Patents by Inventor Tsuyoshi Matsuda
Tsuyoshi Matsuda has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8086009Abstract: To allow the correspondence between a region having different susceptibility and a tissue structure to be easily visible, a phase change weighted image is produced by use of a phase of each pixel of phase change image data and a color bar, and an absolute value image is produced by use of an absolute value of each pixel of absolute value image data and a grayscale. Then, a phase change fused image in which the phase change weighted image and absolute value image are overlaid on each other is displayed.Type: GrantFiled: December 10, 2007Date of Patent: December 27, 2011Assignee: GE Medical Systems Global Technology Company, LLCInventors: Masaya Hirano, Tsuyoshi Matsuda, Hasnine Akter Haque
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Publication number: 20110306746Abstract: A curable silicone gel composition that is of low viscosity, exhibits good fluidity, and generates a silicone gel that exhibits good resistance to external stress and thermal stress. The composition includes (A) a specific organopolysiloxane having at least two alkenyl groups within each molecule, (B) an organohydrogenpolysiloxane having a specific branched main chain structure, containing at least three SiH groups within each molecule, and also containing at least one branch-forming unit within each molecule, and (C) a platinum-based catalyst, wherein the cured product has a penetration value of 10 to 200, and loss coefficient values at 25° C. for shear frequency values of 1 Hz and 10 Hz of 0.1 to 1.0 and 0.3 to 1.5 respectively.Type: ApplicationFiled: June 10, 2011Publication date: December 15, 2011Applicant: Shin-Etsu Chemical Co., Ltd.Inventors: Miyuki TANAKA, Kazuyasu Sato, Tsuyoshi Matsuda
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Patent number: 7872755Abstract: A double-biprism electron interferometer is an optical system which dramatically increases the degree of freedom of a conventional one-stage electron interferometer. The double biprism interferometer, however, is the same as the optical system of the single electron biprism in terms of the one-dimensional shape of an electron hologram formed by filament electrodes, the direction of an interference area, and the azimuth of the interference fringes. In other words, the longitudinal direction of the interference area is determined corresponding to the direction of the filament electrodes, and the azimuth of the interference fringes only coincides with and is in parallel with the longitudinal direction of the interference area.Type: GrantFiled: January 27, 2006Date of Patent: January 18, 2011Assignee: RikenInventors: Ken Harada, Tetsuya Akashi, Yoshihiko Togawa, Tsuyoshi Matsuda, Noboru Moriya
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Patent number: 7859263Abstract: A magnetic resonance imaging apparatus generates slice images by repeating, for a plurality of consecutive repetition times, transmitting an RF pulse to a plurality of slices and scanning the slices to acquire magnetic resonance signals generated therein, in multi-slice acquisition covering the sequential slices, the sequential slices including at least a first slice, a second slice, a third slice, and a fourth slice. In the first, second, third, and fourth slices, phases of the RF pulses are alternately reversed every consecutive repetition time, and the RF pulses are transmitted to the first, second, third, and fourth slices such that the phases of the RF pulses transmitted to the first and third slices are reversed from each other in each consecutive repetition time and such that the phases of the RF pulses transmitted to the second and fourth slices are reversed from each other in each consecutive repetition time.Type: GrantFiled: January 7, 2009Date of Patent: December 28, 2010Assignee: GE Medical Systems Global Technology Company, LLCInventors: Tsuyoshi Matsuda, Hidenori Kawai
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Patent number: 7816648Abstract: In an electron beam interference system using an electron biprism, which is capable of independently controlling each of the interference fringe spacing s and the interference width W, both of which are important parameters for an interferometer and for an interferogram acquired by the interferometer, an optical system used in a two-stage electron biprism interferometer is adopted. The optical system uses two stages of electron biprisms in an optical axis direction to give the flexibility to the relative magnification relative to a specimen image and that relative to an image of a filament electrode of the electron biprism. In addition, as a two-stage configuration in which two objective lenses (51, 52) are combined, independently controlling the focal length of each objective lens makes it possible to set the relative magnification relative to a specimen image and that relative to an image of the filament electrode of the electron biprism at arbitrary values.Type: GrantFiled: March 7, 2005Date of Patent: October 19, 2010Assignee: RikenInventors: Ken Harada, Tetsuya Akashi, Yoshihiko Togawa, Tsuyoshi Matsuda
