Patents by Inventor Young Hoon Song

Young Hoon Song has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20140128271
    Abstract: Provided is an assay method using an encoded particle-based platform. In the assay method, first, a plurality of encoded particles having codes distinguishable from one another according to kinds of included target materials are prepared. The plurality of encoded particles are provided onto a plate including a plurality of wells by pipetting, and disposed in the plurality of wells by a self-assembly method. An analyte is provided into the plurality of wells. The codes of the plurality of encoded particles disposed in the plurality of wells are decoded. The target materials of the plurality of encoded particles are released to cause a reaction between the target materials and the analyte.
    Type: Application
    Filed: January 13, 2014
    Publication date: May 8, 2014
    Applicant: SNU R&DB FOUNDATION
    Inventors: Sung Hoon Kwon, Su Eun Chung, Sung Hoon Lee, Wook Park, Young Hoon Song
  • Patent number: 8673986
    Abstract: The present invention relates to a coacervate comprising a mussel adhesive protein and an anionic polymer, and more particularly, to a coacervate prepared by mixing a mussel adhesive protein with an anionic polymer, and a novel use thereof. In the present invention, a coacervate prepared by mixing a mussel adhesive protein and an anionic polymer shows a very excellent adhesive strength to various substrates such as cells or metals, and is able to maintain its adhesive strength in the presence of water or under water, thereby being effectively used as an adhesive. Moreover, it has an activity capable of encapsulating bioactive materials, thereby being effectively used as an active component of a composition for delivering bioactive materials.
    Type: Grant
    Filed: August 6, 2010
    Date of Patent: March 18, 2014
    Assignee: Postech Academy-Industry Foundation
    Inventors: Hyung Joon Cha, Yoo Seong Choi, Dong Gyun Kang, Young Hoon Song, Seonghye Lim, Bong-Hyuk Choi
  • Patent number: 8574504
    Abstract: A plasma scrubber that forms a high temperature atmosphere in a reactor to effectively decompose and remove a non-biodegradable gas and reduce power consumption is disclosed. The plasma scrubber includes: a first reactor to which a non-biodegradable gas is supplied; an electrode installed in the first reactor and protruding in the flow direction of the non-biodegradable gas to generate plasma in the non-biodegradable gas supplied between the electrode and the first reactor by a discharge reaction in the first reactor; a second reactor connected to the first reactor to form continuous arc jets by anchoring the plasma to the electrode; and a third reactor connected to the second reactor to decompose the non-biodegradable gas by forming a reaction section of high temperature that contains electrons and chemical species of high reactivity in the second reactor and thereby increasing the stay time and reactivity of the non-biodegradable gas.
    Type: Grant
    Filed: October 8, 2008
    Date of Patent: November 5, 2013
    Assignee: Korea Institute of Machinery & Materials
    Inventors: Kwan-Tae Kim, Dae-Hoon Lee, Young-Hoon Song, Min-Suk Cha, Jae-Ok Lee
  • Patent number: 8568662
    Abstract: The present invention relates to a plasma reaction apparatus and a plasma reaction method using the same. More particularly, the present invention relates to a plasma reaction apparatus which is applied to the reforming of fuel by generating rotating arc plasma and using the rotating arc being generated, the chemical treatment of a persistent gas, and the apparatus for decreasing NOx by an occlusion catalyst, and a plasma reaction method using the same. For this purpose, a raw material for a reaction is allowed to flow through an inflow hole in a swirl structure so that the raw material forms a rotating flow to progress. Accordingly, the raw material is sufficiently reacted in a plasma reaction space of a restrictive volume, and a high temperature plasma reaction is more promptly performed.
    Type: Grant
    Filed: October 9, 2006
    Date of Patent: October 29, 2013
    Assignee: Korea Institute of Machinery and Materials
    Inventors: Dae Hoon Lee, Kwan Tae Kim, Young Hoon Song, Min Suk Cha, Jae Ok Lee, Seock Joon Kim
  • Patent number: 8524162
    Abstract: A plasma reaction apparatus and method applied to reformation of fuel by generating and using rotating arc plasma in a furnace, the chemical treatment of a persistent gas, and the apparatus for decreasing NOx by an occlusion catalyst. A raw material for a reaction is allowed to flow into the furnace through a hole, causing it to flow within the furnace in a continuous swirl. Furthermore, an expanded plasma reaction zone is provided by a wide area chamber which is formed on an upper part of the furnace and has a greater width than that of a lower part of the furnace, and thus a plasma being generated can be expanded by the expanded plasma zone and delayed from flowing out of the furnace by corners of the wide area chamber that is spaced from a plasma inducing electrode therein.
