Patents by Inventor Yohei Kanno

Yohei Kanno has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20070131976
    Abstract: In case that a conventional TFT is formed to have an inversely staggered type, a resist mask is required to be formed by an exposing, developing, and droplet discharging in forming an island-like semiconductor region. It resulted in the increase in the number of processes and the number of materials. According to the present invention, a process can be simplified since after forming a source region and a drain region, a portion serving as a channel region is covered by an insulating film serving as a channel protecting film to form an island-like semiconductor film, and so a semiconductor element can be manufactured by using only metal mask without using a resist mask.
    Type: Application
    Filed: November 5, 2004
    Publication date: June 14, 2007
    Applicant: Semiconductor Energy Laboratory Co., Ltd
    Inventors: Yohei Kanno, Gen Fujii
  • Publication number: 20070090358
    Abstract: Especially in case that a light-emitting element composed of layers containing organic compounds or inorganic compounds is driven by a thin film transistor (TFT), a structure having at least two transistors installed with a drive TFT is required to prevent irregularities of ON current of a switching TFT provided to a pixel region. Hence, the simplification of a semiconductor element structure and a process for manufacturing a semiconductor element becomes an urgent task as a large substrate is frequently used. According to the present invention, after that a source region and a drain region are formed, an insulating film serving as a channel protective film is formed to cover a portion for serving as a channel region, then, an island-like semiconductor film is formed. Accordingly, a semiconductor element can be manufactured by using only a metallic mask without forming a resist mask, and so the process can be simplified.
    Type: Application
    Filed: November 5, 2004
    Publication date: April 26, 2007
    Applicant: Semiconductor Energy laboratory Co., Ltd.
    Inventors: Yohei Kanno, Gen Fujii
  • Publication number: 20070085112
    Abstract: As a wiring becomes thicker, discontinuity of an insulating film covering the wiring has become a problem. It is difficult to form a wiring with width thin enough for a thin film transistor used for a current high definition display device. As a wiring is made thinner, signal delay due to wiring resistance has become a problem. In view of the above problems, the invention provides a structure in which a conductive film is formed in a hole of an insulating film, and the surfaces of the conductive film and the insulating film are flat. As a result, discontinuity of thin films covering a conductive film and an insulating film can be prevented. A wiring can be made thinner by controlling the width of the hole. Further, a wiring can be made thicker by controlling the depth of the hole.
    Type: Application
    Filed: November 30, 2004
    Publication date: April 19, 2007
    Applicant: Semiconductor Energy Laboratory Co., Ltd.
    Inventors: Shunpei Yamazaki, Shinji Maekawa, Yohei Kanno
  • Publication number: 20050230752
    Abstract: In the case of providing an LDD region for a TFT, it is necessary to form separately an insulating film to be a mask or to contrive the shape of a gate electrode layer in order to have the concentration difference in impurities injected in a semiconductor film; therefore, the number of patterning steps has increased as a matter of course and the step has become complicated. A semiconductor device according to one feature of the invention comprises a semiconductor layer including a channel region, a pair of impurity regions, and a pair of low-concentration impurity regions; and a gate electrode layer having a single layer structure or a laminated structure, of which film thickness is not even, which is formed to be in contact with the semiconductor layer by sandwiching a gate insulating film therebetween.
    Type: Application
    Filed: March 30, 2005
    Publication date: October 20, 2005
    Applicant: Semiconductor Energy Laboratory Co., Ltd.
    Inventors: Yohei Kanno, Yasuko Watanabe
  • Publication number: 20050168339
    Abstract: In commercial products to which a non-contact type or contact type ID label or ID tag is attached and ID cards, there is fear that, due to a difference between coefficients of thermal expansion between an antenna for communication and a resin provided around the antenna, stress is applied to the resin with the larger coefficient of thermal expansion to break the resin. This contributes to decrease in manufacturing yield, lifetime, and reliability of an ID label or the like. In an article such as an ID label, an ID tag, and an ID card according to the present invention, a filler is included in a filling layer provided around an antenna forming an ID label, an ID tag, and an ID card so that the difference in coefficient of thermal expansion between the antenna and the filling layer can be reduced. This makes it possible to ease generation of stress due to the difference in coefficient of thermal expansion and prevent peeling and cracks of the filling layer.
