Patents by Inventor Yukio Taniguchi

Yukio Taniguchi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7410848
    Abstract: There are provided a crystallization method which can design laser beam having a light intensity and a distribution optimized on an incident surface of a substrate, form a desired crystallized structure while suppressing generation of any other undesirable structure area and satisfy a demand for low-temperature processing, a crystallization apparatus, a thin film transistor and a display apparatus. When crystallizing a non-single-crystal semiconductor thin film by irradiating laser beam thereto, irradiation light beam to the non-single-crystal semiconductor thin film have a light intensity with a light intensity distribution which cyclically repeats a monotonous increase and a monotonous decrease and a light intensity which melts the non-single-crystal semiconductor. Further, at least a silicon oxide film is provided on a laser beam incident surface of the non-single-crystal semiconductor film.
    Type: Grant
    Filed: June 29, 2004
    Date of Patent: August 12, 2008
    Assignee: Advanced LCD Technologies Development Center Co., Ltd.
    Inventors: Masayuki Jyumonji, Hiroyuki Ogawa, Masakiyo Matsumura, Masato Hiramatsu, Yoshinobu Kimura, Yukio Taniguchi, Tomoya Kato
  • Patent number: 7361221
    Abstract: A light irradiation apparatus includes a light modulation element which has a phase modulation area having at least one basic pattern for modulating a light beam, an illumination system which illuminates the phase modulation area of the light modulation element with a light beam, and an image formation optical system which causes a light beam on an irradiation target surface a light intensity distribution having an inverse-peak-shaped pattern formed based on the light beam phase-modulated by the phase modulation element to fall on an irradiation target object. Dimensions of the basic pattern are not greater than a point spread function range of the image formation optical system converted in terms of the light modulation element. The phase modulation area is configured in such a manner that a phase distribution in a light complex amplitude distribution on the irradiation target surface becomes a saw-tooth-like distribution along a line segment in a lateral direction.
    Type: Grant
    Filed: August 25, 2005
    Date of Patent: April 22, 2008
    Assignee: Advanced LCD Technologies Development Center Co., Ltd.
    Inventors: Masakiyo Matsumura, Yukio Taniguchi
  • Patent number: 7347897
    Abstract: A crystallization apparatus of the present invention irradiates a non-single-crystal semiconductor film with a luminous flux having a predetermined light intensity distribution to crystallize the film, and comprises a phase modulation device comprising a plurality of unit areas which are arranged in a certain period and which mutually have substantially the same pattern, and an optical image forming system disposed between the phase modulation device and the non-single-crystal semiconductor film. The unit area of the phase modulation device has a reference face having a certain phase, a first area disposed in the vicinity of a center of each unit area and having a first phase difference with respect to the reference face, and a second area disposed in the vicinity of the first area and having substantially the same phase difference as that of the first phase difference with respect to the reference face.
    Type: Grant
    Filed: April 5, 2005
    Date of Patent: March 25, 2008
    Assignee: Advanced LCD Technologies Development Center Co., Ltd.
    Inventors: Tomoya Kato, Masakiyo Matsumura, Yukio Taniguchi
  • Publication number: 20080064922
    Abstract: A color image pickup and display device that can be simply structured and provided at a low price. A lighting source irradiates lights of primary colors in a manner capable of being switched in a predetermined sequence. Monochrome solid-state image sensors are used as image pickup means, while a backlight type monochrome LCD element is used as a display of a display device. The LCD element can switch the color of backlight to the same color as that of the lighting source synchronously with the switching of color thereof. Thus, the backlight can emit light of the same color as that of the light emitted by the lighting source when the picture signals outputted by the sensors in response to the image observed by the light of the lighting source are displayed by the LCD element.
    Type: Application
    Filed: November 10, 2005
    Publication date: March 13, 2008
    Applicants: PENTAX CORPORATION, TOHOKU UNIVERSITY, SOYOU CORPORATION
    Inventors: Tatsuo Uchida, Yoshito Suzuki, Go Sugiura, Yukio Taniguchi
  • Patent number: 7335261
    Abstract: Disclosed are apparatus for forming a semiconductor film having an excellent crystallinity from a non-single crystal semiconducting layer formed on a base layer made of an insulating material. The apparatus includes a light source, a homogenizer for homogenizing an intensity distribution of the emitted light, an amplitude-modulation means for performing the amplitude-modulation such that the amplitude of the light, of which the intensity distribution is homogenized, is increased in the direction of the relative motion of the light to the base layer, an optional light projection optical system for projecting the amplitude-modulated light onto the surface of the non-single crystal semiconductor such that a predetermined irradiation energy can be obtained, a phase shifter for providing a low temperature point in the surface irradiated by the light, and a substrate stage to move the light relative to the substrate thereby enabling scanning in the X and Y axis.
