Abstract: A measurement assembly (12) for measuring a feature (14A) on a surface (16) includes a metrology system (18), a mover assembly (19), a pointer (22), and a control system (24). The metrology system (18) generates a measurement beam (26), and the mover assembly (19) selectively adjusts the direction of the measurement beam (26). The pointer (22) is handheld and generates a pointer beam (34) that can be selectively directed at the surface (16) to form a pointer spot (36) on the surface (16). Further, the control system (24) controls the mover assembly (19) to move the direction of the measurement beam (26) until the measurement beam (26) is approximately directed at the pointer spot (36).

Abstract: An immersion lithography apparatus includes (i) an optical assembly including an optical element, and configured to project a beam onto a substrate through an immersion liquid; (ii) a containment member that surrounds a path of the beam; and (iii) a stage on which the substrate is held, the substrate on the stage being moved below and spaced from a bottom surface of the containment member. The containment member includes: (1) a nozzle outlet via which water as the immersion liquid is released, (2) a recovery channel via which the immersion liquid is recovered from a gap between the containment member and the substrate and/or the stage, and (3) a fluid channel via which water is released to the gap between the containment member and the substrate and/or the stage, the fluid channel being provided radially inward of the recovery channel.

Abstract: A lithographic projection apparatus includes a projection system having a last element, by which an exposure light is projected onto an upper surface of a wafer through liquid locally covering a portion of the upper surface of the wafer. The last element has a lower surface from which the exposure light is emitted. The last element also has an outer surface which extends upwardly from an edge portion of the lower surface. The apparatus also includes a space along the outer surface of the last element, to which the liquid is supplied from above the lower surface of the last element. The space is defined by the outer surface of the last element and a surface opposing the outer surface of the last element.

Abstract: A liquid immersion lithography apparatus includes a projection system, an opening from which liquid is supplied to a space under the projection system, the opening being connectable to a liquid source via a flow passage to supply the liquid to the space and the opening being connectable to a vacuum source via the flow passage, and a holding member by which a substrate is held, the holding member being movable below the projection system and the opening. The substrate held by the holding member is exposed through the liquid that is supplied from the opening and that covers only a portion of an upper surface of the substrate.

Abstract: A lithographic projection apparatus that is arranged to project a pattern from a patterning device onto a substrate using a projection system has a liquid supply system arranged to supply a liquid to a space between the projection system and the substrate. The apparatus also includes a liquid collecting system that includes a liquid collection member having a permeable member through which a liquid is collected from a surface of an object opposite to the liquid collection member, wherein the permeable member has a plurality of passages that generate a capillary force.

Abstract: A lithographic projection apparatus includes a projection system having a last element from which an exposure light is projected onto a wafer through liquid in a space under the last element. A light incident surface of the last element has a convex shape. A liquid retaining member is disposed adjacent to a surface of the last element through which the exposure light does not pass. The liquid retaining member has an undersurface under which liquid is retained. A gap is formed between the liquid retaining member and the surface of the last element, the gap being in fluidic communication with the space. The liquid is retained between the last element and the undersurface of the liquid retaining member on one side and an upper surface of the wafer on the other side. The liquid locally covers a portion of the upper surface of the wafer.

Abstract: Boresight and other pointing errors are detected based on a monitor beam formed by diverting a portion of a probe beam. The monitor beam is directed to a position sensitive photodetector, and the optical power received at the position sensitive photodetector is used to estimate or correct such pointing errors.

Abstract: A lithographic projection apparatus includes a projection system having a last element from which an exposure light is projected onto a wafer through liquid in a space under the last element. A light incident surface of the last element has a convex shape. A liquid retaining member is disposed adjacent to a surface of the last element through which the exposure light does not pass. The liquid retaining member has an undersurface under which liquid is retained. A gap is formed between the liquid retaining member and the surface of the last element, the gap being in fluidic communication with the space. The liquid is retained between the last element and the undersurface of the liquid retaining member on one side and an upper surface of the wafer on the other side. The liquid locally covers a portion of the upper surface of the wafer.

Abstract: A measurement assembly (12) for measuring a feature (14A) on a surface (16) includes a metrology system (18), a mover assembly (19), a pointer (22), and a control system (24). The metrology system (18) generates a measurement beam (26), and the mover assembly (19) selectively adjusts the direction of the measurement beam (26). The pointer (22) is handheld and generates a pointer beam (34) that can be selectively directed at the surface (16) to form a pointer spot (36) on the surface (16). Further, the control system (24) controls the mover assembly (19) to move the direction of the measurement beam (26) until the measurement beam (26) is approximately directed at the pointer spot (36).

Abstract: A lithographic projection apparatus includes a projection system having a spherical lens element from which an exposure light is projected through liquid in a space under the spherical lens element, a member disposed adjacent to a surface of the spherical lens element through which the exposure light does not pass, and a gap formed between the member and the surface of the spherical lens element. The gap communicates with the space and includes lower and upper portions. A wafer is moved below and relative to the spherical lens element and the member, and the liquid is retained between the spherical lens element and the member on one side and an upper surface of the wafer on the other side. The liquid locally covers a portion of the upper surface of the wafer to expose the wafer by projecting the exposure light onto the wafer through the liquid in the space.

