Abstract: The present invention provides a polishing pad used for planarizing inter layer dielectrics and the like by CMP (chemical mechanical polishing) in the manufacturing process of a semiconductor device, a method of producing the polishing pad and a method of producing a semiconductor device by using the polishing pad. The present invention relates to a semiconductor wafer polishing pad having grooves in a polishing surface and formed from a foamed polyurethane, wherein a processed surface of the groove comprising a side surface and a bottom surface has a surface roughness Ra of not more than 10.

Abstract: A polishing pad has an excellent polishing rate and is superior in longevity without generating center slow. A method of manufacturing a semiconductor device with the polishing pad is also provided. The polishing pad has a polishing layer consisting of a polyurethane foam having fine cells, wherein a high-molecular-weight polyol component that is a starting component of the polyurethane foam contains a hydrophobic high-molecular-weight polyol A having a number-average molecular weight of 550 to 800 and a hydrophobic high-molecular-weight polyol B having a number-average molecular weight of 950 to 1300 in an A/B ratio of from 10/90 to 50/50 by weight.

Abstract: A polishing pad having excellent planarization performance and wear resistance includes a polishing layer including a polyurethane foam having fine cells. The polyurethane foam is a cured product of a reaction of (1) an isocyanate-terminated prepolymer (A) that is capable of reacting with 4,4?-methylenebis(o-chloroaniline) to form a non-foamed polyurethane having a tan ? peak temperature of 100° C. or more, (2) an isocyanate-terminated prepolymer (B) that is capable of reacting with 4,4?-methylenebis(o-chloroaniline) to form a non-foamed polyurethane having a tan ? peak temperature of 40° C. or less, and (3) 4,4?-methylenebis(o-chloroaniline), and the isocyanate-terminated prepolymers (A) and (B) are mixed in an (A)/(B) ratio of 50/50 to 90/10 (by wt%). The pad so made is used in the manufacture of semiconductor devices.

Abstract: Provided are a specific image information adding method with enhanced detection accuracy enabling multiple pieces of information to be added, and an image forming apparatus using the method. In the method of adding specific image information about a recorded image onto the recorded image, the specific image information consists of reference information and identification information, the reference information is formed so as to be able to set a reference position for reading of the specific image information, and the identification information is formed from dot images indicative of bit information at predetermined positions on an arc or a circumference around the reference position. The identification information can represent a single information item by a plurality of dot images, which are placed on a plurality of different arcs or circumferences and arranged at predetermined spacings in the circumferential direction and in the radial direction.

Abstract: Depending on processing to be executed, the processing is prevented from being restricted even if a particular image is included in image data. There is provided an image processing apparatus comprising an authentication section 67 which distinguishes a user; a particular-image judgment section 63 which detects particular images from inputted image data and judges whether or not the number of the particular images exceeds a threshold; and a threshold determination section 66 which determines a threshold according to the user and processing to be executed; and a control section 7 which restricts the processing to be executed when the number of the particular images exceeds the threshold. Depending on the importance degree of the security of the processing to be executed, the threshold determination section 66 lowers the threshold as the importance degree is higher and raises the threshold as the importance degree is lower.

Abstract: An image processing apparatus forming an image of image data on a recording medium, is characterized by, when forming the image by synthesizing the image data with specific information including an image different from the image data, varying the number of pieces of the specific information according to a size of a specific information imparting region to which the specific information is imparted. Thereby, when the specific information imparting region is small, such as in the case of a postcard and a name card, it is possible to surely detect the specific information by increasing the number of pieces of the specific information. Further, when reading an image, the image processing apparatus varies, on the basis of a detected number of pieces of the specific information, a threshold value for determining whether or not the specific information is adopted, according to a size of the recording medium.

Abstract: A polishing pad provides excellent optical detection accuracy properties over a broad wavelength range (particularly at the short-wavelength side). A method for manufacturing a semiconductor device includes a process of polishing the surface of a semiconductor wafer with this polishing pad. The polishing pad has a polishing layer containing a polishing region and a light-transmitting region, wherein the light-transmitting region includes a polyurethane resin having an aromatic ring density of 2 wt % or less, and the light transmittance of the light-transmitting region is 30% or more in the overall range of wavelengths of 300 to 400 nm.

