Abstract: A lithographic projection apparatus includes an optical element through which a substrate is exposed with an exposure beam. A space between the optical element and the substrate is filled with liquid during the exposure. A gap is formed between a member and a surface of the optical element through which the exposure beam does not pass. The liquid is supplied to the gap.

Abstract: An exposure apparatus (10) for transferring a mask pattern (452) from a mask (12) to a substrate (14) includes an illumination system (18), a mask stage assembly (22), a substrate stage assembly (24), and a control system (28). The substrate (14) includes a first site (1) and a second site (2) that are adjacent to each other and that are aligned with each other along a first axis. The illumination system (18) generates an illumination beam (35) that is directed at the mask (12). The mask stage assembly (22) retains and positions the mask (12) relative to the illumination beam (35). The substrate stage assembly (24) retains and positions the substrate (14). The control system (28) controls the illumination system (18) and the substrate stage assembly (24) so that the mask pattern (452) is sequentially transferred to the first site (1) and then the second site (2) while the substrate stage assembly (24) is moving the substrate (24) in a first mask direction along the first axis.

Abstract: A new and useful imaging concept is provided that is designed to improve the manner in which control information for an imaging optical system such as a lithographic imaging optical system can be generated. An imaging optical system comprises imaging optics defining a primary optical path along which a primary image is imaged, and a measurement optical path is established and includes at least part of the primary optical path. The imaging optical system is configured to obtain information from the measurement optical path for use in providing control information for the imaging optical system. Such a system is particularly useful for measuring the topography of a large region of the surface under investigation, like the entire instantaneous field of a wafer, instead being limited to a small patch or set of patches.

Abstract: A lithographic projection apparatus includes an optical element through which a substrate is exposed with an exposure beam. A space between the optical element and the substrate is filled with liquid during the exposure. In addition, a gap is formed between a member and a surface, through which the exposure beam does not pass, of the optical element. A suction is provided to the gap.

Abstract: A method and system is provided that takes advantage of the atmospheric transmission properties of the Hydrogen Lyman-? radiation line (121.6 nm wavelength) to illuminate a sample with high energy VUV photons at least partially in an atmospheric environment. Thus, according to the principles of the present invention, a sample is illuminated by radiation at the Hydrogen Lyman-? radiation line (121.6 nm wavelength), at least partially in an atmospheric environment, and luminescent radiation from the sample at longer wavelengths is detected. The high energy illuminating photons generate luminescent radiation from the sample at longer wavelengths, typically in the visible wavelength range, and this radiation can then be imaged, e.g. with a normal visible microscope.

Abstract: Actuator arrays for use in adaptive-optical elements and optical systems containing at least one such element are disclosed. The actuator arrays provide more precise control of the shape of the adaptive-optical surface while utilizing fewer actuators than conventional systems. An adaptive-optical system of an embodiment includes an array of force devices coupled to a deformable optical surface. The force devices of the array are arranged in braking groups and force-altering groups such that each force device belongs to a respective combination of braking group and force-altering group. A respective force controller is coupled to the force devices of each force-altering group, and a respective braking controller is coupled to the force devices of each braking group.

Abstract: An immersion lithography apparatus and a cleanup method used for the immersion lithography apparatus in which an immersion liquid is supplied from a liquid supply member to a gap between an optical element of a projection optics and a workpiece during an immersion lithography process. A surface of an object, which is different from the workpiece, is provided such that the surface of the object and the optical element are opposite to each other. During a cleanup process, a cleaning liquid is supplied from the liquid supply member onto the surface of the object.

Abstract: An autofocus unit is provided to an immersion lithography apparatus in which a fluid is disposed over a target surface of a workpiece and an image pattern is projected onto this target surface through the fluid. The autofocus unit has an optical element such as a projection lens disposed opposite and above the target surface. An autofocus light source is arranged to project a light beam obliquely at a specified angle such that this light beam passes through the fluid and is reflected by the target surface of the workpiece at a specified reflection position that is below the optical element. A receiver receives and analyzes the reflected light. Correction lenses may be disposed on the optical path of the light beam for correcting propagation of the light beam.

Abstract: An immersion lithography apparatus and cleanup method used for the immersion lithography apparatus in which an immersion liquid is supplied to a gap between an optical element of a projection optics and a workpiece during an immersion lithography process. A surface of an object, which is different from the workpiece, is provided below the optical element, a supply port and a recovery port. During a cleanup process, a cleaning liquid is supplied onto the object such that the cleaning liquid covers only a portion of the surface of the object.

Abstract: A lithographic apparatus includes a substrate table on which a substrate is held, a projection system including a final optical element, the projection system projecting a patterned beam of radiation through an immersion liquid onto the substrate adjacent the final optical element to expose the substrate during an immersion lithography process, and a liquid supply system including an inlet. The liquid supply system supplies the immersion liquid during the immersion lithography process and supplies a cleaning liquid, which is different from the immersion liquid, during a cleanup process. The cleanup process and the immersion lithography process are performed at different times.

Abstract: An immersion lithography apparatus has a reticle stage arranged to retain a reticle, a working stage arranged to retain a workpiece, and an optical system including an illumination source and an optical element opposite the workpiece for having an image pattern of the reticle projected by radiation from the illumination source. A gap is defined between the optical element and the workpiece, and a fluid-supplying device serves to supply an immersion liquid into this gap such that the supplied immersion liquid contacts both the optical element and the workpiece during an immersion lithography process. A cleaning device is incorporated for removing absorbed liquid from the optical element during a cleanup process. The cleaning device may make use of a cleaning liquid having affinity to the absorbed liquid, heat, a vacuum condition, ultrasonic vibrations or cavitating bubbles for the removal of the absorbed liquid.

