Patents by Inventor Toshiyuki Ohno

Toshiyuki Ohno has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20050029515
    Abstract: An organic/inorganic oxide mixture has high capacitance density so as to realize a capacitor material that can be self-contained in a substrate. The mixture film made of inorganic oxide particle has a mean particle size of less than 90 nm dispersed in organic polymer, of which relative dielectric constant is more than 10 and thickness is less than 900 nm.
    Type: Application
    Filed: August 6, 2004
    Publication date: February 10, 2005
    Applicant: Hitachi, Ltd.
    Inventors: Akira Nagai, Toshiyuki Ohno, Fusao Hojo, Shinji Yamada, Mikio Konno, Yomokazu Tanase, Daisuke Naga
  • Patent number: 6750477
    Abstract: In a static induction transistor, in addition to a first gate layer (4), a plurality of second gate layers (41) having a shallower depth and a narrower gap therebetween than those of the first gate layer (4) are provided in an area surrounded by the first gate layer (4), thereby an SiC static induction transistor with an excellent off characteristic is realized, while ensuring a required processing accuracy during production thereof.
    Type: Grant
    Filed: April 15, 2002
    Date of Patent: June 15, 2004
    Assignee: Hitachi, Ltd.
    Inventors: Tsutomu Yatsuo, Toshiyuki Ohno, Hidekatsu Onose, Saburo Oikawa
  • Patent number: 6566726
    Abstract: To reduce the field intensity on the termination surface, almost not affecting the on-characteristic, a drift layer is made of two layers, an n-layer and n− layer, and a termination region is formed on the surface of the above n− layer. An impurity concentration ratio between the n− layer and the n-layer is less than 1:2, and the thickness of the n− layer is less than that of a source n+ layer. Reliability can be secured even in a high temperature operation.
    Type: Grant
    Filed: March 1, 2000
    Date of Patent: May 20, 2003
    Assignee: Hitachi, Ltd.
    Inventors: Hidekatsu Onose, Tsutomu Yatsuo, Toshiyuki Ohno, Saburou Oikawa
  • Publication number: 20030034308
    Abstract: An oil-bearing sludge processing method includes the steps of bringing a processing agent having calcium oxide as its main component into contact with oil-bearing sludge to cause a reaction between a water component of the oil-bearing sludge and the calcium oxide in the processing agent, thereby partially volatizing, dispersing and removing oil component by heat from the reaction and forming porous calcium hydroxide produced by the reaction in a form of a powdery and granular material that has adsorbed the oil component and has been covered with a calcium carbonate layer. The material does not leach out the oil component and is used as a soil fertilizer, a combustion accelerator, a construction material, a road material, etc.
    Type: Application
    Filed: October 3, 2001
    Publication date: February 20, 2003
    Inventors: Zenichiro Uefuji, Kazumasa Matsuura, Toshiyuki Ohno, Daigo Nakano
  • Publication number: 20020109145
    Abstract: In a static induction transistor, in addition to a first gate layer (4), a plurality of second gate layers (41) having a shallower depth and a narrower gap therebetween than those of the first gate layer (4) are provided in an area surrounded by the first gate layer (4), thereby an SiC static induction transistor with an excellent off characteristic is realized, while ensuring a required processing accuracy during production thereof.
    Type: Application
    Filed: April 15, 2002
    Publication date: August 15, 2002
    Inventors: Tsutomu Yatsuo, Toshiyuki Ohno, Hidekatsu Onose, Saburo Oikawa
  • Patent number: 6180959
    Abstract: In a silicon carbide static induction transistor, at a surface part of a semiconductor substrate, a p-type gate region is formed partially overlapping a n-type source region, whereby the high accuracy in alignment between the gate region and the source region is not required, and the gate withstand voltage can be highly increased since the substrate is made of silicon carbide, which improves the yield of static induction transistors.
    Type: Grant
    Filed: April 16, 1998
    Date of Patent: January 30, 2001
    Assignee: Hitachi, Ltd.
