Abstract: Approaches, techniques, and mechanisms are disclosed for accessing AI services from one region to another region. An artificial intelligence (AI) service director is configured with mappings from domain names of AI cloud engines to IP addresses of edge nodes of an AI delivery edge network. The AI cloud engines are located in an AI source region. The AI delivery edge network is deployed in a non-AI-source region. An AI application, which accesses AI services using a domain name of an AI cloud engine in the AI cloud engines located in the AI source region, is redirected to an edge node in the edge nodes of the AI delivery edge network located in the non-AI-source region. The AI application is hosted in the non-AI-source region. The AI services is then provided, by way of the edge node located in the non-AI-source region, to the AI application.

Abstract: The present invention discloses a coating device including: a first shell, having a top portion and a side portion; and a second shell, accommodated in the first shell and at least partially divergently extending downwards from the top portion of the first shell. The first shell and the second shell define a first space in between, the second shell defines a second space, and the first space surrounds the second space and the two are not in communication.

Abstract: The present invention is direct to a two-mode blockchain consensus protocol and a system implementing such a protocol. The system includes a plurality of node computers (and a communications network connecting the plurality of node computers. The plurality of node computers includes a first node computer, a collecting node computer, a committee of node computers, and one or more node computers that operate based on proof of work algorithms. Each node computer in the plurality includes a blockchain consensus software application running on the processor of the node computer. The blockchain consensus software application is adapted to connect to the plurality of node computers that are connected to the communications network. The blockchain consensus software application implements the two-mode blockchain consensus protocol. Through the software application, the plurality of node computers operate to reach a consensus on adding data to a public ledger.

Abstract: Methods and apparatus for processing a substrate are provided herein. For example, apparatus can include a first voltage/current (V/I) probe configured to connect to an input side of a matching network of the processing chamber and a second V/I probe configured to connect to an output side of the matching network and a processor coupled to the first V/I probe and the second V/I probe and configured to, based on a phase gap between a V and I of an RF signal detected by at least one of the first V/I probe or the second V/I probe at a target frequency, detect a minimum phase gap between the V and I, and control at least one of impedance tuning of the matching network or process control of the processing chamber using at least one of a peak or RMS of V, I and phase measured at the target frequency or under sweeping frequency.

Abstract: The present disclosure provides an interactive device, an inductive screen, an interactive system, and a positioning method, and relates to the field of display technologies, with an objective of providing a low-cost positioning and interactive method. The interactive device includes: a first housing, a first end of the first housing having a light-exit opening; a first light-emitting component, arranged inside the first housing and configured to emit a linear light beam through the light-exit opening of the first housing, the linear light beam rotating with rotation of the first housing; and a driving component, connected to a second end of the first housing opposite to the first end and configured to drive the first housing to rotate.

Abstract: The present invention is direct a two-mode blockchain consensus protocol and a system implementing such a protocol. The system includes a plurality of node computers (and a communications network connecting the plurality of node computers. The plurality of node computers includes a first node computer, a collecting node computer, a committee of node computers, and one or more node computers that operate based on proof of work algorithms. Each node computer in the plurality includes a blockchain consensus software application running on the processor of the node computer. The blockchain consensus software application is adapted to connect to the plurality of node computers that are connected to the communications network. The blockchain consensus software application implements the two-mode blockchain consensus protocol. Through the software application, the plurality of node computers operate to reach a consensus on adding data to a public ledger.

Abstract: Embodiments of the disclosure provided herein include an apparatus and method for the plasma processing of a substrate in a processing chamber. More specifically, embodiments of this disclosure describe a biasing scheme that is configured to provide a radio frequency (RF) generated RF waveform from an RF generator to one or more electrodes within a processing chamber and a pulsed-voltage (PV) waveform delivered from one or more pulsed-voltage (PV) generators to the one or more electrodes within the processing chamber. The plasma process(es) disclosed herein can be used to control the shape of an ion energy distribution function (IEDF) and the interaction of the plasma with a surface of a substrate during plasma processing.

