Patents by Inventor Yoshinobu Asako
Yoshinobu Asako has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8698142Abstract: The present invention provides an organic semiconductor element which has a low hygroscopic property and whose property is hardly deteriorated with time and an electronic device and electronic equipment each provided with such an organic semiconductor element and having high reliability. The organic semiconductor element of the present invention includes: a source electrode 20a; a drain electrode 20b; a gate electrode 50; a gate insulating layer 40; an organic semiconductor layer 30; and a buffer layer (another insulating layer) 60, wherein at least one of the gate insulating layer 40 and the buffer layer 60 contains an insulating polymer with a main chain having both end portions and including repeating units represented by the following general formula (1) or (2): where R1 and R2 are the same or different and each of R1 and R2 is a divalent linkage group, and Y is an oxygen atom or a sulfur atom.Type: GrantFiled: September 18, 2009Date of Patent: April 15, 2014Assignee: Seiko Epson CorporationInventors: Takuro Yasuda, Takeo Kawase, Junichi Karasawa, Keiichi Inoue, Kazushi Omote, Tomoya Arai, Keiko Ando, Yoshinobu Asako
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Publication number: 20110175092Abstract: The present invention provides an organic semiconductor element which has a low hygroscopic property and whose property is hardly deteriorated with time and an electronic device and electronic equipment each provided with such an organic semiconductor element and having high reliability. The organic semiconductor element of the present invention includes: a source electrode 20a; a drain electrode 20b; a gate electrode 50; a gate insulating layer 40; an organic semiconductor layer 30; and a buffer layer (another insulating layer) 60, wherein at least one of the gate insulating layer 40 and the buffer layer 60 contains an insulating polymer with a main chain having both end portions and including repeating units represented by the following general formula (1) or (2): where R1 and R2 are the same or different and each of R1 and R2 is a divalent linkage group, and Y is an oxygen atom or a sulfur atom.Type: ApplicationFiled: September 18, 2009Publication date: July 21, 2011Inventors: Takuro Yasuda, Takeo Kawase, Junichi Karasawa, Kelichi Inoue, Kazushi Omote, Tomoya Arai, Keiko Ando, Yoshinobu Asako
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Patent number: 7678881Abstract: The present invention has an object to provide a transparent resin material having a low water absorption ratio without deteriorating various properties such as transparency which transparent resin has and also having a controllable refractive index. The present invention provides a transparent resin material containing a polymer capable of forming a formed product having transparency, wherein the transparent resin material comprises a fluorine atom-containing polymer and/or compound and contains 0.3 to 35% by weight of a fluorine atom in 100% by weight of the formed product.Type: GrantFiled: May 27, 2005Date of Patent: March 16, 2010Assignee: Nippon Shokubai Co., Ltd.Inventors: Ai Nishichi, Yoshinobu Asako, Kazushi Omote, Shimpei Sato, Toshiya Iida, Satoshi Ishida
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Patent number: 7632884Abstract: It is an object of the present invention to provide a liquid composition for an organic-inorganic composite dielectric excellent in dispersibility of an inorganic dielectric in an organic polymer and exhibiting a high dielectric constant in the case where the composition is used for producing an organic-inorganic composite dielectric. The present invention is directed to a liquid composition for a composite dielectric, which comprises an inorganic dielectric and a fluorinated aromatic polymer.Type: GrantFiled: September 28, 2004Date of Patent: December 15, 2009Assignee: Nippon Shokubai Co., Ltd.Inventors: Hayahide Yamasaki, Yoshinobu Asako, Kazushi Omote, Ai Nishichi
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Patent number: 7589228Abstract: The present invention has an object to provide a fluorine-containing compound which can be used for applications such as additives making a transparent resin material low in a water absorbing ratio and high in water repellency without deteriorating of various properties such as transparency which the transparent resin material has, a fluorine-containing ester compound which is superior in properties such as heat resistance and low moisture(water) absorption property and can be suitably used in various fields such as a material for electronic information, a material for precision instruments and an optical material, a fluorine-containing aryl ester polymer, methods of producing the same.Type: GrantFiled: May 27, 2005Date of Patent: September 15, 2009Assignee: Nippon Shokubai Co., Ltd.Inventors: Ai Nishichi, Yoshinobu Asako, Kazushi Omote, Shimpei Sato, Toshiya Iida, Satoshi Ishida
