Abstract: A method of generating a layout pattern includes determining a first energy density indirectly exposed to a first feature of one or more features of a layout pattern on an energy-sensitive material when the one or more features of the layout pattern on the energy-sensitive material are directly exposed by a charged particle beam. The method also includes adjusting a second energy density exposed the first feature when the first feature is directly exposed by the charged particle beam. A total energy density of the first feature that comprises a sum of the first energy density from the indirect exposure and the second energy density from the direct exposure is maintained at about a threshold energy level to fully expose the first feature in the energy-sensitive material.

Abstract: An electron beam lithography system and an electron beam lithography process are disclosed herein for improving throughput. An exemplary method for increasing throughput achieved by an electron beam lithography system includes receiving an integrated circuit (IC) design layout that includes a target pattern, wherein the electron beam lithography system implements a first exposure dose to form the target pattern on a workpiece based on the IC design layout. The method further includes inserting a dummy pattern into the IC design layout to increase a pattern density of the IC design layout to greater than or equal to a threshold pattern density, thereby generating a modified IC design layout. The electron beam lithography system implements a second exposure dose that is less than the first exposure dose to form the target pattern on the workpiece based on the modified IC design layout.

Abstract: The present disclosure relates to systems, non-transitory computer-readable media, and methods for generating a multi-transaction dispute package. For example, in one or more embodiments, the disclosed system receives a dispute request with an initial disputed transaction and identifies other potential transactions based on dispute classifications. In one or more embodiments, the disclosed system provides the identified potential transactions that are potentially related to the initial disputed transaction for selection. In response to receiving a selection from the user, the disclosed system generates and processes a multi-transaction dispute package.

Abstract: A method for establishing a decision tree for disease prediction is provided. The method receives a plurality of physiological measurement data corresponding to different diseases. The method classifies the physiological measurement data corresponding to the purpose. The method calculates at least one cutting point of the physiological measurement data. The method branches the decision tree corresponding to the at least one cutting point. The method prunes the decision tree to complete the establishment of the decision tree. The present invention can assist doctors in medical diagnosis, give preventive medication in advance based on the prediction results, and calculate the data of each terminal branch of the decision tree to obtain the probability of a single disease, which can improve the accuracy of more disease predictions.

Abstract: A wearable device is illustrated. The wearable device has a body, at least one light emitting unit, at least one light sensing unit and an action recognition module. The wearable device is suitable for wearing on a movable part of a user. The light emitting unit is disposed on an inner side of the body, wherein the light emitting unit emits a light beam illuminating at least a portion of the movable part. The light sensing unit operatively senses the light beam reflected by the at least portion of the movable part and generates a light sensing signal. The action recognition module is configured to operatively determine a function that corresponds to an action of the user.

Abstract: A focus identification method adaptable for a focus identification system is provided. The focus identification method includes: capturing a projection picture to generate a captured picture; dividing the captured picture into a plurality of image regions; calculating a plurality of sharpness values corresponding to the plurality of image regions respectively according to image data of the plurality of image regions; and displaying the plurality of sharpness values on the plurality of corresponding image regions respectively to generate a first focus identification picture. Moreover, the disclosure further discloses a focus identification system applying the focus identification method. The focus identification method and the focus identification system using the same in the disclosure may improve the remote maintenance efficiency.

Abstract: An action recognition system is illustrated. The action recognition system has an annular body, at least one light emitting unit, at least one light sensing unit and an action recognition module. The annular body is worn on a movable part of a user. One end of the light emitting unit is exposed on an inner side of the annular body, wherein the light emitting unit emits a first light beam illuminating at least a portion of the movable part. One end of the light sensing unit is exposed on the inner side of the annular body. The light sensing unit operatively senses a second light beam reflected by the at least portion of the movable part and generates a light sensing signal. The action recognition module is configured to operatively determine an action of the user according to the light sensing signal.

Abstract: A method of generating a layout pattern includes determining a first energy density indirectly exposed to a first feature of one or more features of a layout pattern on an energy-sensitive material when the one or more features of the layout pattern on the energy-sensitive material are directly exposed by a charged particle beam. The method also includes adjusting a second energy density exposed the first feature when the first feature is directly exposed by the charged particle beam. A total energy density of the first feature that comprises a sum of the first energy density from the indirect exposure and the second energy density from the direct exposure is maintained at about a threshold energy level to fully expose the first feature in the energy-sensitive material.

Abstract: Disclosed herein are recombinant viruses and/or insect cells suitable for detecting the infection of a pathogen in a biological sample of a test subject. The information derived from the detection may also be used to render a diagnosis on whether the test subject is infected with the pathogen or not, so that proper course of treatment may be assigned to the subject. Also disclosed herein is a vaccine for the prophylaxis and/or treatment of infection caused by said pathogen.

Abstract: A method of generating a layout pattern includes determining a first energy density indirectly exposed to a first feature of one or more features of a layout pattern on an energy-sensitive material when the one or more features of the layout pattern on the energy-sensitive material are directly exposed by a charged particle beam. The method also includes adjusting a second energy density exposed the first feature when the first feature is directly exposed by the charged particle beam. A total energy density of the first feature that comprises a sum of the first energy density from the indirect exposure and the second energy density from the direct exposure is maintained at about a threshold energy level to fully expose the first feature in the energy-sensitive material.

