Abstract: A charged particle beam device includes an input and output device that receives, as inputs, a charged particle beam condition, a light condition, and electronic device circuit information, a charged particle beam control system that controls a charged particle beam applied to a sample based on the electron beam condition, a light control system that controls light applied to the sample based on the light condition, a detector that detects second electrons emitted from the sample by the application of the charged particle beam and the light and outputs a detection signal, and a calculator that generates a calculation netlist based on the electronic device circuit information, generates a light irradiation netlist based on the calculation netlist and the light condition, estimates a first irradiation result when the charged particle beam and the light are applied to the sample based on the light irradiation netlist and the charged particle beam condition, and compares the first irradiation result with a second

Abstract: A method for measuring current-voltage characteristics representing the relationship between the drain current and the drain-source voltage of a first transistor includes: a first step of setting the drain current and the drain-source voltage using a voltage source and a current source connected in series with the first transistor and a rectifying element connected in parallel with, with the reverse polarity to, an inductive load as the current source; a second step of measuring the gate-source voltage and the gate current in the switching transient state of the first transistor; and a third step of calculating the voltage applied to the gate oxide film of the first transistor using the results of the measurement of the gate-source voltage and the gate current and acquiring the current-voltage characteristics of the first transistor using the result of the calculation.

Abstract: A charged particle beam apparatus includes a database that stores a to-be-used-in-calculation device model for use in estimation of a circuit of a sample and an optical condition under which a charged particle beam is applied to the sample, a charged particle beam optical system that controls the beam applied to the sample under the optical condition, a detector that detects secondary electrons emitted from the sample excited by the application of the beam and outputs a detection signal based on the secondary electrons, and a computing unit that generates a to-be-used-in-computation netlist based on the to-be-used-in-calculation device model, estimates a first application result when the beam is applied to the sample based on the to-be-used-in-computation netlist and the optical condition, and compares the first application result with a second application result when the beam is applied to the sample based on the optical condition.

Abstract: Provided is a charged particle beam apparatus capable of estimating an internal device structure of a sample. The charged particle beam apparatus includes an electron beam optical system, a detector, and a calculator. The electron beam optical system irradiates a plurality of irradiation points on a sample, which are different in position or time, with an electron beam. The detector detects electrons emitted from the sample in response to irradiation of the electron beam by the electron beam optical system. The calculator calculates a dependence relationship between the irradiation points based on the electrons detected by the detector at the plurality of irradiation points.

Abstract: A computing unit generates a to-be-used-in-computation netlist on the basis of a to-be-used-in-calculation device model corresponding to a correction sample, estimates a first application result, on the basis of the to-be-used-in-computation netlist and an optical condition, when a charged particle beam is applied to the correction sample under the optical condition, compares the first application result and a second application result based on a detection signal when the charged particle beam is applied to the correction sample under the optical condition, and corrects the optical condition when the first application result and the second application result differ from each other.

Abstract: Provided are a charged particle beam apparatus and a charged particle beam inspection system capable of estimating electrical characteristics of a sample including capacitance characteristics. The charged particle beam apparatus estimates electrical characteristics of the sample using the correspondence data representing the correspondence between the node of the netlist and the coordinate on the sample and the pulsing condition when the sample is irradiated with the charged particle beam in a pulsed manner. The charged particle beam optical system irradiates a predetermined coordinate on the sample with a charged particle beam based on a pulsing condition, and the detector actually measures an emission amount of electrons.

Abstract: An object of the present disclosure is to provide a system for deriving a type of a defect of a semiconductor element and a non-transitory computer-readable medium. The system receives, from the image acquisition tool, image data obtained by sequentially irradiating a plurality of patterns provided on the semiconductor wafer with a beam and extracts characteristics of the plurality of patterns sequentially irradiated with abeam from the received image data, the characteristics being included in the image data, or receives characteristics of the plurality of patterns sequentially irradiated with a beam from the image acquisition tool, the characteristics being extracted from the image data (Step 603), and derives (Step 605) a type of a defect by referring to (Step 604) related information for the characteristics of the plurality of patterns, the related information storing the characteristics of the plurality of patterns and types of defects in association with each other.

Abstract: In order to provide a charged particle beam apparatus capable of stably detecting secondary particles and electromagnetic waves even for a non-conductive sample under high vacuum environment and enabling excellent observation and analysis, the charged particle beam apparatus includes a charged particle gun (12), scanning deflectors (17 and 18) configured to scan a charged particle beam (20) emitted from the charged particle gun (12) onto a sample (21), detectors (40 and 41) configured to detect a scanning control voltage input from an outside into the scanning deflectors, an arithmetic unit (42) configured to calculate, based on the detected scanning control voltage, irradiation pixel coordinates for the charged particle beam; and an irradiation controller (45) configured to control irradiation of the sample with the charged particle beam according to the irradiation pixel coordinates.

Abstract: An ultrasound diagnosis device includes: an ultrasound probe which transmits an ultrasound wave toward a examinee and receives a reflected wave from the examinee; and a main device which controls the transmitting and receiving of the ultrasound waves from the ultrasound probe and is operated to receive a receiving signal obtained by receiving the reflected wave from the examinee by the ultrasound probe, to generate an ultrasound image of the examinee, and to display the ultrasound image on a display screen, wherein the ultrasound probe includes a plurality of subarrays having a plurality of element circuits transmitting and receiving ultrasound signals and a plurality of reference voltage sources, and the plurality of subarrays and the plurality of reference voltage sources have a one-to-one correspondence.

Abstract: There is provided a liquid ejection head whose resolution may be enhanced without narrowing a wiring pitch, and a manufacturing method thereof. To that end, integrated circuits are arranged on a same substrate as that of piezoelectric elements.

