Patents by Inventor Yao-Hung Yang
Yao-Hung Yang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20210035767Abstract: Embodiments of the present disclosure generally relate to a method for forming and treating a component in semiconductor manufacturing. In one embodiment, a method for treating a chamber component used in vacuum processing includes obtaining the chamber component including a recess formed in a surface of the chamber component, the surface being fabricated from a metal, and the recess has a depth ranging from about 0.5 mm to about 10 mm and a width ranging from about 1 mm to about 15 mm. The method further includes polishing the bottom surface of the recess using a laser to form a polished bottom surface having an Ra number of 1 micron or less. The laser can achieve high quality surface finishing.Type: ApplicationFiled: July 29, 2019Publication date: February 4, 2021Inventors: Gang Grant PENG, Wai-Fan YAU, David W. GROECHEL, Frank F. HOOSHDARAN, Tom K. CHO, Yao-Hung YANG
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Publication number: 20200079044Abstract: A method of reclaiming a used seal includes boiling the used seal in a liquid, and after boiling the used seal in the liquid, baking the used seal. The boiling the used seal may include boiling for a predetermined boiling time in the liquid, and the baking the used seal may include baking the used seal for a predetermined bake time at a predetermined temperature.Type: ApplicationFiled: September 6, 2018Publication date: March 12, 2020Inventors: Shagun P. MAHESHWARI, Yao-Hung YANG, Tom K. CHO, Yu-Chi YEH, Andrew YU, Aniruddha PAL, Siamak SALIMIAN
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Publication number: 20200025292Abstract: A sealing member is provided, including a plurality of nodes and a plurality of antinodes. Each sealing member can be rotated to expose non-damaged lobes for sealing, and prevents the sealing member from falling out of the lobed groove. A chamber is provided, including a groove that the sealing member is placed in. A method of rotating and placing the sealing member is provided, including a rotation to expose nondamaged portions of the sealing member.Type: ApplicationFiled: July 19, 2019Publication date: January 23, 2020Inventors: Shagun P. MAHESHWARI, Yao-Hung YANG, King F. LEE, Andrew YU, Aniruddha PAL, Tom K. CHO, Chien-Min LIAO
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Patent number: 9089007Abstract: Methods and substrate processing systems are provided for controlling substrate heating efficiency and generating a desired temperature profile on the surface of a substrate when the substrate is disposed on a substrate support surface of a substrate support assembly. The substrate support assembly is provided with minimum software control and hardware requirement and includes a heating element comprised of multiple heating elements sections. The heating element is connected to a power source for adjusting the temperature outputs of the multiple heating element sections and providing adjustable multi-heating zones and desired temperature distribution over the substrate support surface of the substrate support assembly within a process chamber.Type: GrantFiled: February 14, 2013Date of Patent: July 21, 2015Assignee: APPLIED MATERIALS, INC.Inventors: Yao-Hung Yang, Jeonghoon Oh, Frank F. Hooshdaran, Tom K. Cho, Tao Hou
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Patent number: 8911151Abstract: A bushing assembly for supporting a substrate within a processing chamber is generally provided. In one aspect, the bushing assembly comprises a tubular body having an outer perimeter and an aperture extending therethrough, a first ring having a first inner edge, the first ring disposed in the aperture in an upper portion of the tubular body, and a second ring having a second inner edge, the second ring disposed in the aperture in a lower portion of the tubular body. In another aspect, the first inner edge has a first radius of curvature, and the second inner edge has a second radius of curvature. In another aspect, a first inner edge diameter, a second inner edge diameter, the first radius of curvature, and the second radius of curvature are selected such that a support pin extending through the aperture contacts the bushing assembly on at most two points.Type: GrantFiled: October 9, 2012Date of Patent: December 16, 2014Assignee: Applied Materials, Inc.Inventors: Tao Hou, Jeonghoon Oh, Tom K. Cho, Andrzej Matlosz, Frank F. Hooshdaran, Yao-Hung Yang
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Publication number: 20130284721Abstract: Methods and substrate processing systems are provided for controlling substrate heating efficiency and generating a desired temperature profile on the surface of a substrate when the substrate is disposed on a substrate support surface of a substrate support assembly. The substrate support assembly is provided with minimum software control and hardware requirement and includes a heating element comprised of multiple heating elements sections. The heating element is connected to a power source for adjusting the temperature outputs of the multiple heating element sections and providing adjustable multi-heating zones and desired temperature distribution over the substrate support surface of the substrate support assembly within a process chamber.Type: ApplicationFiled: February 14, 2013Publication date: October 31, 2013Inventors: Yao-Hung Yang, Jeonghoon Oh, Frank F. Hooshdaran, Tom K. Cho, Tao Hou