    Type: Grant
    Filed: August 5, 2005
    Date of Patent: February 26, 2008
    Assignee: Kabushiki Kaisha Ekisho Sentan Gijutsu Kaihatsu Center
    Inventors: Masakiyo Matsumura, Mikihiko Nishitani, Yoshinobu Kimura, Masayuki Jyumonji, Yukio Taniguchi, Masato Hiramatsu, Fumiki Nakano
  • Publication number: 20080032244
    Abstract: A crystallization method which generates a crystallized semiconductor film by irradiating at least one of a polycrystal semiconductor film and an amorphous semiconductor film with light beams having a light intensity distribution with an inverse peak pattern that a light intensity is increased toward the periphery from an inverse peak at which the light intensity is minimum, wherein a light intensity value a (standardized value) in the inverse peak when a maximum value of the light intensity in the light intensity distribution with the inverse peak pattern is standardized as 1 is set to 0.2?value ??0.8.
    Type: Application
    Filed: October 3, 2007
    Publication date: February 7, 2008
    Applicant: Advanced LCD Technologies Dev. Ctr. Co., Ltd.
    Inventors: Yukio TANIGUCHI, Masakiyo Matsumura
  • Publication number: 20080019002
    Abstract: A crystallization apparatus includes an illumination system which applies illumination light for crystallization to a non-single-crystal semiconductor film, and a phase shifter which includes first and second regions disposed to form a straight boundary and transmitting the illumination light from the illumination system by a first phase retardation therebetween, and phase-modulates the illumination light to provide a light intensity distribution having an inverse peak pattern that light intensity falls in a zone of the non-single-crystal semiconductor film containing an axis corresponding to the boundary. The phase shifter further includes a small region which extends into at least one of the first and second regions from the boundary and transmits the illumination light by a second phase retardation with respect to the at least one of the first and second regions.
    Type: Application
    Filed: September 26, 2007
    Publication date: January 24, 2008
    Applicant: Advanced LCD Technologies Dev. Ctr. Co., Ltd
    Inventors: Yukio TANIGUCHI, Masakiyo Matsumura, Hirotaka Yamaguchi, Mikihiko Nishitani, Susumu Tsujikawa, Yoshinobu Kimura, Masayuki Jyumonji
  • Patent number: 7311771
    Abstract: A crystallization apparatus according to the present invention includes a first irradiation system which irradiates a predetermined area on a glass substrate having an irradiation target, i.e., an a-Si thin film with light beams having a substantially homogeneous light intensity distribution, and a second irradiation system which irradiates the predetermined area with light beams having a light intensity distribution with an inverse peak pattern that a light intensity is increased toward the periphery from an area in which the light intensity is minimum.
    Type: Grant
    Filed: March 18, 2004
    Date of Patent: December 25, 2007
    Assignee: Advanced LCD Technologies Development Center Co., Ltd.
    Inventors: Yukio Taniguchi, Masakiyo Matsumura
  • Publication number: 20070215037
    Abstract: A light irradiation apparatus irradiates a target plane with light having a predetermined light intensity distribution. The apparatus includes a light modulation element having a light modulation pattern of a periodic structure represented by a primitive translation vector (a1, a2), an illumination system for illuminating the modulation element with the light, and an image forming optical system for forming the predetermined light intensity distribution obtained by the modulation pattern on the target plane. A shape of an exit pupil of the illumination system is similar to the Wigner-Seitz cell of a primitive reciprocal lattice vector (b1, b2) obtained from the primitive translation vector (a1, a2) by the following equations: b1=2?(a2×a3)/(a1·(a2×a3)) and b2=2?(a3×a1)/(a1·(a2×a3)) in which a3 is a vector having an arbitrary size in a normal direction of a flat surface of the modulation pattern of the modulation element, “·” is an inner product of the vector, and “×” is an outer product of the vector.
    Type: Application
    Filed: March 16, 2007
    Publication date: September 20, 2007
    Inventor: Yukio TANIGUCHI
  • Publication number: 20070211327
    Abstract: A light application apparatus includes an optical modulation element provided with a plurality of phase steps, a light beam which is entered into the optical modulation element being phase-modulated by the phase steps and exits from the optical modulation element as a light beam having a first light intensity distribution. An optical system is arranged between the optical modulation element and an predetermined plane. The optical system divides the phase-modulated light beam into at least two light fluxes having second and third light intensity distributions and different optical characteristics from each other, and projects a light beam including the divided two light fluxes, the light intensity distributions of the projected light fluxes being combined with each other, so that the projected light beam has a fourth light intensity distribution with an inverse peak shape on the predetermined plane and enters the predetermined plane.