Abstract: A metrology system that uses a plurality of photo-detecting targets positioned on the objects to be assembled, a plurality of rotating photo-emitting heads, a master signal generator that generates a reference RF signal, and a signal processor that determines the position of each of the targets from signals generated by each target in response to the photo-emitting heads. During operation, the reference RF signal is broadcast to the rotating photo-emitting heads and the photo-detecting targets. The RF signal is used to determine the azimuth of the heads relative to a zero reference position to a high degree of accuracy.

Abstract: Optical systems suitable for use as or in laser radar systems and other uses include a beam-forming unit, a beam-scan unit, and a controller. The beam-forming unit includes a first optical element, and the beam-scan unit includes a second optical element. The first optical element is movable to shape and direct a substantially collimated optical beam along a nominal propagation axis to a target, and the second optical element includes at least one movable beam deflector that moves the optical beam in a scanning manner relative to the nominal propagation axis. The controller is coupled to the beam-forming unit and beam-scan unit, and is configured to induce movement of the first optical element required for shaping and directing the optical beam along the nominal propagation axis and to induce independent motion of the beam deflector of the second optical element as required to scan the optical beam relative to the nominal propagation axis. The beam deflector can be refractive or reflective.

Abstract: An immersion lithography apparatus and cleanup method used for the immersion lithography apparatus in which an immersion liquid is supplied to a gap between an optical element of a projection optics and a workpiece during an immersion lithography process. A surface of an object, which is different from the workpiece, is provided below the optical element, a supply port and a recovery port. During a cleanup process, a cleaning liquid is supplied onto the object such that the cleaning liquid covers only a portion of the surface of the object.

Abstract: A target (16) for a metrology system (10) that monitors the position of an object (12) includes a target housing (225) and a photo detector assembly (226). The target housing (225) can include a first target surface (218A), and a second target surface (218B) that is at an angle relative to the first target surface (218A). The photo detector assembly (226) can include a first detector (220A) that is secured to the first target surface (218A), and a second detector (220B) that is secured to the second target surface (218B). Each of the detectors (220A) (220B) can be a quad cell that includes four detector cells (238A) (238B) (238C) (238D) that are separated by a gap (236).

Abstract: An exposure apparatus exposes a substrate by radiating a light onto the substrate through an optical assembly and a liquid provided on the substrate. The exposure apparatus includes a stage assembly which is movable relative to the optical assembly, the stage assembly including a support which supports the substrate, a first subregion which substantially encircles the support, and a second subregion which substantially encircles the first subregion. The first subregion includes a first surface having a first characteristic and the second subregion includes a second surface having a second characteristic which is different from the first characteristic.

Abstract: An exposure apparatus for transferring an image to a device includes an optical assembly, an immersion fluid system, and a device stage assembly. The optical assembly is positioned so that there is a gap above the device. The immersion fluid system fills the gap with an immersion fluid. The device stage assembly includes a sloped region that facilitates movement of the immersion fluid that exits the gap away from the device. The device stage assembly can include a collection region and a recovery system that recovers immersion fluid from the collection region.

Abstract: A lithographic projection apparatus includes a projection system having a spherical lens element from which an exposure light is projected through liquid in a space under the spherical lens element, a member disposed adjacent to a surface of the spherical lens element through which the exposure light does not pass, and a gap formed between the member and the surface of the spherical lens element. The gap communicates with the space and includes lower and upper portions. A wafer is moved below and relative to the spherical lens element and the member, and the liquid is retained between the spherical lens element and the member on one side and an upper surface of the wafer on the other side. The liquid locally covers a portion of the upper surface of the wafer to expose the wafer by projecting the exposure light onto the wafer through the liquid in the space.

Abstract: A metrology system that uses multiple rotating receiving heads and either (i) photo-emitting targets or (ii) passive retro-reflector targets. In either case, each receiver head includes a pair of slit-shaped field view collectors, at opposing degrees, relative to the axis of rotation of the head. As each head rotates, radiation either generated by or reflected off the targets, passes through slit-shaped field view collectors and onto photo-detectors. A signal processor couple to each of the rotating heads determines the relative position and height of each of the targets based on the signals generated by the photo-detectors.

Abstract: A metrology system that uses a plurality of photo-detecting targets positioned on the objects to be assembled, a plurality of rotating photo-emitting heads, a master signal generator that generates a reference RF signal, and a signal processor that determines the position of each of the targets from signals generated by each target in response to the photo-emitting heads. During operation, the reference RF signal is broadcast to the rotating photo-emitting heads and the photo-detecting targets. The RF signal is used to determine the azimuth of the heads relative to a zero reference position to a high degree of accuracy.

Abstract: A liquid immersion lithography apparatus includes a stage on which a wafer is held. A projection system projects a pattern image to an exposure region through an immersion liquid to expose the wafer on the stage. A plurality of supply openings are arranged to surround the exposure region, via which the liquid is supplied from above the exposure region. A plurality of recovery openings are arranged to surround the exposure region, via which the liquid is collected from above the exposure region. A part of the supply openings are selected so as to supply the liquid ahead of the exposure region in a direction in which the stage moves.