Patents by Inventor Weijun Liu

Weijun Liu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11952401
    Abstract: The present disclosure belongs to the technical field of biological products for veterinary medicine, and specifically relates to a recombinant foot-and-mouth disease virus (FMDV) with a reduced immunosuppressive activity, a preparation method and use thereof, and a recombinant vaccine strain. According to the present disclosure, it is firstly discovered that FMDV 3B protein has an immunosuppressive function, and key sites for exerting the immunosuppressive function are found. A recombinant FMDV vaccine strain with a lost immunosuppressive function in FMDV 3B protein is constructed by introducing amino acid mutations into three repeated copies of FMDV 3B protein.
    Type: Grant
    Filed: July 14, 2021
    Date of Patent: April 9, 2024
    Assignee: Lanzhou Veterinary Research Institute, Chinese Academy of Agricultural Sciences
    Inventors: Haixue Zheng, Fan Yang, Zixiang Zhu, Xiangle Zhang, Weijun Cao, Congcong Wang, Kangli Li, Huisheng Liu, Hong Tian, Keshan Zhang, Xiangtao Liu
  • Patent number: 11945893
    Abstract: A curable composition can comprise a polymerizable material including a monomer of Formula (1), with R being H or alkyl or alkylaryl, n being 1-4, m being 0-6, X1 being C1-C6 substituted or unsubstituted alkyl, X2 being CH3 or H, After forming a cured layer of the curable composition, the cured layer can have an excellent etch resistance.
    Type: Grant
    Filed: September 30, 2020
    Date of Patent: April 2, 2024
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Fen Wan, Weijun Liu, Gary F. Doyle
  • Patent number: 11945966
    Abstract: A photocurable composition can comprise a polymerizable material and a photoinitiator, wherein the polymerizable material may comprise at least one first polymerizable monomer having a structure of Formula (1): (R1)x—Ar—(R2)y (1), with Ar being one or more substituted or unsubstituted aromatic rings; R1 being a structure covalently bonded to Ar including at least one acrylate group; x being 1-4; and R2 being —CH?CH2 or —CCH3=CH2 covalently bonded to Ar; y being 1-4.
    Type: Grant
    Filed: December 9, 2021
    Date of Patent: April 2, 2024
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Fen Wan, Weijun Liu
  • Publication number: 20240092584
    Abstract: A conveying device (100) and an inspection system (1000) are provided. The conveying device includes: a first support frame (1); a first conveying mechanism (2) and a second conveying mechanism (3) which are installed on the first support frame; and a switching mechanism (4) configured to selectively lift the first conveying mechanism or the second conveying mechanism in a vertical direction, such that the first conveying mechanism or the second conveying mechanism carries goods (401) and conveys the goods in a first horizontal direction or a second horizontal direction different from the first horizontal direction. The conveying device may achieve a positioning and a smooth continuous conveying of goods, and achieve a smooth conveying and a calibrated positioning of the goods in different postures.
    Type: Application
    Filed: November 22, 2021
    Publication date: March 21, 2024
    Inventors: Li ZHANG, Zhiqiang CHEN, Yuanjing LI, Qingping HUANG, Weijun GUO, Liming YAO, Hui DING, Junhao LIU, Jiajia ZHOU
  • Publication number: 20240052183
    Abstract: A photocurable composition can comprise a polymerizable material and a photoinitiator, wherein the polymerizable material can comprise at least one multi-functional acrylate monomer in an amount of at least 75 wt % based on the total weight of the polymerizable material and at least one mono-functional monomer in an amount of at least 5 wt % based on the total weight of the polymerizable material. The at least one mono-functional monomer can have a ring parameter of at least 0.5, and a total carbon content of the photocurable composition after curing may be at least 69%. The photocurable composition may have a low thermal shrinkage after curing, a high etch resistance and be suitable for AIP or NIL processing.
