Patents by Inventor Yoshinori Marumo
Yoshinori Marumo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 9085486Abstract: Provided are a magnetic disk substrate and a method of manufacturing the same, wherein the magnetic disk substrate has very few defects present on its surface with an arithmetic mean roughness (Ra) at a level in the vicinity of 0.1 nm and thus is suitable as a substrate for a magnetic disk with high recording density. The magnetic disk glass substrate is such that the arithmetic mean roughness (Ra) of the main surface of the glass substrate measured using an atomic force microscope with a resolution of 256×256 pixels in a 2 ?m×2 ?m square is 0.12 nm or less and the number of defects detected to have a size of 0.1 ?m to 0.6 ?m in plan view and a depth of 0.5 nm to 2 nm is less than 10 per 24 cm2, wherein the defects are each detected using a shift in wavelength between incident light and reflected light upon irradiating and scanning helium neon laser light with a wavelength of 632 nm on the main surface of the glass substrate.Type: GrantFiled: June 9, 2014Date of Patent: July 21, 2015Assignee: HOYA CORPORATIONInventors: Shinji Eda, Hideki Isono, Takashi Maeda, Hiroshi Tsuchiya, Yoshinori Marumo
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Patent number: 9038417Abstract: When mirror polishing is performed on a glass substrate by bringing a polishing pad into contact with the surface of the glass substrate while supplying a polishing liquid containing polishing grains to the substrate surface, the pH of the polishing liquid is maintained within a certain range or the agglomeration degree or dispersion degree of the polishing liquid is controlled. Consequently, an adequate mirror polishing rate can be maintained and there can be obtained a glass substrate having a good end shape.Type: GrantFiled: May 12, 2014Date of Patent: May 26, 2015Assignee: HOYA CORPORATIONInventors: Toshio Takizawa, Takumi Koshimizu, Yoshinori Marumo, Masahiro Katagiri
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Publication number: 20140287269Abstract: Provided are a magnetic disk substrate and a method of manufacturing the same, wherein the magnetic disk substrate has very few defects present on its surface with an arithmetic mean roughness (Ra) at a level in the vicinity of 0.1 nm and thus is suitable as a substrate for a magnetic disk with high recording density. The magnetic disk glass substrate is such that the arithmetic mean roughness (Ra) of the main surface of the glass substrate measured using an atomic force microscope with a resolution of 256×256 pixels in a 2 ?m×2 ?m square is 0.12 nm or less and the number of defects detected to have a size of 0.1 ?m to 0.6 ?m in plan view and a depth of 0.5 nm to 2 nm is less than 10 per 24 cm2, wherein the defects are each detected using a shift in wavelength between incident light and reflected light upon irradiating and scanning helium neon laser light with a wavelength of 632 nm on the main surface of the glass substrate.Type: ApplicationFiled: June 9, 2014Publication date: September 25, 2014Applicant: HOYA CORPORATIONInventors: Shinji EDA, Hideki ISONO, Takashi MAEDA, Hiroshi TSUCHIYA, Yoshinori MARUMO
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Publication number: 20140248424Abstract: When mirror polishing is performed on a glass substrate by bringing a polishing pad into contact with the surface of the glass substrate while supplying a polishing liquid containing polishing grains to the substrate surface, the pH of the polishing liquid is maintained within a certain range or the agglomeration degree or dispersion degree of the polishing liquid is controlled. Consequently, an adequate mirror polishing rate can be maintained and there can be obtained a glass substrate having a good end shape.Type: ApplicationFiled: May 12, 2014Publication date: September 4, 2014Applicant: HOYA CORPORATIONInventors: Toshio TAKIZAWA, Takumi KOSHIMIZU, Yoshinori MARUMO, Masahiro KATAGIRI
