Abstract: A liquid crystal display device includes a first polarizing plate, an optically anisotropic body (B), an optically anisotropic body (A), a liquid crystal cell of a horizontal orientation mode, and a second polarizing plate having a polarized light transmission axis which is approximately perpendicular to a polarized light transmission axis of the first polarizing plate, in this order from a viewing side. The optically anisotropic body (A) is formed of a material having a negative intrinsic birefringence value. The optically anisotropic body (B) is formed of a material having a positive intrinsic birefringence value. In-plane slow axes of the optically anisotropic bodies (A, B) are approximately parallel to each other. The in-plane slow axis of the optically anisotropic body (B) is approximately perpendicular to the polarized light transmission axis of the first polarizing plate. Retardations of the optically anisotropic bodies (A, B) are in specific ranges.

Abstract: The magnetron sputtering apparatus SM has: a vacuum chamber; and a cathode unit C detachably mounted on the vacuum chamber. The cathode unit has: a target which is disposed to face an inside of the vacuum chamber; and a magnet unit disposed to that side of the target which is opposite to a sputtering surface, thereby generating a leakage magnetic field on a side of the sputtering surface. The sputtering apparatus SM of this invention, having the above-mentioned arrangement has a drive source for driving the magnet unit to rotate with a target center serving as a center of rotation while the target is sputtered to form a film on a to-be-processed substrate. Auxiliary magnet units which cause a leakage magnetic field to function on the inside of the vacuum chamber are locally disposed on an external wall of the vacuum chamber or of a housing H of the cathode unit.

Abstract: A target assembly is provided which is capable of preventing abnormal discharging from being generated between a projected portion of a backing plate and a side surface of a target, and which is also capable of surely preventing a bonding material that bonds the target and the backing plate together from seeping to the outside. The backing plate has a projected portion which is projected outward beyond an outer peripheral end of the target, and an annular shield plate is disposed to lie opposite to the projected portion so as to enclose the target in a state in which the target assembly is assembled onto a sputtering apparatus (SM). That portion of the backing plate to which the target gets bonded is defined as a bonding portion, and this bonding portion is protruded relative to the projected portion.

Abstract: Provided is a RF sputtering apparatus in which film forming can efficiently be made by suppressing an amount of reverse sputtering at a substrate. The RF sputtering apparatus SM, according to this invention, in which RF power is applied in vacuum to a target to thereby perform film forming processing on one surface (Wa) of the substrate (W) is provided with a stage for holding the substrate in a state in which one surface thereof is left open in an electrically insulated state. The stage has a dented portion on such a holding surface as is adapted to hold thereon the substrate. A movable body, which is movable toward, and away from, the substrate, and is connected to grounding is disposed in a space defined by such an opposite surface of the substrate as is opposite to said one surface and an outline of the dented portion.

Abstract: A method of discriminating a state of a sputtering apparatus in which, by sputtering a target (2), a film is formed on a substrate disposed to lie opposite to the target, the discrimination being made, prior to the film formation on the substrate, as to whether an atmosphere in the vacuum chamber is in a state fit for film formation. As the sputtering apparatus, use is made of one provided inside the vacuum chamber with an isolated space which is isolated from the vacuum chamber by an isolating means (6, 71˜73), the isolated space being for the target and the substrate to lie therein opposite to each other, the sputtering apparatus being so arranged that the isolated space is evacuated accompanied by the evacuation in the vacuum chamber. The vacuum chamber is evacuated to a predetermined set pressure and a gas is introduced therein in this state.

Abstract: A target assembly is provided in which an abnormal discharging between a projected portion of a backing plate and a side surface of the target is prevented and also in which a bonding material to bond the target and the backing plate can be surely prevented from seeping to the outside and also which is easy in reusing the backing plate. The target assembly according to this invention having: a target made of an insulating material; and a backing plate bonded to one surface of the target via a bonding material, the backing plate having a projected portion which is projected outward beyond an outer peripheral edge of the target, further has an annular insulating plate. The annular insulating plate: encloses a circumference of the target while maintaining a predetermined clearance to a side surface of the target; and covers that surface of the projected portion.

