Abstract: A method of manufacturing a semiconductor cell comprises a step of anisotropically dry etching a polysilicon layer to form a polysilicon gate wherein an etching stop is formed on a buried contact region before the anisotropically dry etching step, the etching stop is preferably formed by salicide technology of titanium silicide.

Abstract: A method for making planar silicon-based inductor structure with improved Q is disclosed. This method includes the steps of: (a) providing a lightly-doped P-type substrate as a starting wafer; (b) forming a preliminary oxide layer on the lightly-doped P-type substrate; (c) forming a first oxide layer from the preliminary oxide layer enclosing a predetermined epitaxial area; (d) depositing an epitaxial layer in the epitaxial area using intrinsic doping; (e) forming a second oxide layer which covers both the epitaxial layer and the first oxide layer, and is merged with the first oxide layer to thus form a contiguous inter-connected inductor oxide layer; (f) forming a metal line according to a planar inductor pattern so as to form a silicon-based inductor structure. The epitaxial layer has a resistivity of at least 2 K ohm-cm. The planar silicon-based inductor improves the Q value by reducing or stopping current losses into the substrate.

Abstract: A method for manufacturing a semiconductor memory cell with a floating gate having a predetermined length includes the steps of: growing a thin oxide layer over a substrate; depositing a polysilicon layer over the thin oxide layer; depositing a silicon nitride layer over the polysilicon layer; masking and etching the nitride layer down to the polysilicon layer so as to form an oxide receiving groove in the nitride layer, the groove being parallel to a longitudinal axis of the floating gate to be formed and being longer than the predetermined width of the floating gate to be formed, and the width of the receiving groove in latitudal axis is equal to the predetermined length of the floating gate, the receiving groove overlapping a floating gate region to be defined on the polysilicon layer; growing a polysilicon oxide layer in the receiving groove; removing the nitride layer; providing a mask which is transverse to the polysilicon oxide layer and which has a width equal to the predetermined length of the floati