Abstract: A liquid immersion lithography apparatus includes a projection system having a last element. The projection system projects an image onto a workpiece to expose the workpiece through a liquid filled in a space between the last element and the workpiece. A liquid supply device includes a supply inlet that supplies the liquid from the supply inlet to the space between the workpiece and the last element during the exposure. The last element includes an optical element and a plate. The plate prevents the degradation of the optical element that may be affected by contact with the liquid.

Abstract: An edge shot (“ES”) exposure apparatus (14) for transferring edge features (ef) to a substrate edge region (222) of a substrate (18) includes a feature transferer (55), and an ES wafer stage assembly (62). The feature transferer (55) transfers one or more edge features (ef) to the substrate edge region (222), while the ES wafer stage assembly (62) rotates the substrate (18) about a substrate axis (23). This allows the feature transferer (55) to transfer the edge features (ef) to a plurality of alternative locations in the substrate edge region (222). The ES exposure apparatus (14) can be used in conjunction with a primary exposure apparatus (12) that transfers usable features (uf) to a substrate usable region (220) of the substrate (18). With this design, the primary exposure apparatus (12) can be transferring usable features (uf) to a first substrate (18A) while the ES exposure apparatus (14) is transferring edge features (ef) to a second substrate (18B).

Abstract: An immersion lithography system that compensating for any displacement of the optical caused by the immersion fluid. The system includes an optical assembly (14) to project an image defined by the reticle (12) onto the wafer (20). The optical assembly includes a final optical element (16) spaced from the wafer by a gap (24). An immersion element (22) is provided to supply an immersion fluid into the gap and to recover any immersion fluid that escapes the gap. A fluid compensation system is provided for the force on the final optical element of the optical assembly caused by pressure variations of the immersion fluid. The resulting force created by the varying pressure may cause final optical element to become displaced. The fluid compensation system is configured to provide a substantially equal, but opposite force on the optical assembly, to prevent the displacement of the final optical element.

Abstract: Reticle and/or wafer stage interferometers are mounted to a supporting body that is separate from the body that supports the projection optical system of a lithography apparatus. This enables the size of the body supporting the projection optical system to be reduced so that it has more favorable dynamic characteristics.

Abstract: A liquid jet and recovery system for an immersion lithography apparatus has arrays of nozzles arranged to have their openings located proximal to an exposure region through which an image pattern is projected onto a workpiece such as a wafer. These nozzles are each adapted to serve selectively either as a source nozzle for supplying a fluid into the exposure region or as a recovery nozzle for recovering the fluid from the exposure region. A fluid controlling device functions to cause nozzles on selected one or more sides of the exposure region to serve as source nozzles and to cause nozzles on selected one or more of the remaining sides to serve as recovery nozzles such that a desired flow pattern can be established for the convenience of immersion lithography.

Abstract: An exposure apparatus for transferring an image to a device includes an optical assembly, an immersion fluid system, and a device stage assembly. The optical assembly is positioned so that there is a gap above the device. The immersion fluid system fills the gap with an immersion fluid. The device stage assembly includes a sloped region that facilitates movement of the immersion fluid that exits the gap away from the device. The device stage assembly can include a collection region and a recovery system that recovers immersion fluid from the collection region.

Abstract: An autofocus unit is provided to an immersion lithography apparatus in which a fluid is disposed over a target surface of a workpiece and an image pattern is projected onto this target surface through the fluid. The autofocus unit has an optical element such as a projection lens disposed opposite and above the target surface. An autofocus light source is arranged to project a light beam obliquely at a specified angle such that this light beam passes through the fluid and is reflected by the target surface of the workpiece at a specified reflection position that is below the optical element. A receiver receives and analyzes the reflected light. Correction lenses may be disposed on the optical path of the light beam for correcting propagation of the light beam.

Abstract: An image apparatus (10) for providing an adjusted image (242) of a scene (236) includes a capturing system (16) and a control system (24). The capturing system (16) captures an underexposed first frame (240) that is defined by a plurality of pixels (240A), including a first pixel and a second pixel. The first frame (240) includes at least one of a first texture region (240S) and a second texture region (240T). The control system (24) can analyze information from the pixels (240A) and determine if the first pixel has captured a portion of the first texture region (240S) or the second texture region (240T). Further, the control system (16) can analyze information from the pixels (240A) and to determine if the second pixel has captured a portion of the first texture region (240S) or the second texture region (240T). With this design, the control system (16) can reduce the noise in the first frame (240) to provide a well exposed adjusted image (242).

Abstract: A camera (210) for providing an adjusted image (214) of a scene (12) includes an apparatus frame (224), an optical assembly (222), a capturing system (226), and a control system (232). The optical assembly (222) is adjustable to alternatively be focused on a first focal area (356A) and a second focal area (356B) that is different than the first focal area (356A). The capturing system (226) captures a first captured image (360A) when the optical assembly (222) is focused at the first focal area (356A) and captures a second captured image (360B) when the optical assembly (222) is focused at the second focal area (356B). The control system (232) provides the adjusted image (214) of the scene (12) based upon the first captured image (360A) and the second captured image (360B). Additionally, the control system (232) can perform object depth extraction of one or more objects (16) (18) (20) in the scene (12).