Patents by Inventor Yong Seung Kim

Yong Seung Kim has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11133421
    Abstract: A semiconductor device includes a fin-type pattern on a substrate, the fin-type pattern extending in a first direction and protruding from the substrate in a third direction, a first wire pattern on the fin-type pattern, the first wire pattern being spaced apart from the fin-type pattern in the third direction, and a gate electrode extending in a second direction, which is perpendicular to the first and third directions, and surrounding the first wire pattern, the gate electrode including a first portion that overlaps with the fin-type pattern in the second direction and a second portion corresponding to a remainder of the gate electrode except for the first portion.
    Type: Grant
    Filed: March 4, 2020
    Date of Patent: September 28, 2021
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Moon Seung Yang, Eun Hye Choi, Seung Mo Kang, Yong Seung Kim, Jung Taek Kim, Min-Hee Choi
  • Publication number: 20210217860
    Abstract: A semiconductor device including an active pattern extending in a first direction; a channel pattern on the active pattern and including vertically stacked semiconductor patterns; a source/drain pattern in a recess in the active pattern; a gate electrode on the active pattern and extending in a second direction crossing the first direction, the gate electrode surrounding a top surface, at least one side surface, and a bottom surface of each of the semiconductor patterns; and a gate spacer covering a side surface of the gate electrode and having an opening to the semiconductor patterns, wherein the source/drain pattern includes a buffer layer covering inner sides of the recess, the buffer layer includes an outer side surface and an inner side surface, which are opposite to each other, and each of the outer and inner side surfaces is a curved surface that is convexly curved toward a closest gate electrode.
    Type: Application
    Filed: January 5, 2021
    Publication date: July 15, 2021
    Inventors: Ryong HA, Dongwoo KIM, Gyeom KIM, Yong Seung KIM, Pankwi PARK, Seung Hun LEE
  • Publication number: 20200395489
    Abstract: A semiconductor device includes a fin-type pattern on a substrate, the fin-type pattern extending in a first direction and protruding from the substrate in a third direction, a first wire pattern on the fin-type pattern, the first wire pattern being spaced apart from the fin-type pattern in the third direction, and a gate electrode extending in a second direction, which is perpendicular to the first and third directions, and surrounding the first wire pattern, the gate electrode including a first portion that overlaps with the fin-type pattern in the second direction and a second portion corresponding to a remainder of the gate electrode except for the first portion.
    Type: Application
    Filed: March 4, 2020
    Publication date: December 17, 2020
    Inventors: Moon Seung YANG, Eun Hye CHOI, Seung Mo KANG, Yong Seung KIM, Jung Taek KIM, Min-Hee CHOI
  • Patent number: 10790361
    Abstract: Provided is a semiconductor device including: a fin structure on a substrate including a negative channel field-effect transistor (nFET) region and a positive channel field-effect transistor (pFET) region; a gate structure on the fin structure; and a source/drain structure adjacent to the gate structure, wherein the source/drain structure formed in the nFET region is an epitaxial layer including an n-type impurity at a concentration of about 1.8×1021/cm3 or more, includes silicon (Si) and germanium (Ge) on an outer portion of the source/drain structure, and includes Si but not Ge in an inner portion of the source/drain structure, wherein an inclined surface contacting an uppermost surface of the source/drain structure forms an angle of less than about 54.7° with a top surface of the fin structure.
    Type: Grant
    Filed: April 23, 2019
    Date of Patent: September 29, 2020
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Dong-woo Kim, Hyun-ho Noh, Yong-seung Kim, Dong-suk Shin, Kwan-heum Lee, Yu-yeong Jo
  • Publication number: 20190259840
    Abstract: Provided is a semiconductor device including: a fin structure on a substrate including a negative channel field-effect transistor (nFET) region and a positive channel field-effect transistor (pFET) region; a gate structure on the fin structure; and a source/drain structure adjacent to the gate structure, wherein the source/drain structure formed in the nFET region is an epitaxial layer including an n-type impurity at a concentration of about 1.8×1021/cm3 or more, includes silicon (Si) and germanium (Ge) on an outer portion of the source/drain structure, and includes Si but not Ge in an inner portion of the source/drain structure, wherein an inclined surface contacting an uppermost surface of the source/drain structure forms an angle of less than about 54.7° with a top surface of the fin structure.
