Patents by Inventor Wei Fang

Wei Fang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11756187
    Abstract: Systems and methods for optimal electron beam metrology guidance are disclosed. According to certain embodiments, the method may include receiving an acquired image of a sample, determining a set of image parameters based on an analysis of the acquired image, determining a set of model parameters based on the set of image parameters, generating a set of simulated images based on the set of model parameters. The method may further comprise performing measurement of critical dimensions on the set of simulated images and comparing critical dimension measurements with the set of model parameters to provide a set of guidance parameters based on comparison of information from the set of simulated images and the set of model parameters. The method may further comprise receiving auxiliary information associated with target parameters including critical dimension uniformity.
    Type: Grant
    Filed: January 3, 2022
    Date of Patent: September 12, 2023
    Assignee: ASML Netherlands B.V.
    Inventors: Lingling Pu, Wei Fang, Nan Zhao, Wentian Zhou, Teng Wang, Ming Xu
  • Patent number: 11756182
    Abstract: A pattern grouping method may include receiving an image of a first pattern, generating a first fixed-dimensional feature vector using trained model parameters applying to the received image, and assigning the first fixed-dimensional feature vector a first bucket ID. The method may further include creating a new bucket ID for the first fixed-dimensional feature vector in response to determining that the first pattern does not belong to one of a plurality of buckets corresponding to defect patterns, or mapping the first fixed-dimensional feature vector to the first bucket ID in response to determining that the first pattern belongs to one of a plurality of buckets corresponding to defect patterns.
    Type: Grant
    Filed: July 10, 2019
    Date of Patent: September 12, 2023
    Assignee: ASML Netherlands B.V.
    Inventors: Wei Fang, Zhaohui Guo, Ruoyu Zhu, Chuan Li
  • Publication number: 20230282753
    Abstract: A semiconductor device includes a silicon germanium channel, a germanium-free interfacial layer, a high-k dielectric layer, and a metal gate electrode. The silicon germanium channel is over a substrate. The germanium-free interfacial layer is over the silicon germanium channel. The germanium-free interfacial layer is nitridated. The high-k dielectric layer is over the germanium-free interfacial layer. The metal gate electrode is over the high-k dielectric layer.
    Type: Application
    Filed: May 12, 2023
    Publication date: September 7, 2023
    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Chih-Yu CHANG, Hsiang-Pi CHANG, Zi-Wei FANG
  • Publication number: 20230275090
    Abstract: A semiconductor device includes a first cell in a first row, wherein the first row extends in a first direction, the first cell having a first cell height measured in a second direction perpendicular to the first direction. The semiconductor device further includes a second cell in the first row, wherein the second cell has a second cell height measured in the second direction, the second cell height is less than the first cell height. The second cell includes a first active region having a first width measured in the second direction, and a second active region having a second width measured in the second direction, wherein the second width is different from the first width.
    Type: Application
    Filed: June 10, 2022
    Publication date: August 31, 2023
    Inventors: Jiann-Tyng TZENG, Kam-Tou SIO, Shang-Wei FANG, Chun-Yen LIN, Sheng-Feng HUANG, Yi-Kan CHENG, Lee-Chung LU
  • Patent number: 11723360
    Abstract: By determining the lethality rate to Meloidogyne incognita and Caenorhabditis elegans, it was found that the methylmalonic acid has a better nematicidal effect on the Caenorhabditis elegans, with the LC50 being 13.11 and 1.20 for the Meloidogyne incognita and the Caenorhabditis elegans, respectively. After compounding the methylmalonic acid with betaine, the LC50 was 2.85 and 0.27 for the Meloidogyne incognita and the Caenorhabditis elegans, respectively. Meanwhile, the methylmalonic acid also has an inhibiting effect on Pseudomonas solanacearum and Erwinia carotovora. The preparation of the methylmalonic acid provides a new choice for preparing novel biocontrol agents against the root-knot nematodes.
    Type: Grant
    Filed: September 30, 2020
    Date of Patent: August 15, 2023
    Assignee: Hubei Biopesticide Engineering Research Center
    Inventors: Xiaoyan Liu, Wei Fang, Yong Min, Daye Huang, Ronghua Zhou, Guangyang Zhang, Ben Rao, Xianqing Liao, Fang Liu, Wei Chen, Kaimei Wang, Ziwen Yang, Liqiao Shi
  • Publication number: 20230253403
    Abstract: An integrated circuit device includes: a first fin structure disposed on a substrate in a first direction; a second fin structure disposed on the substrate and aligned in the first direction; a third fin structure disposed on the substrate and aligned in the first direction; and a first conductive line aligned in a second direction arranged to wrap a first portion, a second portion, and a third portion of the first fin structure, the second fin structure and the third fin structure, respectively. Each of the first fin structure, the second fin structure and the third fin structure has a same type dopant. A first distance between the first fin structure and the second fin structure is different from a second distance between the second fin structure and the third fin structure.