    Type: Grant
    Filed: August 6, 2012
    Date of Patent: September 3, 2013
    Assignee: Korea Institute of Machinery and Materials
    Inventors: Dae Hoon Lee, Kwan Tae Kim, Young Hoon Song, Min Suk Cha, Jae Ok Lee, Seock Joon Kim
  • Publication number: 20130087287
    Abstract: Provided is a plasma reactor for removal of contaminants, which is installed between a process chamber and a vacuum pump and removes contaminants emitted from a process chamber. The plasma reactor includes: at least one dielectric body that forms a plasma generation space therein; a ground electrode connected to at least one end of the dielectric body; and at least one driving electrode fixed to an outer peripheral surface of the dielectric body, and connected to an AC power supply unit to receive an AC driving voltage. The ground electrode has a non-uniform diameter along the lengthwise direction of the plasma reactor.
    Type: Application
    Filed: June 27, 2012
    Publication date: April 11, 2013
    Applicant: KOREA INSTITUTE OF MACHINERY & MATERIALS
    Inventors: Min HUR, Jae Ok LEE, Woo Seok KANG, Dae-Hoon LEE, Kwan-Tae KIM, Young-Hoon SONG
  • Patent number: 8385048
    Abstract: There is provided a chip type laminated capacitor, including: a ceramic body including a dielectric layer having a thickness equal to 10 or more times an average particle diameter of a grain included therein and being 3 ?m or less; first and second outer electrodes formed on both ends of the ceramic body in a length direction; first and second band parts formed to extend inwardly of the ceramic body in the length direction on a length-width (L-W) plane from the first and second outer electrodes and having different lengths; and third and fourth band parts formed to extend inwardly of the ceramic body in the length direction on a length-thickness (L-T) plane from the first and second outer electrodes and having different lengths.
    Type: Grant
    Filed: June 21, 2012
    Date of Patent: February 26, 2013
    Assignee: Samsung Electro-Mechanics Co., Ltd.
    Inventors: Young Ghyu Ahn, Byoung Hwa Lee, Min Cheol Park, Young Hoon Song, Mi Hee Lee
  • Publication number: 20130039816
    Abstract: A plasma reaction apparatus and method applied to reformation of fuel by generating and using rotating arc plasma in a furnace, the chemical treatment of a persistent gas, and the apparatus for decreasing NOx by an occlusion catalyst. A raw material for a reaction is allowed to flow into the furnace through a hole, causing it to flow within the furnace in a continuous swirl. Furthermore, an expanded plasma reaction zone is provided by a wide area chamber which is formed on an upper part of the furnace and has a greater width than that of a lower part of the furnace, and thus a plasma being generated can be expanded by the expanded plasma zone and delayed from flowing out of the furnace by corners of the wide area chamber that is spaced from a plasma inducing electrode therein.
    Type: Application
    Filed: August 6, 2012
    Publication date: February 14, 2013
    Applicant: Korea Institute of Machinery and Materials
    Inventors: Dae Hoon LEE, Kwan Tae Kim, Young Hoon Song, Min Suk Cha, Jae Ok Lee, Seok Joon Kim
  • Patent number: 8351181
    Abstract: There is provided a chip type laminated capacitor including: a ceramic body formed by laminating a dielectric layer having a thickness equal to 10 or more times an average particle diameter of a grain included therein and being 3 ?m or less; first and second outer electrodes; a first inner electrode having one end forming a first margin together with one end surface of the ceramic body at which the second outer electrode is formed and the other end leading to the first outer electrode; and a second inner electrode having one end forming a second margin together with the other end surface of the ceramic body at which the first outer electrode is formed and the other end leading to the second outer electrode, wherein the first and second margins have different widths under a condition that they are 200 ?m or less.
    Type: Grant
    Filed: June 22, 2012
    Date of Patent: January 8, 2013
    Assignee: Samsung Electro-Mechanics Co., Ltd.