    Type: Application
    Filed: April 23, 2019
    Publication date: August 22, 2019
    Inventors: Dong-woo Kim, Hyun-ho Noh, Yong-seung Kim, Dong-suk Shin, Kwan-heum Lee, Yu-yeong Jo
  • Patent number: 10304932
    Abstract: Provided is a semiconductor device including: a fin structure on a substrate including a negative channel field-effect transistor (nFET) region and a positive channel field-effect transistor (pFET) region; a gate structure on the fin structure; and a source/drain structure adjacent to the gate structure, wherein the source/drain structure formed in the nFET region is an epitaxial layer including an n-type impurity at a concentration of about 1.8×1021/cm3 or more, includes silicon (Si) and germanium (Ge) on an outer portion of the source/drain structure, and includes Si but not Ge in an inner portion of the source/drain structure, wherein an inclined surface contacting an uppermost surface of the source/drain structure forms an angle of less than about 54.7° with a top surface of the fin structure.
    Type: Grant
    Filed: January 15, 2018
    Date of Patent: May 28, 2019
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Dong-woo Kim, Hyun-ho Noh, Yong-seung Kim, Dong-suk Shin, Kwan-heum Lee, Yu-yeong Jo
  • Publication number: 20190006469
    Abstract: Provided is a semiconductor device including: a fin structure on a substrate including a negative channel field-effect transistor (nFET) region and a positive channel field-effect transistor (pFET) region; a gate structure on the fin structure; and a source/drain structure adjacent to the gate structure, wherein the source/drain structure formed in the nFET region is an epitaxial layer including an n-type impurity at a concentration of about 1.8×1021/cm3 or more, includes silicon (Si) and germanium (Ge) on an outer portion of the source/drain structure, and includes Si but not Ge in an inner portion of the source/drain structure, wherein an inclined surface contacting an uppermost surface of the source/drain structure forms an angle of less than about 54.7° with a top surface of the fin structure.
    Type: Application
    Filed: January 15, 2018
    Publication date: January 3, 2019
    Inventors: Dong-woo Kim, Hyun-ho Noh, Yong-seung Kim, Dong-suk Shin, Kwan-heum Lee, Yu-yeong Jo
  • Patent number: 9416778
    Abstract: A self-gettering differential pump for a molecular beam epitaxy system has a collimator with a length greater than its diameter mounted in front of a source in extended port geometry, wherein the reactant delivered by the source also serves as a gettering agent.
    Type: Grant
    Filed: April 16, 2012
    Date of Patent: August 16, 2016
    Assignee: RUTGERS, THE STATE UNIVERSITY OF NEW JERSEY
    Inventors: Seongshik Oh, Yong-Seung Kim
  • Patent number: 9376353
    Abstract: This invention relates to a method of producing aromatic hydrocarbons and olefin from hydrocarbonaceous oils including large amounts of polycyclic aromatic compounds having two or more rings via partial hydrogenation in the presence of a hydrogenation catalyst and catalytic cracking in the presence of a catalytic cracking catalyst.
    Type: Grant
    Filed: October 31, 2012
    Date of Patent: June 28, 2016
    Assignee: SK Innovation Co., Ltd.
    Inventors: Cheol Joong Kim, Sung Won Kim, Sang Hun Oh, Il Yong Jeong, Kang Seok Go, Sung Bum Park, Dae Hyun Choo, Hyuck Jae Lee, Hong Chan Kim, Jae Suk Koh, Yong Seung Kim, Gyung Rok Kim, Myoung Han No, Sun Choi, Seung Hoon Oh, Tae Jin Kim
  • Patent number: 9283553
    Abstract: This invention relates to a hydrocracking catalyst for preparing valuable light aromatic hydrocarbons from polycyclic aromatic hydrocarbons derived from oil, which includes (i) beta-zeolite, (ii) pseudo-boehmite, and (iii) one or more metals selected from among metals of Groups VIII and VIB, and which further includes a cocatalyst component, thereby producing a maximum amount of BTX (Benzene, Toluene, Xylene) from LCO (Light Cycle Oil).
