Patents by Inventor Xinrong Jiang
Xinrong Jiang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8664594Abstract: The present disclosure provides an electron beam column with substantially improved resolution and/or throughput for inspecting manufactured substrates. The electron beam column comprises an electron gun, a scanner, an objective lens, and a detector. In accordance with one embodiment, the electron gun includes a gun lens having a flip-up pole piece configuration. In accordance with another embodiment, the scanner comprises a dual scanner having a pre-scanner and a main scanner, and the detector may be configured between the electron gun and the pre-scanner. In accordance with another embodiment, the electron beam column includes a continuously-variable aperture configured to select a beam current. Other embodiments relate to methods of using an electron beam column for automated inspection of manufactured substrates. In one embodiment, for example, an aperture size is adjusted to achieve a minimum spot size given a selected beam current and a column-condition domain being used.Type: GrantFiled: April 27, 2011Date of Patent: March 4, 2014Assignee: KLA-Tencor CorporationInventors: Xinrong Jiang, Liqun Han, Mohammed Tahmassebpur, Salam Harb, John D. Greene
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Publication number: 20130256530Abstract: One embodiment relates to an apparatus for high-resolution electron beam imaging. The apparatus includes an energy filter configured to limit an energy spread of the electrons in the incident electron beam. The energy filter may be formed using a stigmatic Wien filter and a filter aperture. Another embodiment relates to a method of forming an incident electron beam for a high-resolution electron beam apparatus. Another embodiment relates to a stigmatic Wien filter that includes curved conductive electrodes. Another embodiment relates to a stigmatic Wien filter that includes a pair of magnetic yokes and a multipole deflector. Other embodiments, aspects and features are also disclosed.Type: ApplicationFiled: April 3, 2012Publication date: October 3, 2013Inventors: Xinrong JIANG, Liqun HAN
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Patent number: 8536538Abstract: One embodiment relates to a focused electron beam imaging apparatus. The apparatus includes an electron beam column, an electron source, a gun lens, a pre-scanning deflector, a main scanning deflector, an objective lens, and a detector. The pre-scanning deflector comprises a 12-pole electrostatic deflector which is configured to controllably deflect the electron beam away from the optical axis of the electron beam column. Another embodiment relates to a method of scanning an electron beam over a target substrate in a focused electron beam imaging instrument. The electron beam is controllably deflected, without third-order deflection aberrations, away from an optical axis of an electron beam column using a pre-scanning deflector. The electron beam is then controllably deflected back towards the optical axis using a main scanning deflector so that the electron beam passes through a center of an objective electron lens. Other embodiments, aspects and features are also disclosed.Type: GrantFiled: February 16, 2011Date of Patent: September 17, 2013Assignee: KLA-Tencor CorporationInventor: Xinrong Jiang
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Patent number: 8461526Abstract: In one embodiment, a first vacuum chamber of an electron beam column has an opening which is positioned along an optical axis so as to pass a primary electron beam that travels down the column. A source that emits electrons is positioned within the first vacuum chamber. A beam-limiting aperture is configured to pass a limited angular range of the emitted electrons. A magnetic immersion lens is positioned outside of the first vacuum chamber and is configured to immerse the electron source in a magnetic field so as to focus the emitted electrons into the primary electron beam. An objective lens is configured to focus the primary electron beam onto a beam spot on a substrate surface so as to produce scattered electrons from the beam spot. Controllable deflectors are configured to scan the beam spot over an area of the substrate surface. Other features and embodiments are also disclosed.Type: GrantFiled: December 1, 2010Date of Patent: June 11, 2013Assignee: KLA-Tencor CorporationInventors: Marian Mankos, Liqun Han, Xinrong Jiang, Rex Runyon, Carmela Moreno
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Patent number: 8362425Abstract: One embodiment disclosed relates to a multiple-beamlet electron beam imaging apparatus for imaging a surface of a target substrate. A beam splitter lens array is configured to split the illumination beam to form a primary beamlet array, and a scanning system is configured to scan the primary beamlet array over an area of the surface of the target substrate. In addition, a detection system configured to detect individual secondary electron beamlets. Another embodiment disclosed relates to a method of imaging a surface of a target substrate using a multiple-beamlet electron beam column. Other features and embodiments are also disclosed.Type: GrantFiled: April 27, 2011Date of Patent: January 29, 2013Assignee: KLA-Tencor CorporationInventors: Liqun Han, Xinrong Jiang, John D. Greene
