Patents by Inventor Yoichi Inoue
Yoichi Inoue has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240128846Abstract: A vibration motor includes a stationary portion and a movable portion to vibrate in a central axis direction with respect to the stationary portion. The stationary portion includes a housing and a coil on an outer side in a radial direction of the movable portion. The movable portion includes a core portion including a magnet. The housing houses the movable portion and the coil, and includes a peripheral wall portion on an outer side in the radial direction of the coil and extending in an axial direction, and a magnetic portion on a portion of the peripheral wall portion and including a magnetic body. At least a portion of the magnetic portion opposes the coil in the radial direction and extends in a circumferential direction. The peripheral wall portion includes a through hole adjacent to the magnetic portion in the axial direction and extends in the circumferential direction.Type: ApplicationFiled: October 17, 2023Publication date: April 18, 2024Inventors: Toshitaka YAMAZAKI, Jun INOUE, Yoichi SEKII
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Publication number: 20240076596Abstract: A cell culture container includes: an insert member having a membrane on which a cell is seeded, the insert member defining a first inner space that functions as an anaerobic chamber; a container having an attachment/detachment portion to and from which the insert member is attachable and detachable, the container defining a second inner space that functions as an aerobic chamber; a sealing member that closes an opening of the aerobic chamber between the attachment/detachment portion and the insert member with the insert member being attached to the attachment/detachment portion; and a transfer mechanism that transfers force to the sealing member. The sealing member closes the opening in response to an input of the force from the transfer mechanism.Type: ApplicationFiled: October 14, 2021Publication date: March 7, 2024Inventors: Tsunehiro INOUE, Toyoyuki HASHIMOTO, Yasuko YONEDA, Kenji TAKUBO, Yoichi FUJIYAMA, Tomoki OHKUBO, Eiichi OZEKI, Ryogo TAKAI, Hiroomi GOTO, Sadamu TOMITA
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Patent number: 9188493Abstract: A main object of the present invention is to provide a method capable of measuring surface temperatures of a plurality of points of cast slab at a secondary cooling zone of a continuous caster with a good accuracy and at low cost. The method comprises the steps of inserting one end of a plurality of optical fibers 3 respectively to nozzles 1 and tubes 2, and installing each nozzle between support rolls that support the cast slab, while spraying purge air from each nozzle toward a surface of the cast slab, receiving a thermal radiation light from the cast slab at the one end of each optical fiber, gathering other ends of the optical fibers 3, 81 in a bundle to take images including a core image of the other end of each optical fibers by an imaging means 5, and calculating the surface temperature of the cast slab.Type: GrantFiled: August 27, 2013Date of Patent: November 17, 2015Assignee: NIPPON STEEL & SUMITOMO METAL CORPORATIONInventors: Tatsuro Honda, Chihiro Uematsu, Yoichi Inoue, Naoki Tajima, Yasuhiro Mizuno
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Publication number: 20150204732Abstract: A main object of the present invention is to provide a method capable of measuring surface temperatures of a plurality of points of cast slab at a secondary cooling zone of a continuous caster with a good accuracy and at low cost. The method comprises the steps of inserting one end of a plurality of optical fibers 3 respectively to nozzles 1 and tubes 2, and installing each nozzle between support rolls that support the cast slab, while spraying purge air from each nozzle toward a surface of the cast slab, receiving a thermal radiation light from the cast slab at the one end of each optical fiber, gathering other ends of the optical fibers 3, 81 in a bundle to take images including a core image of the other end of each optical fibers by an imaging means 5, and calculating the surface temperature of the cast slab.Type: ApplicationFiled: August 27, 2013Publication date: July 23, 2015Inventors: Tatsuro Honda, Chihiro Uematsu, Yoichi Inoue, Noaki Tajima, Yasuhiro Mizuno
