Patents by Inventor Yingdong Luo

Yingdong Luo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230194982
    Abstract: Embodiments described herein provide method a method of forming optical devices using nanoimprint lithography that maintains the critical dimension of the optical device structures. The method described herein accounts for lateral shrinkage of the solvent based resist during the cure process to maintain the critical dimension. The method includes disposing a stamp coating on a stamp having an inverse optical device pattern of inverse structures. The coating is disposed on sidewalls, inverse structure bottom, and inverse structure top of the inverse structures. The method includes etching the inverse structures such that the stamp coating remains on the sidewalls and is removed from the inverse structure top and bottom. The method further includes imprinting the stamp into an optical device material disposed and subjecting the imprintable optical device material to a cure process which transfers the optical device critical dimension to the optical device structures of the optical device pattern.
    Type: Application
    Filed: December 30, 2022
    Publication date: June 22, 2023
    Inventors: Yingdong LUO, Yongan XU, Kang LUO, Ludovic GODET
  • Publication number: 20230193064
    Abstract: A method and apparatus for forming an optical device are described. The optical device is formed by depositing a plurality of ink drops on a surface of a substrate. The plurality of ink drops are contained within a chemical stopper, such that the chemical stopper surrounds each individual ink drop. The chemical stopper is configured to reduce reflow of the ink drops and is a fraction of the height of each of the ink drops. The ink drops are baked after being deposited within the chemical stoppers as liquid ink drops.
    Type: Application
    Filed: November 18, 2022
    Publication date: June 22, 2023
    Inventors: Yingdong LUO, Xiaopei DENG, Kang LUO, Rami HOURANI, Daihua ZHANG, Ludovic GODET
  • Patent number: 11646397
    Abstract: A photocurable composition includes quantum dots, quantum dot precursor materials, a chelating agent, one or more monomers, and a photoinitiator. The quantum dots are selected to emit radiation in a first wavelength band in the visible light range in response to absorption of radiation in a second wavelength band in the UV or visible light range. The second wavelength band is different than the first wavelength band. The quantum dot precursor materials include metal atoms or metal ions corresponding to metal components present in the quantum dots. The chelating agent is configured to chelate the quantum dot precursor materials. The photoinitiator initiates polymerization of the one or more monomers in response to absorption of radiation in the second wavelength band.
    Type: Grant
    Filed: August 28, 2020
    Date of Patent: May 9, 2023
    Assignee: Applied Materials, Inc.
    Inventors: Yingdong Luo, Daihua Zhang, Hou T. Ng, Sivapackia Ganapathiappan, Nag B. Patibandla
  • Patent number: 11638979
    Abstract: A polishing pad for a semiconductor fabrication operation includes a polishing region and a window region, wherein both regions are made of an interpenetrating polymer network formed from a free-radically polymerized material and a cationically polymerized material.
    Type: Grant
    Filed: June 9, 2020
    Date of Patent: May 2, 2023
    Assignee: Applied Materials, Inc.
    Inventors: Uma Sridhar, Sivapackia Ganapathiappan, Ashwin Murugappan Chockalingam, Rajeev Bajaj, Daniel Redfield, Mayu Felicia Yamamura, Yingdong Luo, Nag B. Patibandla
  • Patent number: 11612978
    Abstract: Interpenetrating polymer networks (IPNs) for a forming polishing pad for a semiconductor fabrication operation are disclosed. Techniques for forming the polishing pads are provided. In an exemplary embodiment, a polishing pad includes an interpenetrating polymer network formed from a free-radically polymerized material and a cationically polymerized material.
    Type: Grant
    Filed: June 9, 2020
    Date of Patent: March 28, 2023
    Assignee: Applied Materials, Inc.