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Patent number: 7808814Abstract: The magnetization state of a ferromagnetic material is controlled by applying a current pulse to it while externally applying a weak magnetic field to it. The magnetic state of a ferromagnetic material can be switched between a uniformly magnetized state and a multiple magnetic domain structure by controlling the direction and intensity of the magnetic field applied to it and the intensity and pulse width of the current pulse. When an external magnetic field is applied, the possibility of occurrence of the reversal of the magnetic state upon application of the current pulse shows a hysteresis, and the reversal of the magnetic state can be controlled reliably. The intensity of the magnetic field to be applied may be as weak as a few gauss. Furthermore, by using such magnetic information recording elements, a magnetic information recording device (memory) that can achieve a high degree of integration can be produced.Type: GrantFiled: July 17, 2008Date of Patent: October 5, 2010Assignee: RikenInventors: Yoshihiko Togawa, Ken Harada, Tsuyoshi Matsuda, Yoshichika Otani, Takashi Kimura
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Patent number: 7750298Abstract: An interferometer is disclosed which has upper-stage, intermediate-stage, and lower-stage electron biprisms. The disclosed interferometer operates with an azimuth angle ? among filament electrodes of the three electron biprisms to arbitrarily control an interference area and an azimuth ? of the interference fringes formed therein, eliminates Fresnel fringes generation, and allows independent control of an interference fringe spacing s and the azimuth ? of the interference fringes.Type: GrantFiled: January 27, 2006Date of Patent: July 6, 2010Assignee: RikenInventors: Ken Harada, Tetsuya Akashi, Yoshihiko Togawa, Tsuyoshi Matsuda, Noboru Moriya
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Publication number: 20100062478Abstract: The present invention is to provide a drug for analysis of a water transport function of a membrane protein in a biological tissue, wherein the abundance of one or both of 17O water molecules or 18O water molecules in the drug is greater than their abundance in natural water. Furthermore, the present invention is to provide a method of analysis of a water transport function of a membrane protein in a biological tissue, a usage of the drug for analysis of a water transport function, and a method of diagnosis diagnosing pathologies caused by abnormalities of the water transport function.Type: ApplicationFiled: March 27, 2008Publication date: March 11, 2010Inventors: Akihiko Maeda, Hiroshi Taira, Takayuki Fujimoto, Kiyoshi Nagasawa, Tsuyoshi Matsuda, Yuji Hashiguchi, Akira Nakatani
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Patent number: 7655905Abstract: Charged particle beam equipment having a rotary mechanism in which shift of the observing/machining position incident to the rotary operation of the equipment having the rotary mechanism can be corrected conveniently with high precision in a plane perpendicular to the optical axis of the optical system of charged particle beam or in a slightly inclining plane. An X-Y shift incident to rotation in a plane is determined from the angular information of a rotary mechanism such as a sample holder, diaphragms or biprisms in the charged particle beam equipment, and then driving or controlling is performed to cancel the X-Y shift.Type: GrantFiled: May 11, 2006Date of Patent: February 2, 2010Assignee: RikenInventors: Ken Harada, Tetsuya Akashi, Yoshihiko Togawa, Tsuyoshi Matsuda, Noboru Moriya
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Publication number: 20090273789Abstract: A double-biprism electron interferometer is an optical system which dramatically increases the degree of freedom of a conventional one-stage electron interferometer. The double biprism interferometer, however, is the same as the optical system of the single electron biprism in terms of the one-dimensional shape of an electron hologram formed by filament electrodes, the direction of an interference area, and the azimuth of the interference fringes. In other words, the longitudinal direction of the interference area is determined corresponding to the direction of the filament electrodes, and the azimuth of the interference fringes only coincides with and is in parallel with the longitudinal direction of the interference area.Type: ApplicationFiled: January 27, 2006Publication date: November 5, 2009Applicant: RIKENInventors: Ken Harada, Tetsuya Akashi, Yoshihiko Togawa, Tsuyoshi Matsuda, Noboru Moriya