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Publication number: 20090010603Abstract: To provide to a resin composition for an optical packaging material having a coefficient of thermal expansion approximately same as that of quartz and Pyrex (registered trade name) and capable of providing an optical packaging material exhibiting excellent flame retardancy and an optical packaging component, and an optical module and its production method. A molded body, an optical packaging component and an optical module having a low coefficient of thermal expansion and excellent flame retardancy can be obtained using a resin composition for an optical packaging material comprising a resin and inorganic fine particles which are made of a hydrolyzed condensate compound of an alkoxide compound and/or a carboxylic acid salt compound and have an average radius of gyration of 50 nm or smaller.Type: ApplicationFiled: October 7, 2005Publication date: January 8, 2009Inventors: Takuo Sugioka, Yasunori Tsujino, Kozo Tajiri, Yoshinobu Asako
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Patent number: 7364771Abstract: A method for producing a fluorine-containing polyimide film excelling in heat resistance, resistance to chemicals, water repellency, dielectric properties, electrical properties, and optical properties and a spin coater suitable for the method are to be provided. A method for the production of a fluorine-containing polyimide film which comprises forming a coating film of a fluorine-containing polyimide precursor in an atmosphere having a relative humidity thereof adjusted to a level of not more than 50 RH % and then subjecting the fluorine-containing polyimide precursor to heat treatment thereby forming a fluorine-containing polyimide film is provided. By adjusting the relative humidity in accordance with this method, the fluorine-containing polyimide precursor can be prevented from being decomposed by the absorption of moisture and consequently prevent effectively the fluorine-containing polyimide film from forming piriform spots and scratches.Type: GrantFiled: March 5, 2004Date of Patent: April 29, 2008Assignee: Nippon Shokubai Co., Ltd.Inventors: Kozo Tajiri, Shinichi Goto, Yoshinobu Asako, Kumiko Kawada
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Publication number: 20050282996Abstract: The present invention has an object to provide a transparent resin material having a low water absorption ratio without deteriorating various properties such as transparency which transparent resin has and also having a controllable refractive index. The present invention provides a transparent resin material containing a polymer capable of forming a formed product having transparency, wherein the transparent resin material comprises a fluorine atom-containing polymer and/or compound and contains 0.3 to 35% by weight of a fluorine atom in 100% by weight of the formed product.Type: ApplicationFiled: May 27, 2005Publication date: December 22, 2005Applicant: NIPPON SHOKUBAI CO., LTD.Inventors: Ai Nishichi, Yoshinobu Asako, Kazushi Omote, Shimpei Sato, Toshiya Iida, Satoshi Ishida
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Publication number: 20050265686Abstract: The present invention has an object to provide a fluorine-containing compound which can be used for applications such as additives making a transparent resin material low in a water absorbing ratio and high in water repellency without deteriorating of various properties such as transparency which the transparent resin material has, a fluorine-containing ester compound which is superior in properties such as heat resistance and low moisture(water) absorption property and can be suitably used in various fields such as a material for electronic information, a material for precision instruments and an optical material, a fluorine-containing aryl ester polymer, methods of producing the same.Type: ApplicationFiled: May 27, 2005Publication date: December 1, 2005Applicant: NIPPON SHOKUBAI CO., LTD.Inventors: Ai Nishichi, Yoshinobu Asako, Kazushi Omote, Shimpei Sato, Toshiya Iida, Satoshi Ishida
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Publication number: 20050101714Abstract: It is an object of the present invention to provide a liquid composition for an organic-inorganic composite dielectric excellent in dispersibility of an inorganic dielectric in an organic polymer and exhibiting a high dielectric constant in the case where the composition is used for producing an organic-inorganic composite dielectric. The present invention is directed to a liquid composition for a composite dielectric, which comprises an inorganic dielectric and a fluorinated aromatic polymer.Type: ApplicationFiled: September 28, 2004Publication date: May 12, 2005Applicant: Nippon Shokubai Co., Ltd.Inventors: Hayahide Yamasaki, Yoshinobu Asako, Kazushi Omote, Ai Nishichi