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Patent number: 8294125Abstract: One embodiment relates to an electron-beam apparatus for defect inspection and/or review of substrates or for measuring critical dimensions of features on substrates. The apparatus includes an electron gun and an electron column. The electron gun includes an electron source configured to generate electrons for an electron beam and an adjustable beam-limiting aperture which is configured to select and use one aperture size from a range of aperture sizes. Another embodiment relates to providing an electron beam in an apparatus. Advantageously, the disclosed apparatus and methods reduce spot blur while maintaining a high beam current so as to obtain both high sensitivity and high throughput.Type: GrantFiled: December 9, 2009Date of Patent: October 23, 2012Assignee: KLA-Tencor CorporationInventors: Liqun Han, Marian Mankos, Xinrong Jiang, Rex Runyon, John Greene
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Publication number: 20120241606Abstract: One embodiment disclosed relates to a multiple-beamlet electron beam imaging apparatus for imaging a surface of a target substrate. A beam splitter lens array is configured to split the illumination beam to form a primary beamlet array, and a scanning system is configured to scan the primary beamlet array over an area of the surface of the target substrate. In addition, a detection system configured to detect individual secondary electron beamlets. Another embodiment disclosed relates to a method of imaging a surface of a target substrate using a multiple-beamlet electron beam column. Other features and embodiments are also disclosed.Type: ApplicationFiled: April 27, 2011Publication date: September 27, 2012Inventors: Liqun Han, Xinrong Jiang, John D. Greene
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Publication number: 20120205537Abstract: One embodiment relates to a focused electron beam imaging apparatus. The apparatus includes an electron beam column, an electron source, a gun lens, a pre-scanning deflector, a main scanning deflector, an objective lens, and a detector. The pre-scanning deflector comprises a 12-pole electrostatic deflector which is configured to controllably deflect the electron beam away from the optical axis of the electron beam column. Another embodiment relates to a method of scanning an electron beam over a target substrate in a focused electron beam imaging instrument. The electron beam is controllably deflected, without third-order deflection aberrations, away from an optical axis of an electron beam column using a pre-scanning deflector. The electron beam is then controllably deflected back towards the optical axis using a main scanning deflector so that the electron beam passes through a center of an objective electron lens. Other embodiments, aspects and features are also disclosed.Type: ApplicationFiled: February 16, 2011Publication date: August 16, 2012Inventor: Xinrong JIANG
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Publication number: 20120138791Abstract: In one embodiment, a first vacuum chamber of an electron beam column has an opening which is positioned along an optical axis so as to pass a primary electron beam that travels down the column. A source that emits electrons is positioned within the first vacuum chamber. A beam-limiting aperture is configured to pass a limited angular range of the emitted electrons. A magnetic immersion lens is positioned outside of the first vacuum chamber and is configured to immerse the electron source in a magnetic field so as to focus the emitted electrons into the primary electron beam. An objective lens is configured to focus the primary electron beam onto a beam spot on a substrate surface so as to produce scattered electrons from the beam spot. Controllable deflectors are configured to scan the beam spot over an area of the substrate surface. Other features and embodiments are also disclosed.Type: ApplicationFiled: December 1, 2010Publication date: June 7, 2012Inventors: Marian MANKOS, Liqun HAN, Xinrong JIANG, Rex RUNYON, Carmela MORENO
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Publication number: 20110114838Abstract: One embodiment relates to an electron-beam apparatus for defect inspection and/or review of substrates or for measuring critical dimensions of features on substrates. The apparatus includes an electron gun and an electron column. The electron gun includes an electron source configured to generate electrons for an electron beam and an adjustable beam-limiting aperture which is configured to select and use one aperture size from a range of aperture sizes. Another embodiment relates to providing an electron beam in an apparatus. Advantageously, the disclosed apparatus and methods reduce spot blur while maintaining a high beam current so as to obtain both high sensitivity and high throughput.Type: ApplicationFiled: December 9, 2009Publication date: May 19, 2011Inventors: Liqun HAN, Marian MANKOS, Xinrong JIANG, Rex RUNYON, John GREENE