Abstract: An image detecting method is provided that permits the specific image information to be present within image data of a document and is capable of detecting the specific image information within a relatively short period of time and accurately, with little effect of interference with the image data of the document and without regard to an angle at which the document is placed. The specific pattern image comprises a plurality of dot images Sa and Sb arranged in a straight line, and by positioning one of the plurality of dot images Sa and Sb at the center O of a plurality of concentric circles of different diameters and detecting that other dot images are on the plurality of concentric circles R1 to R4 and are on a straight line L running through the center O of the concentric circles, the pattern image is detected.

Abstract: As provided with a first reading section and a second reading section for reading both surfaces of a document, an image reading apparatus respectively calculates gamma correction values in gamma correcting sections and correction factors in color correcting sections, and corrects colors of criteria images being read by the first reading section and the second reading section in accordance with sample data stored on a storing section in order to substantially match the colors of both criteria images. In addition, the image reading apparatus utilizes an distinctive color range common for the both surfaces which defines a color about a distinguishing pattern, in order to determine whether images of both surfaces contain the distinguishing pattern or not.

Abstract: A polishing pad provides excellent optical detection accuracy properties over a broad wavelength range (particularly at the short-wavelength side) and is capable of preventing a slurry from leaking from the boundary between a polishing region and a light-transmitting region. The polishing pad includes at least a transparent support film laminated on one side of a polishing layer including a polishing region and a light-transmitting region; the light transmittance of an optical detection region containing at least the light-transmitting region and the transparent support film is 40% or more in the overall range of wavelengths of 300 to 400 nm.

Abstract: It is an object of the invention to provide a polishing pad capable of high precision optical detection of an endpoint during polishing in progress and prevention of slurry leakage from between a polishing region and a light-transmitting region during the use thereof even after the polishing pad has been used for a long period. It is a second object of the invention to provide a polishing pad capable of suppression of deterioration of polishing characteristics (such as in-plane uniformity) and generation of scratches due to a difference in behavior of a polishing region and a light-transmitting region during polishing. It is a third object of the invention to provide a polishing pad having a polishing region and a light-transmitting region with a concentration of a specific metal equal to or lower than a specific value (threshold value).

Abstract: An image processing apparatus is provided which can output an image from which only specific image information can be positively detected when the specific image information used to prohibit copying of image information is added to image data. The present invention includes a specific image information adding portion that adds specific image information representing a specific image to image data when image processing is performed for input image data and a specific image information setting portion that sets a color and/or number of the specific image information.

Abstract: When an image based on RGB image data accepted by the image processing section and the ICU is to be enlarged by the zoom process section of the ICU (or when specification of an area in an image is accepted by the operation section), the leak-preventing identification mark detecting section, the positional relation calculating section and the forgery-preventing identification mark detecting section respectively determine whether patterns respectively representing a leak-preventing identification mark and a forgery-preventing identification mark are included separately in the entire area of the image and in an area to be enlarged (or an area whose specification has been accepted) or not.

Abstract: A mold comprises a spherical cavity, a support pin capable of being moved forward and backward with respect to the cavity, and a vent pin (8). The vent pin (8) includes two slits (S), an annular groove (20) and a vertical groove (22). An upper end (24) of the slit (S) is opened toward the cavity. A lower end (26) of the slit (S) is opened toward the annular groove (20). The annular groove (20) is coupled to the vertical groove (22). The lower end of the vertical groove (22) is opened toward air. A width (W) of the slit (S) is preferably equal to or greater than 1 ?m, is more preferably equal to or greater than 3 ?m, and is particularly preferably equal to or greater than 5 ?m. A depth (D) of the slit (S) is preferably equal to or greater than 10% of a diameter (?), is more preferably equal to or greater than 15% of the diameter (?), and is particularly preferably equal to or greater than 20% of the diameter (?). It is preferable that the same slit (3) should be formed on the support pin.