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Publication number: 20130287529Abstract: A substrate processing system with independent substrate placement capability to two or more substrate support assemblies is provided. Two different sets of fixed-length lift pins are disposed on two or more substrate support lift pin assemblies of two or more process chambers, where the length of each lift pin in one process chamber is different from the length of each lift pin in another process chamber. The substrate processing system includes simplified mechanical substrate support lift pin mechanisms and minimum accessory parts cooperating with a substrate transfer mechanism (e.g., a transfer robot) for efficient and independent loading, unloading, and transfer of one or more substrates between two or more processing regions in a twin chamber or between two or more process chambers. A method for positioning one or more substrates to be loaded, unloaded, or processed independently or simultaneously in two or more processing regions or process chambers is provided.Type: ApplicationFiled: March 15, 2013Publication date: October 31, 2013Applicant: APPLIED MATERIALS, INC.Inventors: Yao-Hung YANG, Jeonghoon OH, Frank F. HOOSHDARAN, Tom K. CHO, Tao HOU, Yuanhung GUO
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Publication number: 20130122611Abstract: The present invention generally relates to methods of controlling UV lamp output to increase irradiance uniformity. The methods generally include determining a baseline irradiance within a chamber, determining the relative irradiance on a substrate corresponding to a first lamp and a second lamp, and determining correction or compensation factors based on the relative irradiances and the baseline irradiance. The lamps are then adjusted via closed loop control using the correction or compensation factors to individually adjust the lamps to the desired output. The lamps may optionally be adjusted to equal irradiances prior to adjusting the lamps to the desired output. The closed loop control ensures process uniformity from substrate to substrate. The irradiance measurement and the correction or compensation factors allow for adjustment of lamp set points due to chamber component degradation, chamber component replacement, or chamber cleaning.Type: ApplicationFiled: November 5, 2012Publication date: May 16, 2013Inventors: YAO-HUNG YANG, Abhijit Kangude, Sanjeev Baluja, Michael Martinelli, Liliya Krivulina, Thomas Nowak, Juan Carlos Rocha-Alvarez, Scott A. Hendrickson
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Patent number: 8338809Abstract: A reflector for an ultraviolet lamp can be used in a substrate processing apparatus. The reflector comprises a centrally positioned longitudinal strip and first and second side reflectors to form a parabolic-type surface. The longitudinal strip and first and second side reflectors have curved reflective surfaces with dichroic coatings and the longitudinal strip comprises a plurality of through holes to direct a coolant gas toward the ultraviolet lamp. A chamber that uses an ultraviolet lamp module with the reflector, and a method of ultraviolet treatment are also described.Type: GrantFiled: June 20, 2011Date of Patent: December 25, 2012Assignee: Applied Materials, Inc.Inventors: Yao-Hung Yang, Tuan Anh Nguyen, Sanjeev Baluja, Andrzej Kaszuba, Juan Carlos Rocha, Thomas Nowak, Dustin W. Ho
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Patent number: 8309421Abstract: The present invention generally relates to methods of controlling UV lamp output to increase irradiance uniformity. The methods generally include determining a baseline irradiance within a chamber, determining the relative irradiance on a substrate corresponding to a first lamp and a second lamp, and determining correction or compensation factors based on the relative irradiances and the baseline irradiance. The lamps are then adjusted via closed loop control using the correction or compensation factors to individually adjust the lamps to the desired output. The lamps may optionally be adjusted to equal irradiances prior to adjusting the lamps to the desired output. The closed loop control ensures process uniformity from substrate to substrate. The irradiance measurement and the correction or compensation factors allow for adjustment of lamp set points due to chamber component degradation, chamber component replacement, or chamber cleaning.Type: GrantFiled: January 21, 2011Date of Patent: November 13, 2012Assignee: Applied Materials, Inc.Inventors: Yao-Hung Yang, Abhijit Kangude, Sanjeev Baluja, Michael Martinelli, Liliya Krivulina, Thomas Nowak, Juan Carlos Rocha-Alvarez, Scott Hendrickson
