Abstract: A multi-phase hot-rolled steel sheet has a metallurgical structure having a main phase of ferrite with an average grain diameter of at most 3.0 ?m and a second phase including at least one of martensite, bainite, and austenite. In the surface layer, the average grain diameter of the second phase is at most 2.0 ?m, the difference (?nHav) between the average nanohardness of the main phase (nH?av) and the average nanohardness of the second phase (nH2nd av) is 6.0-10.0 GPa, the difference (??nH) of the standard deviation of the nanohardness of the second phase from the standard deviation of the nanohardness of the main phase is at most 1.5 GPa, and in the central portion, the difference (?nHav) between the average nanohardnesses is at least 3.5 GPa to at most 6.0 GPa and the difference (??nH) between the standard deviations of the nanohardnesses is at least 1.5 GPa.

Abstract: A high-strength steel sheet has a chemical composition comprising C: 0.05-0.20%, Si: 0.02-3.0%, Mn: 0.5-3.0%, P: at most 0.5%, S: at most 0.05%, Cr: 0.05-1.0%, sol. Al: 0.01-1.0%, one or more elements selected from the group consisting of Ti, Nb, Mo, V, and W: a total of 0.002-0.03%, and a remainder of Fe and impurities. The sheet has an average grain diameter of ferrite of at most 3.0 ?m at least in a region of 100-200 ?m in the sheet thickness direction from the surface of the steel sheet. The average spacing in the sheet thickness direction of the remaining structure in this region is at most 3.0 ?m. Mechanical properties include at least 750 MPa tensile strength and at least 13,000 MPa·% (tensile strength×elongation).

Abstract: Provided is a transport method comprising judging whether there is a possibility that misalignment greater than or equal to a threshold value occurs between substrates to be layered that are held by a pair of substrate holders aligned and stacked by an aligning section, the misalignment occurring when the pair of substrate holders is transported from the aligning section to a pressure applying section; and if the judgment indicates that there is the possibility of misalignment, transporting the pair of substrate holders to a region other than the pressure applying section. Whether there is the possibility of misalignment may be judged based on at least one of an acceleration of the substrate holders, an acceleration of a transporting section that transports the substrate holders, relative positions of the substrate holders, or relative positions of the transporting section and one of the pair of substrate holders.

Abstract: A multi-phase hot-rolled steel sheet having improved strength in an intermediate strain rate region has a chemical composition comprising, in mass percent, C: 0.07-0.2%, Si+Al: 0.3-1.5%, Mn: 1.0-3.0%, P: at most 0.02%, S: at most 0.005%, Cr: 0.1-0.5%, N: 0.001-0.008%, at least one of Ti: 0.002-0.05% and Nb: 0.002-0.05%, and a remainder of Fe and impurities. The area fraction of ferrite is 7-35%, the grain diameter of ferrite is in the range of 0.5-3.0 ?m, and the nanohardness of ferrite is in the range of 3.5-4.5 GPa. A second phase which is the remainder other than ferrite contains martensite and bainitic ferrite and/or bainite. The average nanohardness of the second phase is 5-12 GPa, and the second phase contains a high-hardness phase of 8-12 GPa with an area fraction of 5-35% based on the overall structure.

Abstract: Provided is a transport method comprising judging whether there is a possibility that misalignment greater than or equal to a threshold value occurs between substrates to be layered that are held by a pair of substrate holders aligned and stacked by an aligning section, the misalignment occurring when the pair of substrate holders is transported from the aligning section to a pressure applying section; and if the judgment indicates that there is the possibility of misalignment, transporting the pair of substrate holders to a region other than the pressure applying section. Whether there is the possibility of misalignment may be judged based on at least one of an acceleration of the substrate holders, an acceleration of a transporting section that transports the substrate holders, relative positions of the substrate holders, or relative positions of the transporting section and one of the pair of substrate holders.

Abstract: Provided is a transport method comprising judging whether there is a possibility that misalignment greater than or equal to a threshold value occurs between substrates to be layered that are held by a pair of substrate holders aligned and stacked by an aligning section, the misalignment occurring when the pair of substrate holders is transported from the aligning section to a pressure applying section; and if the judgment indicates that there is the possibility of misalignment, transporting the pair of substrate holders to a region other than the pressure applying section. Whether there is the possibility of misalignment may be judged based on acceleration of the substrate holders. Whether there is the possibility of misalignment may be judged based on acceleration of a transporting section that transports the substrate holders. Whether there is the possibility of misalignment may be judged based on relative positions of the substrate holders.