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Patent number: 8785010Abstract: Provided are a magnetic disk substrate and a method of manufacturing the same, wherein the magnetic disk substrate has very few defects present on its surface with an arithmetic mean roughness (Ra) at a level in the vicinity of 0.1 nm and thus is suitable as a substrate for a magnetic disk with high recording density. The magnetic disk glass substrate is such that the arithmetic mean roughness (Ra) of the main surface of the glass substrate measured using an atomic force microscope with a resolution of 256×256 pixels in a 2 ?m×2 ?m square is 0.12 nm or less and the number of defects detected to have a size of 0.1 ?m to 0.6 ?m in plan view and a depth of 0.5 nm to 2 nm is less than 10 per 24 cm2, wherein the defects are each detected using a shift in wavelength between incident light and reflected light upon irradiating and scanning helium neon laser light with a wavelength of 632 nm on the main surface of the glass substrate.Type: GrantFiled: September 29, 2009Date of Patent: July 22, 2014Assignee: Hoya CorporationInventors: Shinji Eda, Hideki Isono, Takashi Maeda, Hiroshi Tsuchiya, Yoshinori Marumo
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Patent number: 8763428Abstract: When mirror polishing is performed on a glass substrate by bringing a polishing pad into contact with the surface of the glass substrate while supplying a polishing liquid containing polishing grains to the substrate surface, the pH of the polishing liquid is maintained within a certain range or the agglomeration degree or dispersion degree of the polishing liquid is controlled. Consequently, an adequate mirror polishing rate can be maintained and there can be obtained a glass substrate having a good end shape.Type: GrantFiled: March 16, 2007Date of Patent: July 1, 2014Assignee: Hoya CorporationInventors: Toshio Takizawa, Takumi Koshimizu, Yoshinori Marumo, Masahiro Katagiri
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Patent number: 8127433Abstract: In a manufacturing method of a glass substrate for a magnetic disk including a cleaning process of the glass substrate, the cleaning process includes a process of contacting the glass substrate with a cleaning solution containing a compound, such as thioglycolic acid or a thioglycolic acid derivative, having a thiol group as a functional group.Type: GrantFiled: December 31, 2009Date of Patent: March 6, 2012Assignee: Hoya CorporationInventor: Yoshinori Marumo
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Publication number: 20110171415Abstract: Provided are a magnetic disk substrate and a method of manufacturing the same, wherein the magnetic disk substrate has very few defects present on its surface with an arithmetic mean roughness (Ra) at a level in the vicinity of 0.1 nm and thus is suitable as a substrate for a magnetic disk with high recording density. The magnetic disk glass substrate is such that the arithmetic mean roughness (Ra) of the main surface of the glass substrate measured using an atomic force microscope with a resolution of 256×256 pixels in a 2 ?m×2 ?m square is 0.12 nm or less and the number of defects detected to have a size of 0.1 ?m to 0.6 ?m in plan view and a depth of 0.5 nm to 2 nm is less than 10 per 24 cm2, wherein the defects are each detected using a shift in wavelength between incident light and reflected light upon irradiating and scanning helium neon laser light with a wavelength of 632 nm on the main surface of the glass substrate.Type: ApplicationFiled: September 29, 2009Publication date: July 14, 2011Applicant: HOYA CORPORATIONInventors: Shinji Eda, Hideki Isono, Takashi Maeda, Hiroshi Tsuchiya, Yoshinori Marumo
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Publication number: 20100104743Abstract: In a manufacturing method of a glass substrate for a magnetic disk including a cleaning process of the glass substrate, the cleaning process includes a process of contacting the glass substrate with a cleaning solution containing a compound, such as thioglycolic acid or a thioglycolic acid derivative, having a thiol group as a functional group.Type: ApplicationFiled: December 31, 2009Publication date: April 29, 2010Applicant: HOYA CORPORATIONInventor: Yoshinori MARUMO
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Patent number: 7661188Abstract: In a manufacturing method of a glass substrate for a magnetic disk including a cleaning process of the glass substrate, the cleaning process includes a process of contacting the glass substrate with a cleaning solution containing a compound, such as thioglycolic acid or a thioglycolic acid derivative, having a thiol group as a functional group.Type: GrantFiled: March 24, 2006Date of Patent: February 16, 2010Assignee: Hoya CorporationInventor: Yoshinori Marumo
