Abstract: A guide pipe provided along a movement path of a wire electrode between a direction change pulley and a winding device and guiding the wire electrode has antistatic properties. A gas-liquid mixed fluid is supplied into the guide pipe. A suction nozzle passes between a pair of rollers of the winding device and is directly or indirectly connected to an outlet side of the guide pipe. The suction nozzle suctions the gas-liquid mixed fluid in the guide pipe and a tip of the wire electrode by a suction device and captures the wire electrode. The captured wire electrode is wound by the winding device.

Abstract: A liquid ejecting apparatus includes a liquid ejection head to eject liquid, a recovery unit, a housing, a discharge unit, a casing including the discharge unit and the housing, and a liquid receptacle. The recovery unit maintains liquid ejecting performance of the liquid ejection head. The housing houses a container that accommodates liquid received by the recovery unit. The discharge unit discharges the liquid received by the recovery unit to the container. The liquid receptacle is disposed below the discharge unit in a direction of gravity in the casing and includes a first groove extending in a first direction crossing the direction of gravity and a second groove extending in a second direction crossing the direction of gravity and the first direction.

Abstract: There is provided a substrate processing apparatus that includes a process chamber in which at least one substrate is processed; a gas supplier configured to supply a gas; and a buffer structure. The buffer structure includes at least two plasma generation regions in which gas is converted into plasma by a pair of electrodes connected to a high-frequency power supply and an electrode to be grounded, a first gas supply port that supplies a gas generated in a first plasma generation region among the at least two plasma generation regions, and a second gas supply port that supplies a gas generated in a second plasma generation region among the at least two plasma generation regions.

Abstract: Described herein is a technique capable of efficiently removing a foreign substance in a reaction tube. According to one aspect of the technique, there is provided a substrate processing apparatus including: a reaction tube in which a substrate is processed; and a substrate retainer including a plurality of support columns configured to support the substrate, wherein at least one among the plurality of the support columns includes: a hollow portion through which an inert gas is supplied; and a gas supply port through which the inert gas is supplied toward an inner wall of the reaction tube.

Abstract: To provide a disposable diaper enabling reduction in re-wet amount and having an excellent speed of incorporating liquid regardless of concentration and configuration of a water-absorbing agent in an absorbent material. A water-absorbing agent having excellent Gel Capillary Absorption (GCA) and Free Gel Bed Permeability (FGBP) is obtained by crushing a crosslinked hydrogel polymer obtained in a polymerization step to have a specific weight average particle diameter while fluid retention capacity and a surface tension of a water-absorbing agent are adjusted in a specific range, drying the crushed crosslinked hydrogel polymer, and then adding a liquid permeability enhancer thereto during surface crosslinking or after surface crosslinking.

Abstract: A printing apparatus includes a liquid tank unit, a printing head, and a supply tube unit. The liquid tank unit includes first and second liquid tanks that store liquid and are arranged in parallel to each other. The printing head ejects liquid from the first and second tanks while moving in a main scanning direction. The supply tube unit includes a first supply tube connecting the first liquid tank to the printing head and includes a second supply tube coupled in parallel to the first supply tube and connecting the second liquid tank to the printing head. The second supply tube transitions from a connected tube state in which the second and first supply tubes are coupled in parallel to a single tube state by being separated from the first supply tube, passes across the first supply tube, and is connected to a connection port of the second liquid tank.

Abstract: Disclosed is a recording apparatus including a tank configured to store liquid to be supplied to a recording head that ejects the liquid, the tank including an inlet port for liquid injection; a cap unit including a shaft portion and a cap configured to turn about the shaft portion between a first position at which the cap caps the inlet port and a second position at which the cap does not cap the inlet port, the shaft portion being provided to a housing that encloses the tank; and a biasing unit configured to bias the cap unit in a direction to move the cap apart from the inlet port, wherein the cap unit does not move at the second position while being biased by the biasing unit.

Abstract: A liquid storage container includes a storage portion configured to store liquid, an opening portion provided on a first surface and configured to allow injection of the liquid into the storage portion, a receiving portion consisting of the first surface and a wall disposed around the opening portion on the first surface, and a liquid holding unit configured to hold the liquid guided by a guiding portion from the liquid receiving portion to outside of the liquid receiving portion. The liquid holding unit includes a second surface different from the first surface of the liquid storage container and a flexible member.

Abstract: Crystals of the compound represented by formula (1), a method for the production thereof, and a method for producing an antibody-drug conjugate using the crystals.