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Publication number: 20090179641Abstract: A magnetic resonance imaging apparatus generates slice images by repeating, for a plurality of consecutive repetition times, transmitting an RF pulse to a plurality of slices and scanning the slices to acquire magnetic resonance signals generated therein, in multi-slice acquisition covering the sequential slices, the sequential slices including at least a first slice, a second slice, a third slice, and a fourth slice. In the first, second, third, and fourth slices, phases of the RF pulses are alternately reversed every consecutive repetition time, and the RF pulses are transmitted to the first, second, third, and fourth slices such that the phases of the RF pulses transmitted to the first and third slices are reversed from each other in each consecutive repetition time and such that the phases of the RF pulses transmitted to the second and fourth slices are reversed from each other in each consecutive repetition time.Type: ApplicationFiled: January 7, 2009Publication date: July 16, 2009Inventors: Tsuyoshi Matsuda, Hidenori Kawai
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Patent number: 7557808Abstract: An image processing device for realizing more realistic pictures of explosions in video game devices and the like. Objects displaying such pictures of explosions are formed of spherical polygons (R1, R2, R3, . . . ) and planar polygons (S1, S2, S3, . . . ). Pictures of explosions are realized by alternately arranging these spherical polygons and planar polygons with the lapse in time. Preferably, pictures of polygons are realized by arranging the spherical polygons in layers on the boundary of the planar polygons.Type: GrantFiled: October 31, 2007Date of Patent: July 7, 2009Assignee: Kabushiki Kaisha SegaInventors: Makoto Yamamoto, Kenji Tohma, Shinobu Hayashi, Tsuyoshi Matsuda, Yoshitaka Maeyama, Tomoya Takasugi
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Patent number: 7550388Abstract: A polishing composition contains a deterioration inhibitor for inhibiting deterioration of polishing capability of the polishing composition, an abrasive, and water. The deterioration inhibitor is at least one selected from polysaccharide and polyvinyl alcohol. The polysaccharide is starch, amylopectin, glycogen, cellulose, pectin, hemicellulose, pullulan, or elsinan. Among them, pullulan is preferable. The abrasive is at least one selected from aluminum oxide and silicon dioxide, preferably at least one selected from fumed silica, fumed alumina, and colloidal silica. The polishing composition can be suitably used in polishing for forming wiring a semiconductor device.Type: GrantFiled: March 21, 2005Date of Patent: June 23, 2009Assignee: Fujima IncorporatedInventors: Junhui Oh, Atsunori Kawamura, Tsuyoshi Matsuda, Tatsuhiko Hirano, Kenji Sakai, Katsunobu Hori
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Patent number: 7538323Abstract: The present invention provides a technique enabling to control fringe spacing s and an interference width W independently of each other, which are important parameters for an interferometer using an electron biprism. In the present invention, two electron biprisms 9u, 9b are used in two stages along the optical axis, and fringe spacing s and an interference width W are controlled independently of each other by controlling a voltage applied to an electrode of each of the electron biprisms. Also Fresnel diffraction can be suppressed.Type: GrantFiled: January 7, 2005Date of Patent: May 26, 2009Assignee: RikenInventors: Ken Harada, Tetsuya Akashi, Yoshihiko Togawa, Tsuyoshi Matsuda, Noboru Moriya
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Publication number: 20090045339Abstract: Charged particle beam equipment having a rotary mechanism in which shift of the observing/machining position incident to the rotary operation of the equipment having the rotary mechanism can be corrected conveniently with high precision in a plane perpendicular to the optical axis of the optical system of charged particle beam or in a slightly inclining plane. An X-Y shift incident to rotation in a plane is determined from the angular information of a rotary mechanism such as a sample holder, diaphragms or biprisms in the charged particle beam equipment, and then driving or controlling is performed to cancel the X-Y shift.Type: ApplicationFiled: May 11, 2006Publication date: February 19, 2009Inventors: Ken Harada, Tetsuya Akashi, Yoshihiko Togawa, Tsuyoshi Matsuda, Noboru Moriya