    Inventors: Takayuki Iwasaki, Toshiyuki Ohno, Tsutomu Yatsuo
  • Patent number: 5736753
    Abstract: To provide a field-effect transistor having a large power conversion capacity and its fabrication method by decreasing the leakage current between the source and the drain of a semiconductor device made of hexagonal-system silicon carbide when the gate voltage of the semiconductor device is turned off and also decreasing the electrical resistance of the semiconductor device when the gate voltage of the semiconductor device is turned on. The main current path of the field-effect transistor is formed so that the current flowing between the source and the drain of, for example, a field-effect transistor flows in the direction parallel with the {0001} plane and a channel forming plane is parallel with the {1120} plane. ?Selected Drawing!FIG.
    Type: Grant
    Filed: August 30, 1995
    Date of Patent: April 7, 1998
    Assignee: Hitachi, Ltd.
    Inventors: Toshiyuki Ohno, Yohsuke Inoue, Daisuke Kawase, Yuzo Kozono, Takaya Suzuki, Tsutomu Yatsuo
  • Patent number: 5728481
    Abstract: A magnetic detecting device is constructed of a substrate, a first magnetic layer formed on the substrate, a first magnetic layer formed on the substrate, an intermediate layer containing an atom indicative of weak spincoupling and formed on the first magnetic film, and a second magnetic layer formed on the intermediate layer. The magnetic detecting device further comprises a unit or supplying a current through the first and second magnetic layers, and a unit for detecting a voltage generated between the first magnetic layer and the second magnetic layer while the current is supplied thereto.
    Type: Grant
    Filed: June 6, 1995
    Date of Patent: March 17, 1998
    Assignee: Hitachi, Ltd.
    Inventors: Masahiro Kasai, Yuzo Kozono, Yoko Kanke, Toshiyuki Ohno, Masanobu Hanazono
  • Patent number: 4804606
    Abstract: An electrophotographic sensitized body having a photoconductive layer comprising hydrogenated amorphous silicon on a substrate which comprises conductive material selected from the group consisting of A1, A1-Si (0.2-1.2 wt. %) - Mg (0.45-1.2 wt. %) alloy, super duralmine and extra super duralmine. Provided between the substrate and the photoconductive layer is a diffusion blocking layer 0.005-5 microns in thickness comprising a material selected from the group consisting of titanium nitride, tantalum nitride, hafnium nitride, platinum silicide, nickel silicide, palladium silicide, titanium silicide, hafnium silicide, tantalum silicide, tungsten silicide, vanadium silicide, niobium silicide, molybdenum silicide, zirconium silicide, tungsten carbide, titanium carbide, molybdenum carbide, hafnium carbide, vanadium carbide, niobium carbide, tantalum carbide and metallic chrome.
    Type: Grant
    Filed: September 2, 1987
    Date of Patent: February 14, 1989
    Assignee: Hitachi, Ltd.
    Inventors: Toshiyuki Ohno, Kunihiro Tamahashi, Mitsuo Chigasaki
  • Patent number: 4791040
    Abstract: The photoconductive layer (3) has a triple-layer structure comprised of an upper layer (33) made of amorphous silicon containing germanium and carbon, a middle layer (32) made of amorphous silicon containing germanium, and a lower layer (31) made of amorphous silicon. The upper layer (33) formed between a surface layer (4) and the middle layer (32), and the lower layer (31) formed between the middle layer (32) and a barrier layer (2) serve to reduce the energy difference and the interfacial state between respective layers thus, high electrophotographic sensitivity for a longer wavelength light can be obtained, and sensitivity in the oscillation wavelength of a GaAlAs diode laser improves effectively.
    Type: Grant
    Filed: April 20, 1987
    Date of Patent: December 13, 1988
    Assignees: Hitachi Ltd., Hitachi Chemical Company, Ltd.
    Inventors: Makoto Fujikura, Toshiyuki Ohno, Shigeharu Onuma, Kunihiro Tamahashi, Mitsuo Chigasaki, Yasuo Shimamura