Abstract: A target assembly is provided which is capable of preventing abnormal discharging from being generated between a projected portion of a backing plate and a side surface of a target, and which is also capable of surely preventing a bonding material that bonds the target and the backing plate together from seeping to the outside. The backing plate has a projected portion which is projected outward beyond an outer peripheral end of the target, and an annular shield plate is disposed to lie opposite to the projected portion so as to enclose the target in a state in which the target assembly is assembled onto a sputtering apparatus (SM). That portion of the backing plate to which the target gets bonded is defined as a bonding portion, and this bonding portion is protruded relative to the projected portion.

Abstract: Provided is a RF sputtering apparatus in which film forming can efficiently be made by suppressing an amount of reverse sputtering at a substrate. The RF sputtering apparatus SM, according to this invention, in which RF power is applied in vacuum to a target to thereby perform film forming processing on one surface (Wa) of the substrate (W) is provided with a stage for holding the substrate in a state in which one surface thereof is left open in an electrically insulated state. The stage has a dented portion on such a holding surface as is adapted to hold thereon the substrate. A movable body, which is movable toward, and away from, the substrate, and is connected to grounding is disposed in a space defined by such an opposite surface of the substrate as is opposite to said one surface and an outline of the dented portion.

Abstract: A transport apparatus that supports and moves a substrate by using a robot hand between a plurality of chambers includes a first detection unit that detects the substrate, in a first stop position of the robot hand, using a first detection position set on one surface of the substrate supported by the robot hand, and a second detection unit that detects the substrate, in a second stop position of the robot hand, using a second detection position set on the one surface of the substrate supported by the robot hand.

Abstract: By a transport robot having a hand provided with stationary clamp members and a movable clamp member which pinches a to-be-transported object S between the movable clamp member and the stationary clamp members, after transporting the to-be-transported object-S in a horizontal posture to a transport destination, the hand is lowered in a state in which the movable clamp member is receded to an unclamped position, thereby transferring the to-be-transported object onto a plurality of supporting pins which are disposed at the transport destination. In the method mentioned above, an arrangement is made that, even if the stationary clamp members give rise to dents due to wear, the to-be-transported object is arranged to be transferred onto the supporting pins without problems.

Abstract: There is provided a substrate processing method, in which a throughput can be improved even in case the time for recovery processing for restoring the state of a processing chamber is longer than the time for predetermined processing to be performed in the processing chamber. Substrates are alternately transferred to two processing chambers C, D, and the same film forming processing is performed on the substrates in the processing chambers C, D in parallel with each other. When the number of substrates processed in the processing chamber C has reached a predetermined number (11 substrates), dummy sputtering processing in the film forming chamber C is started and also 23rd-25th substrates of the first lot are transferred to the film forming chamber D to thereby perform film forming processing until the dummy sputtering processing is finished.

Abstract: In a processing apparatus having: moveable parts disposed to form a predetermined processing environment within a processing chamber in which a predetermined processing is performed on an object to be processed; and a control means for controlling the operation of each of the moveable parts, abnormality inclusive of deterioration with time of the moveable parts constituting the processing apparatus is made to be easily judged. There is provided a vibration detection means for detecting the waveforms of vibrations that occur accompanied by the operation of the moveable parts. When control is made from the control means in order to operate any one of the moveable parts, there are obtained event data corresponding to the control and the waveforms of vibrations of all the moveable parts that are operating simultaneously at the time in question.

Abstract: There is provided a teaching method for a transfer robot which is capable of quickly performing teaching at high reliability. Relative to a transfer robot which, in a state in which a substrate to be processed in a plurality of processing chambers is supported, transfers the substrate to a predetermined position by turning and telescopic action on the same plane, teaching is made of the transfer actions. At this time, by using at least one detection means that is disposed so as to detect the substrate when the substrate is transferred among the processing chambers, the transfer robot is caused to perform transfer action. At least one index part provided in advance on an operating part of the transfer robot is detected by the detection means. From this detection position, a reference position which serves as an origin of at least one of the turning action and the telescopic action is taught.