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Patent number: 7485162Abstract: A polishing composition of the present invention, to be used in polishing for forming wiring in a semiconductor device, includes: a specific surfactant; a silicon oxide; at least one selected from the group consisting of carboxylic acid and alpha-amino acid; a corrosion inhibitor; an oxidant; and water. This polishing composition is capable of suppressing the occurrence of the dishing.Type: GrantFiled: September 29, 2004Date of Patent: February 3, 2009Assignee: Fujimi IncorporatedInventors: Tsuyoshi Matsuda, Tatsuhiko Hirano, Junhui Oh, Atsunori Kawamura, Kenji Sakai
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Publication number: 20090021866Abstract: The magnetization state of a ferromagnetic material is controlled by applying a current pulse to it while externally applying a weak magnetic field to it. The magnetic state of a ferromagnetic material can be switched between a uniformly magnetized state and a multiple magnetic domain structure by controlling the direction and intensity of the magnetic field applied to it and the intensity and pulse width of the current pulse. When an external magnetic field is applied, the possibility of occurrence of the reversal of the magnetic state upon application of the current pulse shows a hysteresis, and the reversal of the magnetic state can be controlled reliably. The intensity of the magnetic field to be applied may be as weak as a few gauss. Furthermore, by using such magnetic information recording elements, a magnetic information recording device (memory) that can achieve a high degree of integration can be produced.Type: ApplicationFiled: July 17, 2008Publication date: January 22, 2009Applicant: RIKENInventors: Yoshihiko Togawa, Ken Harada, Tsuyoshi Matsuda, Yoshichika Otani, Takashi Kimura
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Patent number: 7471297Abstract: An image processing device for realizing more realistic pictures of explosions in video game devices as well as other devices. Objects displaying such pictures of explosions are formed of spherical polygons (R1, R2, R3, . . . ) and planar polygons (S1, S2, S3, . . . ). Pictures of explosions are realized by alternately arranging these spherical polygons and planar polygons with the lapse in time. Preferably, pictures of polygons are realized by arranging the spherical polygons in layers on the boundary of the planar polygons.Type: GrantFiled: September 30, 2005Date of Patent: December 30, 2008Assignee: Kabushiki Kaisha Sega EnterprisesInventors: Makoto Yamamoto, Kenji Tohma, Shinobu Hayashi, Tsuyoshi Matsuda, Yoshitaka Maeyama, Tomoya Takasugi
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Publication number: 20080302965Abstract: In an electron beam interference system using an electron biprism, which is capable of independently controlling each of the interference fringe spacing s and the interference width W, both of which are important parameters for an interferometer and for an interferogram acquired by the interferometer, an optical system used in a two-stage electron biprism interferometer is adopted. The optical system uses two stages of electron biprisms in an optical axis direction to give the flexibility to the relative magnification relative to a specimen image and that relative to an image of a filament electrode of the electron biprism. In addition, as a two-stage configuration in which two objective lenses (51, 52) are combined, independently controlling the focal length of each objective lens makes it possible to set the relative magnification relative to a specimen image and that relative to an image of the filament electrode of the electron biprism at arbitrary values.Type: ApplicationFiled: March 7, 2005Publication date: December 11, 2008Inventors: Ken Harada, Tetsuya Akashi, Yoshihiko Togawa, Tsuyoshi Matsuda
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Publication number: 20080292166Abstract: To allow the correspondence between a region having different susceptibility and a tissue structure to be easily visible, a phase change weighted image is produced by use of a phase of each pixel of phase change image data and a color bar, and an absolute value image is produced by use of an absolute value of each pixel of absolute value image data and a grayscale. Then, a phase change fused image in which the phase change weighted image and absolute value image are overlaid on each other is displayed.Type: ApplicationFiled: December 10, 2007Publication date: November 27, 2008Inventors: Masaya Hirano, Tsuyoshi Matsuda, Hasnine Akter Haque