Abstract: The present invention provides an image processing apparatus including: an image reading section for reading a document image; a particular image determining section for determining whether or not a particular image is included in image data read by the image reading section; an image processing section for processing the image data; and a resolution converting section for changing a resolution of the image data to be transferred to the particular image determining section, wherein the resolution converting section lowers a pixel frequency of the image data to be transmitted to the particular image determining section so as to perform simple processing. The lowered pixel frequency slows down processing speed of the image data and thereby improves determination accuracy.

Abstract: A polishing pad capable of maintaining a high level of dimensional stability upon moisture absorption or water absorption and providing high polishing rate includes a polishing layer of a polyurethane foam having fine cells, wherein the polyurethane foam includes a cured product of a reaction of (1) an isocyanate-terminated prepolymer (A) that includes an isocyanate monomer, a high molecular weight polyol (a), and a low molecular weight polyol, (2) an isocyanate-terminated prepolymer (B) that includes a polymerized diisocyanate and a polyethylene glycol with a number average molecular weight of 200 to 1,000, and (3) a chain extender.

Abstract: An object of the invention is to provide a polishing pad having excellent planarization performance and wear resistance and to provide a method for manufacture thereof. The invention is directed to a polishing pad including a polishing layer including a polyurethane foam having fine cells, wherein the polyurethane foam is a cured product of a reaction of (1) an isocyanate-terminated prepolymer (A) that is capable of reacting with 4,4?-methylenebis(o-chloroaniline) to form a non-foamed polyurethane having a tan ? peak temperature of 100° C. or more, (2) an isocyanate-terminated prepolymer (B) that is capable of reacting with 4,4?-methylenebis(o-chloroaniline) to form a non-foamed polyurethane having a tan ? peak temperature of 40° C. or less, and (3) 4,4?-methylenebis(o-chloroaniline), and the isocyanate-terminated prepolymers (A) and (B) are mixed in an (A)/(B) ratio of 50/50 to 90/10 (by wt %).

Abstract: A polishing pad capable of maintaining a high level of dimensional stability during absorption of moisture or water includes a polishing layer including a polyurethane foam having fine cells, wherein the polyurethane foam includes a cured product of a reaction of an isocyanate-terminated prepolymer (A), a polymerized diisocyanate, and a chain extender, and the isocyanate-terminated prepolymer (A) includes an isocyanate monomer, a high molecular weight polyol (a), and a low molecular weight polyol. A method for manufacturing such a polishing pad includes mixing a first component containing an isocyanate-terminated prepolymer with a second component containing a chain extender and curing the mixture to form a polyurethane foam. The pad so made is used in the manufacture of semiconductor devices.

Abstract: It is an object of the invention to provide a polishing pad capable of high precision optical detection of an endpoint during polishing in progress and prevention of slurry leakage from between a polishing region and a light-transmitting region during the use thereof even after the polishing pad has been used for a long period. It is a second object of the invention to provide a polishing pad capable of suppression of deterioration of polishing characteristics (such as in-plane uniformity) and generation of scratches due to a difference in behavior of a polishing region and a light-transmitting region during polishing. It is a third object of the invention to provide a polishing pad having a polishing region and a light-transmitting region with a concentration of a specific metal equal to or lower than a specific value (threshold value).

Abstract: The image processing apparatus (data processing apparatus) stores data in a storing unit (storing means), inputs and outputs the data to and from the storing unit via a storage control unit (input-output means) and processes the data outputted from the storing unit with a control unit (processing means). The storage control unit inputs and outputs image data to and from the storing unit by the DMA method through a path via a DMA control unit and inputs and outputs other data such as a control instruction to and from the storing unit by the PIO method through a path via a PIO control unit. Image data to be inputted and outputted to and from the storing unit by the DMA method is encrypted in an input operation and decrypted in an output operation by an encryption/decryption unit provided on the input-output path for DMA method.