Abstract: A curable composition comprises at least 10 wt % expanding monomers based on a total weight of the curable composition, at least 25 wt % acrylate monomers based on the total weight of the curable composition, a photoinitiator, and a photosensitizer. The acrylate monomers have a molecular weight of 500 or less. The curable composition has a viscosity of 10 cP or less. A total amount of the expanding monomers and the acrylate monomers are at least 90 wt % based on the total weight of the curable composition.

Abstract: A curable composition can comprise a polymerizable material and an initiator. The polymerizable material can comprise a first monomer and a second monomer, wherein the second monomer is soluble in the first monomer, and the second monomer includes a ring structure selected from a maleimide ring, a pyrone ring, or a 2-furanone rings. The curable composition can have a viscosity of not greater than 10 mPa·s, a fast curing kinetic, low shrinkage during curing, and is suitable for use in inkjet adaptive planarization.

Abstract: The pattern forming method, which is a photo-nanoimprint technology, includes in this order: laying a layer formed of a curable composition (A1) containing at least a polymerizable compound on a surface of a substrate; dispensing liquid droplets of a curable composition (A2) containing at least a polymerizable compound dropwise discretely onto the layer of (A1) to lay the liquid droplets; sandwiching a layer obtained by partially mixing (A1) and (A2) between a mold and the substrate; of irradiating the layer obtained by partially mixing (A1) and (A2) with light from a side of the mold to cure the layer in one stroke; and releasing the mold from the layer formed of the curable compositions after the curing, in which a value Vr/Vc obtained by dividing a volume of (A2) per shot area (Vr) by a volume of (A1) (Vc) is 4 or more and 15 or less.

Abstract: A gas permeable superstrate and method using the same is disclosed. The superstrate can include a body and an amorphous fluoropolymer layer on the body. The method of planarization can include dispensing a planarization precursor material over a substrate and contacting the planarization precursor material with a body of a superstrate. In one embodiment, the substrate includes a non-uniform surface topography. The method can also include curing the planarization precursor material to form a planarization layer over the substrate, where curing can be performed while the superstrate is contacting the planarization precursor material.

Abstract: A pattern is formed on a substrate with forming a layer of a curable composition (A1) containing a polymerizable compound (a1) on a surface of the substrate, then dispensing droplets of a curable composition (A2) containing a polymerizable compound (a2) dropwise discretely onto the curable composition (A1) layer, subsequently sandwiching a mixture layer of the curable composition (A1) and the curable composition (A2) between a mold and the substrate, then irradiating the mixture layer with light to cure the mixture layer, and releasing the mold from the mixture layer after the curing. The curable composition (A1) except a solvent has a viscosity at 25° C. of 40 mPa·s or more and less than 500 mPa·s. The curable composition (A2) except a solvent has a viscosity at 25° C. of 1 mPa·s or more and less than 40 mPa·s.

Abstract: An apparatus for controlling a vehicle, comprising: an upper level controller connected to a vehicle CAN (Controller Area Network) bus communication network by using a CAN bus communication mode, configured: to control a first control element connected to a vehicle CAN bus via the CAN bus communication network; and to control a second control element connected to a non-vehicle CAN bus via a hardwired connection.

Abstract: A pattern is formed on a substrate with forming a layer of a first curable composition (A1) containing a component (a1) as a polymerizable compound and a first component (c1) as a surfactant on a surface of the substrate, then dispensing droplets of a second curable composition (A2) containing a component (a2) as a polymerizable compound and a second component (c2) as a surfactant onto the layer formed of the first curable composition (A1), subsequently sandwiching a mixture layer of the first and second curable compositions (A1) and (A2) between a mold having a pattern and the substrate, then irradiating the mixture layer with light to cure the mixture layer, and releasing the mold from the mixture layer after curing. The first curable composition (A1) contains at least 0.5 wt % of the first component (c1), the second curable composition (A2) contains at least 0.5 wt % of the second component (c2).

Abstract: A photocurable composition can comprise a polymerizable material and a photoinitiator, wherein at least 90 wt % of the polymerizable material may comprise acrylate monomers including an aromatic group. The photocurable composition can have a viscosity of not greater than 15 mPa·s, the total carbon content of the photocurable composition after curing can be at least 73%, and the Ohnishi number may be not greater than 3.0.

Abstract: A curable composition can comprise a polymerizable compound and a dual-functional photoinitiator, wherein the dual-functional photoinitiator includes a photo-active group and at least one functional group capable of forming a covalent bond with the polymerizable compound during curing of the curable composition. The curable composition can have a viscosity of not greater than 10 mP·s at a temperature of 23° C. and an increased glass transition temperature after curing in comparison to a corresponding curable composition including a mono-functional photoinitiator.

Abstract: A liquid adhesion composition can include at least one polymerizable compound comprising at least two functional groups; a solvent; a catalyst; and a cross-linking agent, wherein the cross-linking agent can have a structure of Formula (1): A [X—(O—Y—)n1—N(CH2—OR)2]n2 (1), wherein A is an alkyl group, or an aromatic group, or a heteroaromatic group; X is C1-5 alkyl, Y is C1-4 linear or branched alkyl; n1 is 1-10; R is C1-6 alkyl; and n2 is 1-6. The liquid adhesion composition can be cured at elevated temperatures and may be applied in nanoimprint lithography for attaching an imprint resist layer on a substrate.

Abstract: A gas permeable superstrate and method using the same is disclosed. The superstrate can include a body and an amorphous fluoropolymer layer on the body. The method of planarization can include dispensing a planarization precursor material over a substrate and contacting the planarization precursor material with a body of a superstrate. In one embodiment, the substrate includes a non-uniform surface topography. The method can also include curing the planarization precursor material to form a planarization layer over the substrate, where curing can be performed while the superstrate is contacting the planarization precursor material.

