Abstract: An optical projection apparatus comprising an illumination system, a light valve, an imaging system, a power supply circuit and a generator are provided. The illumination system with a color wheel is providing a light beam. The light valve is disposed on the transmitting path of the light beam for transforming the light beam into an image light beam. The imaging system is also disposed on the transmitting path of the image light beam. The power supply circuit is electrically connected to the illumination system and the light valve is connecting with an external power supply. The generator is electrically connected to the power supply circuit. The color wheel connected to the generator drives the generator to generate electric power. The electric power is transmitted to the power supply circuit and powers the optical projection apparatus. Consequently, overall power consumption of the optical projection apparatus is reduced.

Abstract: An electric screen for a projector is provided. The electric screen utilizes a photo-electric conversion apparatus to convert received photon energy into electric energy and stores the electric energy in a storage battery. A motor is driven by the electric energy stored in a storage battery to extend or retract a screen. The electric screen further has a switch, the electric screen cooperates with the projector more efficiently.

Abstract: An electric energy auxiliary device of transdermal drug delivery patch is provided which includes an upper electrode, a lower electrode, and a drug storage area between two electrodes, generating a kinetic energy in the pharmaceutical compound in the drug storage area toward the skin by a electric field between two electrodes. For the pharmaceutical compound with the same polarity, the pharmaceutical compound is pushed by the electric energy interacted with polar the pharmaceutical compound so as to deliver the drug the human body. The lower electrode generates an ion channel with electroporation on the surface of skin. By using the change of electric field on the surface of skin, a temporary ion channel is generated in the cells where the pharmaceutical compound enters the systemic circulation of human body via skin. This temporary ion channel allows large compound to pass into the skin of human body.

Abstract: A method of wafer exposure with correction feedback. The method includes the steps of using a first group of parameters to expose the first wafer to transfer a pattern of a first layer, using a second group of parameters to perform overlay alignment of the pattern of the first layer with a pattern of a second layer for the first wafer, measuring the first wafer to obtain a first and second correction respectively for the first and second parameter groups correcting the first group with the first correction and using the corrected parameters to expose the second wafer to transfer the pattern of the first layer, and correcting the second group with the second correction and using the corrected parameters to perform overlay alignment of the pattern of the first layer with the pattern of the second layer for the second wafer.

Abstract: A vocalizing input device includes a processor device for coupling to various computer facilities, one or more input devices for entering sounds and voices into the processor device, one or more devices for entering information corresponding to the sounds and voices into the processor device, and one or more memories for storing the sounds and voices and the information corresponding to the sounds and voices. The processor device may compare the newly entered and the stored sounds and voices, and then may provide the corresponding information to the computer facilities.

Abstract: A method of wafer exposure with correction feedback. The method comprises the steps of providing a first and second wafer, using a first group of parameters to expose the first wafer to transfer a pattern of a first layer to the first wafer, using a second group of parameters to perform overlay alignment of the pattern of the first layer with a pattern of a second layer for the first wafer, performing measurement of the first wafer to obtain a first and second correction respectively for the first and second group of the parameters, correcting the first group of the parameters with the first correction and using the first group of the corrected parameters to expose the second wafer to transfer the pattern of the first layer to the second wafer, and correcting the second group of the parameters with the second correction and using the second group of the corrected parameters to perform overlay alignment of the pattern of the first layer with the pattern of the second layer for the second wafer.