Patents by Inventor TSAN-HUA HUANG
TSAN-HUA HUANG has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20160233115Abstract: A cleaning apparatus for a semiconductor equipment is provided. The cleaning apparatus comprising a cleaning pad with a plurality of brushes thereon is located on a rotor of the semiconductor equipment to remove residues within the semiconductor equipment by using the brushes against the residues via moving and rotating the rotor and the cleaning apparatus.Type: ApplicationFiled: April 20, 2016Publication date: August 11, 2016Inventors: Chien-Ping HUANG, Tsan-Hua Huang, Tsung-Hsun HAN, Kian-Poh WONG
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Patent number: 9269547Abstract: Semiconductor equipment is disclosed in this invention. The semiconductor equipment includes a reaction chamber, a wafer susceptor, and a liner device. The reaction chamber includes an opening and a circular inner wall. The wafer susceptor is capable of carrying at least one wafer. The liner device is disposed between the wafer susceptor and the circular inner wall of the reaction chamber. The liner device is capable of moving vertically between a first position and a second position. The liner device includes at least one venting opening, wherein the venting opening is connected with a venting device. Particles which are accumulated within the liner device can be removed by the venting device.Type: GrantFiled: May 17, 2012Date of Patent: February 23, 2016Assignee: Hermes-Epitek CorporationInventors: Jui-Sheng Cheng, Tsung-Hsun Han, Tsan-Hua Huang
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Patent number: 9126214Abstract: A showerhead is disclosed in this invention. The showerhead includes a bottom portion, at least one plate, and a top portion. The bottom portion includes a plurality of gas tubes which are integratedly formed on the bottom portion. The gas tubes include at least one first gas tube. The at least one plate includes a first plate. The first plate includes a plurality of first openings, wherein the gas tubes pass through the first openings. The top portion is coupled to the bottom portion for forming at least one inner space.Type: GrantFiled: June 18, 2013Date of Patent: September 8, 2015Assignee: Hermes-Epitek CorporationInventors: Chien-Ping Huang, Tsan-Hua Huang
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Publication number: 20140239091Abstract: A gas injector and cover plate assembly includes a cover plate, a gas injector and a ceiling. The cover plate includes cooling fluid channels. The gas injector is configured to be located on the cover plate, and includes a gas distributor, a fluid-cooling gas transmitter, gas spraying plates and a conducting cone. The gas distributor distributes gases and a gas transmitter cooling fluid. The gas distributor includes a gas conduit for introducing a first gas. The fluid-cooling gas transmitter connects the gas distributor to introduce the gas transmitter cooling fluid to form cooling fluid walls and the first gas and the gases. The gas spraying plates and the conducting cone are located beneath the fluid-cooling gas transmitter.Type: ApplicationFiled: February 21, 2014Publication date: August 28, 2014Applicant: HERMES-EPITEK CORPORATIONInventors: Tsan-Hua Huang, Tsung-Hsun Han, Paul Wong, Miao-Chan Wu
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Patent number: 8719993Abstract: Semiconductor equipment is provided to include a reaction chamber, a movable frame, and at least one cleaning brush head. The cleaning brush head is configured to operate on at least one dirty portion to be cleaned within the reaction chamber. The movable frame is disposed within the reaction chamber. The movable frame is capable of carrying a susceptor. The cleaning brush head is capable of touching the dirty portion. The cleaning brush head is capable of moving relative to the dirty portion for removing the residue which is attached to the portion to be cleaned.Type: GrantFiled: April 3, 2013Date of Patent: May 13, 2014Assignee: Hermes-Epitek CorporationInventors: Chien-Ping Huang, Tsan-Hua Huang, Tsung-Hsun Han
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Publication number: 20140000655Abstract: Semiconductor equipment is provided to include a reaction chamber, a movable frame, and at least one cleaning brush head. The cleaning brush head is configured to operate on at least one dirty portion to be cleaned within the reaction chamber. The movable frame is disposed within the reaction chamber. The movable frame is capable of carrying a susceptor. The cleaning brush head is capable of touching the dirty portion. The cleaning brush head is capable of moving relative to the dirty portion for removing the residue which is attached to the portion to be cleaned.Type: ApplicationFiled: September 5, 2013Publication date: January 2, 2014Inventors: Chien-Ping HUANG, Tsan-Hua Huang, Tsung-Hsun HAN