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Publication number: 20120129275Abstract: The present invention generally relates to methods of controlling UV lamp output to increase irradiance uniformity. The methods generally include determining a baseline irradiance within a chamber, determining the relative irradiance on a substrate corresponding to a first lamp and a second lamp, and determining correction or compensation factors based on the relative irradiances and the baseline irradiance. The lamps are then adjusted via closed loop control using the correction or compensation factors to individually adjust the lamps to the desired output. The lamps may optionally be adjusted to equal irradiances prior to adjusting the lamps to the desired output. The closed loop control ensures process uniformity from substrate to substrate. The irradiance measurement and the correction or compensation factors allow for adjustment of lamp set points due to chamber component degradation, chamber component replacement, or chamber cleaning.Type: ApplicationFiled: January 21, 2011Publication date: May 24, 2012Applicant: APPLIED MATERIALS, INC.Inventors: Yao-Hung Yang, Abhijit Kangude, Sanjeev Baluja, Michael Martinelli, Liliya Krivulina, Thomas Nowak, Juan Carlos Rocha-Alvarez, Scott Hendrickson
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Publication number: 20110248183Abstract: A reflector for an ultraviolet lamp can be used in a substrate processing apparatus. The reflector comprises a centrally positioned longitudinal strip and first and second side reflectors to form a parabolic-type surface. The longitudinal strip and first and second side reflectors have curved reflective surfaces with dichroic coatings and the longitudinal strip comprises a plurality of through holes to direct a coolant gas toward the ultraviolet lamp. A chamber that uses an ultraviolet lamp module with the reflector, and a method of ultraviolet treatment are also described.Type: ApplicationFiled: June 20, 2011Publication date: October 13, 2011Inventors: Yao-Hung Yang, Tuan Anh Nguyen, Sanjeev Baluja, Andrzej Kaszuba, Juan Carlos Rocha, Thomas Nowak, Dustin W. Ho
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Patent number: 7964858Abstract: A reflector for an ultraviolet lamp can be used in a substrate processing apparatus. The reflector comprises a longitudinal strip extending the length of the ultraviolet lamp. The longitudinal strip has a curved reflective surface and comprises a plurality of through holes to direct a coolant gas toward the ultraviolet lamp. A chamber that uses an ultraviolet lamp module with the reflector, and a method of ultraviolet treatment are also described.Type: GrantFiled: October 21, 2008Date of Patent: June 21, 2011Assignee: Applied Materials, Inc.Inventors: Yao-Hung Yang, Tuan Anh Nguyen, Sanjeev Baluja, Andrzej Kaszuba, Juan Carlos Rocha, Thomas Nowak, Dustin W. Ho
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Publication number: 20100096569Abstract: An ultraviolet-transmitting microwave reflector for a substrate processing chamber, comprises a micromesh screen extending across the metallic frame. In one version, the micromesh screen comprises at least one electroformed layer. A method of fabricating the microwave reflector comprises electroforming a metallic frame surrounding a micromesh screen such that the micromesh screen comprises an open area of greater than 80% of the total area.Type: ApplicationFiled: October 21, 2008Publication date: April 22, 2010Inventors: Tuan Anh Nguyen, Yao-Hung Yang, Sanjeev Baluja, Thomas Nowak, Juan Carlos Rocha-Alvarez
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Publication number: 20100096564Abstract: A reflector for an ultraviolet lamp can be used in a substrate processing apparatus. The reflector comprises a longitudinal strip extending the length of the ultraviolet lamp. The longitudinal strip has a curved reflective surface and comprises a plurality of through holes to direct a coolant gas toward the ultraviolet lamp. A chamber that uses an ultraviolet lamp module with the reflector, and a method of ultraviolet treatment are also described.Type: ApplicationFiled: October 21, 2008Publication date: April 22, 2010Inventors: Yao-Hung Yang, Tuan Anh Nguyen, Sanjeev Baluja, Andrzej Kaszuba, Juan Carlos Rocha, Thomas Nowak, Dustin W. Ho
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Publication number: 20070273731Abstract: A method for driving an ink jet head (10) having a piezoelectric actuator (103) includes the steps of: (a) transmitting a negative electrical pulse (31) to drive the piezoelectric actuator to transform in a manner such that ink is filled into an ink chamber (102) of the ink jet head; and (b) transmitting a positive electrical pulse (32) to drive the piezoelectric actuator to transform in a manner such that the ink is ejected out of the ink chamber.Type: ApplicationFiled: May 26, 2006Publication date: November 29, 2007Applicant: ICF Technology LimitedInventors: Whu-Ming Young, Yao-Hung Yang