    Type: Grant
    Filed: October 21, 2011
    Date of Patent: March 15, 2016
    Assignee: SK INNOVATION CO., LTD.
    Inventors: Do Woan Kim, Jae Hyun Koh, Sang Il Lee, Seung Woo Lee, Seung Hoon Oh, Jae Suk Koh, Yong Seung Kim, Gyung Rok Kim, Sun Choi, Hong Chan Kim, Sang Hun Oh
  • Patent number: 9062262
    Abstract: Disclosed is a method of recovering 1,3-butadiene from a C4 stream containing butane, isobutane, 2-butene, 1-butene, isobutene, butadiene and acetylene. The process of recovering highly pure 1,3-butadiene includes acetylene conversion for selectively converting acetylene through liquid-phase hydrogenation, so that the acetylene content is decreased to 70 wt ppm or less, and 1,3-butadiene extraction using an extractive distillation column, a pre-separator, a solvent stripping column, a solvent recovery column, and a purification column. Through the acetylene conversion, the concentration of vinylacetylene is decreased to 70 wt ppm or less, after which 1,3-butadiene is recovered using only one extractive distillation column, thereby considerably decreasing the degree of utility and the loss of streams in the course of extraction. The number of units necessary for the process is decreased, thus remarkably reducing the time during which impurities can accumulate in a processing unit.
    Type: Grant
    Filed: July 18, 2008
    Date of Patent: June 23, 2015
    Assignee: SK INNOVATION CO., LTD.
    Inventors: Hee Du Lee, Kyung Jong Oh, Min Su Ko, Min Gyoo Park, Seong Jun Lee, Yoon Jae Yim, Seung Hoon Oh, Tae Jin Kim, Yong Seung Kim, Deuk Soo Park, Hong Chan Kim
  • Patent number: 9056308
    Abstract: Disclosed are a molecular sieve catalyst and a preparation method thereof to produce light olefins from cracking naphtha catalytically in severe environments of high temperature and high moisture. In detail, the catalyst is prepared by spray-drying and calcining the mixed slurry, in which 0.01˜5.0 wt % of MnO2 and 1˜15 wt % of P2O5 are simultaneously imbedded in catalyst which consists of zeolite, clay and inorganic complex. According to the present invention, the method that manganese and phosphate are imbedded simultaneously in zeolite and inorganic complex is used to increases thermal-stability of obtained spherical catalyst, and increase olefin yield of cracking hydrocarbon such as naphtha by protecting acid-site of zeolite. To synthesize the required catalyst, the important procedures are mixing ratio and mixing sequence of Mn, P, zeolite, and inorganic complex.
    Type: Grant
    Filed: January 30, 2014
    Date of Patent: June 16, 2015
    Assignee: SK INNOVATION CO., LTD.
    Inventors: Dae Hyun Choo, Hong Chan Kim, Suk Joon Kim, Ji Min Kim, Tae Jin Kim, Sun Choi, Seung Hoon Oh, Yong Seung Kim, Deuk Soo Park, Yong Ki Park, Chul Wee Lee, Hee Young Kim, Won Choon Choi, Na Young Kang, Bu Sub Song
  • Patent number: 8975462
    Abstract: The present invention relates to a method for manufacturing aromatic products (benzene/toluene/xylene) and olefinic products from an aromatic-compound-containing oil fraction, whereby it is possible to substitute naphtha as a feedstock for aromatic production and so make stable supply and demand, and it is possible to substantially increase the yield of high-added-value olefinic and high-added-value aromatic components, by providing a method for manufacturing olefinic and aromatic products from light cycle oil comprising a hydrogen-processing reaction step, a catalytic cracking step, an separation step and a transalkylation step, and optionally also comprising a recirculation step.