    Type: Application
    Filed: April 18, 2023
    Publication date: August 10, 2023
    Inventors: KAM-TOU SIO, SHANG-WEI FANG, JIANN-TYNG TZENG, CHEW-YUEN YOUNG
  • Patent number: 11720030
    Abstract: Systems and methods for conducting critical dimension metrology are disclosed. According to certain embodiments, a charged particle beam apparatus generates a beam for imaging a first area and a second area. Measurements are acquired corresponding to a first feature in the first area, and measurements are acquired corresponding to a second feature in the second area. The first area and the second area are at separate locations on a sample. A combined measurement is calculated based on the measurements of the first feature and the measurements of the second feature.
    Type: Grant
    Filed: October 26, 2021
    Date of Patent: August 8, 2023
    Assignee: ASML Netherlands B.V.
    Inventors: Fei Wang, Wei Fang, Kuo-Shih Liu
  • Patent number: 11716894
    Abstract: A method for preparing a perovskite solar cell is disclosed, which comprises the following steps: providing a first electrode; forming an active layer on the first electrode; and forming a second electrode on the active layer. Herein, the active layer can be prepared by the following steps: mixing a perovskite precursor and a solvent mixture to form a precursor solution, wherein the solvent mixture comprises a first solvent and a second solvent, the first solvent is selected from the group consisting of ?-butyrolactone (GBL), dimethyl sulfoxide (DMSO), 2-methylpyrazine (2-MP), dimethylformamide (DMF), 1-methyl-2-pyrrolidone (NMP), dimethylacetamide (DMAc) and a combination thereof, and the second solvent is an alcohol; and coating the first electrode with the precursor solution and heating the precursor solution to form the active layer.
    Type: Grant
    Filed: July 21, 2021
    Date of Patent: August 1, 2023
    Assignee: NATIONAL TAIWAN UNIVERSITY
    Inventors: Wei-Fang Su, Shih-Han Huang, Yu-Ching Huang
  • Publication number: 20230230208
    Abstract: Described herein is a method for training a denoising model. The method includes obtaining a first set of simulated images based on design patterns. The simulated images may be clean and can be added with noise to generate noisy simulated images. The simulated clean and noisy images are used as training data to generate a denoising model.
    Type: Application
    Filed: January 13, 2023
    Publication date: July 20, 2023
    Applicant: ASML Netherlands B.V.
    Inventors: Hairong LEI, Wei FANG
  • Patent number: 11705507
    Abstract: A semiconductor device includes a semiconductor substrate, a semiconductor fin extending from the semiconductor substrate, a gate structure extending across the semiconductor fin, and source/drain semiconductor layers on opposite sides of the gate structure. The source/drain semiconductor layers each have a first thickness over a top side of the semiconductor fin and a second thickness over a lateral side of the semiconductor fin. The first thickness and the second thickness have a difference smaller than about 20 percent of the first thickness.
    Type: Grant
    Filed: May 28, 2021
    Date of Patent: July 18, 2023
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Yao-Sheng Huang, Hung-Chang Sun, I-Ming Chang, Zi-Wei Fang
  • Patent number: 11694312
    Abstract: An improved method and apparatus for enhancing an inspection image in a charged-particle beam inspection system. An improved method for enhancing an inspection image comprises acquiring a first image and a second image of multiple stacked layers of a sample that are taken with a first focal point and a second focal point, respectively, associating a first segment of the first image with a first layer among the multiple stacked layers and associating a second segment of the second image with a second layer among the multiple stacked layers, updating the first segment based on a first reference image corresponding to the first layer and updating the second segment based on a second reference image corresponding to the second layer, and combining the updated first segment and the updated second segment to generate a combined image including the first layer and the second layer.
    Type: Grant
    Filed: May 5, 2021
    Date of Patent: July 4, 2023
    Assignee: ASML Netherlands B.V.
    Inventors: Wei Fang, Ruochong Fei, Lingling Pu, Wentian Zhou, Liangjiang Yu, Bo Wang
  • Patent number: 11688812
    Abstract: A method includes following steps. A silicon germanium layer is formed on a substrate. A surface layer of the silicon germanium layer is oxidized to form an interfacial layer comprising silicon oxide and germanium oxide. The interfacial layer is nitridated. A metal gate structure is formed over the nitridated interfacial layer.
    Type: Grant
    Filed: June 3, 2021
    Date of Patent: June 27, 2023
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Chih-Yu Chang, Hsiang-Pi Chang, Zi-Wei Fang
  • Publication number: 20230198892
    Abstract: A method for sending a multicast packet provided in embodiments of this application includes: a first network device obtains a first multicast packet, where the first multicast packet includes a bit string bit string and an identifier of a network slice, the bit string corresponds to a second network device, and the network slice corresponds to a multicast service of the second network device. The first network device obtains, based on the bit string and the identifier of the network slice, a first interface corresponding to the network slice. The first network device sends the first multicast packet to the second network device by using the first interface.