Abstract: A transport apparatus that supports and moves a substrate by using a robot hand between a plurality of chambers includes a first detection unit that detects the substrate, in a first stop position of the robot hand, using a first detection position set on one surface of the substrate supported by the robot hand, and a second detection unit that detects the substrate, in a second stop position of the robot hand, using a second detection position set on the one surface of the substrate supported by the robot hand.

Abstract: A method of controlling a transfer robot is provided, in which method the communication time of the transfer robot can be reduced and the transfer time of a substrate can be shortened. A series of actions of the transfer robot when a substrate that is present in a processing chamber is transferred to a predetermined position in a processing chamber, are performed by a single command. The series of actions may include a swap action in which, after having taken out by a robot hand the substrate that is present in the processing chamber, a substrate that is different from the substrate is handed over by a robot hand to a predetermined position on the processing chamber.

Abstract: A film-forming device is provided, including: a chamber in which a substrate is disposed; a target, disposed within the chamber, which contains a material from which a film is formed; a substrate-supporting table disposed inside the chamber; driving unit that rotates the substrate-supporting table; a sputtering cathode that causes sputtered particles to be incident on the substrate from an oblique direction; and a control unit that controls the driving unit by setting a rotation period so that a sputtering film formation time required to form a film having a desired thickness is an integer multiple of a rotation period of the substrate-supporting table.

Abstract: There is provided a robot hand for substrate transfer in which the robot hand is so arranged that, even in case a substrate (S) gives rise to warping, the substrate (S) can be stably supported. On an upper surface of the robot hand there is formed a first seating surface on which is seated a lower-surface peripheral portion of the substrate (S) and, on a periphery thereof, there is formed an upwardly extended step. The step is provided with a plurality of stair-shaped stages. On an upper surface of the robot hand inwardly away from the first seating surface there is provided a second seating surface which is inclined downward toward the center of the substrate (S) such that a lower surface of the substrate (S) is seated on the second seating surface when the substrate (S) is warped downward into a concave shape.

Abstract: There is provided a method of detecting a stop of a transport apparatus which can quickly and easily detect and improve the throughput and the ratio of utilization without incurring an increase the number of parts. The apparatus is used which is provided with a drive motor and a transport arm one side of which is mounted on a rotary shaft of the drive motor. As the drive motor there is used one in which an induced electromotive force is generated when a force in the direction of rotation is applied to the rotary shaft. Then, an article S to be transported is held on the other side of the transport arm. When the drive motor is operated to drive the rotary shaft by a predetermined angle of rotation and then stopped, the above-described induced electromotive force to be generated due to the vibrations of the transport arm is detected.

Abstract: By a transport robot having a hand provided with stationary clamp members and a movable clamp member which pinches a to-be-transported object S between the movable clamp member and the stationary clamp members, after transporting the to-be-transported object-S in a horizontal posture to a transport destination, the hand is lowered in a state in which the movable clamp member is receded to an unclamped position, thereby transferring the to-be-transported object onto a plurality of supporting pins which are disposed at the transport destination. In the method mentioned above, an arrangement is made that, even if the stationary clamp members give rise to dents due to wear, the to-be-transported object is arranged to be transferred onto the supporting pins without problems.

Abstract: A treatment tool insertion channel of an endoscope, which is arranged through an inside of an insertion part that includes a flexible tube and a bendable part, includes a flexible inner tube, a spiral groove formed around the flexible inner tube over an entire length of the bendable part and the flexible tube, at least one coil wound along a bottom of the spiral groove, and at least one type of filler with which the spiral groove is filled. The treatment tool insertion channel includes a first portion that includes a part inside the bendable part and a second portion at a proximal end side of the first portion, the first portion being configured more flexible than the second portion.