    Type: Application
    Filed: August 9, 2022
    Publication date: February 15, 2024
    Inventors: Fei LI, Fen Wan, Timothy Brian STACHOWIAK, Weijun LIU
  • Publication number: 20240025428
    Abstract: The present disclosure relates to a method for state estimation of a target comprising: obtaining an observation variable of the target at different moments through a plurality of sensors, wherein at least one observation variable is acquired by each sensor; determining a state variable of the target at different moments based on the observation variable; and optimizing the state variable of the target by minimizing a loss function. The loss function includes at least one of a position loss, an orientation loss, a velocity loss, a size loss, or a structural constraint of the target. The method of the present disclosure may obtain a sufficiently accurate state estimate. In addition, an apparatus, an electronic device, and a medium for state estimation of the target are also provided.
    Type: Application
    Filed: July 13, 2023
    Publication date: January 25, 2024
    Inventors: Yunchen YANG, Weijun LIU, Jiaming SUN, Naiyan WANG
  • Patent number: 11878935
    Abstract: A method of coating a superstrate using a vacuum chuck containing ridges can comprise attaching the superstrate on the vacuum chuck; applying on the superstrate a liquid layer of a coating composition, the coating composition comprising a coating agent and a non-fluorinated solvent, wherein the non-fluorinated solvent has a boiling point of at least 165° C.; and solidifying the coating composition to form a solid coating layer. The material of the superstrate can have a thermal conductivity of not greater than 10 W/mK and the solid coating layer obtained after solidifying may comprise a smoothness value (SM) of not greater than 1%, the smoothness value being defined as SM=(CRD/CT)×100%, with CRD being a maximum roughness depth of the coating layer and CT an average thickness of the coating layer over a length of 10 mm of the solid coating layer.
    Type: Grant
    Filed: December 27, 2022
    Date of Patent: January 23, 2024
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Ilya L. Rushkin, Weijun Liu
  • Publication number: 20240020870
    Abstract: The present disclosure relates to a method for target state estimation comprising: acquiring a data frame sequence corresponding to a plurality of moments; determining a first time window based on the data frame sequence, the first time window comprising a first set of state variables to be optimized; determining a plurality of second time windows within the first time window, wherein the number of data frames in each second time window is less than the number of data frames in the first time window, there is a repeated data frame in two adjacent second time windows, and there is a second set of state variables to be optimized; and optimizing the second set of state variables in the plurality of second time windows to obtain an optimized first set of state variables. The method of the present disclosure may obtain sufficiently accurate state estimation.
    Type: Application
    Filed: July 13, 2023
    Publication date: January 18, 2024
    Inventors: Yunchen YANG, Weijun LIU, Jiaming SUN, Naiyan WANG
  • Publication number: 20230415195
    Abstract: A superstrate can include a body, a first layer, and a second layer, wherein the first layer is disposed between the body and the second layer. Each of the first and second layers has a proximal surface and a distal surface opposite the proximal surface, wherein the body is closer to the proximal surface than to the distal surface. An Ra of the distal surface of the second layer is less than an Ra of the distal surface of the first layer. In a method of making the superstrate, the relatively high Ra of the distal surface of the first layer may be related to the process or equipment used in forming the first layer. The second layer can be formed using another superstrate, where the Ra of the distal surface of the second layer is substantially the same as the contact surface of the other superstrate.
    Type: Application
    Filed: June 28, 2022
    Publication date: December 28, 2023
    Inventors: Niyaz KHUSNATDINOV, Weijun Liu, James W. Irving
  • Patent number: 11845241
    Abstract: A laminate can contain a substrate, an adhesion promoter layer, and a coating layer, wherein the adhesion promoter layer may include an isocyanate group containing compound of formula (1): R1—R2—N?C?O (1), with R1 being a functional group different than the isocyanate group, and R2 being substituted or unsubstituted alkyl or aryl. The adhesion promoter layer can provide strong adhesion of the coating layer to the substrate by forming covalent bonds with the substrate and covalent bonds with the coating layer.
