Patents by Inventor Yi Chang

Yi Chang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11956541
    Abstract: A control method of a driving mechanism is provided, including: the driving mechanism provides a first electrical signal from a control assembly to the driving mechanism to move the movable portion into an initial position relative to the fixed portion, wherein the control assembly includes a control unit and a position sensing unit; the status signal of an inertia sensing unit is read; the control unit sends the status signal to the control unit to calculate a target position; the control unit provides a second electrical signal to the driving assembly according to the target position for driving the driving assembly; a position signal is sent from the position sensing unit to the control unit; the control unit provides a third electric signal to the driving assembly to drive the driving assembly according the position signal.
    Type: Grant
    Filed: January 26, 2023
    Date of Patent: April 9, 2024
    Assignee: TDK TAIWAN CORP.
    Inventors: Chao-Chang Hu, Chen-Hsien Fan, Sung-Mao Tsai, Yueh-Lin Lee, Yu-Chiao Lo, Mao-Kuo Hsu, Ching-Chieh Huan, Yi-Chun Cheng
  • Patent number: 11954527
    Abstract: A resource allocation method comprises using resources with a used resource quantity of a machine learning system to execute a first experiment which has a first minimum resource demand, receiving an experiment request associated with a target dataset, deciding a second experiment according to the target dataset, deciding a second minimum resource demand of the second experiment, allocating resources with a quantity equal to the second minimum resource demand for an execution of the second experiment when a total resource quantity of the machine learning system meets a sum of the first minimum resource demand and the second minimum resource demand and a difference between the total resource quantity and the used resource quantity meets the second minimum resource demand, determining that the machine learning system has an idle resource, and selectively allocating said the idle resource for at least one of the first experiment and the second experiment.
    Type: Grant
    Filed: March 30, 2021
    Date of Patent: April 9, 2024
    Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Shih-Chang Chen, Yi-Chin Chu, Yi-Fang Lu
  • Publication number: 20240113187
    Abstract: The present disclosure relates to an integrated chip. The integrated chip includes a substrate having one or more interior surfaces forming a recess within an upper surface of the substrate. Source/drain regions are disposed within the substrate on opposing sides of the recess. A first gate dielectric is arranged along the one or more interior surfaces forming the recess, and a second gate dielectric is arranged on the first gate dielectric and within the recess. A gate electrode is disposed on the second gate dielectric. The second gate dielectric includes one or more protrusions that extend outward from a recessed upper surface of the second gate dielectric and that are arranged along opposing sides of the second gate dielectric.
    Type: Application
    Filed: January 5, 2023
    Publication date: April 4, 2024
    Inventors: Jhu-Min Song, Ying-Chou Chen, Yi-Kai Ciou, Chien-Chih Chou, Fei-Yun Chen, Yu-Chang Jong, Chi-Te Lin
  • Publication number: 20240112959
    Abstract: A method of fabricating a device includes forming a dummy gate over a plurality of fins. Thereafter, a first portion of the dummy gate is removed to form a first trench that exposes a first hybrid fin and a first part of a second hybrid fin. The method further includes filling the first trench with a dielectric material disposed over the first hybrid fin and over the first part of the second hybrid fin. Thereafter, a second portion of the dummy gate is removed to form a second trench and the second trench is filled with a metal layer. The method further includes etching-back the metal layer, where a first plane defined by a first top surface of the metal layer is disposed beneath a second plane defined by a second top surface of a second part of the second hybrid fin after the etching-back the metal layer.
    Type: Application
    Filed: December 1, 2023
    Publication date: April 4, 2024
    Inventors: Kuan-Ting PAN, Zhi-Chang LIN, Yi-Ruei JHAN, Chi-Hao WANG, Huan-Chieh SU, Shi Ning JU, Kuo-Cheng CHIANG
  • Publication number: 20240111133
    Abstract: An imaging lens assembly module includes a lens carrier, a rotatable component, an imaging surface and a holder portion. At least one lens element of the imaging lens assembly module is disposed on the lens carrier, and the lens carrier includes an assembling structure. The rotatable component includes a blade set and a rotating element. The blade set includes rotatable blades surrounding an optical axis to form a through hole. The rotating element is connected to the blade set. The imaging surface is located on an image side of the lens carrier. The holder portion is configured to keep a fixed distance between the lens carrier and the imaging surface. The blade set and the rotating element are disposed on the assembling structure, and the blade set and the rotating element rotate relatively to the assembling structure, so that the dimension of the through hole is variable.
