Abstract: An exposure apparatus which includes a projection optical system and exposes a substrate to radiant energy via the projection optical system, includes a temperature measuring device configured to perform measurement of a temperature of a temperature measurement portion of the projection optical system, and a controller configured to perform prediction of a change in an optical characteristic of the projection optical system based on a change in temperature measured by the temperature measuring device, and to perform processing of reduction, based on the prediction, of a change in a state of an image formed on the substrate by the projection optical system, wherein the controller is configured to perform the prediction in accordance with a second-order lag response function to the change in temperature of the temperature measurement portion.

Abstract: An exposure apparatus for exposing a substrate to a light comprises a projection optical system including an optical element and configured to project a light from an original onto the substrate, an adjusting device configured to adjust at least one of a position, an orientation and a shape of the optical element, and a controller configured to obtain an adjusting amount of the optical element based on a value of an objective function relating to an optical characteristic of the projection optical system, and to control the adjusting device based on the obtained adjusting amount. The objective function includes a variable which represents an upper limit of the adjusting amount.

Abstract: An exposure apparatus which includes a projection optical system and exposes a substrate to radiant energy via the projection optical system, includes a temperature measuring device configured to perform measurement of a temperature of a temperature measurement portion of the projection optical system, and a controller configured to perform prediction of a change in an optical characteristic of the projection optical system based on a change in temperature measured by the temperature measuring device, and to perform processing of reduction, based on the prediction, of a change in a state of an image formed on the substrate by the projection optical system, wherein the controller is configured to perform the prediction in accordance with a second-order lag response function to the change in temperature of the temperature measurement portion.

Abstract: The present invention provides an exposure apparatus comprising a projection optical system including an optical element of which at least one of a position, orientation, and shape can be regulated, a regulator configured to regulate the at least one of the position, orientation, and shape of the optical element, and a controller configured to calculate, using quadratic programming, a regulation amount of the optical element that minimizes a value of an objective function expressed by a first dummy variable serving as an upper limit of a linear optical characteristic value of the projection optical system, and a second dummy variable serving as an upper limit of a quadratic optical characteristic value of the projection optical system, and to control the regulator based on the calculated regulation amount.

Abstract: An exposure apparatus for exposing a substrate to a light comprises a projection optical system including an optical element and configured to project a light from an original onto the substrate, an adjusting device configured to adjust at least one of a position, an orientation and a shape of the optical element, and a controller configured to obtain an adjusting amount of the optical element based on a value of an objective function relating to an optical characteristic of the projection optical system, and to control the adjusting device based on the obtained adjusting amount. The objective function includes a variable which represents an upper limit of the adjusting amount.

Abstract: A projection exposure apparatus includes an optical element, and projects a pattern formed on a first object onto a second object to be exposed through a projection optical system for correcting imaging characteristics by controlling the optical element. The projection exposure apparatus includes: a displacement measurement unit configured to measure a displacement of the optical element; a storage unit configured to store a measurement criterion of the displacement measurement unit; an imaging characteristics measurement unit configured to measure imaging characteristics of the projection optical system; and a calibration unit configured to calibrate the measurement criterion based on a result of measurement by the imaging characteristics measurement unit.

Abstract: The present invention provides an exposure apparatus comprising a projection optical system including an optical element of which at least one of a position, orientation, and shape can be regulated, a regulator configured to regulate the at least one of the position, orientation, and shape of the optical element, and a controller configured to calculate, using quadratic programming, a regulation amount of the optical element that minimizes a value of an objective function expressed by a first dummy variable serving as an upper limit of a linear optical characteristic value of the projection optical system, and a second dummy variable serving as an upper limit of a quadratic optical characteristic value of the projection optical system, and to control the regulator based on the calculated regulation amount.

Abstract: An optical apparatus which includes an image forming optical system having a movable optical element, and a driving mechanism configured to move the optical element. The apparatus includes a first block which measures a wavefront aberration of the optical system. A second block obtains a linear evaluation value of an aberration expressed by a linear function of a position of the movable optical element out of aberrations of the optical system, and a quadratic evaluation value of a square of a root mean square of the wavefront aberration measured by the first block expressed by a quadratic function of the position. A third block uses a dummy variable as an upper limit value of the linear evaluation value and obtains a minimum value of the dummy variable by a linear programming. A fourth block determines a position of the optical element to be moved by the driving mechanism.