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Publication number: 20150202684Abstract: Provided are a method of molding an amorphous alloy, which has a high degree of work freedom regardless of components of an amorphous alloy, in particular, metallic glass and of the shape of an article to be molded, and is capable of producing a molded article having less pores, and a molded object produced by the molding method. The method of molding an amorphous alloy includes: a melting step of melting an amorphous alloy; a differential-pressure casting step of injecting a melt of the amorphous alloy into a casting mold positioned below the melt and evacuating the casting mold; and a processing step of processing the melt by heating and pressurizing the melt in the casting mold while keeping the melt in a supercooled state.Type: ApplicationFiled: January 30, 2013Publication date: July 23, 2015Inventors: Takashi Hashima, Yoichi Inoue, Yasunori Saotome, Kenji Amiya
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Patent number: 8394231Abstract: That surface of an electrode plate 20 which is opposite to a susceptor 10 has a projection shape. The electrode plate 20 is fitted in an opening 26a of shield ring 26 at a projection 20a. At this time, the thickness of the projection 20a is approximately the same as the thickness of the shield ring 26. Accordingly, the electrode plate 20 and the shield ring 26 form substantially the same plane. The major surface of the projection 20a has a diameter 1.2 to 1.5 times the diameter of a wafer W. The electrode plate 20 is formed of, for example, SiC.Type: GrantFiled: January 23, 2007Date of Patent: March 12, 2013Assignee: Tokyo Electron LimitedInventors: Koichi Takatsuki, Hikaru Yoshitaka, Shigeo Ashigaki, Yoichi Inoue, Takashi Akahori, Shuuichi Ishizuka, Syoichi Abe, Takashi Suzuki, Kohei Kawamura, Hidenori Miyoshi, Gishi Chung, Yasuhiro Oshima, Hiroyuki Takahashi
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Patent number: 7513265Abstract: Disclosed is a high pressure processing method for subjecting a processing object to a high pressure processing using a high pressure fluid. In this method, the high pressure fluid is brought into collision with the surface of the processing object placed in a high pressure processing chamber, and then distributed along the surface of the processing object in an outward direction beyond the processing object.Type: GrantFiled: October 21, 2003Date of Patent: April 7, 2009Assignees: Kabushiki Kaisha Kobe Seiko Sho, Dainippon Screen Mfg. Co., Ltd.Inventors: Tetsuya Yoshikawa, Yoichi Inoue, Katsumi Watanabe, Kaoru Masuda, Katsuyuki Iijima, Tomomi Iwata, Yusuke Muraoka, Kimitsugu Saito, Ikuo Mizobata
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Patent number: 7435396Abstract: Mixing baths 6A and 6B which temporarily hold chemical agents A and B respectively are disposed. The mixing baths 6A and 6B are each connected with a high-pressure fluid supplying unit 2. For surface treatment using a mixture of the chemical agent A and SCF (processing fluid), SCF is fed under pressure from the high-pressure fluid supplying unit 2 to the mixing bath 6A which already holds the chemical agent A, whereby the chemical agent A dissolves in SCF flowing into the mixing bath 6A and the mixture of the chemical agent A and SCF (processing fluid) is created. As a high-pressure valve (processing fluid introducing valve) 39 is opened, the processing fluid is sent into a pressure vessel 1. This achieves a predetermined surface treatment of a substrate which has been set inside the pressure vessel 1, using the processing fluid.Type: GrantFiled: October 4, 2004Date of Patent: October 14, 2008Assignee: Dainippon Screen Mfg. Co., Ltd.Inventors: Yusuke Muraoka, Tomomi Iwata, Kimitsugu Saito, Masahiro Yamagata, Yoichi Inoue, Hisanori Oshiba
