Abstract: An automatic focus detection method comprises the steps of: irradiating onto a single spot of a sample a plurality of beams of illuminating light transmitted and condensed through an objective lens in a symmetrically diagonal manner with respect to an optical axis of the objective lens; branching reflected light from the same spot of the illuminated sample after transmission through the objective lens, in directions of illumination symmetrical with respect to the optical axis so as to obtain a plurality of optical images; and causing a photoelectric conversion device to receive the branched optical images for conversion to an electric signal representing light intensity distribution of the images, whereby a defocus of the sample is detected based on a discrepancy between the optical axis and the center of the light intensity distribution.

Abstract: A pattern detection method and apparatus thereof for inspecting with high resolution a micro fine defect of a pattern on an inspected object and a semiconductor substrate manufacturing method and system for manufacturing semiconductor substrates such as semiconductor wafers with a high yield. A micro fine pattern on the inspected object is inspected by irradiating an annular-looped illumination through an objective lens onto a wafer mounted on a stage, the wafer having micro fine patterns thereon. The illumination light may be circularly or elliptically polarized and controlled according to an image detected on the pupil of the objective lens and image signals are obtained by detecting a reflected light from the wafer. The image signals are compared with reference image signals and a part of the pattern showing inconsistency is detected as a defect so that simultaneously, a micro fine defect or defects on the micro fine pattern are detected with high resolution.

Abstract: A method for irradiating a substrate such as a semiconductor substrate, coated with a photoresist, with light to measure variations in optical properties such as reflectivity, refractive index, transmittance, polarization, spectral transmittance, for determining an optimum photoresist coating condition, an optimum photoresist baking condition, an optimum developing condition or an optimum exposure energy quantity, and forming a photoresist pattern according to the optimum condition. A system for the exposure method, a controlling method of forming a photoresist film by use of the exposure method, and a system for the controlling method, are useful for stabilization of the formation or treatment of the photoresist film, and ensure less variations in the pattern size.

Abstract: A pattern exposure method including the steps of irradiating a mask or reticle having a desired original pattern written thereon with light with a desired directivity from an illuminating light source for exposure, and projecting a transmitted or reflected light from said mask to an object to be exposed through a projection optical system, wherein a pattern-dependent polarizing mask for giving polarization characteristics in compliance with the direction of the pattern on the mask to the illuminating light transmitted through the pattern; and a pattern exposure apparatus including a illuminating light for exposure, a mask or a reticle, an illumination optical system for irradiating the mask with light emitted from the light source, and a projection optical system for projecting the transmitted or reflected light from the mask onto the object to be exposed, further including polarizing unit for polarizing the illuminating light on the pupil of the projection optical system so as to be nearly rotationally symme

Abstract: A method for irradiating a substrate such as a semiconductor substrate, coated with a photoresist, with light to measure variations in optical properties, such as reflectivity, refractive index, transmittance, polarization, spectral transmittance, for determining an optimum photoresist coating condition, an optimum photoresist baking condition, an optimum developing condition or an optimum exposure energy quantity, and forming a photoresist pattern according to the optimum condition. A system for the exposure method, a controlling method of forming a photoresist film by use of the exposure method, and a system for the controlling method, are useful for stabilization of the formation or treatment of the photoresist film, and ensure less variations in the pattern size.

Abstract: A novel exposure system includes a reduced-projection lens optimized for a predetermined single exposure wavelength and a chromatic aberration correction system for TTL (Through The Lens) alignment with broadband light. The correction system includes a holographic lens which dispersion has a negative number in contrast to a conventional glass lens which has a positive dispersion number. By employing a holographic lens, the total optical length of an alignment system can be made short enough to avoid the necessity of installing a mirror therein, thus realizing a highly accurate alignment system.

Abstract: A beam control method and apparatus for processing a specimen. A specimen is irradiated with a first beam capable of modifying a property of the specimen. Subsequently, a second beam, incapable of modifying a property of the specimen, irradiates the trace formed by the first beam to thereby identify the actual position of the trace by detecting a signal representing the actual position of the trace. On the basis of comparing actual position of the trace with a desired position of the trace, the latter is controlled.

Abstract: In a magnetic head of perpendicular magnetization type having main and sub magnetic poles arranged at both sides of a recording medium, a nonmagnetic supporter holding a high permeability magnetic thin layer of the main magnetic pole is formed by a polycrystalline sintered body substantially composed of titanium carbide and alumina. This polycrystalline sintered product well matches with a recording medium having a cobalt-chromium alloy layer so that the recording medium does not wear for a long time of use, and therefore, so that the contact surface of the main magnetic pole is hardly damaged. The same sintered body may also be used for the sub magnetic pole arranged to be in contact with the recording medium. Some structural improvements are also provided so that undesirable influence due to an adhesive layer adjacent to the magnetic thin layer is removed. One or more additional thin layers may be provided for reducing crosstalk between adjacent tracks.

Abstract: In a magnetic head of perpendicular magnetization type having main and sub magnetic poles arranged at both sides of a recording medium, a nonmagnetic supporter holding a high permeability magnetic thin layer of the main magnetic pole is formed by a polycrystalline sintered body substantially composed of titanium carbide and alumina. This polycrystalline sintered product well matches with a recording medium having a cobalt-chromium alloy layer so that the recording medium does not wear for a long time of use, and therefore, so that the contact surface of the main magnetic pole is hardly damaged. The same sintered body may also be used for the sub magnetic pole arranged to be in contact with the recording medium. Some structural improvements are also provided so that undesirable influence due to an adhesive layer adjacent to the magnetic thin layer is removed. One or more additional thin layers may be provided for reducing crosstalk between adjacent tracks.

Abstract: In a magnetic head for perpendicular magnetization recording of a main magnetic pole exited type, a high permeability magnetic thin layer is held at its top portion by nonmagnetic supporter and the thin layer is closed by a first high permeability block. The thus constructed main magnetic pole is surrounded by a second high permeability block, and a third high permeability block is located in facing relation to the main magnetic pole and second high permeability material. This magnetic head has high recording and reproducing efficiency and well-shielded from external magnetic field. Some structural improvements are also provided so that leakage of magnetic flux, disconnection and short circuit of a coil are avoided.

Abstract: A magnetic amorphous alloy having a compositional formula(Co.sub.100-y Fe.sub.y).sub.100-x Zr.sub.100-w Nb.sub.w).sub.xin which 5.ltoreq.x.ltoreq.10, 0.5.ltoreq.y.ltoreq.4, and 20.ltoreq.w.ltoreq.90.

Abstract: Electronic flash incorporated camera including a camera body having a lens, a case for the camera body, and a lens protective cover slidably mounted on the case. The cover is slidable between a closed position in which the cover covers the lens, and a retracted position in which the lens is exposed. An electronic flash emission member is mounted on the cover, and the emission member is positioned so as to project beyond the contour of the camera case when the cover is in the retracted position.

Abstract: A sound cinecamera is provided with an intermittent film feeding motor, a continuous film driving means for sound recording, an operating means, a plurality of switch means which is operated by said operating means so as to control the ON and OFF as well as the driving direction of said film feeding motor, and a controlling means which is connected with said film feeding motor by said operating means so as to be driven in concert with said motor and controls an overlapping operation in co-operation with said switch means.