Abstract: A printing apparatus includes a support member configured to support a printhead that performs printing by discharging ink to a print medium, a connecting member including a connecting portion connected to an ink introduction portion of the printhead and through which the ink introduction portion communicates with an ink supply passage via the connecting portion, a rotation member configured to hold the connecting member such that a posture of the connecting member is changeable, and configured to be supported by the support member to be rotatable between a connecting position at which the ink introduction portion and the connecting portion are connected and a connection releasing position at which the ink introduction portion and the connecting portion are not connected, and a biasing portion configured to bias the connecting member to a first posture with respect to the rotation member.

Abstract: There is provided is a technique that includes: a process chamber in which at least one substrate is processed; and at least one buffer chamber in which plasma is formed, wherein the at least one buffer chamber includes at least two application electrodes of different lengths to which high frequency electric power is applied, and a reference electrode subjected to a reference potential.

Abstract: There is provided a technique that includes a process chamber in which a substrate is processed, a substrate retainer on which a plurality of substrates are stacked in multiple stages, a plasma generator generating plasma inside the process chamber, and a magnet generating a magnetic field inside the process chamber.

Abstract: According to one aspect of the technique of the present disclosure, there is provided an electrode structure capable of generating a plasma, including: a primary electrode to which an appropriate electric potential is applied; and a secondary electrode to which a reference potential is applied, wherein an area of the primary electrode is set to be greater than an area of the secondary electrode, and the primary electrode is configured as an integrated structure.

Abstract: There is provided is a technique that includes: a process chamber in which at least one substrate is processed; and at least one buffer chamber in which plasma is formed, wherein the at least one buffer chamber includes at least two application electrodes of different lengths to which high frequency electric power is applied, and a reference electrode subjected to a reference potential.

Abstract: According to one aspect of the technique of the present disclosure, there is provided a substrate processing method including: forming a film on a substrate by performing a cycle a predetermined number of times, wherein the cycle includes: (a) supplying a source gas to the substrate; (b) supplying a plasma-excited gas containing nitrogen and hydrogen to the substrate by exciting a gas containing nitrogen and hydrogen into a plasma state; and (c) supplying a plasma-excited inert gas to the substrate by exciting an inert gas into a plasma state, wherein a pressure of a space where the substrate is present is set to be lower in (c) than in (b).

Abstract: According to the present disclosure, there is provided a technique capable of performing a substrate processing more uniformly. According to one aspect thereof, there is provided an electrode structure capable of generating a plasma, including: a first electrode group constituted by: at least one first electrode to which an electric potential is applied; at least one second electrode whose length is different from that of the first electrode and to which an electric potential is applied; and at least one third electrode to which a reference potential is applied; and a second electrode group constituted by: at least one fourth electrode to which an electric potential is applied; at least one fifth electrode whose length is different from that of the fourth electrode and to which an electric potential is applied; and at least one sixth electrode to which the reference potential is applied.

Abstract: There is provided a plasma generating device that includes a first electrode connected to a high-frequency power supply, and a second electrode to be grounded, a buffer structure configured to form a buffer chamber that accommodates the first and second electrodes wherein the first electrode and the second electrode are alternately arranged such that a number of electrodes of the first electrode and the second electrode are in an odd number of three or more in total, and wherein the second electrode is used in common for two of the first electrode being respectively adjacent to the second electrode used in common, and wherein a gas supply port that supplies gas into a process chamber is installed on a wall surface of the buffer structure.

Abstract: There is provided a plasma generating device that includes a first electrode connected to a high-frequency power supply, and a second electrode to be grounded, a buffer structure configured to form a buffer chamber that accommodates the first and second electrodes wherein the first electrode and the second electrode are alternately arranged such that a number of electrodes of the first electrode and the second electrode are in an odd number of three or more in total, and wherein the second electrode is used in common for two of the first electrode being respectively adjacent to the second electrode used in common, and wherein a gas supply port that supplies gas into a process chamber is installed on a wall surface of the buffer structure.

Abstract: There is provided a technique that includes: high-frequency power sources supplying power to plasma generators; and matchers installed between the high-frequency power sources and the plasma generators and matching load impedances of the plasma generators with output impedances of the high-frequency power sources, wherein at least one of the high-frequency power sources includes: a high-frequency oscillator; a directional coupler at a subsequent stage of the high-frequency oscillator, which extracts a part of a traveling wave component from the high-frequency oscillator and a part of a reflected wave component from the matcher; a filter removing a noise signal in the reflected wave component extracted by the directional coupler; and a power monitor measuring the reflected wave component after passing through the filter and the traveling wave component extracted by the directional coupler and feedback-controlling the matcher to reduce a ratio between the reflected wave component and the traveling wave componen

Abstract: There is provided a technique that includes: a process chamber in which a substrate is processed; a plurality of first electrodes; a plurality of second electrodes; a high-frequency power supply configured to supply a high-frequency power; a high-frequency power application plate configured to connect the plurality of first electrodes to the high-frequency power supply; and a grounding plate configured to ground the plurality of second electrodes.