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Patent number: 7351323Abstract: A quantitative analyzing method is provided for electrochemically measuring the concentration of a substance in a sample liquid using a sensor including a reagent layer (30) which contains a reagent for reacting with the substance and to which (30) the sample liquid is introduced, and a first electrode (22) and a second electrode (23) for applying a voltage to the reagent layer (30). The method includes a current measuring step for applying a voltage across the first electrode (22) and the second electrode (23) for measuring current flowing between the first and the second electrodes (22,23), a parameter calculating step for calculating a parameter based on the measured current, and a determining step for determining a state of the sample liquid introduced to the reagent layer (30) based on the parameter and at least one predetermined constant.Type: GrantFiled: January 15, 2002Date of Patent: April 1, 2008Assignee: Arkray, Inc.Inventors: Kazuo Iketaki, Yoichi Inoue
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Publication number: 20070131171Abstract: That surface of an electrode plate 20 which is opposite to a susceptor 10 has a projection shape. The electrode plate 20 is fitted in an opening 26a of shield ring 26 at a projection 20a. At this time, die thickness of the projection 20a is approximately the same as the thickness of the shield ring 26. Accordingly, the electrode plate 20 and the shield ring 26 form substantially the same plane. The major surface of the projection 20a has a diameter 1.2 to 1.5 times the diameter of a wafer W. The electrode plate 20 is formed of, for example, SiC.Type: ApplicationFiled: January 23, 2007Publication date: June 14, 2007Applicant: Tokyo Electron LimitedInventors: Koichi Takatsuki, Hikaru Yoshitaka, Shigeo Ashigaki, Yoichi Inoue, Takashi Akahori, Shuuichi Ishizuka, Syoichi Abe, Takashi Suzuki, Kohei Kawamura, Hidenori Miyoshi, Gishi Chung, Yasuhiro Oshima, Hiroyuki Takahashi
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Patent number: 7122111Abstract: A glucose sensor system comprising the steps of using as a sample discriminating parameter a ratio (I/?I) of a measured current value I to the time-differential value of the current value ?I, defining a discrimination function that discriminates whether a sample is blood or control fluid and uses the discriminating parameter as an independent variable, quantitating as a discriminating index a numeric value obtained by substituting a discriminating parameter value into this discrimination function, and automatically discriminating, based on this index, whether the sample is blood or a control fluid, whereby a kind of the sample can be automatically quantitated by measuring electric current when a sensor system is used for quantitating the concentration of an analysis object in the sample.Type: GrantFiled: June 29, 2004Date of Patent: October 17, 2006Assignees: Matsushita Electric Industrial Co., Ltd., Arkray, Inc.Inventors: Hiroyuki Tokunaga, Shoji Miyazaki, Hideyuki Baba, Yoichi Inoue, Kazuo Iketaki, Katsumi Hamamoto
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Patent number: 7111630Abstract: When the hatch of a substrate washing chamber 5 is opened to receive a substrate, certain valves are closed, and a valve is opened, supply CO2 to purge the substrate washing chamber 5 to and exclude air. When the hatch is closed, another valve is opened to vent substrate washing chamber 5 so that the CO2 expels any gas and unwanted air from the substrate washing chamber 5 and the conduits. Thereafter, super critical CO2 is used to wash the substrate and clean the circulation line. The flow of supercritical CO2 is sent to the substrate washing chamber 5. After flowing through the circulation line, including a circulation channel 11, it passes through a bypass channel 12 to a decompressor 7. Any chemicals or organic substances left in the circulation line are continuously sent to a separation/recover bath 8 together with the flow.Type: GrantFiled: June 28, 2004Date of Patent: September 26, 2006Assignees: Dainippon Screen Mfg. Co., Ltd., Kobe Steel, Ltd.Inventors: Ikuo Mizobata, Yusuke Muraoka, Kimitsugu Saito, Ryuji Kitakado, Yoichi Inoue, Yoshihiko Sakashita, Katsumi Watanabe, Masahiro Yamagata, Hisanori Oshiba