    Type: Application
    Filed: February 13, 2023
    Publication date: June 22, 2023
    Inventors: Shuying Liu, Ting Liao, Wei Fang, Rui Gu, Jingrong Xie, Xuesong Geng
  • Patent number: 11681279
    Abstract: Embodiments of the present disclosure provide systems and methods for enhancing the semiconductor manufacturing yield. Embodiments of the present disclosure provide a yield improvement system. The system comprises a training tool configured to generate training data based on receipt of one or more verified results of an inspection of a first substrate. The system also comprises a point determination tool configured to determine one or more regions on a second substrate to inspect based on the training data, weak point information for the second substrate, and an exposure recipe for a scanner of the second substrate.
    Type: Grant
    Filed: August 14, 2017
    Date of Patent: June 20, 2023
    Assignee: ASML Netherlands B.V.
    Inventor: Wei Fang
  • Publication number: 20230185280
    Abstract: An integrated circuit (IC) configurable to perform adaptive thermal ceiling control in a per-functional-block manner, an associated main circuit, an associated electronic device and an associated thermal control method are provided. The IC may include a plurality of hardware circuits arranged to perform operations of a first functional block, and at least one thermal control circuit. At least one temperature sensor is coupled with the first functional block to detect temperature and to generate at least one temperature sensing result of the first functional block.
    Type: Application
    Filed: November 23, 2022
    Publication date: June 15, 2023
    Applicant: MEDIATEK INC.
    Inventors: Chih-Fu Tsai, Yu-Chia Chang, Bo-Jiun Yang, Yen-Hwei Hsieh, Shun-Yao Yang, Jia-Wei Fang, Ta-Chang Liao, Tai-Yu Chen
  • Patent number: 11664186
    Abstract: The present invention provides an apparatus of electron beam comprising an electron gun with a pinnacle limiting plate having at least one current-limiting aperture. The pinnacle limiting plate is located between a bottom (or lowest) anode and a top (or highest) condenser within the electron gun. A current (ampere) of the electron beam that has passed through the current-limiting aperture remains the same (unchanged) after the electron beam travels through the top condenser and an electron optical column and arrives at a sample space. Electron-electron interaction of the electron beam is thus reduced.
    Type: Grant
    Filed: August 7, 2022
    Date of Patent: May 30, 2023
    Assignee: BORRIES PTE. LTD.
    Inventors: Zhongwei Chen, Wei Fang, Xiaoming Chen, Daniel Tang, Liang-Fu Fan
  • Patent number: 11658182
    Abstract: An integrated circuit device includes: a first fin structure disposed on a substrate in a first direction; a second fin structure disposed on the substrate and aligned in the first direction; a third fin structure disposed on the substrate and aligned in the first direction; and a first conductive line aligned in a second direction arranged to wrap a first portion, a second portion, and a third portion of the first fin structure, the second fin structure and the third fin structure, respectively. Each of the first fin structure, the second fin structure and the third fin structure has a same type dopant. A first distance between the first fin structure and the second fin structure is different from a second distance between the second fin structure and the third fin structure.
    Type: Grant
    Filed: March 23, 2021
    Date of Patent: May 23, 2023
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
    Inventors: Kam-Tou Sio, Shang-Wei Fang, Jiann-Tyng Tzeng, Chew-Yuen Young
  • Patent number: 11658820
    Abstract: A distributed system, such as a distributed storage system in a virtualized computing environment and having storage nodes arranged in a cluster, is provided by management server with a transition period between non-encryption and encryption modes of operation. The transition period enables all of the nodes to complete a transition from the non-encryption mode of operation to the encryption mode of operation, without loss of data-in-transit (DIT). An auto-remediation feature is provided by the management server to the cluster, so as to fix inconsistent state(s) of one or more nodes in the cluster.
    Type: Grant
    Filed: November 23, 2020
    Date of Patent: May 23, 2023
    Assignee: VMWARE, INC.
    Inventors: Wei Fang, Haoran Zheng, Tao Xie, Yun Zhou, YangYang Zhang
  • Publication number: 20230152084
    Abstract: A height measurement method includes obtaining an image including a target object and a pose of a camera used when the image is photographed, obtaining pixel coordinates of at least two key skeleton points of the target object in the image, obtaining three-dimensional coordinates of the key skeleton points based on the pose of the camera and the pixel coordinates of the key skeleton points, and determining height data of the target object based on the three-dimensional coordinates of the at least two key skeleton points.
    Type: Application
    Filed: January 13, 2023
    Publication date: May 18, 2023
    Inventors: Wei Fang, Qi Su, Yafei Wu
  • Publication number: 20230153236
    Abstract: Data writing methods and computing devices are provided. An example data writing method is applied to a computer system, and the computer system includes a file system and a flash memory-based storage system. The example data writing method includes obtaining a target logical address, where the target logical address is an address allocated from a first logical block to target data to be written into the flash memory-based storage system, the first logical block is one of multiple logical blocks in the file system, and the flash memory-based storage system includes multiple physical blocks. It is determined that the target logical address belongs to the first logical block. The target data is written into a first physical block based on a correspondence between the first logical block and the first physical block, where the first physical block is one of the multiple physical blocks.
    Type: Application
    Filed: December 28, 2022
    Publication date: May 18, 2023
    Inventors: Wei FANG, Xie MIAO, Tao HOU