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Patent number: 7821187Abstract: An electron gun of the type having an electron emitter for emitting electrons, including an electrostatic lens and a magnetic lens formed by pole pieces with a winding coil disposed between the magnetic pole pieces. The magnetic lens forms a rotationally symmetrical magnetic field in a gap formed by the pole pieces. The magnetic field forms the magnetic lens and focuses the electrons emitted from the emitter. A vacuum tube separates the electron gun from the magnetic lens. The electron gun is sealed in a vacuum by the vacuum tube and the magnetic lens is shielded in air.Type: GrantFiled: September 5, 2008Date of Patent: October 26, 2010Assignee: KLA-Tencor CorporationInventors: Xinrong Jiang, Marian Mankos, Liqun Han
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Patent number: 7800075Abstract: A multifunction module for an electron beam column comprises upper and lower electrodes, and a central ring electrode. The upper and lower electrodes have multipoles and are capable of deflecting, or correcting an aberration of, an electron beam passing through the electrodes. A voltage can be applied to the central ring electrode independently of the voltages applied to the upper and lower electrodes to focus the electron beam on a substrate.Type: GrantFiled: August 19, 2008Date of Patent: September 21, 2010Inventors: Benyamin Buller, William J. DeVore, Juergen Frosien, Xinrong Jiang, Richard L. Lozes, Henry Thomas Pearce-Percy, Dieter Winkler, Steven T. Coyle, Helmut Banzhof
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Publication number: 20080308751Abstract: A multifunction module for an electron beam column comprises upper and lower electrodes, and a central ring electrode. The upper and lower electrodes have multipoles and are capable of deflecting, or correcting an aberration of, an electron beam passing through the electrodes. A voltage can be applied to the central ring electrode independently of the voltages applied to the upper and lower electrodes to focus the electron beam on a substrate.Type: ApplicationFiled: August 19, 2008Publication date: December 18, 2008Inventors: Benyamin Buller, William J. DeVore, Juergen Frosien, Xinrong Jiang, Richard L. Lozes, Henry Thomas Pearce-Percy, Dieter Winkler, Steven T. Coyle, Helmut Banzhof
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Patent number: 7427765Abstract: An electron beam column comprises a thermal field emission electron source to generate an electron beam, an electron beam blanker, a beam shaping module, and electron beam optics comprising a plurality of electron beam lenses. In one version, the optical parameters of the electron beam blanker, beam shaping module, and electron beam optics are set to achieve an acceptance semi-angle ? of from about ¼ to about 3 mrads, where the acceptance semi-angle ? is half the angle subtended by the electron beam at the writing plane. The beam-shaping module can also operate as a single lens using upper and lower projection lenses. A multifunction module for an electron beam column is also described.Type: GrantFiled: October 3, 2005Date of Patent: September 23, 2008Assignee: Jeol, Ltd.Inventors: Benyamin Buller, William J. DeVore, Juergen Frosien, Xinrong Jiang, Richard L. Lozes, Henry Thomas Pearce-Percy, Dieter Winkler, Steven T. Coyle, Helmut Banzhof
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Patent number: 7262418Abstract: A multi-charged particle beam tool for semiconductor wafer inspection or lithography includes an array of electron beam columns, each having its own electron or ion source. The objective lenses of the various electron beam columns, while each has its own pole piece, share a common single magnetic coil which generates a uniform magnetic field surrounding the entire array of electron beam columns. This advantageously improves the spacing between the beams while providing the superior optical properties of a strong magnetic objective lens. When used as an inspection tool, each column also has its own associated detector to detect secondary and back-scattered electrons from the wafer under inspection. In one version the gun lenses similarly have individual pole pieces for each column and share a common magnetic coil.Type: GrantFiled: April 15, 2004Date of Patent: August 28, 2007Assignee: Applied Materials, Inc.Inventors: Chiwoei Wayne Lo, Xinrong Jiang