    Type: Application
    Filed: May 16, 2007
    Publication date: September 13, 2007
    Inventors: Yukio Taniguchi, Masakiyo Matsumura
  • Publication number: 20070201014
    Abstract: A light irradiation apparatus includes a light modulation element that modulates a phase of incident light to emit the modulated light therefrom, and an image forming optical system that is arranged between the light modulation element and an irradiation target plane, and forms an image of the emitted light to irradiate the irradiation target plane with the light having a predetermined light intensity. The light modulation element has in a unit region a plurality of area ratio changing structures including a first area ratio changing structure and a second area ratio changing structure. The first area ratio changing structure has at least one first phase modulation region in which an area share ratio varies in a first direction. The second area ratio changing structure has at least one second phase modulation region in which an area share ratio varies in a second direction different from the first direction.
    Type: Application
    Filed: February 13, 2007
    Publication date: August 30, 2007
    Inventors: Yukio Taniguchi, Masakiyo Matsumura
  • Publication number: 20070188840
    Abstract: A light irradiation apparatus includes a light modulation element which modulates a phase of an incident light beam to obtain a V-shaped light intensity distribution having a bottom portion of a minimum light intensity, and an image formation optical system which applies the modulated light beam from the light modulation element to an irradiation target surface in such a manner that the V-shaped light intensity distribution is provided on the irradiation target surface. The light modulation element has such a complex amplitude transmittance distribution that a secondary derivative of a phase value of a complex amplitude distribution becomes substantially zero at the bottom portion of the V-shaped light intensity distribution in an image space of the image formation optical system.
    Type: Application
    Filed: April 17, 2007
    Publication date: August 16, 2007
    Inventor: Yukio Taniguchi
  • Publication number: 20070151507
    Abstract: The present invention comprises a light modulation optical system having a first element which forms a desired light intensity gradient distribution to an incident light beam and a second element which forms a desired light intensity minimum distribution with an inverse peak shape to the same, and an image formation optical system which is provided between the light modulation optical system and a substrate having a polycrystal semiconductor film or an amorphous semiconductor film, wherein the incident light beam to which the light intensity gradient distribution and the light intensity minimum distribution are formed is applied to the polycrystal semiconductor film or the amorphous semiconductor film through the image formation optical system, thereby crystallizing a non-crystal semiconductor film. The pattern of the first element is opposed to the pattern of the second element.
    Type: Application
    Filed: March 1, 2007
    Publication date: July 5, 2007
    Inventors: Yukio TANIGUCHI, Masakiyo Matsumura, Noritaka Akita
  • Patent number: 7239374
    Abstract: A light application apparatus includes an optical modulation element provided with a plurality of phase steps, a light beam which is entered into the optical modulation element being phase-modulated by the phase steps and exits from the optical modulation element as a light beam having a first light intensity distribution. An optical system is arranged between the optical modulation element and an predetermined plane. The optical system divides the phase-modulated light beam into at least two light fluxes having second and third light intensity distributions and different optical characteristics from each other, and projects a light beam including the divided two light fluxes, the light intensity distributions of the projected light fluxes being combined with each other, so that the projected light beam has a fourth light intensity distribution with an inverse peak shape on the predetermined plane and enters the predetermined plane.
    Type: Grant
    Filed: January 25, 2005
    Date of Patent: July 3, 2007
    Assignee: Advanced LCD Technologies Development Center Co. Ltd.
    Inventors: Yukio Taniguchi, Masakiyo Matsumura
  • Patent number: 7227679
    Abstract: A light irradiation apparatus includes a light modulation element which modulates a phase of an incident light beam to obtain a V-shaped light intensity distribution having a bottom portion of a minimum light intensity, and an image formation optical system which applies the modulated light beam from the light modulation element to an irradiation target surface in such a manner that the V-shaped light intensity distribution is provided on the irradiation target surface. The light modulation element has such a complex amplitude transmittance distribution that a secondary derivative of a phase value of a complex amplitude distribution becomes substantially zero at the bottom portion of the V-shaped light intensity distribution in an image space of the image formation optical system.
    Type: Grant
    Filed: February 7, 2005
    Date of Patent: June 5, 2007
    Assignee: Advanced LCD Technologies Development Center Co., Ltd.