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Publication number: 20090158775Abstract: When mirror polishing is performed on a glass substrate by bringing a polishing pad into contact with the surface of the glass substrate while supplying a polishing liquid containing polishing grains to the substrate surface, the pH of the polishing liquid is maintained within a certain range or the agglomeration degree or dispersion degree of the polishing liquid is controlled. Consequently, an adequate mirror polishing rate can be maintained and there can be obtained a glass substrate having a good end shape.Type: ApplicationFiled: March 16, 2007Publication date: June 25, 2009Applicant: HOYA CORPORATIONInventors: Toshio Takizawa, Takumi Koshimizu, Yoshinori Marumo, Masahiro Katagiri
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Manufacturing method of glass substrate for magnetic disk, and manufacturing method of magnetic disk
Patent number: 7314575Abstract: A method for manufacturing a glass substrate for a magnetic disk comprises mirror surface polishing and cleaning of a glass substrate, wherein polishing agent of which the principal component is rare-earth oxide with content of fluorine 5% by weight or less, is supplied to the glass substrate, the surface of the glass substrate is subjected to mirror surface polishing by relatively moving the polishing cloth and the glass substrate, then this glass substrate is brought into contact with a cleaning solution including ascorbic acid, fluorine ion, and sulfuric acid of 3% by weight or more, and the polishing agent is dissolved and removed. The concentration of the ascorbic acid included in the cleaning solution is 0.1% by weight or more, and the content of the fluorine ion is 1 ppm to 40 ppm. At least a magnetic layer is formed on the obtained glass substrate to manufacture a magnetic disk.Type: GrantFiled: September 29, 2005Date of Patent: January 1, 2008Assignees: Hoya Corporation, Hoya Glass Disk (thailand) Ltd.Inventors: Yoshinori Marumo, Intanon Sitalaphruek -
Patent number: 7198662Abstract: It is an object of the present invention to provide an electroless plating pre-treatment solution and an electroless plating method capable of shortening the incubation time and achieving cost reduction. As the pre-treatment solution 7 to be supplied onto the wafer W before the electroless plating, an aqueous solution is supplied in which an activation accelerator to accelrate the oxidative decomposition reaction of a reducing agent and an oxide layer remover to remove an oxide layer formed on the wiring portions 4a are dissolved. The activation accelerator includes at least one selected from the group consisting of sulfonic acid having two or more characteristic groups, derivatives of the sulfonic, and salts of the sulfonic acid.Type: GrantFiled: July 2, 2004Date of Patent: April 3, 2007Assignee: Tokyo Electron LimitedInventor: Yoshinori Marumo
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Publication number: 20060266732Abstract: In a manufacturing method of a glass substrate for a magnetic disk including a cleaning process of the glass substrate, the cleaning process includes a process of contacting the glass substrate with a cleaning solution containing a compound, such as thioglycolic acid or a thioglycolic acid derivative, having a thiol group as a functional group.Type: ApplicationFiled: March 24, 2006Publication date: November 30, 2006Inventor: Yoshinori Marumo
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Manufacturing method of glass substrate for magnetic disk, and manufacturing method of magnetic disk
Publication number: 20060070980Abstract: A method for manufacturing a glass substrate for a magnetic disk comprises mirror surface polishing and cleaning of a glass substrate, wherein polishing agent of which the principal component is rare-earth oxide with content of fluorine 5% by weight or less, is supplied to the glass substrate, the surface of the glass substrate is subjected to mirror surface polishing by relatively moving the polishing cloth and the glass substrate, then this glass substrate is brought into contact with a cleaning solution including ascorbic acid, fluorine ion, and sulfuric acid of 3% by weight or more, and the polishing agent is dissolved and removed. The concentration of the ascorbic acid included in the cleaning solution is 0.1% by weight or more, and the content of the fluorine ion is 1 ppm to 40 ppm. At least a magnetic layer is formed on the obtained glass substrate to manufacture a magnetic disk.Type: ApplicationFiled: September 29, 2005Publication date: April 6, 2006Inventors: Yoshinori Marumo, Intanon Sitalaphruek -