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Patent number: 7080651Abstract: When the hatch of a substrate washing chamber 5 is opened to receive a substrate, certain valves are closed, and one valve is opened, to supply CO2 to purge the substrate washing chamber 5 to and exclude air. When the hatch is closed, another valve is opened to vent substrate washing chamber 5 so that the CO2 expels any gas and unwanted air from the substrate washing chamber 5 and the conduits. Thereafter, supercritical CO2 is used to wash the substrate and clean the circulation line. The flow of supercritical CO2 is sent to the substrate washing chamber 5. After flowing through the circulation line, including a circulation channel 11, it passes through a bypass channel 12 to a decompressor 7. Any chemicals or organic substances left in the circulation line are continuously sent to separation/recovery bath 8 together with the flow.Type: GrantFiled: May 16, 2002Date of Patent: July 25, 2006Assignees: Dainippon Screen Mfg. Co., Ltd., Kobe Steel, Ltd.Inventors: Ikuo Mizobata, Yusuke Muraoka, Kimitsugu Saito, Ryuji Kitakado, Yoichi Inoue, Yoshihiko Sakashita, Katsumi Watanabe, Masahiro Yamagata, Hisanori Oshiba
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Publication number: 20050258034Abstract: A quantitative analyzing method is provided for electrochemically measuring the concentration of a substance in a sample liquid using a sensor including a reagent layer (30) which contains a reagent for reacting with the substance and to which (30) the sample liquid is introduced, and a first electrode (22) and a second electrode (23) for applying a voltage to the reagent layer (30). The method includes a current measuring step for applying a voltage across the first electrode (22) and the second electrode (23) for measuring current flowing between the first and the second electrodes (22,23), a parameter calculating step for calculating a parameter based on the measured current, and a determining step for determining a state of the sample liquid introduced to the reagent layer (30) based on the parameter and at least one predetermined constant.Type: ApplicationFiled: January 15, 2002Publication date: November 24, 2005Inventors: Kazuo Iketaki, Yoichi Inoue
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Patent number: 6962161Abstract: In a high pressure processing method for removing an unnecessary substrate on the surface of the surface of a workpiece by bringing it into contact with supercritical carbon dioxide and additives in a high-pressure chamber, removing the unnecessary substance on the workpiece, first rinsing and second rinsing are performed under a substantially same pressure with continuous flowing of supercritical carbon dioxide.Type: GrantFiled: November 21, 2002Date of Patent: November 8, 2005Assignee: Kobe Steel, Ltd.Inventors: Yoichi Inoue, Kaoru Masuda, Katsuyuki Iijima
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Publication number: 20050079107Abstract: Mixing baths 6A and 6B which temporarily hold chemical agents A and B respectively are disposed. The mixing baths 6A and 6B are each connected with a high-pressure fluid supplying unit 2. For surface treatment using a mixture of the chemical agent A and SCF (processing fluid), SCF is fed under pressure from the high-pressure fluid supplying unit 2 to the mixing bath 6A which already holds the chemical agent A, whereby the chemical agent A dissolves in SCF flowing into the mixing bath 6A and the mixture of the chemical agent A and SCF (processing fluid) is created. As a high-pressure valve (processing fluid introducing valve) 39 is opened, the processing fluid is sent into a pressure vessel 1. This achieves a predetermined surface treatment of a substrate which has been set inside the pressure vessel 1, using the processing fluid.Type: ApplicationFiled: October 4, 2004Publication date: April 14, 2005Inventors: Yusuke Muraoka, Tomomi Iwata, Kimitsugu Saito, Masahiro Yamagata, Yoichi Inoue, Hisanori Oshiba