Abstract: The throughput of the alignment in an alignment apparatus is improved. There is provided an alignment apparatus for aligning a substrate having an alignment mark, including a first aligner that aligns the substrate to a first reference position, a second aligner that aligns a substrate holder to a second reference position before the substrate holder holds the substrate, and a position detector that detects a position of the alignment mark of the substrate after the substrate holder holds the substrate.

Abstract: Provided is a transport method comprising judging whether there is a possibility that misalignment greater than or equal to a threshold value occurs between substrates to be layered that are held by a pair of substrate holders aligned and stacked by an aligning section, the misalignment occurring when the pair of substrate holders is transported from the aligning section to a pressure applying section; and if the judgment indicates that there is the possibility of misalignment, transporting the pair of substrate holders to a region other than the pressure applying section. Whether there is the possibility of misalignment may be judged based on acceleration of the substrate holders. Whether there is the possibility of misalignment may be judged based on acceleration of a transporting section that transports the substrate holders. Whether there is the possibility of misalignment may be judged based on relative positions of the substrate holders.

Abstract: A method for exposure control comprising the steps of measuring the change of the transmissivity or transmittance for the light incident to the projection optical system prior to the exposure operation effected by illuminating a pattern on a reticle to form an image of the pattern on a photosensitive wafer through the projection optical system, storing the measured change of the transmissivity, sequentially measuring the amount of the light incident to the projection optical system during the exposure operation, calculating the exposure light amount for the photosensitive wafer from the exposure light amount based on the stored change of the transmissivity, and integrating the exposure from the start of the exposure operation to terminate the exposure operation when the total exposure light amount has reached a predetermined value. The total exposure light amount for the wafer surface can be controlled even if the transmissivity of the projection optical system fluctuates.

Abstract: An apparatus for exposing a pattern, formed on a mask, on each of a plurality of partitioned areas on a photosensitive substrate by a step-and-repeat scheme includes a projection optical system for projecting the pattern of the mask on the photosensitive substrate, a substrate stage for holding the photosensitive substrate and two-dimensionally moving the photosensitive substrate within a plane perpendicular to the optical axis of the projection optical system, a detection unit for projecting a pattern image having a predetermined shape on the photosensitive substrate and photoelectrically detecting light reflected by the photosensitive substrate to detect a position at each of a plurality of points on the photosensitive substrate along the optical axis of the projection optical system, and a measurement unit for, when each of a plurality of measurement points in a partitioned area on which a pattern of the mask is to be exposed next coincides with or approaches the pattern image, detecting an offset amount b

Abstract: An aligner applies exposure light from an exposure light source to a reticle through an illuminating optical system to project a pattern image of the reticle onto a photosensitive substrate through a projection optical system, and is equipped with a gas supply device for filling spaces formed between optical elements in a lens barrel housing the projection optical system therein with an inert gas, pressure sensors for sensing the pressures in the spaces, and optical performance adjustment devices for adjusting the optical performance of the projection optical system. The optical performance adjustment device can be, for example, a device for adjusting a distance between a pair of the optical elements or a device for adjusting a pressure in a space between the optical elements.

Abstract: An apparatus for exposing a pattern, formed on a mask, on each of a plurality of partitioned areas on a photosensitive substrate by a step-and-repeat scheme includes a projection optical system for projecting the pattern of the mask on the photosensitive substrate, a substrate stage for holding the photosensitive substrate and two-dimensionally moving the photosensitive substrate within a plane perpendicular to the optical axis of the projection optical system, a detection unit for projecting a pattern image having a predetermined shape on the photosensitive substrate and photoelectrically detecting light reflected by the photosensitive substrate to detect a position at each of a plurality of points on the photosensitive substrate along the optical axis of the projection optical system, and a measurement unit for, when each of a plurality of measurement points in a partitioned area on which a pattern of the mask is to be exposed next coincides with or approaches the pattern image, detecting an offset amount b

Abstract: A CVD apparatus for fabricating a titanium nitride thin film is provided. The apparatus comprises an evacuatable reaction vessel having an interior, a pumping apparatus capable of exhausting the reaction vessel and maintaining the interior of the reaction vessel at a prescribed pressure, a gas feeder for introducing a mixed gas into the reaction vessel, a substrate holder in the reaction vessel for holding a substrate to be coated with a titanium nitride thin film, and a heater for heating the substrate. The gas feeder is equipped with the following components: (a) a vaporizer for vaporizing tetrakis(dialkylamino)titanium (TDAAT) from a liquid source material, (b) a first flow controller capable of setting a flow rate of the vaporized TDAAT to any level within a range of 0.

