Patents by Inventor Yoichi Inoue

Yoichi Inoue has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240128846
    Abstract: A vibration motor includes a stationary portion and a movable portion to vibrate in a central axis direction with respect to the stationary portion. The stationary portion includes a housing and a coil on an outer side in a radial direction of the movable portion. The movable portion includes a core portion including a magnet. The housing houses the movable portion and the coil, and includes a peripheral wall portion on an outer side in the radial direction of the coil and extending in an axial direction, and a magnetic portion on a portion of the peripheral wall portion and including a magnetic body. At least a portion of the magnetic portion opposes the coil in the radial direction and extends in a circumferential direction. The peripheral wall portion includes a through hole adjacent to the magnetic portion in the axial direction and extends in the circumferential direction.
    Type: Application
    Filed: October 17, 2023
    Publication date: April 18, 2024
    Inventors: Toshitaka YAMAZAKI, Jun INOUE, Yoichi SEKII
  • Publication number: 20240076596
    Abstract: A cell culture container includes: an insert member having a membrane on which a cell is seeded, the insert member defining a first inner space that functions as an anaerobic chamber; a container having an attachment/detachment portion to and from which the insert member is attachable and detachable, the container defining a second inner space that functions as an aerobic chamber; a sealing member that closes an opening of the aerobic chamber between the attachment/detachment portion and the insert member with the insert member being attached to the attachment/detachment portion; and a transfer mechanism that transfers force to the sealing member. The sealing member closes the opening in response to an input of the force from the transfer mechanism.
    Type: Application
    Filed: October 14, 2021
    Publication date: March 7, 2024
    Inventors: Tsunehiro INOUE, Toyoyuki HASHIMOTO, Yasuko YONEDA, Kenji TAKUBO, Yoichi FUJIYAMA, Tomoki OHKUBO, Eiichi OZEKI, Ryogo TAKAI, Hiroomi GOTO, Sadamu TOMITA
  • Patent number: 9188493
    Abstract: A main object of the present invention is to provide a method capable of measuring surface temperatures of a plurality of points of cast slab at a secondary cooling zone of a continuous caster with a good accuracy and at low cost. The method comprises the steps of inserting one end of a plurality of optical fibers 3 respectively to nozzles 1 and tubes 2, and installing each nozzle between support rolls that support the cast slab, while spraying purge air from each nozzle toward a surface of the cast slab, receiving a thermal radiation light from the cast slab at the one end of each optical fiber, gathering other ends of the optical fibers 3, 81 in a bundle to take images including a core image of the other end of each optical fibers by an imaging means 5, and calculating the surface temperature of the cast slab.
    Type: Grant
    Filed: August 27, 2013
    Date of Patent: November 17, 2015
    Assignee: NIPPON STEEL & SUMITOMO METAL CORPORATION
    Inventors: Tatsuro Honda, Chihiro Uematsu, Yoichi Inoue, Naoki Tajima, Yasuhiro Mizuno
  • Publication number: 20150204732
    Abstract: A main object of the present invention is to provide a method capable of measuring surface temperatures of a plurality of points of cast slab at a secondary cooling zone of a continuous caster with a good accuracy and at low cost. The method comprises the steps of inserting one end of a plurality of optical fibers 3 respectively to nozzles 1 and tubes 2, and installing each nozzle between support rolls that support the cast slab, while spraying purge air from each nozzle toward a surface of the cast slab, receiving a thermal radiation light from the cast slab at the one end of each optical fiber, gathering other ends of the optical fibers 3, 81 in a bundle to take images including a core image of the other end of each optical fibers by an imaging means 5, and calculating the surface temperature of the cast slab.