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Patent number: 6874513Abstract: A high-pressure processing apparatus for removing unnecessary matters on objects to be processed by bringing a high-pressure fluid and a chemical liquid other than the high-pressure fluid into contact with the objects to be processed in a pressurized state is provided with a plurality of high-pressure processing chambers, a common high-pressure fluid supply unit for supplying the high-pressure fluid to each one of the high-pressure processing chambers, a common chemical liquid supply unit for supplying the chemical liquid to the each high-pressure processing chambers, and a separating unit for separating gaseous components from a mixture of the high-pressure fluid and the chemical liquid discharged from the high-pressure processing chambers after the objects are processed. Thus, a high-pressure processing apparatus which has such a compact construction as to be partly installable in a clean room and can stably perform a high-pressure processing can be provided.Type: GrantFiled: April 17, 2002Date of Patent: April 5, 2005Assignees: Kabushiki Kaisha Kobe Seiko Sho, Dainippon Screen Mfg. Co., Ltd.Inventors: Masahiro Yamagata, Hisanori Oshiba, Yoshihiko Sakashita, Yoichi Inoue, Yusuke Muraoka, Kimitsugu Saito, Ikuo Mizobata, Ryuji Kitakado
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Publication number: 20050005957Abstract: Provided is a cleaning apparatus for cleaning an object to be treated by contacting the object to be treated with a high pressure fluid of a cleaning composition containing a cleaning component as an essential ingredient. The cleaning apparatus includes high pressure fluid supplying means for supplying the high pressure fluid of the cleaning composition, a high pressure washing vessel for removing unnecessary materials deposited on the object to be treated by contacting the object to be treated with the high pressure fluid of the cleaning composition therein, a storing vessel for storing a waste high pressure fluid of the cleaning composition carrying the unnecessary materials therein, and a sealed structure for sealably housing the high pressure fluid supplying means, the high pressure washing vessel, and the storing vessel therein. The sealed structure has first exhaust means for exhausting the gas remaining in the sealed structure therefrom.Type: ApplicationFiled: July 9, 2004Publication date: January 13, 2005Applicants: KABUSHIKI KAISHA KOBE SEIKO SHO, DAINIPPON SCREEN MFG. CO., LTD.Inventors: Masahiro Yamagata, Hisanori Oshiba, Yoichi Inoue, Yusuke Muraoka, Tomomi Iwata, Kimitsugu Saito
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Patent number: 6824670Abstract: A glucose sensor system comprising the steps of using as a sample discriminating parameter a ratio (I/&Dgr;I) of a measured current value I to the time-differential value of the current value &Dgr;I, defining a discrimination function that discriminates whether a sample is blood or control fluid and uses the discriminating parameter as an independent variable, quantitating as a discriminating index a numeric value obtained by substituting a discriminating parameter value into this discrimination function, and automatically discriminating, based on this index, whether the sample is blood or a control fluid, whereby a kind of the sample can be automatically quantitated by measuring electric current when a sensor system is used for quantitating the concentration of an analysis object in the sample.Type: GrantFiled: October 29, 2001Date of Patent: November 30, 2004Assignees: Matsushita Electric Industrial Co. Ltd., Arkray, Inc.Inventors: Hiroyuki Tokunaga, Shoji Miyazaki, Hideyuki Baba, Yoichi Inoue, Kazuo Iketaki, Katsumi Hamamoto
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Publication number: 20040235178Abstract: A glucose sensor system comprising the steps of using as a sample discriminating parameter a ratio (I/&Dgr;I) of a measured current value I to the time-differential value of the current value &Dgr;I, defining a discrimination function that discriminates whether a sample is blood or control fluid and uses the discriminating parameter as an independent variable, quantitating as a discriminating index a numeric value obtained by substituting a discriminating parameter value into this discrimination function, and automatically discriminating, based on this index, whether the sample is blood or a control fluid, whereby a kind of the sample can be automatically quantitated by measuring electric current when a sensor system is used for quantitating the concentration of an analysis object in the sample.Type: ApplicationFiled: June 29, 2004Publication date: November 25, 2004Applicants: Matsushita Electric Industrial Co., Ltd., Arkray, Inc.Inventors: Hiroyuki Tokunaga, Shoji Miyazaki, Hideyuki Baba, Yoichi Inoue, Kazuo Iketaki, Katsumi Hamamoto