    Type: Application
    Filed: September 21, 2023
    Publication date: April 4, 2024
    Inventors: Yu-Tzu CHANG, Hsiu-Yi HSIAO, Ming-Ta CHOU, Te-Sheng TSENG
  • Publication number: 20240113071
    Abstract: An integrated circuit package including electrically floating metal lines and a method of forming are provided. The integrated circuit package may include integrated circuit dies, an encapsulant around the integrated circuit dies, a redistribution structure on the encapsulant, a first electrically floating metal line disposed on the redistribution structure, a first electrical component connected to the redistribution structure, and an underfill between the first electrical component and the redistribution structure. A first opening in the underfill may expose a top surface of the first electrically floating metal line.
    Type: Application
    Filed: January 5, 2023
    Publication date: April 4, 2024
    Inventors: Chung-Shi Liu, Mao-Yen Chang, Yu-Chia Lai, Kuo-Lung Pan, Hao-Yi Tsai, Ching-Hua Hsieh, Hsiu-Jen Lin, Po-Yuan Teng, Cheng-Chieh Wu, Jen-Chun Liao
  • Publication number: 20240113113
    Abstract: Methods of cutting gate structures, and structures formed, are described. In an embodiment, a structure includes first and second gate structures over an active area, and a gate cut-fill structure. The first and second gate structures extend parallel. The active area includes a source/drain region disposed laterally between the first and second gate structures. The gate cut-fill structure has first and second primary portions and an intermediate portion. The first and second primary portions abut the first and second gate structures, respectively. The intermediate portion extends laterally between the first and second primary portions. First and second widths of the first and second primary portions along longitudinal midlines of the first and second gate structures, respectively, are each greater than a third width of the intermediate portion midway between the first and second gate structures and parallel to the longitudinal midline of the first gate structure.
    Type: Application
    Filed: December 1, 2023
    Publication date: April 4, 2024
    Inventors: Chih-Chang Hung, Chia-Jen Chen, Ming-Ching Chang, Shu-Yuan Ku, Yi-Hsuan Hsiao, I-Wei Yang
  • Publication number: 20240112945
    Abstract: In one embodiment, a susceptor for thermal processing is provided. The susceptor includes an outer rim surrounding and coupled to an inner dish, the outer rim having an inner edge and an outer edge. The susceptor further includes one or more structures for reducing a contacting surface area between a substrate and the susceptor when the substrate is supported by the susceptor. At least one of the one or more structures is coupled to the inner dish proximate the inner edge of the outer rim.
    Type: Application
    Filed: December 14, 2023
    Publication date: April 4, 2024
    Inventors: Anhthu NGO, Zuoming ZHU, Balasubramanian RAMACHANDRAN, Paul BRILLHART, Edric TONG, Anzhong CHANG, Kin Pong LO, Kartik SHAH, Schubert S. CHU, Zhepeng CONG, James Francis MACK, Nyi O. MYO, Kevin Joseph BAUTISTA, Xuebin LI, Yi-Chiau HUANG, Zhiyuan YE
  • Publication number: 20240110978
    Abstract: A semiconductor chip includes a physical layer and a processing circuit. The physical layer includes an input/output circuit, at least one sequence checking circuit and at least one signal transmission path, wherein the at least one sequence checking circuit is configured to generate at least one test result signal according to a clock signal transmitted through the input/output circuit and at least one test data signal transmitted through the at least one signal transmission path. The processing circuit is electrically coupled to the physical layer and is configured to determine an operation status of the at least one signal transmission path according to a voltage level of the at least one test result signal.
    Type: Application
    Filed: March 27, 2023
    Publication date: April 4, 2024
    Inventors: Hung-Yi CHANG, Bi-Yang LI, Shih-Cheng KAO
  • Patent number: 11945885
    Abstract: A vinyl-containing copolymer is copolymerized from (a) first compound, (b) second compound, and (c) third compound. (a) First compound is an aromatic compound having a single vinyl group. (b) Second compound is polybutadiene or polybutadiene-styrene having side vinyl groups. (c) Third compound is an acrylate compound. The vinyl-containing copolymer includes 0.003 mol/g to 0.010 mol/g of benzene ring, 0.0005 mol/g to 0.008 mol/g of vinyl group, and 1.2*10?5 mol/g to 2.4*10?4 mol/g of ester group.