    Type: Application
    Filed: August 27, 2013
    Publication date: July 23, 2015
    Inventors: Tatsuro Honda, Chihiro Uematsu, Yoichi Inoue, Noaki Tajima, Yasuhiro Mizuno
  • Publication number: 20150202684
    Abstract: Provided are a method of molding an amorphous alloy, which has a high degree of work freedom regardless of components of an amorphous alloy, in particular, metallic glass and of the shape of an article to be molded, and is capable of producing a molded article having less pores, and a molded object produced by the molding method. The method of molding an amorphous alloy includes: a melting step of melting an amorphous alloy; a differential-pressure casting step of injecting a melt of the amorphous alloy into a casting mold positioned below the melt and evacuating the casting mold; and a processing step of processing the melt by heating and pressurizing the melt in the casting mold while keeping the melt in a supercooled state.
    Type: Application
    Filed: January 30, 2013
    Publication date: July 23, 2015
    Inventors: Takashi Hashima, Yoichi Inoue, Yasunori Saotome, Kenji Amiya
  • Patent number: 8394231
    Abstract: That surface of an electrode plate 20 which is opposite to a susceptor 10 has a projection shape. The electrode plate 20 is fitted in an opening 26a of shield ring 26 at a projection 20a. At this time, the thickness of the projection 20a is approximately the same as the thickness of the shield ring 26. Accordingly, the electrode plate 20 and the shield ring 26 form substantially the same plane. The major surface of the projection 20a has a diameter 1.2 to 1.5 times the diameter of a wafer W. The electrode plate 20 is formed of, for example, SiC.
    Type: Grant
    Filed: January 23, 2007
    Date of Patent: March 12, 2013
    Assignee: Tokyo Electron Limited
    Inventors: Koichi Takatsuki, Hikaru Yoshitaka, Shigeo Ashigaki, Yoichi Inoue, Takashi Akahori, Shuuichi Ishizuka, Syoichi Abe, Takashi Suzuki, Kohei Kawamura, Hidenori Miyoshi, Gishi Chung, Yasuhiro Oshima, Hiroyuki Takahashi
  • Patent number: 7513265
    Abstract: Disclosed is a high pressure processing method for subjecting a processing object to a high pressure processing using a high pressure fluid. In this method, the high pressure fluid is brought into collision with the surface of the processing object placed in a high pressure processing chamber, and then distributed along the surface of the processing object in an outward direction beyond the processing object.
    Type: Grant
    Filed: October 21, 2003
    Date of Patent: April 7, 2009
    Assignees: Kabushiki Kaisha Kobe Seiko Sho, Dainippon Screen Mfg. Co., Ltd.
    Inventors: Tetsuya Yoshikawa, Yoichi Inoue, Katsumi Watanabe, Kaoru Masuda, Katsuyuki Iijima, Tomomi Iwata, Yusuke Muraoka, Kimitsugu Saito, Ikuo Mizobata
  • Patent number: 7435396
    Abstract: Mixing baths 6A and 6B which temporarily hold chemical agents A and B respectively are disposed. The mixing baths 6A and 6B are each connected with a high-pressure fluid supplying unit 2. For surface treatment using a mixture of the chemical agent A and SCF (processing fluid), SCF is fed under pressure from the high-pressure fluid supplying unit 2 to the mixing bath 6A which already holds the chemical agent A, whereby the chemical agent A dissolves in SCF flowing into the mixing bath 6A and the mixture of the chemical agent A and SCF (processing fluid) is created. As a high-pressure valve (processing fluid introducing valve) 39 is opened, the processing fluid is sent into a pressure vessel 1. This achieves a predetermined surface treatment of a substrate which has been set inside the pressure vessel 1, using the processing fluid.
    Type: Grant
    Filed: October 4, 2004
    Date of Patent: October 14, 2008
    Assignee: Dainippon Screen Mfg. Co., Ltd.
    Inventors: Yusuke Muraoka, Tomomi Iwata, Kimitsugu Saito, Masahiro Yamagata, Yoichi Inoue, Hisanori Oshiba
  • Patent number: 7351323
    Abstract: A quantitative analyzing method is provided for electrochemically measuring the concentration of a substance in a sample liquid using a sensor including a reagent layer (30) which contains a reagent for reacting with the substance and to which (30) the sample liquid is introduced, and a first electrode (22) and a second electrode (23) for applying a voltage to the reagent layer (30). The method includes a current measuring step for applying a voltage across the first electrode (22) and the second electrode (23) for measuring current flowing between the first and the second electrodes (22,23), a parameter calculating step for calculating a parameter based on the measured current, and a determining step for determining a state of the sample liquid introduced to the reagent layer (30) based on the parameter and at least one predetermined constant.