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Publication number: 20130277459Abstract: A showerhead is disclosed in this invention. The showerhead includes a bottom portion, at least one plate, and a top portion. The bottom portion includes a plurality of gas tubes which are integratedly formed on the bottom portion. The gas tubes include at least one first gas tube. The at least one plate includes a first plate. The first plate includes a plurality of first openings, wherein the gas tubes pass through the first openings. The top portion is coupled to the bottom portion for forming at least one inner space.Type: ApplicationFiled: June 18, 2013Publication date: October 24, 2013Inventors: Chien-Ping HUANG, Tsan-Hua Huang
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Publication number: 20130220222Abstract: The invention provides a gas distribution apparatus comprising a main frame and a cover. The main frame includes a plurality of walls having a plurality of second gas channels therein, a plurality of first plenums defined by the walls, a plurality of heat exchange channels, a plurality of first gas channels under the first plenums, a plurality of heat exchange channel covers on the heat exchange channel, and a plurality of first plenum covers on the first plenums. Each first plenum and two adjacent walls defining the first plenum form a trunk with a plurality of branches extending from the trunk, and the branches of adjacent trunks are arranged in an interlaced manner. Each heat exchange channel is between two adjacent trunks. The cover on the main frame encloses a second plenum thereon.Type: ApplicationFiled: February 23, 2012Publication date: August 29, 2013Applicant: HERMES-EPITEK CORPORATIONInventors: Tsan-Hua Huang, Miao-Chan Wu
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Patent number: 8484847Abstract: A showerhead is disclosed in this invention. The showerhead includes a bottom portion, at least one plate, and a top portion. The bottom portion includes a plurality of gas tubes which are integratedly formed on the bottom portion. The gas tubes include at least one first gas tube. The at least one plate includes a first plate. The first plate includes a plurality of first openings, wherein the gas tubes pass through the first openings. The top portion is coupled to the bottom portion for forming at least one inner space.Type: GrantFiled: April 9, 2010Date of Patent: July 16, 2013Assignee: Hermes-Epitek CorporationInventors: Chien-Ping Huang, Tsan-Hua Huang
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Patent number: 8448288Abstract: Semiconductor equipment is provided to include a reaction chamber, a movable frame, and at least one cleaning brush head. The cleaning brush head is configured to operate on at least one dirty portion to be cleaned within the reaction chamber. The movable frame is disposed within the reaction chamber. The movable frame is capable of carrying a susceptor. The cleaning brush head is capable of touching the dirty portion. The cleaning brush head is capable of moving relative to the dirty portion for removing the residue which is attached to the portion to be cleaned.Type: GrantFiled: March 17, 2010Date of Patent: May 28, 2013Assignee: Hermes-Epitek CorporationInventors: Chien-Ping Huang, Tsan-Hua Huang, Tsung-Hsun Han
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Publication number: 20120304922Abstract: Semiconductor equipment is disclosed in this invention. The semiconductor equipment includes a reaction chamber, a wafer susceptor, and a liner device. The reaction chamber includes an opening and a circular inner wall. The wafer susceptor is capable of carrying at least one wafer. The liner device is disposed between the wafer susceptor and the circular inner wall of the reaction chamber. The liner device is capable of moving vertically between a first position and a second position. The liner device includes at least one venting opening, wherein the venting opening is connected with a venting device. Particles which are accumulated within the liner device can be removed by the venting device.Type: ApplicationFiled: May 17, 2012Publication date: December 6, 2012Applicant: HERMES-EPITEK CORPORATIONInventors: Jui-Sheng CHENG, Tsung-Hsun HAN, Tsan-Hua Huang