    Inventors: Young Ghyu Ahn, Byoung Hwa Lee, Min Cheol Park, Young Hoon Song, Mi Hee Lee
  • Publication number: 20120327555
    Abstract: There is provided a chip type laminated capacitor, including: a ceramic body including a dielectric layer having a thickness equal to 10 or more times an average particle diameter of a grain included therein and being 3 ?m or less; first and second outer electrodes formed on both ends of the ceramic body in a length direction; first and second band parts formed to extend inwardly of the ceramic body in the length direction on a length-width (L-W) plane from the first and second outer electrodes and having different lengths; and third and fourth band parts formed to extend inwardly of the ceramic body in the length direction on a length-thickness (L-T) plane from the first and second outer electrodes and having different lengths.
    Type: Application
    Filed: June 21, 2012
    Publication date: December 27, 2012
    Inventors: Young Ghyu AHN, Byoung Hwa Lee, Min Cheol Park, Young Hoon Song, Mi Hee Lee
  • Publication number: 20120327557
    Abstract: There is provided a chip type laminated capacitor including: a ceramic body formed by laminating a dielectric layer having a thickness equal to 10 or more times an average particle diameter of a grain included therein and being 3 ?m or less; first and second outer electrodes; a first inner electrode having one end forming a first margin together with one end surface of the ceramic body at which the second outer electrode is formed and the other end leading to the first outer electrode; and a second inner electrode having one end forming a second margin together with the other end surface of the ceramic body at which the first outer electrode is formed and the other end leading to the second outer electrode, wherein the first and second margins have different widths under a condition that they are 200 ?m or less.
    Type: Application
    Filed: June 22, 2012
    Publication date: December 27, 2012
    Inventors: Young Ghyu AHN, Byoung Hwa Lee, Min Cheol Park, Young Hoon Song, Mi Hee Lee
  • Publication number: 20120295297
    Abstract: Provided is an assay method using an encoded particle-based platform. In the assay method, first, a plurality of encoded particles having codes distinguishable from one another according to kinds of included target materials are prepared. The plurality of encoded particles are provided onto a plate including a plurality of wells by pipetting, and disposed in the plurality of wells by a self-assembly method. An analyte is provided into the plurality of wells. The codes of the plurality of encoded particles disposed in the plurality of wells are decoded. The target materials of the plurality of encoded particles are released to cause a reaction between the target materials and the analyte.
    Type: Application
    Filed: May 17, 2012
    Publication date: November 22, 2012
    Applicant: SNU R&DB FOUNDATION
    Inventors: Sunghoon KWON, Su Eun CHUNG, Sung Hoon LEE, Wook PARK, Young Hoon SONG, Ji Sung JANG, Hyoki KIM, Howon LEE
  • Patent number: 8272206
    Abstract: A reduction system for particulate materials in exhaust gas, which is connected to a tailpipe of an engine that burns a hydrocarbon-based fuel supplied from a fuel storage tank, and collects and removes particulate materials within the exhaust gas, may include a plasma reactor having a gas inlet and an outlet, and a DPF (diesel particulate filter) trap having a filter. The tailpipe of the engine may communicate with the gas inlet of the plasma reactor, and the outlet of the plasma reactor may communicate with the DPF trap. The exhaust gas exhausted from the engine may be transferred to the DPF trap after being heated while passing through the plasma reactor.
    Type: Grant
    Filed: July 12, 2007
    Date of Patent: September 25, 2012
    Assignee: Korea Institute of Machinery & Materials
    Inventors: Dae-hoon Lee, Kwan-tae Kim, Young-hoon Song, Min-suk Cha, Jae-ok Lee
  • Patent number: 8257455
    Abstract: A plasma burner and a diesel particulate filter (DPF) trap that can effectively oxidize and remove a particulate material (PM) within an exhaust gas by preheating fuel and mixing the fuel with the exhaust gas are provided. The DPF includes: a filter that is connected to an exhaust conduit at a side opposite to that of an engine; a plasma burner that is provided within the exhaust conduit between the engine and the filter, and that includes a fuel inlet that supplies fuel and a flame vent that projects a flame by a plasma discharge, and that heats exhaust gas; and a fuel inflow conduit that connects the fuel inlet and a fuel tank.
    Type: Grant
    Filed: June 6, 2008
    Date of Patent: September 4, 2012
    Assignee: Korea Institute of Machinery & Materials
    Inventors: Dae-Hoon Lee, Kwan-Tae Kim, Young-Hoon Song, Min-Suk Cha, Jae-Ok Lee
  • Publication number: 20120201748
    Abstract: The present invention relates to a coacervate comprising a mussel adhesive protein and an anionic polymer, and more particularly, to a coacervate prepared by mixing a mussel adhesive protein with an anionic polymer, and a novel use thereof. In the present invention, a coacervate prepared by mixing a mussel adhesive protein and an anionic polymer shows a very excellent adhesive strength to various substrates such as cells or metals, and is able to maintain its adhesive strength in the presence of water or under water, thereby being effectively used as an adhesive. Moreover, it has an activity capable of encapsulating bioactive materials, thereby being effectively used as an active component of a composition for delivering bioactive materials.