    Type: Grant
    Filed: January 15, 2002
    Date of Patent: April 1, 2008
    Assignee: Arkray, Inc.
    Inventors: Kazuo Iketaki, Yoichi Inoue
  • Publication number: 20070131171
    Abstract: That surface of an electrode plate 20 which is opposite to a susceptor 10 has a projection shape. The electrode plate 20 is fitted in an opening 26a of shield ring 26 at a projection 20a. At this time, die thickness of the projection 20a is approximately the same as the thickness of the shield ring 26. Accordingly, the electrode plate 20 and the shield ring 26 form substantially the same plane. The major surface of the projection 20a has a diameter 1.2 to 1.5 times the diameter of a wafer W. The electrode plate 20 is formed of, for example, SiC.
    Type: Application
    Filed: January 23, 2007
    Publication date: June 14, 2007
    Applicant: Tokyo Electron Limited
    Inventors: Koichi Takatsuki, Hikaru Yoshitaka, Shigeo Ashigaki, Yoichi Inoue, Takashi Akahori, Shuuichi Ishizuka, Syoichi Abe, Takashi Suzuki, Kohei Kawamura, Hidenori Miyoshi, Gishi Chung, Yasuhiro Oshima, Hiroyuki Takahashi
  • Patent number: 7122111
    Abstract: A glucose sensor system comprising the steps of using as a sample discriminating parameter a ratio (I/?I) of a measured current value I to the time-differential value of the current value ?I, defining a discrimination function that discriminates whether a sample is blood or control fluid and uses the discriminating parameter as an independent variable, quantitating as a discriminating index a numeric value obtained by substituting a discriminating parameter value into this discrimination function, and automatically discriminating, based on this index, whether the sample is blood or a control fluid, whereby a kind of the sample can be automatically quantitated by measuring electric current when a sensor system is used for quantitating the concentration of an analysis object in the sample.
    Type: Grant
    Filed: June 29, 2004
    Date of Patent: October 17, 2006
    Assignees: Matsushita Electric Industrial Co., Ltd., Arkray, Inc.
    Inventors: Hiroyuki Tokunaga, Shoji Miyazaki, Hideyuki Baba, Yoichi Inoue, Kazuo Iketaki, Katsumi Hamamoto
  • Patent number: 7111630
    Abstract: When the hatch of a substrate washing chamber 5 is opened to receive a substrate, certain valves are closed, and a valve is opened, supply CO2 to purge the substrate washing chamber 5 to and exclude air. When the hatch is closed, another valve is opened to vent substrate washing chamber 5 so that the CO2 expels any gas and unwanted air from the substrate washing chamber 5 and the conduits. Thereafter, super critical CO2 is used to wash the substrate and clean the circulation line. The flow of supercritical CO2 is sent to the substrate washing chamber 5. After flowing through the circulation line, including a circulation channel 11, it passes through a bypass channel 12 to a decompressor 7. Any chemicals or organic substances left in the circulation line are continuously sent to a separation/recover bath 8 together with the flow.
    Type: Grant
    Filed: June 28, 2004
    Date of Patent: September 26, 2006
    Assignees: Dainippon Screen Mfg. Co., Ltd., Kobe Steel, Ltd.