    Type: Grant
    Filed: March 18, 2021
    Date of Patent: December 19, 2023
    Assignee: CANON KABUSHIKI KAISHA
    Inventor: Weijun Liu
  • Publication number: 20230374167
    Abstract: A photocurable composition can comprise a polymerizable material and at least one photoinitiator, wherein the polymerizable material comprises a multi-functional vinylbenzene monomer in an amount of at least 30 wt % based on the total weight of the polymerizable material and the at least one photoinitiator includes an oxime ester compound. The photocurable composition can be adapted that a UV shrinkage after forming a photo-cured layer at 23° C. is not greater than 4.0%; and that a thermal shrinkage after conducting a baking treatment of the photo-cured layer at 350° C. is not greater than 3.5%.
    Type: Application
    Filed: May 18, 2022
    Publication date: November 23, 2023
    Inventors: Fen Wan, Weijun Liu, Timothy Brian Stachowiak
  • Patent number: 11753497
    Abstract: In one embodiment, a photocurable composition can comprise a polymerizable material and a photoinitiator, wherein the polymerizable material includes an isocyanate group containing compound of formula (1): R1-R2-N?C?O (1), with R1 including a carbon-carbon double bond, and R2 being substituted or unsubstituted alkyl, aryl, or alkylaryl. An amount of 1 wt % to 10 wt % of the isocyanate group containing compound can cause a strong adhesion strength of the photocurable composition to a silicon substrate after curing, and may allow the omission of an adhesion layer between substrate and the photo-cured layer.
    Type: Grant
    Filed: April 29, 2021
    Date of Patent: September 12, 2023
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Fen Wan, Weijun Liu
  • Publication number: 20230257617
    Abstract: A photocurable composition can comprise a polymerizable material, and a photoinitiator, wherein the polymerizable material can comprise at least one polymerizable monomer and at least one reactive polymer. The reactive polymer can have a carbon content of at least 75% based on the total weight of the reactive polymer; a molecular weight of the at least one reactive polymer can be at least 400 g/mol and not greater than 50,000 g/mol; an amount of the reactive polymer may be at least 5 wt %; and a viscosity of the photocurable composition may be not greater than 100 mPa·s. The photocurable composition may have a low linear shrinkage after curing, a high carbon content and high etch resistance and being suitable for AIP or NIL processing.
    Type: Application
    Filed: February 17, 2022
    Publication date: August 17, 2023
    Inventors: Fen WAN, Timothy Brian STACHOWIAK, Weijun LIU
  • Publication number: 20230257496
    Abstract: A photocurable composition can comprise a polymerizable material, at least one non-reactive polymer, and a photoinitiator, wherein the non-reactive polymer can have a carbon content of at least 80% based on the total weight of the non-reactive polymer; a molecular weight of the at least one non-reactive polymer can be at least 750 g/mol and not greater than 20,000 g/mol; an amount of the non-reactive polymer may be at least 10 wt % and not greater than 30 wt %; and a viscosity of the photocurable composition may be not greater than 110 mPa·s. The photocurable composition may have a low linear shrinkage after curing, a high carbon content and high etch resistance and being suitable for AIP or NIL processing.
    Type: Application
    Filed: February 11, 2022
    Publication date: August 17, 2023
    Inventors: Timothy Brian STACHOWIAK, Fen WAN, Weijun LIU
  • Publication number: 20230203210
    Abstract: A photocurable composition can comprise a polymerizable material and a photoinitiator, wherein the polymerizable material can comprise a first polymerizable monomer having a structure of Formula (1) or Formula (2): with X being C1-C4-alkyl or oxygen (O); n being 0 or 1 Y1, Y2 being with R3 or, with R3 being H or methyl, wherein Y1 and Y2 may be the same or different and an amount of Y1 and Y2 per benzene ring being 1, 2, or 3; R1, R2 being substituted or unsubstituted alkyl or aryl, and an amount of each of R1 and R2 per benzene ring being 0, 1, 2, 3, or 4.
