Abstract: A system for identifying irregularities in behaviors of a non-human animal, the system comprising a processing circuitry configured to: provide a behavioral baseline including first information on regular behaviors of the non-human animal over a given period of time when no irregularities occur; obtain data on a series of consecutively identified behaviors of the non-human animal identified over a second period of time; perform an action upon the data not complying with the behavioral baseline, thereby indicating an irregularity in the non-human animal behavior.

Abstract: A calibrated lithographic model may be used to generate a lithographic model output based on an integrated circuit (IC) design layout. Next, at least a chemical parameter may be extracted from the lithographic model output. A calibrated defect rate model may then be used to predict a defect rate for the IC design layout based on the chemical parameter.

Abstract: In some aspects, a mask pattern is accessed. The mask pattern is for use in a lithography process that prints a pattern on a wafer. The mask pattern is applied as input to a deterministic model of the lithography process to predict a characteristic of the printed pattern. The deterministic model is deterministic, but it accounts for local stochastic variations of the characteristic in the printed pattern.

Abstract: In some aspects, a mask pattern is accessed. The mask pattern is for use in a lithography process that prints a pattern on a wafer. The mask pattern is applied as input to a deterministic model of the lithography process to predict a characteristic of the printed pattern. The deterministic model is deterministic, but it accounts for local stochastic variations of the characteristic in the printed pattern.

Abstract: Certain aspects relate to a method for improving a lithography configuration. In the lithography configuration, a source illuminates a mask to expose resist on a wafer. A processor determines a defect-based focus exposure window (FEW). The defect-based FEW is an area of depth of focus and exposure latitude for the lithography configuration with an acceptable level of defects on the wafer. The defect-based FEW is determined based on a predicted probability distribution for occurrence of defects on the wafer. A processor also determines a critical dimension (CD)-based FEW. The CD-based FEW is an area of depth of focus and exposure latitude for the lithography configuration with an acceptable level of CD variation on the wafer. It is determined based on predicted CDs on the wafer. The lithography configuration is modified based on increasing an area of overlap between the defect-based FEW and the CD-based FEW.

Abstract: A calibrated lithographic model may be used to generate a lithographic model output based on an integrated circuit (IC) design layout. Next, at least a chemical parameter may be extracted from the lithographic model output. A calibrated defect rate model may then be used to predict a defect rate for the IC design layout based on the chemical parameter.

Abstract: A drive arrangement for a motor vehicle functional part includes: a housing, in which a drive motor, a gear mechanism and an adjustor are provided at least partially; a drive shaft configured to transfer the adjustor via the gear mechanism from a closed position into an open position and vice versa; and a wrap spring arrangement comprising two wrap spring members, which act in opposite directions. The wrap spring arrangement is arranged on a gear mechanism output side, in a region of the adjustor.

Abstract: Certain aspects relate to a method for improving a lithography configuration. In the lithography configuration, a source illuminates a mask to expose resist on a wafer. A processor determines a defect-based focus exposure window (FEW). The defect-based FEW is an area of depth of focus and exposure latitude for the lithography configuration with an acceptable level of defects on the wafer. The defect-based FEW is determined based on a predicted probability distribution for occurrence of defects on the wafer. A processor also determines a critical dimension (CD)-based FEW. The CD-based FEW is an area of depth of focus and exposure latitude for the lithography configuration with an acceptable level of CD variation on the wafer. It is determined based on predicted CDs on the wafer. The lithography configuration is modified based on increasing an area of overlap between the defect-based FEW and the CD-based FEW.

Abstract: A drive arrangement for a motor vehicle functional part includes: a housing, in which a drive motor, a gear mechanism and an adjustor are provided at least partially; a drive shaft configured to transfer the adjustor via the gear mechanism from a closed position into an open position and vice versa; and a wrap spring arrangement comprising two wrap spring members, which act in opposite directions. The wrap spring arrangement is arranged on a gear mechanism output side, in a region of the adjustor.

Abstract: A compound of formula (I) of formula (II) or of formula (III) wherein R1 and R2 independently from each other are a C1- to C8-alkyl group and R3 to R12 independently from each other are a hydrogen or a C1- to C4-alkyl group.

Abstract: Solution comprising a sulfone polymer, a water-soluble polymer and a N-acyl-morpholine of formula I wherein R1 is a hydrogen atom or a C1- to C3 alkyl group.

Abstract: Solution comprising a sulfone polymer and a N-acyl-pyrrolidine of formula I wherein R1 to R9 independently from each other are a hydrogen atom or a methyl group. The solution is applied in membrane formation with polyvinylpyrrolidone as optional component.

Abstract: Cured epoxy resins are widespread because of their excellent mechanical and chemical properties. Typically, epoxy resins based on bisphenol A diglycidyl ethers or bisphenol F diglycidyl ethers are used, but these are problematic for many sectors because of their effect on the endocrine system. The present invention relates to glycidyl ethers of limonene-based diols and/or polyols, and to curable epoxy resin compositions based thereon as alternatives to the bisphenol A diglycidyl ethers or bisphenol F diglycidyl ethers, or the epoxy resin compositions based thereon.

Abstract: Solutions of polyvinylidene fluoride (PVDF) or copolymers of 1,1-difluoroethylene in a solvent which comprises N-formylmorpholine (NFM), N-acetylmorpholine (NAM) or mixtures thereof and additionally a cosolvent selected from alkylene carbonate, mono-, di- or polyalkylene glycol dialkyl ethers or mixtures thereof.

Abstract: The present invention relates to N-acylmorpholines as solvents for use in processes for preparing polymer dispersions.

Abstract: Cured epoxy resins are widespread because of their excellent mechanical and chemical properties. Typically, epoxy resins based on bisphenol A diglycidyl ethers or bisphenol F diglycidyl ethers are used, but these are problematic for many sectors because of their effect on the endocrine system. The present invention relates to glycidyl ethers of divinylbenzene-based diols and/or polyols, and to curable epoxy resin compositions based thereon as alternatives to the bisphenol A diglycidyl ethers or bisphenol F diglycidyl ethers, or the epoxy resin compositions based thereon.

Abstract: Cured epoxy resins are widespread because of their excellent mechanical and chemical properties. Typically, epoxy resins based on bisphenol A diglycidyl ethers or bisphenol F diglycidyl ethers are used, but these are problematic for many sectors because of their effect on the endocrine system. The present invention relates to glycidyl ethers of limonene-based diols and/or polyols, and to curable epoxy resin compositions based thereon as alternatives to the bisphenol A diglycidyl ethers or bisphenol F diglycidyl ethers, or the epoxy resin compositions based thereon.

Abstract: Insecticide-impregnated nets made of textile fibers, which nets have a small mesh size, and their use for the protection against pests.

Abstract: Cured epoxy resins are widespread on account of their outstanding mechanical and chemical properties. It is common to use epoxy resins based on bisphenol A diglycidyl ether or bisphenol F diglycidyl ether, but for many sectors these are problematic because of their endocrine effect. The present invention relates to 2-phenyl-1,3-propanediol diglycidyl ether derivates and to curable epoxy resin compositions based thereon, as alternatives to the bisphenol A or bisphenol F diglycidyl ethers and to the epoxy resin compositions based thereon.

Abstract: The invention includes a method and apparatus for managing a system specification. The method includes identifying a first system specification defined at a first refinement level where the first system specification includes specification data, generating a second system specification at a second refinement level where the second system specification inherits the specification data of the first system specification, modifying the inherited specification data of the second system specification, and storing the second system specification including the modified specification data.