    Type: Application
    Filed: January 28, 2005
    Publication date: August 4, 2005
    Applicant: Semiconductor Energy Laboratory Co., Ltd.
    Inventors: Yasuyuki Arai, Mai Akiba, Yuko Tachimura, Yohei Kanno
  • Publication number: 20050148121
    Abstract: With non-contact and contact IC chips becoming common, it is necessary to mass-produce enormous amount of IC chips, which are utilizable for human beings, animals and plants, commercial products, banknotes, and the like, at low cost. For example, it is necessary to manufacture IC chips to be applied to commercial products, banknotes, and the like at a cost of 1 to several yen per IC chip, preferably, at a cost less than 1 yen, and it is desired to realize a structure of an IC chip that can be mass-produced at low cost and a manufacturing process of the IC chip.
    Type: Application
    Filed: December 9, 2004
    Publication date: July 7, 2005
    Inventors: Shunpei Yamazaki, Toru Takayama, Yohei Kanno
  • Publication number: 20050141256
    Abstract: Although a product having such the IC chip has been diffused, information on the product may be capable of being perceived, abstracted, falsified, or the like by a third person with his external device during distribution of the product or after purchase of the product. Further, privacy may be seriously infringed. Paper money, various products, and the like are disclosed according to the present invention with an integrated circuit device having a switching memory for controlling reading and writing of information (lock/unlock of information) in order to protect the information recorded and stored in the integrated circuit such as an IC chip installed to the product or the like.
    Type: Application
    Filed: December 22, 2004
    Publication date: June 30, 2005
    Applicant: Semiconductor Energy Laboratory Co., Ltd.
    Inventors: Shunpei Yamazaki, Yasuyuki Arai, Yohei Kanno
  • Publication number: 20050122351
    Abstract: When using a liquid droplet ejection method, a conventional photomask is not required, however, it is required instead that a moving path of a nozzle or a substrate is controlled with accuracy at least in ejecting liquid droplets. According to the characteristics of compositions to be ejected or their pattern, such ejection conditions are desirably set as the moving rate of a nozzle or a substrate, ejection quantity, ejection distance and ejection rate of compositions, atmosphere of the space that the compositions are ejected, the temperature and moisture of the space, and heating temperature of the substrate.
    Type: Application
    Filed: October 21, 2004
    Publication date: June 9, 2005
    Inventors: Shunpei Yamazaki, Jun Koyama, Yasuyuki Arai, Shinji Maekawa, Yohei Kanno
  • Patent number: 6568385
    Abstract: A cutting machine of a type having bellows means disposed at least on one side of a chuck table to be reciprocated. A protective sheet covering the upper surface of the bellows means is disposed. One end of the protective sheet is reciprocated in accordance with the reciprocation of the chuck table, while the other end of the protective sheet is connected to winding means. When the chuck table is moved forward or backward, the protective sheet is gradually wound up by the winding means. When the chuck table is moved backward or forward, the protective sheet is gradually wound off from the winding means.
    Type: Grant
    Filed: August 22, 2001
    Date of Patent: May 27, 2003
    Assignee: Disco Corporation
    Inventors: Kazuma Sekiya, Naoki Omiya, Yohei Kanno
  • Publication number: 20020045414
    Abstract: A cutting machine of a type having bellows means disposed at least on one side of a chuck table to be reciprocated. A protective sheet covering the upper surface of the bellows means is disposed. One end of the protective sheet is reciprocated in accordance with the reciprocation of the chuck table, while the other end of the protective sheet is connected to winding means. When the chuck table is moved forward or backward, the protective sheet is gradually wound up by the winding means. When the chuck table is moved backward or forward, the protective sheet is gradually wound off from the winding means.
    Type: Application
    Filed: August 22, 2001
    Publication date: April 18, 2002
    Inventors: Kazuma Sekiya, Naoki Omiya, Yohei Kanno