    Inventors: Ikuo Mizobata, Yusuke Muraoka, Kimitsugu Saito, Ryuji Kitakado, Yoichi Inoue, Yoshihiko Sakashita, Katsumi Watanabe, Masahiro Yamagata, Hisanori Oshiba
  • Patent number: 7080651
    Abstract: When the hatch of a substrate washing chamber 5 is opened to receive a substrate, certain valves are closed, and one valve is opened, to supply CO2 to purge the substrate washing chamber 5 to and exclude air. When the hatch is closed, another valve is opened to vent substrate washing chamber 5 so that the CO2 expels any gas and unwanted air from the substrate washing chamber 5 and the conduits. Thereafter, supercritical CO2 is used to wash the substrate and clean the circulation line. The flow of supercritical CO2 is sent to the substrate washing chamber 5. After flowing through the circulation line, including a circulation channel 11, it passes through a bypass channel 12 to a decompressor 7. Any chemicals or organic substances left in the circulation line are continuously sent to separation/recovery bath 8 together with the flow.
    Type: Grant
    Filed: May 16, 2002
    Date of Patent: July 25, 2006
    Assignees: Dainippon Screen Mfg. Co., Ltd., Kobe Steel, Ltd.
    Inventors: Ikuo Mizobata, Yusuke Muraoka, Kimitsugu Saito, Ryuji Kitakado, Yoichi Inoue, Yoshihiko Sakashita, Katsumi Watanabe, Masahiro Yamagata, Hisanori Oshiba
  • Publication number: 20050258034
    Abstract: A quantitative analyzing method is provided for electrochemically measuring the concentration of a substance in a sample liquid using a sensor including a reagent layer (30) which contains a reagent for reacting with the substance and to which (30) the sample liquid is introduced, and a first electrode (22) and a second electrode (23) for applying a voltage to the reagent layer (30). The method includes a current measuring step for applying a voltage across the first electrode (22) and the second electrode (23) for measuring current flowing between the first and the second electrodes (22,23), a parameter calculating step for calculating a parameter based on the measured current, and a determining step for determining a state of the sample liquid introduced to the reagent layer (30) based on the parameter and at least one predetermined constant.
    Type: Application
    Filed: January 15, 2002
    Publication date: November 24, 2005
    Inventors: Kazuo Iketaki, Yoichi Inoue
  • Patent number: 6962161
    Abstract: In a high pressure processing method for removing an unnecessary substrate on the surface of the surface of a workpiece by bringing it into contact with supercritical carbon dioxide and additives in a high-pressure chamber, removing the unnecessary substance on the workpiece, first rinsing and second rinsing are performed under a substantially same pressure with continuous flowing of supercritical carbon dioxide.
    Type: Grant
    Filed: November 21, 2002
    Date of Patent: November 8, 2005
    Assignee: Kobe Steel, Ltd.
    Inventors: Yoichi Inoue, Kaoru Masuda, Katsuyuki Iijima
  • Publication number: 20050079107
    Abstract: Mixing baths 6A and 6B which temporarily hold chemical agents A and B respectively are disposed. The mixing baths 6A and 6B are each connected with a high-pressure fluid supplying unit 2. For surface treatment using a mixture of the chemical agent A and SCF (processing fluid), SCF is fed under pressure from the high-pressure fluid supplying unit 2 to the mixing bath 6A which already holds the chemical agent A, whereby the chemical agent A dissolves in SCF flowing into the mixing bath 6A and the mixture of the chemical agent A and SCF (processing fluid) is created. As a high-pressure valve (processing fluid introducing valve) 39 is opened, the processing fluid is sent into a pressure vessel 1. This achieves a predetermined surface treatment of a substrate which has been set inside the pressure vessel 1, using the processing fluid.
    Type: Application
    Filed: October 4, 2004
    Publication date: April 14, 2005
    Inventors: Yusuke Muraoka, Tomomi Iwata, Kimitsugu Saito, Masahiro Yamagata, Yoichi Inoue, Hisanori Oshiba
  • Patent number: 6874513
    Abstract: A high-pressure processing apparatus for removing unnecessary matters on objects to be processed by bringing a high-pressure fluid and a chemical liquid other than the high-pressure fluid into contact with the objects to be processed in a pressurized state is provided with a plurality of high-pressure processing chambers, a common high-pressure fluid supply unit for supplying the high-pressure fluid to each one of the high-pressure processing chambers, a common chemical liquid supply unit for supplying the chemical liquid to the each high-pressure processing chambers, and a separating unit for separating gaseous components from a mixture of the high-pressure fluid and the chemical liquid discharged from the high-pressure processing chambers after the objects are processed. Thus, a high-pressure processing apparatus which has such a compact construction as to be partly installable in a clean room and can stably perform a high-pressure processing can be provided.