    Type: Application
    Filed: December 27, 2021
    Publication date: June 29, 2023
    Inventors: Fen WAN, Weijun LIU
  • Publication number: 20230183492
    Abstract: A photocurable composition can comprise a polymerizable material and a photoinitiator, wherein the polymerizable material may comprise at least one first polymerizable monomer having a structure of Formula (1): (R1)x—Ar—(R2)y (1), with Ar being one or more substituted or unsubstituted aromatic rings; R1 being a structure covalently bonded to Ar including at least one acrylate group; x being 1-4; and R2 being —CH?CH2 or —CCH3=CH2 covalently bonded to Ar; y being 1-4.
    Type: Application
    Filed: December 9, 2021
    Publication date: June 15, 2023
    Inventors: Fen Wan, Weijun Liu
  • Patent number: 11611198
    Abstract: The present invention belongs to the technical field of mobile transformer substation, and in particular relates to a vehicle-mounted mobile transformer with a position-adjustable lead-out bushing.
    Type: Grant
    Filed: April 6, 2020
    Date of Patent: March 21, 2023
    Assignees: STATE GRID ZHEJIANG ECONOMIC RESEARCH INSTITUTE, STATE GRID WENZHOU ELECTRIC POWER SUPPLY COMPANY, CHINA ENERGY ENGINEERING GROUP ZHEJIANG ELECTRIC POWER DESIGN INSTITUTE CO. LTD, HENAN PINGGAO ELECTRIC CO., LTD.
    Inventors: Meijin Gao, Tingting Wang, Qian Di, Junhua Yin, Weijun Liu, Jianhua Yang, Huiwen Zhou, Yanhan Zhu, Jiangqian Huang, Jiarui Yang, Chu Li, Zhichao Zhou, Xuejing Kang, Fangli Jia, Jicheng Zhang, Chaowei Qiao, Jianyu Li, Xihui Xia
  • Publication number: 20230073942
    Abstract: The present disclosure provides a method and an apparatus for vehicle control. The method includes: obtaining (101) manual operation information of a vehicle; determining (102) an intervention intention of a driver based on the manual operation information; and controlling (103), when the vehicle is currently in an automated driving mode and the intervention intention is determined to be a slow intervention, the vehicle to reach a predetermined safe state and handing corresponding control of the vehicle over to the driver. The method and apparatus can solve potential safety problems in vehicle control and improve safety of the vehicle control.
    Type: Application
    Filed: November 14, 2022
    Publication date: March 9, 2023
    Inventors: Qiyuan LIU, Nan WU, Weijun LIU
  • Patent number: 11597781
    Abstract: A photocurable composition can comprise a polymerizable material and a photoinitiator, wherein the polymerizable material can comprise at least one acrylate monomer including at least one cyano group (CN-acrylate monomer). The presence of a low amount of the CN-acrylate monomer between 10 wt % and not greater than 30 wt % can lower the contact angle of the composition and may improve the etch resistance of a photo-cured layer made from the photocurable composition.
    Type: Grant
    Filed: December 29, 2020
    Date of Patent: March 7, 2023
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Fen Wan, Weijun Liu
  • Publication number: 20230021464
    Abstract: A photocurable composition can comprise a polymerizable material, a fullerene or fullerene derivative in an amount of at least 0.2 wt % and not greater than 5.0 wt %, and a photoinitiator and may be adapted for AIP or NIL processing. A photo-cured layer made from the photocurable composition can have an improved thermal stability in comparison to a photo-cured layer made from the same photocurable composition except not containing a fullerene or fullerene derivative.
    Type: Application
    Filed: July 16, 2021
    Publication date: January 26, 2023
    Inventors: Fen WAN, Weijun LIU