    Inventors: Uma Sridhar, Sivapackia Ganapathiappan, Ashwin Murugappan Chockalingam, Mayu Felicia Yamamura, Daniel Redfield, Rajeev Bajaj, Yingdong Luo, Nag B. Patibandla
  • Publication number: 20230080430
    Abstract: Embodiments herein generally relate to polishing pads and methods of forming polishing pads. A polishing pad includes a plurality of polishing elements. Each polishing element comprises an individual surface that forms a portion of a polishing surface of the polishing pad and one or more sidewalls extending downwardly from the individual surface to define a plurality of channels disposed between the polishing elements. Each of the polishing elements has a plurality of pore-features formed therein. Each of the polishing elements is formed of a pre-polymer composition and a sacrificial material composition. In some cases, a sample of the cured pre-polymer composition has a glass transition temperature (Tg) of about 80° C. or greater. A storage modulus (E?) of the cured pre-polymer composition at a temperature of 80° C. (E?80) can be about 200 MPa or greater.
    Type: Application
    Filed: September 10, 2021
    Publication date: March 16, 2023
    Inventors: Sivapackia GANAPATHIAPPAN, Rajeev Bajaj, Yingdong Luo, Aniruddh Jagdish Khanna, You Wang, Daniel Redfield
  • Publication number: 20230006110
    Abstract: A photocurable composition includes quantum dots, quantum dot precursor materials, a chelating agent, one or more monomers, and a photoinitiator. The quantum dots are selected to emit radiation in a first wavelength band in the visible light range in response to absorption of radiation in a second wavelength band in the UV or visible light range. The second wavelength band is different than the first wavelength band. The quantum dot precursor materials include metal atoms or metal ions corresponding to metal components present in the quantum dots. The chelating agent is configured to chelate the quantum dot precursor materials. The photoinitiator initiates polymerization of the one or more monomers in response to absorption of radiation in the second wavelength band.
    Type: Application
    Filed: September 1, 2022
    Publication date: January 5, 2023
    Inventors: Yingdong Luo, Daihua Zhang, Hou T. Ng, Sivapackia Ganapathiappan, Nag B. Patibandla
  • Patent number: 11530288
    Abstract: The present invention generally relates to covalent network polymers prepared from an imine-linked oligomer and an independent crosslinker comprising reactive moieties selected from the group consisting of epoxy, isocyanate, bismaleimide, sulfide, polyurethane, anhydride, polyester and combinations thereof. The covalent network polymers disclosed herein are advantageously made by anhydrous reactions, which enables the highest known glass transition temperatures to date for this class of materials. Further, the disclosed covalent network polymers can be formed in continuous processes, such as additive manufacturing processes that produce three-dimensional objects or roll-to-roll processes that produce covalent network polymer films or fully cured prepreg in various size formats.
    Type: Grant
    Filed: September 6, 2019
    Date of Patent: December 20, 2022
    Assignee: Mallinda
    Inventors: Philip Taynton, Yingdong Luo, Heather Rubin, Denis Kissounko, Samuel Loob, Sarah Sadowski
  • Publication number: 20220367763
    Abstract: A light-emitting device includes a plurality of light-emitting diodes, a first cured composition over a first subset of the light-emitting diodes, and a second cured composition over a second subset of light-emitting diodes. The first cured composition includes a first photopolymer and a blue photoluminescent material that is an organic, organometallic, or polymeric material, embedded in the first photopolymer. The second cured composition includes a second photopolymer and a nanomaterial embedded in the second photopolymer. The nanomaterial is selected to emit red or green light in response.
    Type: Application
    Filed: July 21, 2022
    Publication date: November 17, 2022
    Inventors: Yingdong Luo, Lisong Xu, Sivapackia Ganapathiappan, Hou T. Ng, Byung Sung Kwak, Mingwei Zhu, Nag B. Patibandla
  • Publication number: 20220362904
    Abstract: Embodiments herein generally relate to polishing pads and methods of forming polishing pads. A method of forming a polishing pad includes (a) dispensing droplets of a pre-polymer composition and droplets of a sacrificial material composition onto a surface of a previously formed print layer according to a predetermined droplet dispense pattern. The method includes (b) at least partially curing the dispensed droplets of the pre-polymer composition to form a print layer. The method includes (c) sequentially repeating (a) and (b) to form a polishing layer having a plurality of pore-features formed therein. The pre-polymer composition includes a multifunctional acrylate component.
