558
    Abstract: Provided is a polishing liquid including cerium oxide particles, an organic acid A, a polymer compound B having a carboxyl acid group or a carboxylate group, and water, wherein the organic acid A has at least one group selected from the group consisting of —COOM group, -Ph-OM group, —SO3M group and —PO3M2 group, pKa of the organic acid A is less than 9, a content of the organic acid A is 0.001 to 1 mass % with respect to the total mass of the polishing liquid, and a content of the polymer compound B is 0.01 to 0.50 mass % with respect to the total mass of the polishing liquid, and pH is in the range of 4.0 to 7.0.
    Type: Application
    Filed: December 22, 2011
    Publication date: October 3, 2013
    Applicant: HITACHI CHEMICAL CO., LTD.
    Inventors: Munehiro Oota, Takaaki Tanaka, Toshio Takizawa, Shigeru Yoshikawa, Takaaki Matsumoto, Takahiro Yoshikawa, Takashi Shinoda
  • Publication number: 20120276416
    Abstract: It is an object to provide a magnetic disk substrate highly reliable to prevent the occurrence of crash failure even if a magnetic disk is rotated at high speed, and suitable for a hard disk that starts and stops by the load/unload method, and a magnetic disk using such a substrate. The representative structure of a magnetic disk substrate according to this invention is a disk-shaped glass substrate 10 having a generally flat main surface 11, an end face 12, a chamfered face 13 formed between the main surface 11 and the end face 12, and an offset portion, at the periphery of the main surface 11, raised or lowered with respect to a flat surface, other than the periphery, of the main surface 11, and characterized in that the magnitude of the offset portion is approximately uniform over the entire circumference of the glass substrate 10.
    Type: Application
    Filed: July 9, 2012
    Publication date: November 1, 2012
    Applicants: HOYA GLASS DISK (THAILAND) LTD., HOYA CORPORATION
    Inventors: Toshio TAKIZAWA, Kraisorn PHANDON, Kenichi NISHIMORI
  • Patent number: 8241768
    Abstract: It is an object to provide a magnetic disk substrate highly reliable to prevent the occurrence of crash failure even if a magnetic disk is rotated at high speed, and suitable for a hard disk that starts and stops by the load/unload method, and a magnetic disk using such a substrate. The representative structure of a magnetic disk substrate according to this invention is a disk-shaped glass substrate 10 having a generally flat main surface 11, an end face 12, a chamfered face 13 formed between the main surface 11 and the end face 12, and an offset portion, at the periphery of the main surface 11, raised or lowered with respect to a flat surface, other than the periphery, of the main surface 11, and characterized in that the magnitude of the offset portion is approximately uniform over the entire circumference of the glass substrate 10.
    Type: Grant
    Filed: February 19, 2008
    Date of Patent: August 14, 2012
    Assignees: Hoya Corporation, Hoya Glass Disk (thailand) Ltd.
    Inventors: Toshio Takizawa, Kraisom Phandon, Kenichi Nishimori