    Type: Application
    Filed: August 6, 2010
    Publication date: August 9, 2012
    Applicant: POSTECH ACADEMY-INDUSTRY FOUNDATION
    Inventors: Hyung Joon Cha, Yoo Seong Choi, Dong Gyun Kang, Young Hoon Song, Seonghye Lim, Bong-Hyuk Choi
  • Publication number: 20120202748
    Abstract: The present invention relates to a bio-adhesive derived from mussel. In particular, it relates to a recombinant protein fp(foot protein)-131 that is a hybrid of fp-3 variant A and fp-1. According to the present invention, the recombinant protein with adhesive activity can be economically produced in large scale to be used in place of chemical adhesives.
    Type: Application
    Filed: February 7, 2012
    Publication date: August 9, 2012
    Applicant: POSTECH ACADEMY-INDUSTRY FOUNDATION
    Inventors: Hyung Joon CHA, Dong Gyun KANG, Young Hoon SONG, Yoo Seong CHOI, Seonghye LIM
  • Patent number: 7998357
    Abstract: For integrated circuit fabrication, at least one spacer support structure is formed in a first area over a semiconductor substrate, and a mask material is deposited on exposed surfaces of the spacer support structure and on a second area over the semiconductor substrate. A masking structure is formed on a portion of the mask material in the second area, and the mask material is patterned to form spacers on sidewalls of the spacer support structure and to form a mask pattern under the masking structure. The spacer support structure and the masking structure are comprised of respective high carbon content materials that have been spin-coated and have substantially a same etch selectivity.
    Type: Grant
    Filed: July 9, 2008
    Date of Patent: August 16, 2011
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Nam-Myun Cho, Myeong-Cheol Kim, Shi-Yong Yi, Young-Hoon Song, Young-Ju Park
  • Publication number: 20110089017
    Abstract: The present invention provides a plasma reactor for abating hazardous materials generated in a low-pressure process during a process of manufacturing a display or a semiconductor. A plasma reactor for abating hazardous materials according to an exemplary embodiment of the present invention includes: a first ground electrode and a second ground electrode disposed at a distance from each other; a dielectric fixed between the first ground electrode and the second ground electrode; and at least one driving electrode disposed on an outer surface of the dielectric, being spaced apart from the first ground electrode and the second ground electrode and connected to an AC power supply unit to receive a driving voltage therefrom.
    Type: Application
    Filed: October 15, 2010
    Publication date: April 21, 2011
    Inventors: Min HUR, Min-Suk Cha, Young-Hoon Song, Jae-Ok Lee, Dae-Hoon Lee, Kwan-Tae Kim
  • Publication number: 20100115405
    Abstract: A mobile communication terminal is provided. The mobile communication terminal includes a memory, a touch screen, and a controller. The touch screen is configured to display an Internet address input window, at least a portion of an Internet page corresponding to an Internet address in the Internet address input window, and a virtual key pad. The controller is configured to generate a duplicate window of the Internet address input window in response to a first touch input performed on the Internet address input window, move the duplicate window in response to a drag operation, store the Internet address in a memory in response to dropping the moved duplicate window on a key in the virtual key pad, and generate a short-cut by assigning the stored Internet address to the key.
    Type: Application
    Filed: May 5, 2009
    Publication date: May 6, 2010
    Inventors: Min Kyoung Chang, Joo Hee Son, Young Hoon Song, Seung Hwan Son, Hyo Jin Suh
  • Publication number: 20100097321
    Abstract: Disclosed are a terminal in which a shape or configuration of a virtual keypad is transformable by considering user's convenience and a method for controlling the same, the terminal including: a display module configured to display a virtual keypad; a user input unit configured to receive a touch or drag input from a user; and a controller configured to transform the shape of the virtual keypad according to a dragged direction or dragged length when a spot of the virtual keypad is touched to be dragged in a specific direction.
    Type: Application
    Filed: June 12, 2009
    Publication date: April 22, 2010
    Inventors: Joo-Hee Son, Young-Hoon Song, Hyo-Jin Suh, Seung-Hwan Son