Abstract: Embodiments of the disclosure provided herein include an apparatus and method for the plasma processing of a substrate in a processing chamber. More specifically, embodiments of this disclosure describe a biasing scheme that is configured to provide a radio frequency (RF) generated RF waveform from an RF generator to one or more electrodes within a processing chamber and a pulsed-voltage (PV) waveform delivered from one or more pulsed-voltage (PV) generators to the one or more electrodes within the processing chamber. The plasma process(es) disclosed herein can be used to control the shape of an ion energy distribution function (IEDF) and the interaction of the plasma with a surface of a substrate during plasma processing.

Abstract: Embodiments of the disclosure provided herein include an apparatus and method for the plasma processing of a substrate in a processing chamber. More specifically, embodiments of this disclosure describe a biasing scheme that is configured to provide a radio frequency (RF) generated RF waveform from an RF generator to one or more electrodes within a processing chamber and a pulsed-voltage (PV) waveform delivered from one or more pulsed-voltage (PV) generators to the one or more electrodes within the processing chamber. The plasma process(es) disclosed herein can be used to control the shape of an ion energy distribution function (IEDF) and the interaction of the plasma with a surface of a substrate during plasma processing.

Abstract: The present disclosure provides a method and apparatus of fusing operators, an electronic device and a storage medium, which relates to fields of deep learning, artificial intelligence and knowledge graph. The method includes: determining operator groups to be fused, according to an operator graph to be processed, wherein each operator group of the operator groups includes at least two operators in the operator graph respectively; obtaining a fused operator corresponding to the each operator group respectively; and for the fused operator, replacing corresponding operators in the operator graph with the fused operator respectively, and coupling dependence edges of the corresponding operators to the any fused operator, wherein the corresponding operators include operators in the operator group corresponding to the fused operator.

Abstract: A model training method includes: constructing a mapping model between original color information values and standard color information values of images with a coefficient matrix; establishing an objective function of the mapping model based on a regular term of a variable exponent; determining original color information values and standard color information values of a plurality of sample images; and calculating the objective function from the original color information values and the standard color information values of the plurality of sample images to determine the coefficient matrix.

Abstract: Methods and apparatus for processing a substrate are provided herein. For example, a method for processing a substrate includes applying at least one of low frequency RF power or DC power to an upper electrode formed from a high secondary electron emission coefficient material disposed adjacent to a process volume; generating a plasma comprising ions in the process volume; bombarding the upper electrode with the ions to cause the upper electrode to emit electrons and form an electron beam; and applying a bias power comprising at least one of low frequency RF power or high frequency RF power to a lower electrode disposed in the process volume to accelerate electrons of the electron beam toward the lower electrode.

Abstract: Methods and apparatus for processing a substrate are provided herein. For example, a method for processing a substrate includes applying at least one of low frequency RF power or DC power to an upper electrode formed from a high secondary electron emission coefficient material disposed adjacent to a process volume; generating a plasma comprising ions in the process volume; bombarding the upper electrode with the ions to cause the upper electrode to emit electrons and form an electron beam; and applying a bias power comprising at least one of low frequency RF power or high frequency RF power to a lower electrode disposed in the process volume to accelerate electrons of the electron beam toward the lower electrode.

Abstract: A method of forming a transparent carbon layer on a substrate is provided. The method comprises generating an electron beam plasma above a surface of a substrate positioned over a first electrode and disposed in a processing chamber having a second electrode positioned above the first electrode. The method further comprises flowing a hydrocarbon-containing gas mixture into the processing chamber, wherein the second electrode has a surface containing a secondary electron emission material selected from a silicon-containing material and a carbon-containing material. The method further comprises applying a first RF power to at least one of the first electrode and the second electrode and forming a transparent carbon layer on the surface of the substrate.

Abstract: Methods and apparatus for processing a substrate are provided herein. For example, a method for processing a substrate includes applying at least one of low frequency RF power or DC power to an upper electrode formed from a high secondary electron emission coefficient material disposed adjacent to a process volume; generating a plasma comprising ions in the process volume; bombarding the upper electrode with the ions to cause the upper electrode to emit electrons and form an electron beam; and applying a bias power comprising at least one of low frequency RF power or high frequency RF power to a lower electrode disposed in the process volume to accelerate electrons of the electron beam toward the lower electrode.