Abstract: In one example, an apparatus includes an extreme ultraviolet illumination source and an illuminator. The extreme ultraviolet illumination source is arranged to generate a beam of extreme ultraviolet illumination to pattern a resist layer on a substrate. The illuminator is arranged to direct the beam of extreme ultraviolet illumination onto a surface of a photomask. In one example, the illuminator includes a field facet mirror and a pupil facet mirror. The field facet mirror includes a first plurality of facets arranged to split the beam of extreme ultraviolet illumination into a plurality of light channels. The pupil facet mirror includes a second plurality of facets arranged to direct the plurality of light channels onto the surface of the photomask. The distribution of the second plurality of facets is denser at a periphery of the pupil facet mirror than at a center of the pupil facet mirror.

Abstract: A projection system and its color calibration method are provided. The projection system includes a projection device, a camera device, and a processing circuit. The projection device projects a calibration projection image including a plurality of calibration regions. The camera device captures the calibration projection image. The processing circuit performs a color calibration operation to calibrate color uniformity of the calibration projection image. The processing circuit drives the projection device to project the calibration projection image according to color gain values of the calibration regions. The processing circuit drives the camera device to capture the calibration projection image, calculates color values of the calibration regions, and updates the color gain values of the calibration regions to make the color values of the calibration regions approach at least one target value.

Abstract: An electron beam lithography system and an electron beam lithography process are disclosed herein for improving throughput. An exemplary method for increasing throughput achieved by an electron beam lithography system includes receiving an integrated circuit (IC) design layout that includes a target pattern, wherein the electron beam lithography system implements a first exposure dose to form the target pattern on a workpiece based on the IC design layout. The method further includes inserting a dummy pattern into the IC design layout to increase a pattern density of the IC design layout to greater than or equal to a threshold pattern density, thereby generating a modified IC design layout. The electron beam lithography system implements a second exposure dose that is less than the first exposure dose to form the target pattern on the workpiece based on the modified IC design layout.

Abstract: A method includes generating an electron beam from a radiation source; modifying an energy distribution of the electron beam through a first shaping aperture; and exposing a substrate to portions of the electron beam passing through the first shaping aperture. The first shaping aperture comprises blocking strips with a plurality of slots therebetween, a frame surrounding the blocking strips, and a diagonal support connected to the frame and one of the blocking strips.

Abstract: A method of operating a semiconductor apparatus includes forming a first electron beam passing through a first shaping aperture; modifying an energy distribution of the first electron beam by a second shaping aperture, such that the first electron beam has a main region and an edge region having a greater energy than the main region; and exposing a workpiece to the main region and the edge region of the first electron beam to create a pattern.

Abstract: A resistor device has a resistor body, a first electrode assembly and a second electrode assembly. The resistor body has a resistor layer. The first electrode assembly has two first electrodes symmetrically distributed on both sides of the resistor layer, wherein the first electrodes are electrically connected to the resistor layer. The second electrode assembly has two second electrodes symmetrically distributed on both sides of the resistor layer, wherein the second electrodes are electrically connected to the resistor layer, and positions which the first electrode and the second electrode located on the same side of the resistor layer are connected to the resistor layer have an equipotential. The resistor device does not generate voltage drop through voltammetry detection, improves the accuracy of resistance value precision measurement of the voltammetry detection, and thus can be applied to precision circuits that have high requirements on resistance value precision.

Abstract: An analog-to-digital converter (ADC) device equipped with a conversion suspension function and an associated operation method thereof are provided. The ADC device includes: an interleaved clock controller, arranged to generate a first clock signal and a second clock signal according to a master clock signal; and a multi-ADC circuit, coupled to the interleaved clock controller, arranged to perform analog-to-digital conversion. The multi-ADC circuit includes a first ADC and a second ADC, wherein the first ADC performs sampling and conversion operations according to the first clock signal, and the second ADC performs sampling and conversion operations according to the second clock signal. Based on the timing control of the first clock signal and the second clock signal, when any ADC of the first ADC and the second ADC is performing a sampling operation, the other ADC of the first ADC and the second ADC suspends conversion.

Abstract: An action recognition system is illustrated. The action recognition system has an annular body, at least one light emitting unit, at least one light sensing unit and an action recognition module. The annular body is worn on a movable part of a user. One end of the light emitting unit is exposed on an inner side of the annular body, wherein the light emitting unit emits a first light beam illuminating at least a portion of the movable part. One end of the light sensing unit is exposed on the inner side of the annular body. The light sensing unit operatively senses a second light beam reflected by the at least portion of the movable part and generates a light sensing signal. The action recognition module is configured to operatively determine an action of the user according to the light sensing signal.

Abstract: A chip on film package including a chip and a flexible film. The chip includes bumps disposed on the chip and is mounted on the flexible film. The flexible film includes first vias, second vias, upper leads and lower leads. The first vias and the second vias penetrate the flexible film and are arranged on two opposite sides of a reference line respectively. A distance between one of the first vias and one of the second vias, which are closer to a first side of the chip, is longer than that between another one of the first vias and another one of the second, which are further from the first side. The upper leads are disposed on the upper surface connected between the vias and the bumps. The lower leads are disposed on the lower surface and connected to the vias.

Abstract: An action recognition system is illustrated. The action recognition system has an annular body, at least one light emitting unit, at least one light sensing unit and an action recognition module. The annular body is worn on a movable part of a user. One end of the light emitting unit is exposed on an inner side of the annular body, wherein the light emitting unit emits a first light beam illuminating at least a portion of the movable part. One end of the light sensing unit is exposed on the inner side of the annular body. The light sensing unit operatively senses a second light beam reflected by the at least portion of the movable part and generates a light sensing signal. The action recognition module is configured to operatively determine an action of the user according to the light sensing signal.