    Type: Grant
    Filed: November 25, 2010
    Date of Patent: March 10, 2015
    Assignee: SK Innovation Co., Ltd.
    Inventors: Hong Chan Kim, Sung Won Kim, Yong Seung Kim, Sang Hun Oh, Soo Kil Kang, Hyuck Jae Lee, Cheol Joong Kim, Gyung Rok Kim, Sun Choi, Sam Ryong Park
  • Patent number: 8962901
    Abstract: This invention relates to a method of producing aromatics and olefins from oils derived from coal or wood, including partially saturating and cracking the oils derived from coal or wood in a hydrogenation and reaction area, separating them depending on the number of carbons, recirculating heavy oils having 11 or more carbons to the hydrogenation and reaction area, feeding oils suitable for producing BTX to an aromatic separation process and a transalkylation process to recover aromatics, and feeding hydrocarbonaceous components having 5 or less carbons to a light separation process, thus obtaining olefins.
    Type: Grant
    Filed: September 15, 2011
    Date of Patent: February 24, 2015
    Assignee: SK Innovation CO., Ltd.
    Inventors: Hong Chan Kim, Yong Seung Kim, Sung Won Kim, Sang Hun Oh, Hyuck Jae Lee, Dae Hyun Choo, Cheol Joong Kim, Gyung Rok Kim, Myoung Han Noh, Jae Suk Koh, Hyun Chul Choi, Eun Kyoung Kim, Yoon Kyung Lee, Jong Hyung Lee, Sun Choi, Seung Hoon Oh, Jae Hyun Koh, Sang Il Lee, Seung Woo Lee
  • Patent number: 8962900
    Abstract: This invention relates to a method of producing aromatics and light paraffins from hydrocarbonaceous oils derived from oil, coal or wood, including partially saturating and hydrocracking the oils derived from oil in a hydrogenation and reaction area, separating them depending on the number of carbons, recirculating heavy oils having 11 or more carbons to the hydrogenation and reaction area, feeding oils suitable for producing BTX to an aromatic separation process and a transalkylation process to recover aromatics, and feeding hydrocarbonaceous components having 5 or fewer carbons to a light separation process, thus obtaining light paraffins.
    Type: Grant
    Filed: October 20, 2011
    Date of Patent: February 24, 2015
    Assignee: SK Innovation Co., Ltd.
    Inventors: Hong Chan Kim, Yong Seung Kim, Sang Hun Oh, Hyuck Jae Lee, Jae Suk Koh, Gyung Rok Kim, Myoung Han Noh, Sang Il Lee, Seung Woo Lee, Do Woan Kim, Jae Hyun Koh, Jong Hyung Lee, Sun Choi, Seung Hoon Oh, Kyung Jong Oh
  • Patent number: 8933283
    Abstract: This invention relates to a petroleum refining method for producing high value-added clean petroleum products and aromatics (Benzene/Toluene/Xylene) together, by which low pollution petroleum products including liquefied petroleum gas or low-sulfur gas oil and aromatics can be efficiently produced together from a fluid catalytic cracked oil fraction.
    Type: Grant
    Filed: November 26, 2008
    Date of Patent: January 13, 2015
    Assignee: SK Innovation Co., Ltd.
    Inventors: Cheol Joong Kim, Jae Wook Ryu, Kyeong Hak Seong, Byoung Mu Chang, Byeung Soo Lim, Jong Hyung Lee, Kyung Seok Noh, Hyuck Jae Lee, Sam Ryong Park, Sun Choi, Seung Hoon Oh, Yong Seung Kim, Gyung Rok Kim
  • Publication number: 20140275671
    Abstract: This invention relates to a method of producing aromatic hydrocarbons and olefin from hydrocarbonaceous oils including large amounts of polycyclic aromatic compounds having two or more rings via partial hydrogenation in the presence of a hydrogenation catalyst and catalytic cracking in the presence of a catalytic cracking catalyst.