Abstract: The present invention discloses a selenium-doped MXene material and a preparation method thereof, comprising the following steps: (1) adding MXene and an organic selenium source into a dispersant, and stirring to prepare a dispersion with a concentration of 10 mg/ml to 100 mg/ml, wherein a mass ratio of MXene and an organic selenium source is 0.1 to 1:1; (2) transferring the dispersion into a reaction kettle, heating to 110° C. to 230° C., reacting for 10 h to 30 h, and then naturally cooling to a room temperature; and (3) washing the product obtained in the step (2) with a cleaning agent, centrifuging to collect a precipitate, and drying the precipitate under vacuum to obtain the selenium-doped MXene material. The composite material prepared by the present invention has high specific surface area, good electrical conductivity, cycle stability performance, rate performance and high theoretical specific capacity.

Abstract: Methods and apparatus for processing a substrate are provided herein. For example, a method for processing a substrate includes applying at least one of low frequency RF power or DC power to an upper electrode formed from a high secondary electron emission coefficient material disposed adjacent to a process volume; generating a plasma comprising ions in the process volume; bombarding the upper electrode with the ions to cause the upper electrode to emit electrons and form an electron beam; and applying a bias power comprising at least one of low frequency RF power or high frequency RF power to a lower electrode disposed in the process volume to accelerate electrons of the electron beam toward the lower electrode.

Abstract: The present disclosure provides methods for treating a human patient diagnosed with a cancer, comprising administering a therapeutically effective amount of a PRMT5 (protein arginine methyltransferase 5) inhibitor, certain methods comprising (i) administering to the patient initial doses of at least about 0.1 mg per day of the PRMT5 inhibitor that is (1S,2R,3S,5R)-3-(2-(2-amino-3-bromoquinolin-7-yl)ethyl)-5-(4-amino-7H-pyrrolo[2,3-d]pyrimidin-7-yl)cyclopentane-1,2-diol or a pharmaceutically acceptable addition salt or solvate thereof for an initial dosing period of about 5 to about 21 days; and (ii) administering to the patient subsequent doses of at least about 0.1 mg per day of the PRMT5 inhibitor for one or more subsequent dosing periods of about 5 to about 21 days each. In these methods, a first subsequent dosing period is separated in time from the initial dosing period by at least about 5 days and the subsequent dosing periods are separated in time from each other by at least about 5 days.

Abstract: The present invention discloses a tellurium-doped MXene composite material and a preparation method thereof, comprising the following steps: (1) adding MXene and a tellurium source into a dispersant to prepare a dispersion, and then stirring the dispersion; (2) heating the dispersion, reacting, and then cooling; (3) centrifuging the product obtained in the step (2), then washing and drying under vacuum; and (4) placing the dry product obtained in the step (3) into a corundum ark, and then transferring into a tubular furnace, heating under the protection of inert gas, retaining the temperature, and then cooling to obtain the tellurium-doped MXene composite material. The composite material prepared by the present invention can be used as a cathode of a potassium ion battery, which increases the interlamellar spacing, and optimizes an ion diffusion channel, so that the electrochemical performance of the potassium ion battery is improved.

Abstract: Embodiments described herein relate to apparatus and methods for performing electron beam reactive plasma etching. In one embodiment, an apparatus for performing EBRPE processes includes an electrode formed from a material having a high secondary electron emission coefficient. The electrode has an electron emitting surface disposed at a nonparallel angle relative to a major axis of a substrate assembly. The EBRPE apparatus may further comprise a capacitive or inductive coupled plasma generator. In another embodiment, methods for etching a substrate include generating a plasma and bombarding an electrode with ions from the plasma to cause the electrode to emit electrons. The electrons are accelerated toward a substrate to induce directional etching of the substrate. During the EBPRE process, the substrate or electrode is actuated through a process volume during the etching.