Abstract: An apparatus for exposing a pattern, formed on a mask, on each of a plurality of partitioned areas on a photosensitive substrate by a step-and-repeat scheme includes a projection optical system for projecting the pattern of the mask on the photosensitive substrate, a substrate stage for holding the photosensitive substrate and two-dimensionally moving the photosensitive substrate within a plane perpendicular to the optical axis of the projection optical system, a detection unit for projecting a pattern image having a predetermined shape on the photosensitive substrate and photoelectrically detecting light reflected by the photosensitive substrate to detect a position at each of a plurality of points on the photosensitive substrate along the optical axis of the projection optical system, and a measurement unit for, when each of a plurality of measurement points in a partitioned area on which a pattern of the mask is to be exposed next coincides with or approaches the pattern image, detecting an offset amount b

Abstract: The quantity of ultraviolet light (IL) incident on a projection optical system (PL) is measured by means of an integrator sensor (9), and the quantity of ultraviolet pulse light (IL) that has passed through the projection optical system (PL) is measured by means of an irradiation monitor (32). The quantity of transmitted light is divided by the quantity of incident light to calculate the proportion at which the ultraviolet pulse light (IL) is attenuated in the projection optical system (PL), or an attenuation factor. The attenuation factor is determined as a function of the integrated value of the quantity of incident light. During exposure, the integrated value as quantity measured by means of the integrator sensor (9) is substituted into the function to estimate the transmissivity (attenuation factor) of the projection optical system (PL).

Abstract: The present invention is directed to a molded resin product and resin composition form making the same. The molded resin product includes at least one thick wall portion, at least one thin wall portion, and at least one thickness changing portion extending between the thick wall portion and the thin wall portion. The resin composition being used for forming the molded resin product includes 0.01-0.1 part by weight of a delustering agent and 100 parts by weight of blend components comprising: 30-50% by weight of a polypropylene block copolymer containing 4-20% by weight of ethylene, 0-10% by weight of polyethylene, 5-15% by weight of a propylene/butene copolymer, and 40-60% by weight of an ethylene/&agr;-olefin copolymer rubber.

Abstract: A resin molded product made of a thermoplastic resin composition and having a thick-walled portion, a thin-walled portion, and a wall-thickness changed portion provided between the thick-walled portion and the thin-walled portion. The thermoplastic resin composition exhibits a melting viscosity of not larger than 1500 poise and a die swell ratio of not lower than 1.0 when measured by using a capillary rheometer (temperature of 200° C. and die L/D=10 mm/1 mm) at a shear rate of not lower than 1200/sec.

Abstract: A projection exposure apparatus which can perform superior observation or projection of a selected mark when the mark is observed or projected through a projection optical system in which a pupil filter is set. The projection exposure apparatus which projects a pattern on a mask through a projection optical system onto a photosensitive substrate held on a substrate stage movable in a plane perpendicular to the optical axis of the projection optical system and which has a pupil filter (optical correction plate) placed on or near the pupil plane of the projection optical system, a reference mark formed on the substrate stage in a scale factor according to the shape of the pupil filter, illuminating means for illuminating the reference mark with illumination light, and light-receiving means for receiving the illumination light having emerged from the reference mark and thereafter having passed the projection optical system.

Abstract: A method for fabricating a titanium nitride thin film in a reaction vessel on a surface of a substrate heated to a prescribed temperature, includes the steps of mixing tetrakis(dialkylamino)titanium (TDAAT) and a first carrier gas to create a first mixed gas; feeding the first mixed gas into the reaction vessel through a first set of nozzles; mixing an added gas reactive with the tetrakis(dialkylamino)titanium with a second carrier gas to create a second mixed gas; feeding the second mixed gas into the reaction vessel through a second set of nozzles; while controlling the flow rates of the TDAAT, added gas, firt and second carrier gases; and depositing a titanium nitride thin film by the first mixed gas and the second mixed gas while confining the pressure inside the reaction vessel to a range of 0.1-15 Pa.

Abstract: A projection optical system of a projection exposure apparatus according to the present invention has a plurality of optical members made of glass materials at least one of which has a temperature characteristic of index of refraction different from that of the other glass material. Further, a temperature control device for controlling a temperature of at least one of the optical members is provided. An imaging characteristic of the projection optical system is controlled. The imaging characteristic to be controlled is a non-linear magnification or curvature of field. The temperature control device sets the temperature to be controlled to a variable target temperature determined in accordance with the imaging characteristic of the projection optical system. An exposing operation for transferring a mask pattern to a photosensitive substrate is started after the temperature of the optical member to be controlled reaches a predetermined allowable range of the target temperature.