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Patent number: 6837919Abstract: According to the present invention, electrorheological fluid is deaerated after it is sealed in a closed device which is operated by the electrorheological fluid. Thus, it is possible to control the operation of the closed device in accordance with an electric field. Additionally, the control of viscosity is not affected by repetitive operations of the closed device, thereby obtaining a closed device having a smooth operation and good repeatability. The deaeration is achieved under a predetermined reduced pressure, for example, of not more than 100 torr. In addition thereto, a suitable heating process is carried out as required.Type: GrantFiled: September 30, 2002Date of Patent: January 4, 2005Assignees: Nippon Shokubai Co., Ltd., CKD CorporationInventors: Yoshinobu Asako, Satoru Ono, Kazutoshi Ito, Eiji Uematu
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Publication number: 20040234686Abstract: A method for producing a fluorine-containing polyimide film excelling in heat resistance, resistance to chemicals, water repellency, dielectric properties, electrical properties, and optical properties and a spin coater suitable for the method are to be provided. A method for the production of a fluorine-containing polyimide film which comprises forming a coating film of a fluorine-containing polyimide precursor in an atmosphere having a relative humidity thereof adjusted to a level of not more than 50 RH % and then subjecting the fluorine-containing polyimide precursor to heat treatment thereby forming a fluorine-containing polyimide film is provided. By adjusting the relative humidity in accordance with this method, the fluorine-containing polyimide precursor can be prevented from being decomposed by the absorption of moisture and consequently prevent effectively the fluorine-containing polyimide film from forming piriform spots and scratches.Type: ApplicationFiled: March 5, 2004Publication date: November 25, 2004Inventors: Kozo Tajiri, Shinichi Goto, Yoshinobu Asako, Kumiko Kawada
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Publication number: 20030024392Abstract: According to the present invention, electrorheological fluid is deaerated after it is sealed in a closed device which is operated by the electrorheological fluid. Thus, it is possible to control the operation of the closed device in accordance with an electric field. Additionally, the control of viscosity is not affected by repetitive operations of the closed device, thereby obtaining a closed device having a smooth operation and good repeatability. The deaeration is achieved under a predetermined reduced pressure, for example, of not more than 100 torr. In addition thereto, a suitable heating process is carried out as required.Type: ApplicationFiled: September 30, 2002Publication date: February 6, 2003Inventors: Yoshinobu Asako, Satoru Ono, Kazutoshi Ito, Eiji Uematu
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Patent number: 6433231Abstract: A method for producing inexpensively in a high yield a halogen-containing aromatic compound, particularly a halogen-containing aromatic compound incorporating therein a bromodifluoroalkyl group, and a halogen-containing naphthalene compound useful as a raw material for a resin excelling in heat resistance, chemical resistance and water repellency, and having a low dielectric constant and a low refractivity are provided.Type: GrantFiled: June 21, 2001Date of Patent: August 13, 2002Assignee: Nippon Shokubai Co., Ltd.Inventors: Seiichi Teshima, Masayoshi Konishi, Kozo Tajiri, Yoshinobu Asako, Sadao Miki
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Patent number: 6384289Abstract: A process is provided which allows a 1,4-bis(difluoroalkyl)benzene derivative to be produced inexpensively by a simple procedure without requiring any special facility. This process comprises causing a compound (A) of the following formula (1): wherein X1, X2, X3, and X4 independently stand for an oxygen or sulfur atom, Y1 and Y2 independently stand for a group of the formula: —CnH2n—, in which n is 2 or 3, k is an integer in the range of 0 to 4, G stands for a halogen group, an alkyl group, a perfluoroalkyl group, or an alkoxy group, and m is an integer in the range of 0 to 4, to react with a fluorine-containing species, the molar ratio of the fluorine-containing species to compound (A) being in the range of 20-40. The process is carried out in the presence of a bromine-containing compound, which is in an amount of 2 to 3 equivalences to the amount of compound (A), in an organic solvent at −80° C. to 30° C.Type: GrantFiled: January 11, 2001Date of Patent: May 7, 2002Assignee: Nippon Shokubai Co., Ltd.Inventors: Seiichi Teshima, Yoshinobu Asako