    Type: Grant
    Filed: December 29, 2022
    Date of Patent: April 2, 2024
    Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Cheng-Po Kuo, Shin-Liang Kuo, Shu-Chuan Huang, Yan-Ting Jiang, Jian-Yi Hang, Wen-Sheng Chang
  • Patent number: 11946733
    Abstract: An image rendering device and an image rendering method are disclosed. For the elements of the image rendering device, a first sensor and a second sensor are configured to sense a target object in a two-dimensional (2D) mode and three-dimensional (3D) mode to generate a first surface-color-signal, a first 3D-depth-signal, a second surface-color-signal and a second 3D-depth-signal respectively. An IR projector is configured to generate an IR-dot-pattern. A processor is configured to control the IR projector to project the IR-dot-pattern on the target object in the 3D mode, and configured to process the first surface-color-signal, the second surface-color-signal, the first 3D-depth-signal and the second 3D-depth-signal to obtain a color 3D model of the target object.
    Type: Grant
    Filed: October 14, 2021
    Date of Patent: April 2, 2024
    Assignee: EYS3D MICROELECTRONICS CO.
    Inventors: Kuan-Cheng Chung, Tsung-Yi Huang, Shi-Fan Chang
  • Patent number: 11944412
    Abstract: A blood pressure detection device manufactured by a semiconductor process includes a substrate, a microelectromechanical element, a gas-pressure-sensing element, a driving-chip element, an encapsulation layer and a valve layer. The substrate includes inlet apertures. The microelectromechanical element and the gas-pressure-sensing element are stacked and integrally formed on the substrate. The encapsulation layer is encapsulated and positioned on the substrate. A flowing-channel space is formed above the microelectromechanical element and the gas-pressure-sensing element. The encapsulation layer includes an outlet aperture in communication with an airbag. The driving-chip element controls the microelectromechanical element, the gas-pressure-sensing element and valve units to transport gas.
    Type: Grant
    Filed: June 2, 2021
    Date of Patent: April 2, 2024
    Assignee: MICROJET TECHNOLOGY CO., LTD.
    Inventors: Hao-Jan Mou, Ying-Lun Chang, Ching-Sung Lin, Chi-Feng Huang, Yung-Lung Han, Chang-Yen Tsai, Wei-Ming Lee, Chun-Yi Kuo, Tsung-I Lin
  • Patent number: 11948722
    Abstract: A planar winding transformer includes a magnetic core set and a multilayer circuit board. The magnetic core set includes two magnetic cores and two magnetic columns. The two magnetic cores are parallel to each other. The multilayer circuit board is disposed between two magnetic cores, and two magnetic columns penetrate through the multilayer circuit board. The multilayer circuit board includes two low voltage winding layers and one high voltage winding layer. Two low voltage winding layers are connected to each other in parallel, and the high voltage winding layer is disposed between two low voltage winding layers. When the high voltage winding layer receives a polarity current, at least one of the low voltage winding layers generates a corresponding induced current. Two magnetic cores and two magnetic columns form a closed path for magnetic flux.
    Type: Grant
    Filed: January 8, 2021
    Date of Patent: April 2, 2024
    Assignees: CHICONY POWER TECHNOLOGY CO., LTD., NATIONAL TAIPEI UNIVERSITY OF TECHNOLOGY
    Inventors: Yen-Shin Lai, Yong-Yi Huang, Chun-Hung Lee, Hao-Chieh Chang
  • Patent number: 11947737
    Abstract: An optical navigation device control method comprising: (a) computing brightness contrast information of original images captured by an image sensor of an optical navigation device; (b) computing brightness variation levels of the original images; (c) improving image qualities of the original images based on the brightness contrast information and the brightness variation levels, to generate adjusted images; and (d) computing movements of the optical navigation device based on displacement between the adjusted images. The optical navigation device is located on a surface. The step (d) comprises: collecting reference images of different parts of the surface for a plurality of combinations of moving directions of the optical navigation device and placement directions of the surface; and determining a type of the surface via comparing images of a current surface with the reference images.