    Type: Application
    Filed: May 17, 2021
    Publication date: November 17, 2022
    Inventors: Sivapackia GANAPATHIAPPAN, Uma SRIDHAR, Yingdong LUO, Ashwin CHOCKALINGAM, Mayu YAMAMURA, Sebastian David ROZO, Daniel REDFIELD, Rajeev BAJAJ, Nag B. PATIBANDLA, Hou T. NG, Sudhakar MADHUSOODHANAN
  • Publication number: 20220336246
    Abstract: A method for printing on a substrate includes printing a support structure by printing a liquid precursor material and curing the liquid precursor material, positioning a substrate within the support structure, printing one or more anchors on the substrate and the support structure by printing and curing the liquid precursor material to secure the substrate to the support structure, and printing one or more device structures on the substrate while anchored by printing and curing the liquid precursor material.
    Type: Application
    Filed: May 2, 2022
    Publication date: October 20, 2022
    Inventors: Daihua Zhang, Hou T. Ng, Nag B. Patibandla, Sivapackia Ganapathiappan, Yingdong Luo, Kyuil Cho, Han-Wen Chen
  • Publication number: 20220328336
    Abstract: Printing on a substrate includes printing a support structure by printing a liquid precursor material and curing the liquid precursor material, printing one or more alignment markers by printing the liquid precursor material outside the support structure and curing the liquid precursor material, positioning a substrate within the support structure, performing a registration of the substrate using the one or more alignment markers, and printing one or more device structures on the substrate while registered by printing and curing the liquid precursor material.
    Type: Application
    Filed: June 16, 2022
    Publication date: October 13, 2022
    Inventors: Daihua Zhang, Hou T. Ng, Nag B. Patibandla, Sivapackia Ganapathiappan, Yingdong Luo, Kyuil Cho, Han-Wen Chen
  • Patent number: 11404612
    Abstract: A light-emitting device includes a plurality of light-emitting diodes, a first cured composition over a first subset of the light-emitting diodes, and a second cured composition over a second subset of light-emitting diodes. The first cured composition includes a first photopolymer and a blue photoluminescent material that is an organic, organometallic, or polymeric material, embedded in the first photopolymer. The second cured composition includes a second photopolymer and a nanomaterial embedded in the second photopolymer. The nanomaterial is selected to emit red or green light in response.
    Type: Grant
    Filed: August 28, 2020
    Date of Patent: August 2, 2022
    Assignee: Applied Materials, Inc.
    Inventors: Yingdong Luo, Lisong Xu, Sivapackia Ganapathiappan, Hou T. Ng, Byung Sung Kwak, Mingwei Zhu, Nag B. Patibandla
  • Patent number: 11367643
    Abstract: A method for printing on a substrate includes printing a support structure by printing a liquid precursor material and curing the liquid precursor material, printing one or more alignment markers by printing the liquid precursor material outside the support structure and curing the liquid precursor material, positioning a substrate within the support structure, performing a registration of the substrate using the one or more alignment markers, and printing one or more device structures on the substrate while registered by printing and curing the liquid precursor material.
    Type: Grant
    Filed: April 2, 2020
    Date of Patent: June 21, 2022
    Assignee: Applied Materials, Inc.
    Inventors: Daihua Zhang, Hou T. Ng, Nag B. Patibandla, Sivapackia Ganapathiappan, Yingdong Luo, Kyuil Cho, Han-Wen Chen
  • Publication number: 20220189933
    Abstract: A multi-color display includes a backplane having backplane circuitry, an array of micro-LEDs electrically integrated with backplane circuitry of the backplane, a cover layer spanning the LEDs and having a plurality of recesses, and first and second color conversion layers. Each recess of the plurality of recesses positioned over a corresponding micro-LED from the plurality of micro-LEDs, the first color conversion layer is in each recess over a first plurality of LEDs to convert the illumination from the first plurality of LEDs to light of a first color, and the second color conversion layer is in each recess over a second plurality of LEDs to convert the illumination from the second plurality of LEDs to light of a different second color.