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Publication number: 20010045350Abstract: A method for producing inexpensively in a high yield a halogen-containing aromatic compound, particularly a halogen-containing aromatic compound incorporating therein a bromodifluoroalkyl group, and a halogen-containing naphthalene compound useful as a raw material for a resin excelling in heat resistance, chemical resistance and water repellency, and having a low dielectric constant and a low refractivity are provided.Type: ApplicationFiled: June 21, 2001Publication date: November 29, 2001Applicant: Nippon Shokubai Co., Ltd., a Japan corporationInventors: Seiichi Teshima, Masayoshi Konishi, Kozo Tajiri, Yoshinobu Asako, Sadao Miki
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Patent number: 6288290Abstract: This invention relates to a method for the production of an aromatic compound (II) having a (CH2)nCX2Br group (wherein X represents a fluorine or chlorine atom and the X's may be same or different, and n is an integer in the range of 0 to 4) by the reaction of photo-bromination of an aromatic compound (I) having a (CH2)nCX2H group (wherein X and n are as defined above) with a brominating agent, wherein the photo-bromination reaction is carried out while removing hydrogen bromide generated in the reaction system and/or in an atmosphere of a low oxygen content, and a halogen-containing naphthalene compound represented by the following formula (1): wherein Y represents —CF2H, —CF2Br, or —CHO group, Z1 and Z2 independently represent a halogen atom, and p and q independently are an integer in the range of 0 to 3.Type: GrantFiled: October 19, 1999Date of Patent: September 11, 2001Assignee: Nippon Shokubai, Co., Ltd.Inventors: Seiichi Teshima, Masayoshi Konishi, Kozo Tajiri, Yoshinobu Asako, Sadao Miki
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Publication number: 20010002425Abstract: A process is provided which allows a 1,4-bis(difluoroalkyl)benzene derivative to be produced inexpensively by a simple procedure without requiring any special facility.Type: ApplicationFiled: January 11, 2001Publication date: May 31, 2001Applicant: Nippon Shokubai Co., Ltd., a Japan CorporationInventors: Seiichi Teshima, Yoshinobu Asako
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Patent number: 6218465Abstract: For example, a blended composition is produced first by letting a monomer composition, mainly composed of alkyl (meth)acrylate and including a compound having a plurality of polymeric groups within a molecule, contain microscopic particles, such as carbon black, having an average primary particle size in a range between 1 nm and 200 nm, and then the blended composition is polymerized. Consequently, it has become possible to produce inexpensive crosslinked elastomer having excellent physical properties, such as small creep (low creep) in compression set, tensile elongation set, etc., and excellent mechanical strength, such as tensile break strength and tensile break elongation, in a simple procedure omitting the post-crosslinking step at a high-level productivity while saving energy and time spent in the kneading step.Type: GrantFiled: February 27, 1998Date of Patent: April 17, 2001Assignee: Nippon Shokubai Co., Ltd.Inventors: Minoru Kobayashi, Minoru Aoki, Yoshinobu Asako, Akihiko Fukada, Hayato Ikeda
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Patent number: 6194540Abstract: The sulfonation of a polyaniline or a derivative thereof by the use of a sulfonating agent, characterized by dispersing the polyaniline or the derivative thereof in a reaction solvent thereby inhibiting the formation of lumps of grains due to substantial aggregation. Preferably, the solvent for the reaction is an organic solvent incapable of reacting with the sulfonating agent. The initial stirring power for the reaction of sulfonation is preferred to be not less than 0.03 kW/m3 and the polyaniline or the derivative thereof is preferred to have a water content of not more than 8 wt. %. Further, this invention is characterized by subjecting a polyaniline having introduced a sulfonic acid group therein or a derivative thereof to hydrolysis in a mixed solution of water with a hydrophilic organic solvent. The hydrophilic organic solvent is preferred to be an alcohol.Type: GrantFiled: October 19, 1999Date of Patent: February 27, 2001Assignee: Nippon Shokubai Co., Ltd.Inventors: Shoji Ito, Kazuhiko Murata, Ryuji Aizawa, Yoshinobu Asako