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Publication number: 20070085033Abstract: An electron beam column comprises a thermal field emission electron source to generate an electron beam, an electron beam blanker, a beam shaping module, and electron beam optics comprising a plurality of electron beam lenses. In one version, the optical parameters of the electron beam blanker, beam shaping module, and electron beam optics are set to achieve an acceptance semi-angle ? of from about ¼ to about 3 mrads, where the acceptance semi-angle ? is the half the angle subtended by the electron beam at the writing plane. The beam-shaping module can also operate as a single lens using upper and lower projection lenses. A multifunction module for an electron beam column is also described.Type: ApplicationFiled: October 3, 2005Publication date: April 19, 2007Inventors: Benyamin Buller, William DeVore, Juergen Frosien, Xinrong Jiang, Richard Lozes, Henry Pearce-Percy, Dieter Winkler, Steven Coyle, Helmut Banzhof
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Patent number: 7067809Abstract: A multi-charged particle beam tool for semiconductor wafer inspection or lithography includes an array of electron beam columns, each having its own electron or ion source. The objective lenses of the various electron beam columns, while each has its own pole piece, share a common single magnetic coil which generates a uniform magnetic field surrounding the entire array of electron beam columns. This advantageously improves the spacing between the beams while providing the superior optical properties of a strong magnetic objective lens. When used as an inspection tool, each column also has its own associated detector to detect secondary and back-scattered electrons from the wafer under inspection. In one version the gun lenses similarly have individual pole pieces for each column and share a common magnetic coil.Type: GrantFiled: April 15, 2004Date of Patent: June 27, 2006Assignee: Applied Materials, Inc.Inventors: Chiwoei Wayne Lo, Xinrong Jiang
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Publication number: 20060108531Abstract: A multi-charged particle beam tool for semiconductor wafer inspection or lithography includes an array of electron beam columns, each having its own electron or ion source. The objective lenses of the various electron beam columns, while each has its own pole piece, share a common single magnetic coil which generates a uniform magnetic field surrounding the entire array of electron beam columns. This advantageously improves the spacing between the beams while providing the superior optical properties of a strong magnetic objective lens. When used as an inspection tool, each column also has its own associated detector to detect secondary and back-scattered electrons from the wafer under inspection. In one version the gun lenses similarly have individual pole pieces for each column and share a common magnetic coil.Type: ApplicationFiled: April 15, 2004Publication date: May 25, 2006Inventors: Chiwoei Lo, Xinrong Jiang
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Publication number: 20050230633Abstract: A multi-charged particle beam tool for semiconductor wafer inspection or lithography includes an array of electron beam columns, each having its own electron or ion source. The objective lenses of the various electron beam columns, while each has its own pole piece, share a common single magnetic coil which generates a uniform magnetic field surrounding the entire array of electron beam columns. This advantageously improves the spacing between the beams while providing the superior optical properties of a strong magnetic objective lens. When used as an inspection tool, each column also has its own associated detector to detect secondary and back-scattered electrons from the wafer under inspection. In one version the gun lenses similarly have individual pole pieces for each column and share a common magnetic coil.Type: ApplicationFiled: April 15, 2004Publication date: October 20, 2005Inventors: Chiwoei Lo, Xinrong Jiang
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Patent number: 6750455Abstract: A multi-charged particle beam tool for semiconductor wafer inspection or lithography includes an array of electron beam columns, each having its own electron or ion source. The objective lenses of the various electron beam columns, while each has its own pole piece, share a common single magnetic coil which generates a uniform magnetic field surrounding the entire array of electron beam columns. This advantageously improves the spacing between the beams while providing the superior optical properties of a strong magnetic objective lens. When used as an inspection tool, each column also has its own associated detector to detect secondary and back-scattered electrons from the wafer under inspection. In one version the gun lenses similarly have individual pole pieces for each column and share a common magnetic coil.Type: GrantFiled: July 2, 2001Date of Patent: June 15, 2004Assignee: Applied Materials, Inc.Inventors: Chiwoe Wayne Lo, Xinrong Jiang