    Type: Grant
    Filed: May 4, 2023
    Date of Patent: April 2, 2024
    Assignee: PixArt Imaging Inc.
    Inventors: Bo-Yi Chang, Yao-Hsuan Lin
  • Publication number: 20240103377
    Abstract: A composition and method for removing a metal-containing layer or portion of a layer of a pellicle of an EUV mask are provided. The composition includes water; one or more oxidizing agents; and one or more acids. The method includes forming one or more layers over a silicon substrate with at least one of those layers includes a metal containing layer and removing the metal containing layer by contacting the metal containing layer with the composition of the disclosed and claimed subject matter.
    Type: Application
    Filed: October 15, 2020
    Publication date: March 28, 2024
    Applicant: Versum Materials US, LLC
    Inventors: CHAO-HSIANG CHEN, CHUNG-YI CHANG, YI-CHIA LEE, WEN DAR LIU
  • Publication number: 20240101485
    Abstract: A powder composition includes a first powder, a second powder, and a modified functional group. A particle size range of the first powder is between 1 micron and 100 microns. The second powder and the modified functional group are modified on the first powder. A particle size range of the second powder is between 10 nanometers and 1 micron. A manufacturing method of a powder composition is also provided.
    Type: Application
    Filed: November 15, 2022
    Publication date: March 28, 2024
    Applicant: NAN YA PLASTICS CORPORATION
    Inventors: Te-Chao Liao, Hung-Yi Chang, Chia-Lin Liu
  • Patent number: 11942380
    Abstract: A method includes forming a dummy pattern over test region of a substrate; forming an interlayer dielectric (ILD) layer laterally surrounding the dummy pattern; removing the dummy pattern to form an opening; forming a dielectric layer in the opening; performing a first testing process on the dielectric layer; performing an annealing process to the dielectric layer; and performing a second testing process on the annealed dielectric layer.
    Type: Grant
    Filed: October 26, 2020
    Date of Patent: March 26, 2024
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Ming-Shiang Lin, Chia-Cheng Ho, Chun-Chieh Lu, Cheng-Yi Peng, Chih-Sheng Chang
  • Patent number: 11943909
    Abstract: A semiconductor memory device and a method of forming the same are provided, with the semiconductor memory device including a substrate, a stacked structure, plural openings, plural flared portions and an electrode layer. The stacked structure is disposed on the substrate and includes alternately stacked oxide material layers and stacked nitride material layers. Each of the openings is disposed in the stacked structure, and each of the flared portions is disposed under each of the openings, in connection with each opening. The electrode layer is disposed on surfaces of each opening and each flared portion.
    Type: Grant
    Filed: November 5, 2020
    Date of Patent: March 26, 2024
    Assignees: UNITED MICROELECTRONICS CORP., Fujian Jinhua Integrated Circuit Co., Ltd.
    Inventors: Feng-Yi Chang, Fu-Che Lee
  • Patent number: 11942329
    Abstract: A method for forming a semiconductor device is provided. The method includes forming a semiconductor protruding structure over a substrate and surrounding the semiconductor protruding structure with an insulating layer. The method also includes forming a dielectric layer over the insulating layer. The method further includes partially removing the dielectric layer and insulating layer using a planarization process. As a result, topmost surfaces of the semiconductor protruding structure, the insulating layer, and the dielectric layer are substantially level with each other. In addition, the method includes forming a protective layer to cover the topmost surfaces of the dielectric layer. The method includes recessing the insulating layer after the protective layer is formed such that the semiconductor protruding structure and a portion of the dielectric layer protrude from a top surface of a remaining portion of the insulating layer.
    Type: Grant
    Filed: March 3, 2022
    Date of Patent: March 26, 2024
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Wan-Yi Kao, Che-Hao Chang, Yung-Cheng Lu, Chi On Chui
  • Patent number: D1021220
    Type: Grant
    Filed: July 15, 2021
    Date of Patent: April 2, 2024
    Assignee: Radiant Opto-Electronics Corporation
    Inventors: Cheng-Ang Chang, Guo-Hao Huang, Chun-Yi Sun, Chih-Hung Ju, Pin-Tsung Wang