Patents by Inventor Yasuhisa Inao

Yasuhisa Inao has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Exposure method and exposure apparatus using near-field light and exposure mask
    Publication number: 20010036581
    Abstract: A photolithography method using near-field light comprises a step of controlling the position of an exposure mask and an object to be processed so as to make the object to be located in a region where near-field light is present, and a step of exposing the object to near-field light while controlling the intensity of such light as a function of the aperture density of the exposure mask. The intensity of near-field light is controlled by modifying the aperture width or modifying the transmittivity of the exposure mask depending on the aperture density.
    Type: Application
    Filed: March 1, 2001
    Publication date: November 1, 2001
    Inventors: Yasuhisa Inao, Ryo Kuroda, Takako Yamaguchi