    Type: Grant
    Filed: April 17, 2002
    Date of Patent: April 5, 2005
    Assignees: Kabushiki Kaisha Kobe Seiko Sho, Dainippon Screen Mfg. Co., Ltd.
    Inventors: Masahiro Yamagata, Hisanori Oshiba, Yoshihiko Sakashita, Yoichi Inoue, Yusuke Muraoka, Kimitsugu Saito, Ikuo Mizobata, Ryuji Kitakado
  • Publication number: 20050005957
    Abstract: Provided is a cleaning apparatus for cleaning an object to be treated by contacting the object to be treated with a high pressure fluid of a cleaning composition containing a cleaning component as an essential ingredient. The cleaning apparatus includes high pressure fluid supplying means for supplying the high pressure fluid of the cleaning composition, a high pressure washing vessel for removing unnecessary materials deposited on the object to be treated by contacting the object to be treated with the high pressure fluid of the cleaning composition therein, a storing vessel for storing a waste high pressure fluid of the cleaning composition carrying the unnecessary materials therein, and a sealed structure for sealably housing the high pressure fluid supplying means, the high pressure washing vessel, and the storing vessel therein. The sealed structure has first exhaust means for exhausting the gas remaining in the sealed structure therefrom.
    Type: Application
    Filed: July 9, 2004
    Publication date: January 13, 2005
    Applicants: KABUSHIKI KAISHA KOBE SEIKO SHO, DAINIPPON SCREEN MFG. CO., LTD.
    Inventors: Masahiro Yamagata, Hisanori Oshiba, Yoichi Inoue, Yusuke Muraoka, Tomomi Iwata, Kimitsugu Saito
  • Patent number: 6824670
    Abstract: A glucose sensor system comprising the steps of using as a sample discriminating parameter a ratio (I/&Dgr;I) of a measured current value I to the time-differential value of the current value &Dgr;I, defining a discrimination function that discriminates whether a sample is blood or control fluid and uses the discriminating parameter as an independent variable, quantitating as a discriminating index a numeric value obtained by substituting a discriminating parameter value into this discrimination function, and automatically discriminating, based on this index, whether the sample is blood or a control fluid, whereby a kind of the sample can be automatically quantitated by measuring electric current when a sensor system is used for quantitating the concentration of an analysis object in the sample.
    Type: Grant
    Filed: October 29, 2001
    Date of Patent: November 30, 2004
    Assignees: Matsushita Electric Industrial Co. Ltd., Arkray, Inc.
    Inventors: Hiroyuki Tokunaga, Shoji Miyazaki, Hideyuki Baba, Yoichi Inoue, Kazuo Iketaki, Katsumi Hamamoto
  • Publication number: 20040235178
    Abstract: A glucose sensor system comprising the steps of using as a sample discriminating parameter a ratio (I/&Dgr;I) of a measured current value I to the time-differential value of the current value &Dgr;I, defining a discrimination function that discriminates whether a sample is blood or control fluid and uses the discriminating parameter as an independent variable, quantitating as a discriminating index a numeric value obtained by substituting a discriminating parameter value into this discrimination function, and automatically discriminating, based on this index, whether the sample is blood or a control fluid, whereby a kind of the sample can be automatically quantitated by measuring electric current when a sensor system is used for quantitating the concentration of an analysis object in the sample.
    Type: Application
    Filed: June 29, 2004
    Publication date: November 25, 2004
    Applicants: Matsushita Electric Industrial Co., Ltd., Arkray, Inc.
    Inventors: Hiroyuki Tokunaga, Shoji Miyazaki, Hideyuki Baba, Yoichi Inoue, Kazuo Iketaki, Katsumi Hamamoto