Abstract: An optical apparatus including an image forming optical system having a movable optical element, and a driving mechanism. A first block obtains a linear evaluation value by normalizing, by a first tolerance, an aberration expressed by a linear function of a position of the movable optical element and normalizing, by a second tolerance, an aberration expressed by a quadratic function of the position out of the aberrations of the optical system. A second block obtains a minimum value of a dummy variable by linear programming. A third block determines a position of the optical element to be moved by the driving mechanism using a value prepared by adding a relaxation amount to the minimum value obtained by the second block and minimizes the weighted sum of the quadratic evaluation values by adjusting the weights assigned to the quadratic evaluation values and a relaxation amount.

Abstract: An optical apparatus including an image forming optical system having a movable optical element, and a driving mechanism which moves the optical element is disclosed.

Abstract: A projection system for projecting a pattern of a mask onto a substrate. The projection system includes a projection optical system disposed between the mask and the substrate, and an optical element for correcting aberration produced in the projection optical system. The optical element has different refracting powers in two orthogonal directions or has a refracting power in one direction of two orthogonal directions and no refracting power in the other of the two orthogonal directions. The optical element is disposed between the mask and the substrate, in which an optical axis of the optical element is inclined with respect to an optical axis of the projection optical system.

Abstract: A projection system for projecting a pattern of a mask onto a substrate. The projection system includes a projection optical system disposed between the mask and the substrate, and an optical element for correcting aberration produced in the projection optical system. The optical element has different refracting powers in two orthogonal directions or has a refracting power in one direction of two orthogonal directions and no refracting power in the other of the two orthogonal directions. The optical element is disposed between the mask and the substrate. An optical axis of the optical element is inclined with respect to an optical axis of the projection optical system.

Abstract: An optical apparatus including an image forming optical system having a movable optical element, and a driving mechanism which moves the optical element is disclosed.

Abstract: An aberration changing optical system to be used with a projection optical system of a projection exposure apparatus, includes an optical element having at least one of a cylindrical surface and a toric surface and being rotatable about and tiltable to an optical axis of the optical system. In another form, the aberration changing optical system includes an optical element having different refracting powers in two orthogonal directions or having a refracting power only in one direction, the optical element being made rotatable about and tiltable to an optical axis of the optical system.

Abstract: An aberration changing optical system to be used with a projection optical system of a projection exposure apparatus, includes an optical element having at least one of a cylindrical surface and a toric surface and being rotatable about and tiltable to an optical axis of the optical system. In another form, the aberration changing optical system includes an optical element having different refracting powers in two orthogonal directions or having a refracting power only in one direction, the optical element being made rotatable about and tiltable to an optical axis of the optical system.

Abstract: An aberration changing optical system to be used with a projection optical system of a projection exposure apparatus, includes an optical element having at least one of a cylindrical surface and a toric surface and being rotatable about and tiltable to an optical axis of the optical system. In another form, the aberration changing optical system includes an optical element having different refracting powers in two orthogonal directions or having a refracting power only in one direction, the optical element being made rotatable about and tiltable to an optical axis of the optical system.

Abstract: An electrophotographic photosensitive member comprises a conductive support and a photosensitive layer which comprises a charge generation layer and a charge transport layer, characterized in that the charge generation layer contains a polycarbonate resin, and the electrophotographic photosensitive member is electrostatically charged by applying a direct current voltage to a charging member in contact with the surface of said electrophotographic photosensitive member.

Abstract: A cylindrical structure is formed by a cylinder and a terminal engaging member, such as a gear or flange for rotating the cylinder. The terminal engaging member has a head which is inserted into the cylinder and a plurality of recesses by which the member is fastened to at least one end of the cylinder through bending and cutting the assocrated cylinder at plural parts thereof into the recesses of the terminal engaging member. In this mannaer, the joint between the cylinder and the terminal engaging member can be formed securely in a simple manner. The cylindrical structure may be employed, for example, as a photosensitive drum or a developing sleeve for electrophotography.

Abstract: An image forming method includes forming an electrostatic latent image on an image bearing member having a surface of which contact angle with water is at least 90.degree., forming a toner layer on a toner carrying member, bringing the toner layer into contact with the surface of the image bearing member on which the electrostatic latent image has been formed, while rotating the image bearing member and the toner carrying member reciprocally, and developing the electrostatic latent image by the use of the toner of the toner layer to form a toner image.

Abstract: An electrophotographic apparatus includes an electrophotographic photosensitive member, a charging member, an imagewise exposure system, a developing system having a toner feed member, a transfer system, and a cleaning system wherein the electrophotographic photosensitive member includes a surface layer containing a lubricative, fluorine-containing resin powder and the toner feed member includes a spacer member coming into contact with the surface layer of the electrophotographic photosensitive member; and also a process cartridge than can be detachably mounted on the electrophotographic apparatus.