Abstract: A battery management device includes an SOCv calculation unit that calculates a state of charge using voltage across both ends of a battery, an SOCi calculation unit calculates a state of charge by integrating currents flowing in the battery, and an SOCw calculation unit performs weighted addition of the battery's state of charges calculated by the SOCv and the SOCi calculation unit. An SOCi biased time calculation unit calculates an SOCi biased time based on one or a plurality of elapsed time from the end of a previous system operation or the end of charging or discharging during the previous system operation to the start of the current system, temperature, degree of degradation, and polarization voltage of the battery. The SOCw increases a weight of the state of charge of the battery calculated by the SOCi calculation while the elapsed time from the activation is within the SOCi biased time.

Abstract: A liquid ejection apparatus includes an ejection port ejecting a liquid, a pressure chamber storing the liquid, an element generating energy for ejecting the liquid in the pressure chamber, first and second tanks which can store the liquid, a flow passage establishing communication between the first and second tanks through the pressure chamber, a switching unit switching a flowing direction of the liquid in the flow passage between a first direction from the first tank to the second tank and a second direction being opposite to the first direction, and a pressure compensation unit. When a pressure in a downstream side flow passage portion downstream of the pressure chamber has a predetermined pressure or below, the pressure compensation unit compensates for reduction in pressure in the downstream side flow passage portion by supplying the liquid to the downstream side flow passage portion.

Abstract: The liquid ejecting head includes a first individual flow path and a second individual flow path for supplying liquid to a pressure chamber, a first common flow path for supplying liquid to the first individual flow path, and a second common flow path for supplying liquid to the second individual flow path. A first circulation for causing liquid to flow in the order of the first individual flow path, the pressure chamber, and the second individual flow path and a second circulation for causing liquid to flow in the reverse order of the first circulation are switched. A flow path resistance of the first common flow path is designed to be less than a flow path resistance of the second common flow path and a flow path resistance of the first individual flow path is designed to be less than a flow path resistance of the second individual flow path.

Abstract: A liquid ejection apparatus includes a plurality of liquid ejection units ejecting different types of liquids. Each liquid ejection unit includes an ejection orifice which ejects a liquid, first and second liquid tanks which store the liquid, and a liquid flow path which connects the first liquid tank and the second liquid tank to each other across the ejection orifice. The liquid ejection apparatus further includes a cap member which covers of the ejection orifices of the plurality of liquid ejection units and forms a space sealed between the ejection orifices of the plurality of liquid ejection units and the cap member, and a pressure control mechanism which simultaneously pressurizes the first and second liquid tanks.

Abstract: A liquid ejection apparatus includes an ejection port ejecting a liquid, a pressure chamber storing the liquid, an element generating energy for ejecting the liquid in the pressure chamber, first and second tanks which can store the liquid, a flow passage establishing communication between the first and second tanks through the pressure chamber, a switching unit switching a flowing direction of the liquid in the flow passage between a first direction from the first tank to the second tank and a second direction being opposite to the first direction, and a pressure compensation unit. When a pressure in a downstream side flow passage portion downstream of the pressure chamber has a predetermined pressure or below, the pressure compensation unit compensates for reduction in pressure in the downstream side flow passage portion by supplying the liquid to the downstream side flow passage portion.

Abstract: A liquid ejection head including a recording element substrate that ejects a liquid, a flow passage member provided with a flow passage that supplies the liquid to the recording element substrate, an elastic member having elasticity disposed between the recording element substrate and the flow passage member, and a fixing member that fixes the recording element substrate and the flow passage member. In the liquid ejection head, an area between the recording element substrate and the flow passage member through which the liquid flows is sealed by having the elastic member be deformed with the fixing member.

Abstract: The liquid ejecting head includes a first individual flow path and a second individual flow path for supplying liquid to a pressure chamber, a first common flow path for supplying liquid to the first individual flow path, and a second common flow path for supplying liquid to the second individual flow path. A first circulation for causing liquid to flow in the order of the first individual flow path, the pressure chamber, and the second individual flow path and a second circulation for causing liquid to flow in the reverse order of the first circulation are switched. A flow path resistance of the first common flow path is designed to be less than a flow path resistance of the second common flow path and a flow path resistance of the first individual flow path is designed to be less than a flow path resistance of the second individual flow path.

Abstract: A liquid discharge head includes a recording element substrate. The recording element substrate includes a discharge aperture forming member defining a discharge aperture from which a liquid is discharged and a substrate having a pressure generating element that pressurizes the liquid so as to discharge the liquid. The liquid discharge head also includes a cover member that defines an opening through which the discharge aperture is exposed. The cover member is disposed on a side of the recording element substrate on which the discharge aperture is formed. In the liquid discharge head, the recording element substrate further includes an electrode disposed on a side of the substrate on which the discharge aperture forming member is formed and an insulation member that covers the electrode. In addition, the insulation member is covered by the cover member.

Abstract: A measuring apparatus that irradiates a sample with a charged particle beam to observe the sample includes a particle source that outputs the charged particle beam, a lens that collects the charged particle beam, a detector that detects a signal of emitted electrons emitted from the sample which is irradiated with the charged particle beam, and a control device that controls the output of the charged particle beam and the detection of the signal of the emitted electrons in accordance with an observation condition, in which the control device sets, as the observation condition, a first parameter for controlling an irradiation cycle of the charged particle beam, a second parameter for controlling a pulse width of the pulsed charged particle beam, and a third parameter for controlling detection timing of the signal of the emitted electron within the irradiation time of the pulsed charged particle beam, and the third parameter is determined in accordance with a difference in intensity of signals of the plurali

Abstract: Provided is a probe which transmits an ultrasonic wave to a diagnostic site and receives a reception signal which is a reflected wave.