Abstract: A pattern is formed on a substrate with forming a layer of a curable composition (A1) containing a component (a1) serving as a polymerizable compound on a surface of the substrate, then dispensing droplets of a curable composition (A2) containing a component (a2) serving as a polymerizable compound (a2) and a component (b2) serving as a photopolymerization initiator dropwise discretely onto the layer of the curable composition (A1), subsequently sandwiching a mixture layer of the curable composition (A1) and the curable composition (A2) between a mold and the substrate, then irradiating the mixture layer with light to cure the mixture layer, and then releasing the mold from the mixture layer after the curing.

Abstract: A pattern is formed on a substrate with forming a layer of a curable composition (A1) containing a component (a1) serving as a polymerizable compound and a component (d1) serving as a solvent on a surface of the substrate, then dispensing droplets of a curable composition (A2) containing at least a component (a2) serving as a polymerizable compound dropwise discretely onto the layer of the curable composition, subsequently sandwiching a mixture layer of the curable composition (A1) and the curable composition (A2) between a mold and the substrate, then irradiating the mixture layer with light to cure the layer, and releasing the mold from the mixture layer after the curing.

Abstract: A liquid adhesion composition can include at least one polymerizable compound comprising at least two functional groups; a solvent; a catalyst; and a cross-linking agent, wherein the cross-linking agent can have a structure of Formula (1): A [X—(O—Y—)n1-N(CH2—OR)2]n2 (1), wherein A is an alkyl group, or an aromatic group, or a heteroaromatic group; X is C1-5 alkyl, Y is C1-4 linear or branched alkyl; n1 is 1-10; R is C1-6 alkyl; and n2 is 1-6. The liquid adhesion composition can be cured at elevated temperatures and may be applied in nanoimprint lithography for attaching an imprint resist layer on a substrate.

Abstract: A photocurable composition can comprise a polymerizable material and a shrinkage compensating agent (SCA), wherein the photocurable composition may be adapted that a linear shrinkage of the photocurable composition after curing is not greater than 3 percent. The shrinkage compensating agent can be a compound comprising a functional group which releases a gas if subjected to UV radiation or heat. The released gas can form a fine pore structure within the cured photocurable composition and may thereby compensate shrinkage of the photocurable composition during curing.

Abstract: A nanoimprint lithography method includes disposing a pretreatment composition on a substrate to form a pretreatment coating. The pretreatment composition includes a polymerizable component. Discrete imprint resist portions are disposed on the pretreatment coating, with each discrete portion of the imprint resist covering a target area of the substrate. A composite polymerizable coating is formed on the substrate as each discrete portion of the imprint resist spreads beyond its target area. The composite polymerizable coating includes a mixture of the pretreatment composition and the imprint resist. The composite polymerizable coating is contacted with a template, and is polymerized to yield a composite polymeric layer on the substrate. The interfacial surface energy between the pretreatment composition and air exceeds the interfacial surface energy between the imprint resist and air or between at least a component of the imprint resist and air.

Abstract: A nanoimprint lithography method includes disposing a pretreatment composition on a nanoimprint lithography substrate to form a pretreatment coating, and disposing discrete portions of imprint resist on the pretreatment coating, each discrete portion of the imprint resist covering a target area of the nanoimprint lithography substrate. The imprint resist is a polymerizable composition and includes a polymerization initiator. A composite polymerizable coating is formed on the nanoimprint lithography substrate as each discrete portion of the imprint resist spreads beyond its target area. The composite polymerizable coating is contacted with a nanoimprint lithography template. The polymerization initiator is activated, and the composite polymerizable coating is polymerized to yield a composite polymeric layer and an uncured portion of the pretreatment coating on the nanoimprint lithography substrate.

Abstract: The present disclosure provides a method and an apparatus for vehicle control. The method includes: obtaining (101) manual operation information of a vehicle; determining (102) an intervention intention of a driver based on the manual operation information; and controlling (103), when the vehicle is currently in an automated driving mode and the intervention intention is determined to be a slow intervention, the vehicle to reach a predetermined safe state and handing corresponding control of the vehicle over to the driver. The method and apparatus can solve potential safety problems in vehicle control and improve safety of the vehicle control.

Abstract: The pattern forming method, which is a photo-nanoimprint technology, includes in this order: laying a layer formed of a curable composition (A1) containing at least a polymerizable compound on a surface of a substrate; dispensing liquid droplets of a curable composition (A2) containing at least a polymerizable compound dropwise discretely onto the layer of (A1) to lay the liquid droplets; sandwiching a layer obtained by partially mixing (A1) and (A2) between a mold and the substrate; of irradiating the layer obtained by partially mixing (A1) and (A2) with light from a side of the mold to cure the layer in one stroke; and releasing the mold from the layer formed of the curable compositions after the curing, in which a value Vr/Vc obtained by dividing a volume of (A2) per shot area (Vr) by a volume of (A1) (Vc) is 4 or more and 15 or less.

Abstract: A nanoimprint lithography method includes disposing a pretreatment composition including a polymerizable component on a substrate to form a pretreatment coating. Discrete imprint resist portions are disposed on the pretreatment coating, with each discrete portion of the imprint resist covering a target area of the substrate. The imprint resist is a polymerizable composition and includes a fluorinated photoinitiator. A composite polymerizable coating is formed on the substrate as each discrete portion of the imprint resist spreads beyond its target area. The composite polymerizable coating includes a mixture of the pretreatment composition and the imprint resist. The composite polymerizable coating is contacted with a template, and is polymerized to yield a composite polymeric layer on the substrate. The interfacial surface energy between the pretreatment composition and air exceeds the interfacial surface energy between the imprint resist and air or between at least a component of the imprint resist and air.