Publication number: 20060037858Abstract: A plate is placed near a substrate held by a substrate holding section. A treating liquid is ejected from a treating liquid ejecting section, thereby plating the substrate electrolessly. The treating liquid flows through the gap between the substrate and the plate. Therefore a flow of the treating liquid occurs on the substrate. As a result, a fresh treating liquid can be supplied onto the substrate. Thus, a plating film can be formed very uniformly on the substrate even if the amount of treating liquid is small.Type: ApplicationFiled: May 23, 2003Publication date: February 23, 2006Applicant: TOKYO ELECTRON LIMITEDInventors: Yoshinori Marumo, Miho Jomen, Takayuki Komiya, Hiroshi Sato, Gishi Chung
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Publication number: 20050196523Abstract: In an electroless plating method and apparatus, an electroless plating solution is supplied onto a substrate, a reaction acceleration condition is applied to the electroless plating solution to accelerate a reaction, and a coating is formed on the substrate by using the electroless plating solution to which the reaction acceleration condition has been applied. Further, In an electroless plating method and apparatus, a first coating is formed on a substrate by using a first electroless plating solution at a first coating formation rate, and a second coating is formed on the substrate, on which the first coating has been formed, by using a second electroless plating solution at a second coating formation rate higher than the first coating formation rate. The methods allow a coating to be formed in a recess portion, uniformly.Type: ApplicationFiled: April 7, 2005Publication date: September 8, 2005Applicant: TOKYO ELECTRON LIMITEDInventor: Yoshinori Marumo
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Patent number: 6926817Abstract: A plating apparatus includes a plating solution tank which stores a plating solution, a holder including an inner space to house a wafer and an opening for the wafer to be in contact with the plating solution, and a nitrogen supplying mechanism to supply nitrogen to the inner space of the holder.Type: GrantFiled: May 13, 2002Date of Patent: August 9, 2005Assignee: Tokyo Electron LimitedInventors: Yoshinori Marumo, Koichiro Kimura
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Publication number: 20050164499Abstract: In a method of electroless plating, catalytically active nuclei are formed on a diffusion inhibiting layer (such as a barrier layer), the catalytically active nuclei being catalytically active on a reducing agent contained in an electroless plating solution, and an electroless plating is then carried out by using the electroless plating solution. The method allows the formation of an electrolessly plated coating on a barrier layer through the acceleration of the reaction of a reducing agent contained in an electroless plating solution by catalytically active nucleus.Type: ApplicationFiled: March 18, 2005Publication date: July 28, 2005Applicant: TOKYO ELECTRON LIMITEDInventors: Yoshinori Marumo, Hiroshi Sato, Miho Jomen
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Patent number: 6848457Abstract: Providing liquid treatment equipment capable of largely reducing a frequency of discarding a treatment solution as a whole and capable of implementing smooth and high quality liquid treatment with less manufacturing burden. Equipment comprises a treatment solution bath capable of accommodating a treatment solution for implementing liquid treatment to a substrate to treat, a treatment solution circulating system circulating the accommodated treatment solution between the outside of the treatment solution bath, and a product removal unit removing a reaction product due to the liquid treatment contained in the circulated treatment solution. By circulating the accommodated treatment solution between the outside of the treatment solution bath, reaction products contained in the circulated treatment solution are removed by means of the product removal unit.Type: GrantFiled: May 7, 2001Date of Patent: February 1, 2005Assignee: Tokyo Electron LimitedInventors: Yoshinori Marumo, Yoshinori Kato, Hiroshi Sato, Kyungho Park