    Inventor: Yukio Taniguchi
  • Publication number: 20070115521
    Abstract: The hologram recording sheet according to the invention is made up of a base film and hologram sensitive materials sensitive to different wavelength regions formed therein in a desired pattern, or a film and at least two hologram recording sensitive materials sensitive to different wavelength regions laminated on the film with a transparent plastic spacer layer located therebetween, thereby enabling the required diffraction light wavelengths to be recorded on the required sites without producing unnecessary interference fringes. At least two hologram recording sensitive materials sensitive to different wavelength regions are formed on different sites on a film in dotted or striped configuration, the size of which is up to 200 mm or at least twice as large as the thickness of the sensitive material layers, thereby enabling regions diffracting light of different wavelengths to be formed in the form of independent sets of interference fringes.
    Type: Application
    Filed: January 12, 2007
    Publication date: May 24, 2007
    Applicant: DAI NIPPON PRINTING CO., LTD.
    Inventors: Kenji UEDA, Tsuyoshi Hotta, Yukio Taniguchi, Atsushi Sekiguchi, Hideyuki Iriyama
  • Publication number: 20070115522
    Abstract: The hologram recording sheet according to the invention is made up of a base film and hologram sensitive materials sensitive to different wavelength regions formed therein in a desired pattern, or a film and at least two hologram recording sensitive materials sensitive to different wavelength regions laminated on the film with a transparent plastic spacer layer located therebetween, thereby enabling the required diffraction light wavelengths to be recorded on the required sites without producing unnecessary interference fringes. At least two hologram recording sensitive materials sensitive to different wavelength regions are formed on different sites on a film in dotted or striped configuration, the size of which is up to 200 mm or at least twice as large as the thickness of the sensitive material layers, thereby enabling regions diffracting light of different wavelengths to be formed in the form of independent sets of interference fringes.
    Type: Application
    Filed: January 12, 2007
    Publication date: May 24, 2007
    Applicant: DAI NIPPON PRINTING CO., LTD.
    Inventors: Kenji Ueda, Tsuyoshi Hotta, Yukio Taniguchi, Atsushi Sekiguchi, Hideyuki Iriyama
  • Patent number: 7217319
    Abstract: A crystallization apparatus includes an illumination system which illuminates a phase shifter having a phase shift portion, and irradiates a polycrystal semiconductor film or an amorphous semiconductor film with a light beam having a predetermined light intensity distribution in which a light intensity is minimum in a point area corresponding to the phase shift portion of the phase shifter, thereby forming a crystallized semiconductor film, the phase shifter has four or more even-numbered phase shift lines which intersect at a point constituting the phase shift portion. An area on one side and an area on the other side of each phase shift line have a phase difference of approximately 180 degrees.
    Type: Grant
    Filed: December 1, 2003
    Date of Patent: May 15, 2007
    Assignee: Advanced LCD Technologies Development Center Co., Ltd.
    Inventors: Masakiyo Matsumura, Yukio Taniguchi
  • Publication number: 20070106122
    Abstract: An intubation assistance apparatus includes a main body; an insertion instrument having an elongated insertion section for insertion into a trachea or its vicinity of a patient from a mouth cavity of the patient; and an imaging device for acquiring an image of an observation site at a distal end portion of the insertion instrument as an electronic image. The intubation assistance apparatus is adapted to be used in an assembled state that the main body, the insertion instrument and the imaging means are assembled together. The main body includes a display having a rectangular screen for displaying the electronic image taken by the imaging device in the assembled state.
    Type: Application
    Filed: October 24, 2006
    Publication date: May 10, 2007
    Applicant: PENTAX CORPORATION
    Inventors: Hidetaka YOKOTA, Yukio TANIGUCHI
  • Publication number: 20070106121
    Abstract: An intubation assistance apparatus includes a main body and an intubation assistance instrument detachably mounted to the main body. The intubation assistance instrument has an elongated insertion section for insertion into the trachea or its vicinity of a patient from the mouth. The insertion section of the intubation assistance instrument is provided with a groove for leading an intubation tube to the trachea of the patient and a scope guide bore for receiving a laryngoscope with a CCD and a white LED. A distal end portion of the scope guide bore is fluid-tightly (air-tightly) sealed. The scope guide bore is fluid-tightly (air-tightly) sealed in its entirety in a state that the intubation assistance instrument is mounted to the main body. A plate-like tongue piece protruding forward and having optical transparency is formed on a distal end portion of the insertion section.
    Type: Application
    Filed: October 24, 2006
    Publication date: May 10, 2007
    Applicants: PENTAX Corporation
    Inventors: Hidetaka Yokota, Yukio Taniguchi, Junichi Koyama