    Type: Application
    Filed: January 28, 2022
    Publication date: June 16, 2022
    Inventors: Daihua Zhang, Yingdong Luo, Mingwei Zhu, Hou T. Ng, Sivapackia Ganapathiappan, Nag B. Patibandla
  • Patent number: 11329003
    Abstract: A method of printing structures on a reconstructed wafer includes positioning a plurality of semiconductor dies on a support substrate, anchoring the plurality of semiconductor dies to the support substrate by printing a plurality of anchors that extend across edges of the semiconductor dies onto the support substrate and thus form a reconstructed wafer, and printing one or more device structures on the pluralities of semiconductor dies while anchored on the support substrate. The printing operations include ejecting droplets of a liquid precursor material and curing the liquid precursor material.
    Type: Grant
    Filed: April 2, 2020
    Date of Patent: May 10, 2022
    Assignee: Applied Materials, Inc.
    Inventors: Daihua Zhang, Hou T. Ng, Nag B. Patibandla, Sivapackia Ganapathiappan, Yingdong Luo, Kyuil Cho, Han-Wen Chen
  • Patent number: 11322381
    Abstract: A method for printing on a substrate includes printing a support structure by printing a liquid precursor material and curing the liquid precursor material, positioning a substrate within the support structure, printing one or more anchors on the substrate and the support structure by printing and curing the liquid precursor material to secure the substrate to the support structure, and printing one or more device structures on the substrate while anchored by printing and curing the liquid precursor material.
    Type: Grant
    Filed: April 2, 2020
    Date of Patent: May 3, 2022
    Assignee: Applied Materials, Inc.
    Inventors: Daihua Zhang, Hou T. Ng, Nag B. Patibandla, Sivapackia Ganapathiappan, Yingdong Luo, Kyuil Cho, Han-Wen Chen
  • Publication number: 20220069175
    Abstract: A light-emitting device includes a plurality of light-emitting diodes, a first cured composition over a first subset of the light-emitting diodes, and a second cured composition over a second subset of light-emitting diodes. The first cured composition includes a first photopolymer and a blue photoluminescent material that is an organic, organometallic, or polymeric material, embedded in the first photopolymer. The second cured composition includes a second photopolymer and a nanomaterial embedded in the second photopolymer. The nanomaterial is selected to emit red or green light in response.
    Type: Application
    Filed: August 28, 2020
    Publication date: March 3, 2022
    Inventors: Yingdong Luo, Lisong Xu, Sivapackia Ganapathiappan, Hou T. Ng, Byung Sung Kwak, Mingwei Zhu, Nag B. Patibandla
  • Publication number: 20220069174
    Abstract: A photocurable composition includes a blue photoluminescent material, one or more monomers, and a photoinitiator that initiates polymerization of the one or more monomers in response to absorption of the ultraviolet light. The blue photoluminescent material is selected to absorb ultraviolet light with a maximum wavelength in a range of about 300 nm to about 430 nm and to emit blue light. The blue photoluminescent material also has an emission peak in a range of about 420 nm to about 480 nm. The full width at half maximum of the emission peak is less than 100 nm, and the photoluminescence quantum yield is in a range of 5% to 100%.
    Type: Application
    Filed: August 28, 2020
    Publication date: March 3, 2022
    Inventors: Yingdong Luo, Lisong Xu, Sivapackia Ganapathiappan, Hou T. Ng, Byung Sung Kwak, Mingwei Zhu, Nag B. Patibandla
  • Publication number: 20220069173
    Abstract: A photocurable composition includes quantum dots, quantum dot precursor materials, a chelating agent, one or more monomers, and a photoinitiator. The quantum dots are selected to emit radiation in a first wavelength band in the visible light range in response to absorption of radiation in a second wavelength band in the UV or visible light range. The second wavelength band is different than the first wavelength band. The quantum dot precursor materials include metal atoms or metal ions corresponding to metal components present in the quantum dots. The chelating agent is configured to chelate the quantum dot precursor materials. The photoinitiator initiates polymerization of the one or more monomers in response to absorption of radiation in the second wavelength band.
    Type: Application
    Filed: August 28, 2020
    Publication date: March 3, 2022
    Inventors: Yingdong Luo, Daihua Zhang, Hou T. Ng, Sivapackia Ganapathiappan, Nag B. Patibandla