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Publication number: 20120085747Abstract: A heater assembly and a wafer processing apparatus using the same are provided. The heater assembly comprises a substrate, a heater, a reflector and a protective layer. The substrate has a top surface, a side surface surrounding the top surface and a trench formed on the top surface. The heater comprises a heater element accommodated within the trench and two electrodes respectively connecting two ends of the heater element and extending outside of the substrate. The reflector covers an inner surface of the trench. The protective layer covers the top surface, the side surface and the trench.Type: ApplicationFiled: October 7, 2010Publication date: April 12, 2012Inventors: Benson CHAO, Tsan-Hua HUANG
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Publication number: 20120024478Abstract: A showerhead is disclosed in this invention. The showerhead includes a bottom plate, a channel plate, and a top plate. The bottom plate includes a plurality of cooling channels and a plurality of gas holes, wherein the gas holes includes at least one first gas hole and at least one second gas hole. The channel plate includes a first trench area and a second trench area, wherein the first gas hole is connected with the first trench area, and the second gas hole is connected with the second trench area. The top plate is coupled to the channel plate.Type: ApplicationFiled: July 29, 2010Publication date: February 2, 2012Applicant: HERMES-EPITEK CORPORATIONInventors: Chien-Ping Huang, Tsan-Hua HUANG
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Publication number: 20110186078Abstract: Semiconductor equipment is provided to include a reaction chamber, a movable frame, and at least one cleaning brush head. The cleaning brush head is configured to operate on at least one dirty portion to be cleaned within the reaction chamber. The movable frame is disposed within the reaction chamber. The movable frame is capable of carrying a susceptor. The cleaning brush head is capable of touching the dirty portion. The cleaning brush head is capable of moving relative to the dirty portion for removing the residue which is attached to the portion to be cleaned.Type: ApplicationFiled: March 17, 2010Publication date: August 4, 2011Applicant: HERMES-EPITEK CORPORATIONInventors: Chien-Ping HUANG, Tsan-Hua HUANG, Tsung-Hsun HAN
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Publication number: 20110186228Abstract: A showerhead is disclosed in this invention. The showerhead includes a bottom portion, at least one plate, and a top portion. The bottom portion includes a plurality of gas tubes which are integratedly formed on the bottom portion. The gas tubes include at least one first gas tube. The at least one plate includes a first plate. The first plate includes a plurality of first openings, wherein the gas tubes pass through the first openings. The top portion is coupled to the bottom portion for forming at least one inner space.Type: ApplicationFiled: April 9, 2010Publication date: August 4, 2011Applicant: HERMES-EPITEK CORPORATIONInventors: Chien-Ping Huang, Tsan-Hua Huang
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Publication number: 20100055330Abstract: An epitaxy processing system and its processing method for enhancing operation efficiency is provided. The system includes a stacked cassette, a transportation device, a reaction chamber, and a cooling device. The cooling device can rapidly cool down susceptor and processed wafers without damaging the epitaxy layer. The cluster system design minimizes the footprint of system, reduces the operation cost, and increases throughput and thereby enhances the productivity of the system.Type: ApplicationFiled: August 28, 2008Publication date: March 4, 2010Applicant: Hermes Systems Inc.Inventors: Tsan-Hua Huang, Benson Chao
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Publication number: 20090211707Abstract: An apparatus for gas distribution includes a top dome-cover, a first gas distribution plate and a bottom plate bonded each other to deliver different gases onto substrates supporting by a susceptor. The first gas distribution plate is provided with a plurality of first island protrusions formed by intersecting a plurality of first channels and each first island protrusions has a bypass through hole so that different gases can be individually delivered via independent gas pathways formed by those through holes or those channels to prevent those different gases premix before processing on those substrates. Additionally, a fluid distribution plate disposed between the first gas distribution plate and the bottom plate may be adapted for heat dissipation.Type: ApplicationFiled: February 22, 2008Publication date: August 27, 2009Applicant: HERMES SYSTEMS INC.Inventors: BENSON CHAO, TSAN-HUA HUANG