    Type: Application
    Filed: October 31, 2012
    Publication date: September 18, 2014
    Inventors: Cheol Joong Kim, Sung Won Kim, Sang Hun Oh, Il Yong Jeong, Kang Seok Go, Sung Bum Park, Dae Hyun Choo, Hyuck Jae Lee, Hong Chan Kim, Jae Suk Koh, Yong Seung Kim, Gyung Rok Kim, Myoung Han No, Sun Choi, Seung Hoon Oh, Tae Jin Kim
  • Publication number: 20140213431
    Abstract: Disclosed are a molecular sieve catalyst and a preparation method thereof to produce light olefins from cracking naphtha catalytically in severe environments of high temperature and high moisture. In detail, the catalyst is prepared by spray-drying and calcining the mixed slurry, in which 0.01˜5.0 wt % of MnO2 and 1˜15 wt % of P2O5 are simultaneously imbedded in catalyst which consists of zeolite, clay and inorganic complex. According to the present invention, the method that manganese and phosphate are imbedded simultaneously in zeolite and inorganic complex is used to increases thermal-stability of obtained spherical catalyst, and increase olefin yield of cracking hydrocarbon such as naphtha by protecting acid-site of zeolite. To synthesize the required catalyst, the important procedures are mixing ratio and mixing sequence of Mn, P, zeolite, and inorganic complex.
    Type: Application
    Filed: January 30, 2014
    Publication date: July 31, 2014
    Applicants: KOREA RESEARCH INSTITUTE OF CHEMICAL TECHNOLOGY, SK INNOVATION CO., LTD
    Inventors: DAE HYUN CHOO, HONG CHAN KIM, SUK JOON KIM, JI MIN KIM, TAE JIN KIM, SUN CHOI, SEUNG HOON OH, YONG SEUNG KIM, DEUK SOO PARK, YONG KI PARK, CHUL WEE LEE, HEE YOUNG KIM, WON CHOON CHOI, NA YOUNG KANG, BU SUB SONG
  • Publication number: 20140179967
    Abstract: This invention relates to a method of producing an aromatic hydrocarbon compound from byproducts of aromatic carboxylic acid and/or aromatic carboxylic acid alkylester preparation processes using hydroprocessing under conditions of high temperature and high hydrogen pressure in the presence of a catalyst, and to a hydroprocessing catalyst used therein.
    Type: Application
    Filed: July 25, 2012
    Publication date: June 26, 2014
    Applicants: SK GLOBAL CHEMICAL CO., LTD., SK INNOVATION CO., LTD.
    Inventors: Sang Il Lee, Do Woan Kim, Hyuck Jae Lee, Sang Hun Oh, Jae Hyun Koh, Sun Choi, Seung Hoon Oh, Byeung Soo Lim, Yong Seung Kim, Gyung Rok Kim, Young Moo Park, Jong Su Lee
  • Patent number: 8673802
    Abstract: Disclosed are a molecular sieve catalyst and a preparation method thereof to produce light olefins from cracking naphtha catalytically in severe environments of high temperature and high moisture. In detail, the catalyst is prepared by spray-drying and calcining the mixed slurry, in which 0.01˜5.0 wt % of MnO2 and 1˜15 wt % of P2O5 are simultaneously imbedded in catalyst which consists of zeolite, clay and inorganic complex. According to the present invention, the method that manganese and phosphate are imbedded simultaneously in zeolite and inorganic complex is used to increases thermal-stability of obtained spherical catalyst, and increase olefin yield of cracking hydrocarbon such as naphtha by protecting acid-site of zeolite. To synthesize the required catalyst, the important procedures are mixing ratio and mixing sequence of Mn, P, zeolite, and inorganic complex.
    Type: Grant
    Filed: February 5, 2009
    Date of Patent: March 18, 2014
    Assignees: SK Innovation Co., Ltd., Korea Research Institute of Chemical Technology
    Inventors: Dae Hyun Choo, Hong Chan Kim, Suk Joon Kim, Ji Min Kim, Tae Jin Kim, Sun Choi, Seung Hoon Oh, Yong Seung Kim, Deuk Soo Park, Yong Ki Park, Chul Wee Lee, Hee Young Kim, Won Choon Choi, Na Young Kang, Bu Sub Song